TW555822B - Light diffuse reflecting film-forming composition, manufacturing method thereof, light diffuse reflecting film and liquid crystal display element - Google Patents

Light diffuse reflecting film-forming composition, manufacturing method thereof, light diffuse reflecting film and liquid crystal display element Download PDF

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TW555822B
TW555822B TW091104734A TW91104734A TW555822B TW 555822 B TW555822 B TW 555822B TW 091104734 A TW091104734 A TW 091104734A TW 91104734 A TW91104734 A TW 91104734A TW 555822 B TW555822 B TW 555822B
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light
film
weight
composition
group
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TW091104734A
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Chinese (zh)
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Shoji Ogasawara
Takaki Minowa
Kazuaki Niwa
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Jsr Corp
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Priority claimed from JP2001073491A external-priority patent/JP3775231B2/en
Priority claimed from JP2001389219A external-priority patent/JP3642048B2/en
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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K19/00—Liquid crystal materials
    • C09K19/52—Liquid crystal materials characterised by components which are not liquid crystals, e.g. additives with special physical aspect: solvents, solid particles
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/06—Hydrocarbons
    • C08F212/08—Styrene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/04—Acids; Metal salts or ammonium salts thereof
    • C08F220/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/32—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals
    • C08F220/325—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals containing glycidyl radical, e.g. glycidyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/04—Anhydrides, e.g. cyclic anhydrides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/12—Esters of phenols or saturated alcohols
    • C08F222/18—Esters containing halogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/30—Nitriles
    • C08F222/32—Alpha-cyano-acrylic acid; Esters thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/22—Compounds containing nitrogen bound to another nitrogen atom
    • C08K5/27—Compounds containing a nitrogen atom bound to two other nitrogen atoms, e.g. diazoamino-compounds
    • C08K5/28—Azides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/34—Heterocyclic compounds having nitrogen in the ring
    • C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
    • C08K5/3477—Six-membered rings
    • C08K5/3492—Triazines
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
    • C08K5/41—Compounds containing sulfur bound to oxygen
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/02—Diffusing elements; Afocal elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133553—Reflecting elements

Abstract

This invention is to obtain a composition capable of readily forming a film having a pattern used for a light diffuse reflecting film of a reflecting type or a semi-transmitting type liquid crystal display element, which is excellent in control properties of adhesion to a base film, heat and solvent resistances, and concave and convex shape and can be easily formed and the light diffuse reflecting film having the film formed from the composition and excellent light scattering functions, the method to manufacture the same, and to provide the liquid crystal display element. This composition comprises an alkali-soluble resin, a 1,2-diazide compound and a specific compound or an unsaturated carboxylic acid and/or an unsaturated carboxylic anhydride, an unsaturated compound containing epoxy group, a copolymer of other olefin unsaturated compound and 1,2-diazide. The light diffuse reflecting film and liquid crystal display element have the pattern formed from the composition.

Description

555822 A7 B7 五、發明説明（）| 〔技術領域〕 (請先閲讀背面之注意事項再填寫本頁) 本發明係有關液晶顯示元件等所用之光擴散反射膜形 成用組成物、具有由該組成物所形成之膜的光擴散反射膜 、及具有此光擴散反射膜之液晶顯示元件° 【以往技術】 由於液晶顯示器需要均勻且正面輝度高之表面照明’ 因此以往以具備背光單元者爲主流。然而近年來受到攜帶 式終端機普及化等影響，從省電之觀點而逐漸採用半透過 型及反射型之液晶顯示器。 半透過型及反射型液晶顯示器係於液晶面板下方設置 鋁板等反射膜，藉由反射來自面板上部之光而獲得輝度。 但使用該方法時，因反射膜爲平面，因此當面板上部之入 射光之入射方向傾斜時，反射光之方向會偏離面板之正面 方向，而不能獲得充分之正面輝度。 經濟部智慧財產局員工消費合作社印製 提案使用所謂光擴散板之技術改善反射型液晶顯示器 之上述缺點，該方法係藉由在反射板表面附加微細之凹凸 形狀，使反射光之方向擴散，而得到正面輝度之方法。 例如日本特開2 0 0 0 — 1 1 1 8 8 6號公報揭示玻 璃基板經由化學蝕刻形成粗糙表面，且形成金屬膜，賦予 反射板表面凹凸形狀之技術。依據該方法不僅要保護玻璃 基板內面不受蝕刻液之侵蝕，因此步驟繁雜，而且因使用 腐蝕性之蝕刻液，因此有裝置上、製程上之成本的問題。 又，日本特開2000 — 19380 7號公報中揭示 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） -4- 555822 A7 B7 五、發明説明（i 將含有氟化合物及烷氧矽烷之水解物之溶液狀組成物塗佈 於基板上，利用形成塗膜時之相分離製作具有凹凸形狀之 膜，其上形成金屬膜之技術。該方法對於凹凸形狀之控制 不易，很難得到有效率之擴散光，且與基板之密著性差。 最近使用光敏樹脂，藉由光蝕刻法製作圖案，形成具 有凹凸形狀之膜，其表面形成金屬層，成爲光擴散反射膜 的方法爲主流，但是以往之光敏樹脂不易控制凹凸形狀， 耐熱性不足，反射材料因濺鍍時的熱產生形狀變化，或反 射金屬膜形成圖案時，耐溶劑性不足等之缺點。 〔發明之揭示〕 本發明之目的係提供具有光擴散反射膜所用之粗糙面 ，且與基板之密著性、耐熱性、耐溶劑性、凹凸形狀之控 制性優異，可容易形成反射型或半透過型之液晶顯示元件 之光擴散反射膜用之膜的組成物。 本發明之另一目的係提供具有由上述組成物所形成之 膜，且光擴散功能優異之光擴散反射膜。 本發明之另一目的係提供具有上述光擴散反射膜之液 晶顯不兀件。 本發明之另一目的及優點如下述說明。 依據本發明時，本發明之上述目的及優點第1係藉由 含有（a )鹼可溶性樹脂、（b ) 1 ，2 -醌二疊氮化合 物及（c )分子內具有2個以上之環氧基之化合物之光擴 散反射膜形成用組成物來達成。 本紙張尺度適用中國國家標準（CNS )八4規格（210X297公釐） (請先閲讀背面之注意事項再填寫本頁) 衣· 經濟部智慧財產局員工消費合作社印製 -5- 555822555822 A7 B7 V. Description of the Invention () | [Technical Field] (Please read the precautions on the back before filling out this page) The present invention relates to a composition for forming a light-diffusing reflective film used for liquid crystal display elements and the like, and has the composition A light-diffusive reflection film formed of an object, and a liquid crystal display element having the light-diffusive reflection film. [Previous technology] Since a liquid crystal display requires a uniform and high-brightness surface illumination, conventionally, a backlight unit is the mainstream. However, in recent years, due to the popularity of portable terminals, from the viewpoint of power saving, semi-transmissive and reflective liquid crystal displays have been gradually adopted. The transflective and reflective liquid crystal displays are provided with a reflective film such as an aluminum plate under the liquid crystal panel, and reflect the light from the upper part of the panel to obtain brightness. However, when this method is used, the reflective film is flat, so when the incident direction of the incident light on the top of the panel is inclined, the direction of the reflected light will deviate from the front direction of the panel, and sufficient front luminance cannot be obtained. The consumer property cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs printed a proposal to use the so-called light diffusion plate technology to improve the above-mentioned shortcomings of reflective liquid crystal displays. Method to get positive brightness. For example, Japanese Patent Application Laid-Open No. 2000- 1 1 8 8 6 discloses a technique for forming a rough surface of a glass substrate by chemical etching, forming a metal film, and providing a concave-convex shape on the surface of a reflective plate. According to this method, not only the inner surface of the glass substrate needs to be protected from the etching solution, so the steps are complicated, but because of the use of a corrosive etching solution, there is a problem of cost in terms of equipment and process. In addition, Japanese Patent Laid-Open No. 2000-19380 7 discloses that the paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) -4- 555822 A7 B7 5. Description of the invention (i will contain fluorine compounds and alkoxysilane The solution-like composition of the hydrolysate is coated on a substrate, and a film having a concave-convex shape is produced by using phase separation when forming a coating film, and a metal film is formed thereon. This method is difficult to control the concave-convex shape and it is difficult to obtain Efficient diffusion of light and poor adhesion to substrates. Recently, photosensitive resins have been used to make patterns by photolithography to form a film with uneven shapes. A metal layer is formed on the surface of the film, and it has become the mainstream method to become a light diffusion reflection film. Conventional photosensitive resins are difficult to control the uneven shape, have insufficient heat resistance, have a defect in the shape of the reflective material due to heat during sputtering, or have insufficient solvent resistance when the reflective metal film is patterned. [Disclosure of the Invention] Objects of the Invention It is provided with a rough surface used for a light-diffusing reflective film, and adhesion to a substrate, heat resistance, solvent resistance, and uneven shape. It has excellent properties and can easily form a film composition for a light-diffusing reflective film of a reflective or semi-transmissive liquid crystal display element. Another object of the present invention is to provide a film having the above-mentioned composition and having light diffusion A light-diffusing reflective film with excellent functions. Another object of the present invention is to provide a liquid crystal display device having the above-mentioned light-diffusing reflective film. Another object and advantages of the present invention are as described below. According to the present invention, the above-mentioned of the present invention Purpose and Advantages The first is formed by a light-diffusing reflective film containing (a) an alkali-soluble resin, (b) 1,2-quinonediazide compound, and (c) a compound having two or more epoxy groups in the molecule. It is achieved by composition. This paper size is in accordance with Chinese National Standard (CNS) 8-4 specification (210X297 mm) (Please read the precautions on the back before filling out this page.) 5- 555822

RR

A7 B7 五、發明説明（> 依據本發明時，本發明之上述目的及優點第2係藉由 含有（a )鹼可溶性樹脂、（^ ) 1，2 一醌二疊氮化合 物、（d )以下述式（1 ) VR2 (1) 〔式中R1〜R6可相同或不同，分別爲氫原子或 一 CH1〇R基，R係表示氫原子或碳數1〜6之烷基〕表 示之化合物及以下述式（2 )A7 B7 V. Description of the invention (> In accordance with the present invention, the above-mentioned object and advantages of the present invention are secondly by containing (a) an alkali-soluble resin, (^) 1,2-quinonediazide compound, (d) A compound represented by the following formula (1) VR2 (1) [wherein R1 to R6 may be the same or different, and are a hydrogen atom or a CH1OR group, respectively, R is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms] And with the following formula (2)

(請先閲讀背面之注意事項再填寫本頁} 經濟部智慧財產局員工消費合作社印製 〔式中X係表示鹵素，A係CX 3或以下述式 (B)™(Please read the notes on the back before filling out this page} Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economics [where X is halogen, A is CX 3 or the following formula (B) ™

(B), 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） -6- 1 555822 Α7 Β7 五、發明説明（）t(B), this paper size applies Chinese National Standard (CNS) A4 specification (210X297 mm) -6- 1 555822 Α7 Β7 V. Description of invention () t

表示之基，B、D及E係分別爲氫原子、碳數1〜 10之烷基、芳基、烷氧基或硫烷基、碳數1〜12之芳 基羥基或硫芳基、鹵原子、氰基、硝基、含有碳數1〜 10之烷基之二級胺基、羧基、羥基、碳數1〜10之院 基、碳數1〜1 0之氧代烷基或氧代芳基、碳數1〜20 之烷氧基羰基或烷基羰基氧基，m爲0〜5之整數〕表示 之化合物之光擴散反射膜形成用組成物來達成。 依據本發明時，本發明之上述目的及優點第3係藉由 含有（a )鹼可溶性樹脂、（b ) 1，2 -醌二疊氮化合 物、（d)以上述式（1)表示之化合物及（f)以下述 式（3 ) (A ) n Z + Y - ( 3 ) 〔式中Α之定義係與上述式（2 )相同，Ζ係硫原子 或砩原子，Y係BF4、PFe、SbFe、AsF6、對甲 苯磺酸鈉、三氟甲烷磺酸鈉或三氟乙酸酯，η爲2或3〕 表示之化合物之光擴散反射膜形成用組成物來達成。 本紙張尺度適用中國國家標準（CNS ) Α4規格（210X297公釐） (請先閲讀背面之注意事項再填寫本頁) 、1Τ 經濟部智慧財產局員工消費合作社印製 555822 A 7 B7 五、發明説明（名 依據本發明時，本發明之上述目的及優點第4係藉由 含有（a’ ) (al)不飽和羧酸及/或不飽和羧酸酐、 (請先閲讀背面之注意事項再填寫本頁) (a 2 )含有環氧基之不飽和化合物、及（a 3 )其他之 少希烴系不飽和化合物之共聚物及（b) 1 ，2 -醌二疊氮 化合物之光擴散反射膜形成用組成物來達成。 依據本發明時，本發明之上述目的及優點第5係藉由 (1 )基板之表面塗佈上述本發明之任一種之光擴散反射 膜形成用組成物形成塗膜， (2 )將塗膜預烘烤， (3 )介於圖案光罩以放射線照射塗膜， (4 )以鹼顯影液使具有圖案潛像之塗膜進行顯影形 成圖案之光擴散反射膜之製造方法來達成。 本發明之上述目的及優點第6係藉由具有本發明之上 述任一種之光擴散反射膜形成用組成物所形成之圖案之光 擴散反射膜來達成。 依據本發明時，本發明之上述目的及優點最後係藉由 具有本發明之光擴散反射膜之液晶顯示元件來達成。 經濟部智慧財產局員工消費合作社印製 〔圖面之簡單說明〕 圖1係表示圖案狀塗膜之斷面形狀之模式圖。 圖2係表示液晶顯示元件之結構之模式圖。 圖3係表示液晶顯示元件之結構之模式圖。 圖4係表示以實施例6所得之光擴散反射膜之光散射 特性之圖。 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） -8 - 555822 經濟部智慧財產局員工消費合作社印製 A7 B7五、發明説明（ 圖5係表示以實施例7所得之光擴散反射膜之光散射 特性之圖。 圖6係表示以實施例1 3所得之光擴散反射膜之光散 射特性之圖。 圖7係表示以實施例1 4所得之光擴散反射膜之光散 射特性之圖。 主要元件對照表 1 :基板 2 :圖案狀塗膜 3 :金屬層 4 :濾光片層 5 :保護膜 6 :透明電極 7 :配向膜 8 :液晶層 9 :配向膜 1 0 :透明電極 1 1 :對向基板 1 2 :偏光板 1 3 : T F T元件 2 3 :光擴散反射膜 〔發明之理想的實施形態〕 (請先閲讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） -9- 555822 Α7 __ Β7 五、發明説明（)[ 以下詳述本發明之光散射凹凸膜形成用組成物。 (請先閲讀背面之注意事項再填寫本頁) 又，本發明中之「放射線」一詞係包括紫外線、遠紫 外線、X射線、電子線、分子線、7線、同步加速輻射線 、質子束射線等。 (a )鹼可溶性樹脂 本發明使用之（a )鹼可溶性樹脂只要可溶於鹼水溶 液’則無特別限制，可使用藉由含有苯酚性羥基或羧基賦 予鹼可溶性之樹脂。 這種鹼可溶性樹脂例如有含有苯酚性羥基或羧基之自 由基聚合性單體之單獨聚合物或該自由基聚合性單體與其 他之自由基聚合性單體之共聚物。 經濟部智慧財產局員工消費合作社印製 含有苯酚性羥基或羧基之自由基聚合性單體例如有鄰 羥甲基苯乙烯、間羥甲基苯乙烯、對羥甲基苯乙烯或這些 被烷基、烷氧基、鹵素、鹵烷基、硝基、氰基、醯胺基、 酯基、羧基取代之取代物；乙烯基對苯二酚、5 一乙烯基 焦梧酣、6 -乙嫌基焦掊酣、1 一乙烁基氧**等之聚經 基乙烯基苯酚類；鄰乙烯基苯甲酸、間乙烯基苯甲酸、對 乙烯基苯甲酸或這些被烷基、烷氧基、鹵素、硝基、氰基 、醯胺基或酯取代之取代物；甲基丙烯酸、丙烯酸及這些 之α -位置被鹵烷基、烷氧基、鹵素、硝基或氰基取代之 α -位置取代物；馬來酸、馬來酸酐、富馬酸、富馬酸酐 、檸康酸、中康酸、衣康酸、1，4 一環己烯二羧酸等之 不飽和羧酸或這些其中之一之羧基變成甲基、乙基、丙基 本紙張尺度適用中國國家標準（CNS ) Α4規格（210Χ297公釐） -10- 555822 A7 B7 五、發明説明（》 、異丙基、正丁基、第二丁基、第三丁基、苯基、鄰甲苯 基、間甲苯基及對甲苯酸酯基之半酯或其中之一之羧基變 成醯胺基之半醯胺。 這些含有苯酚性羥基或羧基之自由基聚合性單體中， 較佳者爲間羥甲基苯乙烯、對羥甲基苯乙烯、丙烯酸、甲 基丙烯酸、馬來酸、馬來酸酐、衣康酸。這些可單獨使用 或組合二種以上使用。 其他之自由基聚合性單體例如有苯乙烯、苯乙烯之^ 一甲基、鄰烷基、間烷基、對烷基、烷氧基、鹵素、硝基 、氰基、醯胺基或酯取代之取代物； 丁二烯、異戊二烯、氯戊二烯之烯烴類；（甲基）（ 甲基）（甲基）（甲基）（甲基）（甲基） 甲基（甲基）丙烯酸酯、乙基（甲基）丙烯酸酯、正 丙基（甲基）丙烯酸酯、異丙基（甲基）丙烯酸酯、正丁 基（甲基）丙烯酸酯、第二丁基（甲基）丙烯酸酯、第三 丁基（甲基）丙烯酸酯、戊基（甲基）丙烯酸酯、新戊基 (甲基）丙烯酸酯、異戊基（甲基）丙烯酸酯、環己基甲 基丙烯酸酯、金剛烷基（甲基）烷基丙烯酸酯、燃丙基（ 甲基）丙烯酸酯、丙炔基（甲基）丙烯酸酯、苯基（甲基 )丙烯酸酯、萘基（甲基）丙烯酸酯、蒽基（甲基）丙嫌 酸酯、蒽醌基（甲基）丙烯酸酯、胡椒基（甲基）丙燃酸 酯、水楊基（甲基）丙烯酸酯、環己基（曱基）丙燦酸酯 、苄基（甲基）丙烯酸酯、苯乙基（甲基）丙條酸醋、甲 苯基（甲基）丙烯酸酯、環氧丙基（甲基）丙燦酸目旨、λ 本紙張尺度適用中國國家標準（CNS ) Α4規格（210X297公着) '----- (請先閲讀背面之注意事項再填寫本頁) 衣·B, D, and E are a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, an aryl group, an alkoxy group or a sulfanyl group, an aryl hydroxyl group or a thioaryl group having 1 to 12 carbon atoms, and a halogen, respectively. Atoms, cyano, nitro, secondary amines containing 1 to 10 carbons, carboxyl, hydroxy, courtyards with 1 to 10 carbons, oxoalkyls or oxo with 1 to 10 carbons An aryl group, an alkoxycarbonyl group or an alkylcarbonyloxy group having 1 to 20 carbon atoms, where m is an integer of 0 to 5] is achieved by a composition for forming a light-diffusing reflective film. According to the present invention, the above-mentioned object and advantages of the present invention are the third aspect by containing (a) an alkali-soluble resin, (b) a 1,2-quinonediazide compound, and (d) a compound represented by the above formula (1) And (f) is represented by the following formula (3) (A) n Z + Y-(3) [wherein the definition of A is the same as the above formula (2), the Z is a sulfur atom or the hafnium atom, and the Y is BF4, PFe, SbFe, AsF6, sodium p-toluenesulfonate, sodium trifluoromethanesulfonate, or trifluoroacetate, wherein η is 2 or 3] is achieved by a composition for forming a light-diffusing reflective film of a compound represented by η. This paper size applies to Chinese National Standard (CNS) A4 specification (210X297 mm) (Please read the precautions on the back before filling out this page), 1T printed by the Intellectual Property Bureau Staff Consumer Cooperative of the Ministry of Economic Affairs 555822 A 7 B7 V. Description of the invention (When the name is based on the present invention, the fourth purpose and advantages of the present invention is the fourth one by containing (a ') (al) unsaturated carboxylic acid and / or unsaturated carboxylic anhydride, (Please read the precautions on the back before filling in this Page) (a 2) Epoxy group-containing unsaturated compounds, and (a 3) copolymers of other oligomeric unsaturated compounds and (b) 1,2-quinonediazide light-diffusing reflective films The composition for forming is achieved. According to the present invention, the above-mentioned object and advantages of the present invention are the fifth aspect: (1) The surface of the substrate is coated with the composition for forming a light-diffusing reflection film according to any one of the present invention to form a coating film. (2) pre-baking the coating film, (3) irradiating the coating film with radiation through a patterned photomask, (4) developing the coating film having a latent image of the pattern with an alkali developing solution to form a patterned light-diffusion reflection film To achieve the manufacturing method. Aim and Advantage The sixth aspect is achieved by a light-diffusing reflective film having a pattern formed by the light-diffusing reflective film-forming composition according to any one of the above aspects of the present invention. According to the present invention, the above-mentioned objects and advantages of the present invention are finally This is achieved by a liquid crystal display element having the light-diffusing reflective film of the present invention. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs [Simplified description of the drawing] FIG. 1 is a schematic diagram showing the cross-sectional shape of a patterned coating film. Fig. 2 is a schematic diagram showing a structure of a liquid crystal display element. Fig. 3 is a schematic diagram showing a structure of a liquid crystal display element. Fig. 4 is a diagram showing a light scattering characteristic of a light diffusion reflection film obtained in Example 6. This paper scale Applicable to China National Standard (CNS) A4 specification (210X297 mm) -8-555822 Printed by A7 B7, Consumer Cooperative of Intellectual Property Bureau, Ministry of Economic Affairs, V. Invention description (Figure 5 shows the light diffusion reflection film obtained in Example 7 FIG. 6 is a graph showing the light scattering characteristics of the light diffusion reflection film obtained in Example 13 in FIG. 6 is a graph showing the light scattering characteristics obtained in Example 14 Diagram of light scattering characteristics of diffuse reflection film. Comparison of main components Table 1: Substrate 2: Pattern coating film 3: Metal layer 4: Filter layer 5: Protective film 6: Transparent electrode 7: Alignment film 8: Liquid crystal layer 9 : Alignment film 1 0: Transparent electrode 1 1: Opposite substrate 1 2: Polarizing plate 1 3: TFT element 2 3: Light diffusion reflection film [ideal embodiment of invention] (Please read the precautions on the back before filling in this Page) This paper size is in accordance with Chinese National Standard (CNS) A4 specification (210X297 mm) -9- 555822 Α7 __ Β7 V. Description of the invention () [Details of the composition for forming the light-scattering concave-convex film of the present invention are described below. (Please read the precautions on the back before filling this page.) In addition, the term "radiation" in the present invention includes ultraviolet rays, far ultraviolet rays, X-rays, electron rays, molecular rays, 7 rays, synchrotron radiation, and proton beams. Rays etc. (a) Alkali-soluble resin The (a) alkali-soluble resin used in the present invention is not particularly limited as long as it is soluble in an alkaline aqueous solution ', and a resin that is rendered alkali-soluble by containing a phenolic hydroxyl group or a carboxyl group can be used. Such alkali-soluble resins include, for example, a separate polymer containing a phenolic hydroxyl group or a carboxyl group-free polymerizable monomer or a copolymer of the radical polymerizable monomer and another radical polymerizable monomer. Printed by the Consumers ’Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs of radical polymerizable monomers containing phenolic hydroxyl or carboxyl groups such as o-methylolstyrene, m-methylolstyrene, p-methylolstyrene , Alkoxy, halogen, haloalkyl, nitro, cyano, amidino, ester, and carboxyl-substituted substitutes; vinyl hydroquinone, 5-vinyl pyrofluorene, 6-ethoxyl Polyvinyl phenols such as pyromethane, 1-ethoxyloxy **; o-vinyl benzoic acid, m-vinyl benzoic acid, p-vinyl benzoic acid or these are alkyl, alkoxy, halogen , Nitro, cyano, amido or ester-substituted substituents; methacrylic acid, acrylic acid, and these α-positions substituted with haloalkyl, alkoxy, halogen, nitro, or cyano substituted α-positions Substances; maleic acid, maleic anhydride, fumaric acid, fumaric anhydride, citraconic acid, mesaconic acid, itaconic acid, 1,4-cyclohexene dicarboxylic acid, and the like or unsaturated carboxylic acids or one of these The carboxyl group becomes methyl, ethyl, and propyl. The standard of this paper is applicable to China National Standard (CNS) Α4. 210 × 297 mm) -10- 555822 A7 B7 V. Description of the invention (", isopropyl, n-butyl, second butyl, third butyl, phenyl, o-tolyl, m-tolyl and p-toluate A half-ester of a carboxylic acid group or one of the carboxyl groups is changed to a fluorenyl-hemiamine. Among these radically polymerizable monomers containing a phenolic hydroxyl group or a carboxyl group, preferred are m-methylolstyrene and p-methylol. Styrene, acrylic acid, methacrylic acid, maleic acid, maleic anhydride, itaconic acid. These can be used alone or in combination of two or more. Other free-radically polymerizable monomers include styrene and styrene. Methyl, o-alkyl, m-alkyl, p-alkyl, alkoxy, halogen, nitro, cyano, amido or ester-substituted substitutions; butadiene, isoprene, chloroprene Olefins; (meth) (meth) (meth) (meth) (meth) (meth) (meth) meth (meth) acrylate, ethyl (meth) acrylate, n-propyl ( Meth) acrylate, isopropyl (meth) acrylate, n-butyl (meth) acrylate, second (Meth) acrylate, third butyl (meth) acrylate, pentyl (meth) acrylate, neopentyl (meth) acrylate, isoamyl (meth) acrylate, cyclohexyl Methacrylate, adamantyl (meth) alkyl acrylate, propyl (meth) acrylate, propynyl (meth) acrylate, phenyl (meth) acrylate, naphthyl (methyl Base) acrylate, anthryl (meth) propionate, anthraquinone (meth) acrylate, piperonyl (meth) propionate, salicyl (meth) acrylate, cyclohexyl ( Fluorenyl) propionate, benzyl (meth) acrylate, phenethyl (meth) propionate, tolyl (meth) acrylate, epoxypropyl (meth) propionate Purpose, λ This paper size applies the Chinese National Standard (CNS) Α4 specification (210X297). '----- (Please read the precautions on the back before filling this page)

、1T 經濟部智慧財產局員工消費合作社印製 -11 - 555822 A7 B7 五、發明説明（> (請先閲讀背面之注意事項再填寫本頁) 、1、1 一三氟乙基（甲基）丙烯酸酯、全氟乙基（甲基 )丙烯酸酯、全氟正丙基（甲基）丙烯酸酯、全氟異丙基 (甲基）丙烯酸酯、三環〔5·2·1·02’6〕癸烷一 8 -基（甲基）丙烯酸酯（該技術領域慣稱爲〔二環戊烯 〕（甲基）丙烯酸酯）、枯烯基（甲基）丙烯酸酯、3 -(N，N —二甲基胺基）丙基（甲基）丙烯酸酯、3-（ N，N -二甲基胺基）乙基（甲基）丙烯酸酯、呋喃基（ 甲基）丙烯酸酯、糠基（甲基）丙烯酸酯之（甲基）丙烯 酸酯；（甲基）丙烯醯替苯胺、（甲基）丙烯醯胺、或（ 甲基）丙烯酸一 N，N —二甲基醯胺、（甲基）丙烯酸一 N，N -二乙基醯胺、（甲基）丙烯酸一 N，N —二丙基 醯胺、（甲基）丙烯酸一N，N—二異丙基醯胺、（甲基 )丙烯酸蒽基醯胺、（甲基）丙烯腈、丙烯醛、氯乙烯、 偏氯乙烯、氟乙烯、偏氟乙烯、N -乙烯基吡咯烷酮、乙 烯基吡啶、醋酸乙烯酯、N —苯基順丁烯二胺、N -（ 4 -羥苯基）順丁烯二胺、N -甲基丙烯醯基 醯亞胺、N -丙烯醯基 醯亞胺等。 經濟部智慧財產局員工消費合作社印製 這些其他之自由基聚合性單體中，較理想者爲苯乙烯 、丁二烯、苯基（甲基）丙烯酸酯、苄基（甲基）丙烯酸 酯、二環戊烯基丙烯酸酯等。這些可單獨使用或組合兩種 以上使用。 這些其他之自由基聚合性單體之共聚比例係因可賦予 鹼可溶性之基的種類而異。具有羥基之自由基聚合性單體 爲具有苯酚性羥基之自由基聚合性單體時，其他之自由基 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） -12 - 555822 A7 __ B7 五、發明説明（>〇 (請先閱讀背面之注意事項再填寫本頁) 聚合性單體之共聚比例爲對於具有苯酚性羥基之自由基聚 合性單體與其他之自由基聚合性單體之合計量時，理想爲 0〜3 0重量％、更理想爲5〜2 0重量％。具有經基之 自由基聚合性單體爲具有羧基之自由基聚合性單體時，其 他之自由基聚合性單體之共聚比例係對於具有羧基之自由 基聚合性單體與其他之自由基聚合性單體之合計量時，理 想爲0〜90重量％、更理想爲10〜80重量％。這些 其他之自由基聚合性單體之共聚比例係對於具有羥基或羧 基之自由基聚合性單體時，超過前述比例時，有時鹼顯影 性不足。 經濟部智慧財產局員工消費合作社印製 上述鹼可溶性樹脂（a )合成用之溶媒例如有甲醇、 乙醇、二丙醇等之醇類；四氫化呋喃、四氫化吡喃、二噁 烷等之醚類；乙二醇單甲醚、乙二醇單乙醚等之乙二醇烷 醚類；甲基溶纖素乙酸酯、乙基溶纖素乙酸酯等之乙二醇 烷醚乙酸酯類；二乙二醇單甲醚、二乙二醇單乙醚、二乙 二醇二甲醚、二乙二醇二乙醚、二乙二醇二乙基甲醚等之 二乙二醇醚類；丙二醇甲醚、丙二醇乙醚、丙二醇丙醚、 丙二醇丁醚等之丙二醇單烷醚類；丙二醇甲醚醋酸酯、、 丙二醇乙醚醋酸酯、、丙二醇丙醚醋酸酯、、丙二醇丁醚 醋酸酯等之丙二醇烷醚醋酸酯類；丙二醇甲醚丙酸酯、丙 二醇乙醚丙酸酯、丙二醇丙醚丙酸酯、丙二醇丁醚丙酸酯 等之丙二醇烷醚丙酸酯類；甲苯、二甲苯等之芳香族烴類 ;甲基乙基酮、環己酮、4 一羥基—4 —甲基一 2 -戊酮 等之酮類；及醋酸甲酯、醋酸乙酯、醋酸丙酯、醋酸丁酯 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公 -13- 555822 A7 B7 五、發明説明（）11 (請先閲讀背面之注意事項再填寫本頁) 、2 —羥基丙酸乙酯、2 —羥基一2 —甲基丙酸甲酯、2 -羥基- 2 —甲基丙酸乙酯、羥基醋酸甲酯、羥基醋酸乙 酯、羥基醋酸丙酯、羥基醋酸丁酯、乳酸甲酯、乳酸乙酯 、乳酸丙酯、乳酸丁酯、3 -羥基丙酸曱酯、3 -羥基丙 酸乙酯、3 —羥基丙酸丙酯、3 -羥基丙酸丁酯、2 -羥 基一 3 —甲基丁酸甲酯、甲氧基醋酸甲酯、甲氧基醋酸乙 酯、甲氧基醋酸丙酯、甲氧基醋酸丁酯、乙氧基醋酸甲酯 、乙氧基醋酸乙酯、乙氧基醋酸丙酯、乙氧基醋酸丁酯、 丙氧基醋酸甲酯、丙氧基醋酸乙酯、丙氧基醋酸丙酯、丙 氧基醋酸丁酯、丁氧基醋酸甲酯、丁氧基醋酸乙酯、丁氧 基醋酸丙酯、丁氧基醋酸丁酯、2 -甲氧基丙酸甲酯、2 -甲氧基丙酸乙酯、2 -甲氧基丙酸丙酯、2 -甲氧基丙 酸丁酯、2 —乙氧基丙酸甲酯、2 -乙氧基丙酸乙酯、2 -乙氧基丙酸丙酯、2 -乙氧基丙酸丁酯、2 -丁氧基丙 酸甲酯、2 —丁氧基丙酸乙酯、2 -丁氧基丙酸丙酯、2 一丁氧基丙酸丁酯、/3 —甲氧基丙酸甲酯、3 -甲氧基 丙酸乙酯、3 -甲氧基丙酸丙酯、3 —甲氧基丙酸丁酯、 經濟部智慧財產局員工消費合作社印製 3 —乙氧基丙酸甲酯、3 -乙氧基丙酸乙酯、3 -乙氧基 丙酸丙酯、3 -乙氧基丙酸丁酯、3 -丙氧基丙酸甲酯、 3 -丙氧基丙酸乙酯、3 -丙氧基丙酸丙酯、3 -丙氧基 丙酸丁酯、3 - 丁氧基丙酸甲酯、3 - 丁氧基丙酸乙酯、 3 - 丁氧基丙酸丙酯、3 - 丁氧基丙酸丁酯等之酯類。這 些溶媒之使用量係對於反應原料1 0 0重量份時，理想爲 使用20〜1，000重量份。 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） -14 - 555822 A7 B7 五、發明説明（）|2 (請先閲讀背面之注意事項再填寫本頁) 製造鹼可溶性樹脂（a )所使用之聚合引發劑可使用 ~般之自由基聚合引發劑，例如有2，2 ’ 一偶氮二異丁 腈、2，2’一偶氮二—（2，4_二甲基戊腈）、2, 2’ 一偶氮二一 （4 一甲氧基—2，4 一二甲基戊腈）等 之偶氮化合物；過氧化苯醯、過氧化月桂醯、第三丁基過 三甲基乙烯酯、1 ，1’ 一雙一（第三丁基過氧）環己院 等之有機過氧化物；及過氧化氫。自由基聚合引發劑使用 過氧化物時，過氧化物與還原劑一起使用可作爲氧化還原 引發劑。 本發明使用之（a )鹼可溶性樹脂之另外的合成法例 如’得到相當於以烷基、乙醯基、苯醯甲基等保護基保護 前述具有苯酚性羥基或羧基之自由基聚合性單體之苯酚性 羥基或羧基之單體之單體的單獨聚合物或該相當之單體與 其他單體之共聚物後，以水解等反應脫去保護，賦予鹼可 溶性之方法來合成。 本發明使用之（a )鹼可溶性樹脂例如可使用以氫化 等處理修正透明性或軟化點者。 經濟部智慧財產局員工消費合作社印製 本發明使用之（a )鹼可溶性樹脂之聚苯乙烯換算重 量平均分子量理想爲2，000〜1〇〇，◦〇〇的範圍 ，更理想爲3，0 0 0〜5 0，0 〇 〇的範圍，特別理想 爲5 ，0〇0〜30 ，000的範圍。此範圍內可提供圖 案形狀、解像度、顯影性及耐熱性、顯影性及感度之平衡 性優異之感放射線性樹脂組成物。 這種鹼可溶性樹脂之市售品例如有maruk inker_M、 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） -15- 555822 A7 B7 五、發明説明（h (請先閲讀背面之注意事項再填寫本頁) PHM - C(以上爲九善石油化學（股）製）、VP -1500 (日本曹達（股）製）等之羥基苯乙烯（共）聚 物或其部分氫化物等。 酚醛樹脂係在酸觸媒存在下，苯酚類與醛類進行聚縮 合所得。.此時使用之苯酚類例如有苯酚、鄰甲酚、間甲酚 、對曱酚、鄰乙基苯酚、間乙基苯酚、對乙基苯酚、鄰丁 基苯酚、間丁基苯酚、對丁基苯酚、2，3 -二甲酚、2 ，4 —二甲酚、2 ，5 —二甲酚、3 ，4 一二甲酚、3 ， 5 —二甲酚、2，3 ，5 —三甲基苯酚、3，4，5 —三 甲基苯酚、對苯基苯酚、對苯二酚、兒茶酚、間苯二酚、 2 -甲基間苯二酚、焦掊酚、α -萘酚、0 -萘酚、雙酚 A、二羥基苯甲酸酯、沒食子酸酯、鄰硝基苯酚、間硝基 苯酚、對硝基苯酚、鄰氯苯酚、間氯苯酚、對氯苯酚等。 這些中較理想者爲鄰甲酚、間甲酚、對甲酚、2 ，3 —二 甲酚、2 ，4 —二甲酚、2 ，5 —二甲酚、2 ，3 ，5 — 三甲基苯酚、間苯二酚、2 -甲基間苯二酚等。這些苯酚 可單獨使用或組合二種以上使用。 經濟部智慧財產局員工消費合作社印製 又與上述苯酚類聚縮合之醛類例如有甲醛、對甲醛、 苯甲醛、乙醛、丙醛、苯醛、α —苯基丙醛、/3 -苯基丙 醛、鄰羥基苯甲醛、間羥基苯甲醛、對羥基苯曱醛、鄰氯 苯甲醛、間氯苯甲醛、對氯苯甲醛、鄰硝基苯甲醛、間硝 基苯甲醛、對硝基苯甲醛、鄰甲基苯甲醛、間甲基苯甲醛 、對甲基苯甲醛、鄰乙基苯甲醛、間乙基苯甲醛、對乙基 苯甲醛、對正丁醛、糠醛、1 一萘醛、2 -萘醛、2 -羥 本紙張尺度適用中國國家標準（CNS ) A4規格（210 X 297公釐) -16- 555822 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明説明（）|4 基- 1 -萘醛等。反應中生成醛之化合物之三噁烷等也可 與前述醛類同樣使用。這些中特別適甲醛較理想。這些酸 類及生成醛之化合物可單獨使用或組合二種以上使用。醒 類系對於酚類1莫耳時，使用0 · 7〜3莫耳，更理想爲 〇 · 7〜2莫耳。 酸觸媒可使用鹽酸、硝酸、硫酸、對苯磺酸、甲酸、 乙酸、草酸等。其使用量係對於酚類1莫耳時，理想爲使 用 lx 1 0一4 〜5x 1 Ο-1莫耳。 聚縮合反應時，反應媒質理想爲使用水，但是聚縮合 反應所使用之苯酚類不溶解於醛類之水溶液，反應初期形 成不均一體系時，反應媒質也可使用親水性有機溶媒。此 時所用之有機溶媒例如有甲醇、乙醇、丁醇之醇類；如四 氫化呋喃、二噁烷之環狀醚類。這些反應媒質之使用量係 對於反應原料1 0 0重量份時，理想爲使用2 0〜1 0 0 重量份。 聚縮合之反應溫度可配合反應原料之反應性來適當調 節。理想爲1 0〜2 0 0 °C。聚縮合反應結束後，爲了除 去體系內之未反應原料、觸媒及反應媒質時，理想爲昇溫 至1 3 0〜2 3 0 °C以上，減壓下餾去揮發成分，可回收 酚醛樹脂。此時必要時可以適當之溶劑洗淨聚縮合反應後 之反應混合物後，進行酚醛樹脂之回收步驟。 又酚醛樹脂之聚苯乙烯換算重量平均分子量（以下稱 爲「Mw」）理想爲2，000〜20，000的範圍， 更理想爲3，000〜15，000的範圍。Mw超過 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） (請先閲讀背面之注意事項再填寫本頁) 衣·Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs of the 1T-11-555822 A7 B7 V. Description of the invention (> (Please read the precautions on the back before filling this page), 1, 1-trifluoroethyl (methyl ) Acrylate, perfluoroethyl (meth) acrylate, perfluoro n-propyl (meth) acrylate, perfluoroisopropyl (meth) acrylate, tricyclic [5 · 2 · 1 · 02 ' 6] decane-8-yl (meth) acrylate (commonly known in the technical field as [dicyclopentene] (meth) acrylate), cumenyl (meth) acrylate, 3- (N, N-dimethylamino) propyl (meth) acrylate, 3- (N, N-dimethylamino) ethyl (meth) acrylate, furyl (meth) acrylate, furfuryl (Meth) acrylates of (meth) acrylates; (meth) acrylamide, (meth) acrylamide, or (meth) acrylic acid, N, N-dimethylammonium, (formyl) (Meth) acrylic acid mono-N, N-diethylphosphonium amine, (meth) acrylic acid mono-N, N-dipropylphosphonium amine, (meth) acrylic acid mono-N, N-diisopropylphosphonium amine , Anthrylamide (meth) acrylate, (meth) acrylonitrile, acrolein, vinyl chloride, vinylidene chloride, vinylidene fluoride, vinylidene fluoride, N-vinylpyrrolidone, vinylpyridine, vinyl acetate, N —Phenyl maleimide, N- (4-hydroxyphenyl) maleimide, N-methacrylfluorenylimide, N-acrylmethyleneimide, etc. Intellectual Property Bureau, Ministry of Economic Affairs Among these other free-radically polymerizable monomers printed by employee consumer cooperatives, the preferred ones are styrene, butadiene, phenyl (meth) acrylate, benzyl (meth) acrylate, and dicyclopentenyl. Acrylates, etc. These can be used alone or in combination of two or more. The copolymerization ratio of these other radically polymerizable monomers varies depending on the type of the base that can impart alkali solubility. The radically polymerizable monomer having a hydroxyl group is For free radical polymerizable monomers with phenolic hydroxyl groups, other free basic paper sizes are subject to Chinese National Standard (CNS) A4 (210X297 mm) -12-555822 A7 __ B7 V. Description of the invention (> 〇 (Please Read the notes on the back first (Please fill in this page again) When the copolymerization ratio of the polymerizable monomer is the total amount of the radical polymerizable monomer having a phenolic hydroxyl group and other radical polymerizable monomers, it is preferably 0 to 30% by weight, and more preferably It is 5 to 20% by weight. When the radical polymerizable monomer having a radical is a radical polymerizable monomer having a carboxyl group, the copolymerization ratio of other radical polymerizable monomers is relative to the radical polymerizability of a carboxyl group. When the total amount of the monomer and other radically polymerizable monomers is preferably 0 to 90% by weight, and more preferably 10 to 80% by weight. The copolymerization ratio of these other radically polymerizable monomers is for those having a hydroxyl group or When the carboxyl radical polymerizable monomer exceeds the aforementioned ratio, alkali developability may be insufficient. The consumer cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs printed the above-mentioned solvents for the synthesis of the alkali-soluble resin (a), for example, alcohols such as methanol, ethanol, and dipropanol; ethers such as tetrahydrofuran, tetrahydropyran, and dioxane; Glycols; Glycol monomethyl ethers, Glycol monoethyl ethers, etc. Glycol alkyl ethers; Glycol lysin acetate, Ethyl cellulose lysin acetate, etc. ; Diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol diethyl methyl ether and other diethylene glycol ethers; propylene glycol Propylene glycol monoalkane ethers such as methyl ether, propylene glycol ether, propylene glycol propyl ether, propylene glycol butyl ether, etc .; propylene glycol methyl ether acetate, propylene glycol ether acetate, propylene glycol propyl ether acetate, propylene glycol butyl ether acetate, and the like Ether acetates; propylene glycol methyl ether propionate, propylene glycol ether propionate, propylene glycol propyl ether propionate, propylene glycol butyl ether propionate, and other propylene glycol alkyl ether propionates; toluene, xylene and other aromatic hydrocarbon Class; methyl ethyl ketone, cyclohexanone, 4-hydroxyl— 4-Methyl ketones such as 2-pentanone; and methyl acetate, ethyl acetate, propyl acetate, butyl acetate. The paper size is applicable to Chinese National Standard (CNS) A4 specification (210X297 public-13-555822 A7) B7 V. Description of the invention () 11 (Please read the precautions on the back before filling out this page), 2-Hydroxypropionate, 2-Hydroxy-2, Methylmethylpropionate, 2-Hydroxy-2 Ethyl propionate, methyl glycolate, ethyl glycolate, propyl glycolate, butyl glycolate, methyl lactate, ethyl lactate, propyl lactate, butyl lactate, 3-hydroxypropyl propionate, 3-Hydroxypropionate, 3-Hydroxypropionate, 3-Hydroxypropionate, 2-Hydroxy-3-methylbutyrate, Methyl Methoxyacetate, Ethyl Methoxyacetate , Propyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate, propyl ethoxyacetate, butyl ethoxyacetate, methyl propoxyacetate, Ethyl propoxyacetate, propyl propoxy acetate, butyl propoxy acetate, methyl butoxy acetate, ethyl butoxy acetate, Propoxyacetate, Butoxybutyrate, Methyl 2-methoxypropionate, Ethyl 2-methoxypropionate, Propyl 2-methoxypropionate, 2-Methoxypropionic acid Butyl ester, methyl 2-ethoxypropionate, ethyl 2-ethoxypropionate, propyl 2-ethoxypropionate, butyl 2-ethoxypropionate, 2-butoxypropionic acid Methyl ester, ethyl 2-butoxypropionate, propyl 2-butoxypropionate, butyl mono-butoxypropionate, methyl / 3-methoxypropionate, 3-methoxypropionate Ethyl Acetate, Propyl 3-methoxypropionate, Butyl 3-methoxypropionate, Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, Methyl 3-ethoxypropionate, 3-Ethoxypropionate Acid ethyl ester, 3-ethoxypropionate, butyl 3-ethoxypropionate, methyl 3-propoxypropionate, ethyl 3-propoxypropionate, 3-propoxypropionate Propyl ester, butyl 3-propoxypropionate, methyl 3-butoxypropionate, ethyl 3-butoxypropionate, propyl 3-butoxypropionate, 3 -butoxypropyl Esters such as butyl acid ester. When these solvents are used in an amount of 100 parts by weight with respect to the reaction raw materials, it is desirable to use 20 to 1,000 parts by weight. This paper size applies to Chinese National Standard (CNS) A4 (210X297 mm) -14-555822 A7 B7 V. Description of the invention () | 2 (Please read the precautions on the back before filling this page) Manufacture of alkali soluble resin (a The polymerization initiator used can be used as a general free radical polymerization initiator, for example, there are 2,2'-azobisisobutyronitrile, 2,2'-azobis- (2,4_dimethylpentane Nitrile), 2, 2'-Azobis (4-methoxy-2,4-Dimethylvaleronitrile), etc .; Benzene peroxide, Laurel oxide, Third butyl peroxide Organic peroxides such as trimethyl vinyl ester, 1,1 'bis (third butyl peroxy) cyclohexane; and hydrogen peroxide. When a peroxide is used as a radical polymerization initiator, a peroxide can be used as a redox initiator together with a reducing agent. (A) Another method for synthesizing an alkali-soluble resin used in the present invention is, for example, 'obtaining a radically polymerizable monomer having a phenolic hydroxyl group or a carboxyl group equivalent to protecting the aforementioned phenolic hydroxyl group or carboxyl group with a protecting group such as an alkyl group, an ethyl fluorenyl group, or a benzyl methyl group. The phenolic hydroxyl or carboxyl monomer monomer alone polymer or the equivalent monomer and other monomer copolymers, and then deprotected by hydrolysis and other reactions to give alkali solubility and synthesis. The (a) alkali-soluble resin used in the present invention can be used, for example, one having a transparency or a softening point corrected by a treatment such as hydrogenation. (A) The polystyrene-equivalent weight average molecular weight of the (a) alkali-soluble resin used in the present invention is printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, which is preferably in the range of 2,000 to 100, and more preferably 3,0. The range of 0 0 to 50,000 is particularly preferable, and the range of 5,000 to 30,000 is particularly preferable. Within this range, a radiation-sensitive resin composition excellent in pattern shape, resolution, developability and heat resistance, and balance between developability and sensitivity can be provided. The commercially available products of this alkali-soluble resin are, for example, maruk inker_M. The paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) -15- 555822 A7 B7 5. Description of the invention (h (Please read the note on the back first Please fill in this page again for details) PHM-C (the above is made by Jiushan Petrochemical Co., Ltd.), VP-1500 (Japan Soda Co., Ltd.) and other hydroxystyrene (co) polymers or their partial hydrides. Phenolic resins are obtained by polycondensation of phenols and aldehydes in the presence of an acid catalyst. The phenols used at this time are, for example, phenol, o-cresol, m-cresol, p-cresol, o-ethylphenol, m-ethyl Phenol, p-ethylphenol, o-butylphenol, m-butylphenol, p-butylphenol, 2,3-xylenol, 2,4-xylenol, 2,5-xylenol, 3,4 Monoxylenol, 3, 5-xylenol, 2, 3, 5-trimethylphenol, 3, 4, 5-trimethylphenol, p-phenylphenol, hydroquinone, catechol, m-phenol Resorcinol, 2-methylresorcinol, pyrogallol, α-naphthol, 0-naphthol, bisphenol A, dihydroxybenzoate, gallate , O-nitrophenol, m-nitrophenol, p-nitrophenol, o-chlorophenol, m-chlorophenol, p-chlorophenol, etc. The more ideal of these are o-cresol, m-cresol, p-cresol, 2, 3 -Xylenol, 2,4-xylenol, 2,5-xylenol, 2,3,5-trimethylphenol, resorcinol, 2-methylresorcinol, etc. These phenols can be Used alone or in combination of two or more. Aldehydes printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs and polycondensed with the above phenols are, for example, formaldehyde, paraformaldehyde, benzaldehyde, acetaldehyde, propionaldehyde, benzoaldehyde, α-benzene Propanal, / 3-phenylpropanal, o-hydroxybenzaldehyde, m-hydroxybenzaldehyde, p-hydroxybenzaldehyde, o-chlorobenzaldehyde, m-chlorobenzaldehyde, p-chlorobenzaldehyde, o-nitrobenzaldehyde, m Nitrobenzaldehyde, p-nitrobenzaldehyde, o-methylbenzaldehyde, m-methylbenzaldehyde, p-methylbenzaldehyde, o-ethylbenzaldehyde, m-ethylbenzaldehyde, p-ethylbenzaldehyde, p-n-butyl Aldehyde, furfural, 1-naphthaldehyde, 2-naphthaldehyde, 2-hydroxyl This paper size is applicable to China National Standard (CNS) A4 specifications (210 X 297 mm) -16- 555822 A7 B7 printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 5. Description of the invention () It is used in the same way as the aforementioned aldehydes. Among these, formaldehyde is particularly suitable. These acids and aldehyde-forming compounds can be used alone or in combination of two or more. When the phenols are 1 mol, use 0 · 7 ~ 3 mol More preferably, it is 0.7 to 2 moles. As the acid catalyst, hydrochloric acid, nitric acid, sulfuric acid, p-benzenesulfonic acid, formic acid, acetic acid, and oxalic acid can be used. When the amount is 1 mol for phenols, it is preferably Use lx 1 0 to 4 to 5x 10 mol. In the polycondensation reaction, water is preferably used as the reaction medium, but the phenols used in the polycondensation reaction are not dissolved in an aqueous solution of aldehydes. When a heterogeneous system is formed at the beginning of the reaction, a hydrophilic organic solvent may be used as the reaction medium. The organic solvents used at this time include, for example, alcohols such as methanol, ethanol, and butanol; cyclic ethers such as tetrahydrofuran and dioxane. The amount of these reaction media used is preferably 100 to 100 parts by weight with respect to 100 parts by weight of the reaction raw material. The reaction temperature of the polycondensation can be appropriately adjusted according to the reactivity of the reaction raw materials. Ideally, it is 10 to 2 0 ° C. After the completion of the polycondensation reaction, in order to remove unreacted raw materials, catalysts, and reaction media in the system, it is desirable to raise the temperature to 130 to 230 ° C and distill off the volatile components under reduced pressure to recover the phenolic resin. At this time, if necessary, the reaction mixture after the polycondensation reaction may be washed with an appropriate solvent, and then a phenol resin recovery step may be performed. The polystyrene-equivalent weight average molecular weight (hereinafter referred to as "Mw") of the phenol resin is preferably in the range of 2,000 to 20,000, and more preferably in the range of 3,000 to 15,000. Mw exceeds this paper size Applicable to China National Standard (CNS) A4 size (210X297 mm) (Please read the precautions on the back before filling this page)

、1T Ρ. -17- 555822 A7 ___ B7____ 五、發明説明（ 2 0，0 〇 〇時，有時不易將組成物均勻塗佈於晶圓上， 有時顯影性及感度會降低。 (請先閲讀背面之注意事項再填寫本頁) ia ’ ）共聚合物 共聚合物（a’ ）可在溶媒中，聚合引發劑存在下， 將化合物（al) 、（a2)及（a3)進行自由基聚合 來製造。 共聚合物（a’ ）係依據由化合物（al) 、（a2 )及（a 3 )所衍生之重複單位之合計，理想爲含有5 -4 ◦重量％，更理想爲1 〇 - 3 0重量％之由化合物（ a 1 )所衍生之構成單位。此構成單位爲5重量％以下之 共聚物不易溶解於鹼水溶液中，又超過4 0重量％之共聚 物對於鹼水溶液之溶解性太大。化合物（a 1 )可列舉如 丙烯酸、甲基丙烯酸、丁烯酸等之單羧酸；馬來酸、富馬 酸、檸康酸、中康酸、衣康酸等之二羧酸；以及此等之二 羧酸之酸酐； 經濟部智慧財產局員工消費合作社印製 琥珀酸單（2 —(甲基）丙烯醯氧乙基）酯、苯二甲 酸單（2 —（甲基）丙烯醯氧乙基）酯等之二價以上之多 價羧酸之單〔（甲基）丙烯醯氧烷基〕酯類； ω -殘基聚己內酯單（甲基）丙烯酸酯等之兩終端具 有羧基和羥基之聚合物的單（甲基）丙燦酸酯類等。這些 當中從共聚反應性、對於鹼水溶液之溶解性及取得之容易 度來看，較佳者爲丙烯酸、甲基丙烯酸、馬來酸酐等。這 些可單獨使用或組合使用。 本紙張尺度適用中國國家標準（CNS ) Α4規格（210Χ297公釐） — -18- 555822 A7 B7_____ 五、發明説明（>6 共聚合物（a ’ ）係依據由化合物（a 1 ) 、（ a 2 )及（a 3 )所衍生之重複單位之合計，理想爲含有1 0 一 7 0重量％，更理想爲2 0 — 6 0重量％之由化合物（ a 2 )所衍生之構成單位。此構成單位爲1 0重量％以下 時，所得之保護膜或絕緣膜之耐熱性、表面硬度有降低的 傾向，，又超過70重量％時，共聚物之保存安定性有降 低的傾向。 上述化合物（a 2 )可列舉如： 丙烯酸環氧丙酯、甲基丙烯酸環氧丙酯、^ -乙基丙 烯酸環氧丙酯、α -正丙基丙烯酸環氧丙酯、α -正丁基 丙烯酸環氧丙酯、 丙烯酸- 3，4 -環氧丁酯、甲基丙 烯酸一 3 ，4 一環氧丁酯、丙烯酸一 4，5 —環氧戊酯、 甲基丙烯酸一 4，5 -環氧戊酯、丙烯酸一 6 ，7 —環氧 庚酯、甲基丙烯酸- 6 ，7 -環氧庚酯、α -乙基丙烯酸 - 6 ，7 —環氧庚酯、鄰乙烯基苄基縮水甘油醚、間乙烯 基Τ基縮水甘油醚、對乙烯基苄基縮水甘油醚等。其中從 提高共聚反應性及所得之光擴散反射膜之耐熱性、表面硬 度來看，可使用甲基丙烯酸環氧丙酯、甲基丙烯酸- 6， 7 -環氧庚酯、鄰乙烯基苄基縮水甘油醚、間乙烯基苄基 縮水甘油醚、對乙烯基苄基縮水甘油醚等。這些可單獨使 用或組合使用。 共聚合物（a ’ ）係依據由化合物（a 1 ) 、（ a 2 )及（a 3 )所衍生之重複單位之合計，理想爲含有1 〇 —7 0重量％，更理想爲1 5 - 5 0重量％之由化合物（ 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） (請先閱讀背面之注意事項再填寫本頁) 、1Τ IP-· 經濟部智慧財產局員工消費合作社印製 -19- 555822 A7 B7 五、發明説明（）|7 a 3 )所衍生之構成單位。此構成單位爲1 0重量％以下 時，共聚合物（a ’ ）之保存安定性有降低的傾向，又超 過7 0重量％時，共聚物對於鹼水溶液有不易溶解的傾向 〇 上述化合物（a 3 )可列舉如甲基丙烯酸甲酯、甲基 丙烯酸乙酯、甲基丙烯酸正丁酯、甲基丙烯酸第二丁酯、 甲基丙烯酸第三丁酯等之甲基丙烯酸烷酯；甲基丙烯酸酯 、丙烯酸異丙酯等之丙烯酸烷酯；環己基甲基丙烯酸酯、 2 —甲基環己基甲基丙烯酸酯、甲基丙烯酸三環〔 5 · 2 · 1 · 0 2 6〕癸院—8 —基酯（該技術領域中習 用之名稱爲甲基丙烯酸二環戊酯）、甲基丙烯酸二環戊基 氧基乙酯、曱基丙烯酸異氟爾酯等之甲基丙烯酸環狀烷酯 ;環己基丙烯酸酯、2-甲基環己基丙烯酸酯、丙烯酸三 環〔5 . 2 · 1 · 0 2 ’ 6〕癸烷—8 -基酯（該技術領域 中習用之名稱爲丙烯酸二環戊酯）、丙烯酸二環戊基氧基 乙酯、丙烯酸異氟爾酯等之丙烯酸環狀烷酯；苯基甲基丙 烯酸酯、苄基甲基丙烯酸酯等之芳基甲基丙烯酸酯；苯基 (請先閲讀背面之注意事項再填寫本頁) 衣· 訂 經濟部智慧財產局員工消費合作社印製 酸 二 烯 丁 順 酯 酸 烯 丙 基 芳 之 等 酯 酸 儲 丙 基 芣 酯 酸 綠 丙 匕曰 乙 2 二、 酸酯 康酸 衣烯 、丙 酯基 乙甲 二基 酸乙 馬羥基 富 I 院 、2 經 酯；之 乙醋等 酯 酸 烯 丙 2 2 η 環 雙 庚 2 2 2 2 2 Ν—f \—f 環環 雙雙 基基 甲乙 - I 5 5 烯庚庚 匕曰 2 2 酸酸 羧烯 二丙 和基 飽甲 不基 之丙 等羥 烯烯 本紙張尺度適用中國國家標準（CNS ) A4規格（210X29?公釐） -20- 555822 A7 B7 五、發明説明（）18 5 —羥基雙環〔2 . 2 . 1〕庚一 2 -烯、 5 -羧基雙環〔2 . 2 . 1〕庚—2 —烯、 5-羥甲基雙環〔2·2·1〕庚一2-烯、 5 —（2’ —羥乙基）雙環〔2. 2.1〕庚—2 — 烯、 5 -甲氧基雙環〔2 . 2 · 1〕庚—2 -烯、 5 —乙氧基雙環〔2 . 2 · 1〕庚一 2 -烯、 5，6 —二羥甲基雙環〔2 . 2 · 1〕庚—2 -烯、 5，6 —二羧基雙環〔2 _ 2 . 1〕庚—2 —烯、 5 ，6 —二（羥甲基）雙環〔2 . 2 . 1〕庚—2 — 烯、 5，6 —二（2’ —羥乙基）雙環〔2. 2.1〕庚 —2 —烯、 5，6 —二甲氧基雙環〔2 · 2 · 1〕庚一 2 —烯、 5，6 —二乙氧基雙環〔2 . 2 · 1〕庚—2 —烯、 5 —羥基一 5 —甲基雙環〔2 . 2 · 1〕庚—2 —烯 、 5 —羥基一 5 -乙基雙環〔2 · 2 . 1〕庚一 2 —烯 5 -羧基一 5 —甲基雙環〔2 . 2 · 1〕庚—2 —烯 5 —羧基一 5 —乙基雙環〔2 · 2 · 1〕庚一 2 -烯 5 —羥甲基一5 —甲基雙環〔2 . 2 . 1〕庚—2 — 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐) (請先閲讀背面之注意事項再填寫本頁) 、1Τ 經濟部智慧財產局員工消費合作社印製 -21 - 555822 Α7 Β7 五、發明説明（>9 烯、 5 -羧基一 6 —甲基雙環〔2 . 2 · 1〕庚—2 -嫌 、 5 —羧基—6 -乙基雙環〔2 · 2 · 1〕庚—2 —燒 、 5，6 —二羧基雙環〔2 · 2 · 1〕庚一 2 —烯酸酐 (氺*酸酐）、 5 -殘基—5 -乙基雙環〔2 . 2 . 1〕庚一 2 —嫌 % 5-第三丁氧基羧基雙環〔2.2·1〕庚一2-烯 、 5，6 —二（環己基氧基羰基）雙環〔2 · 2 · 1〕 庚- 2 -烯等之雙環不飽和化合物類； 及苯乙烯、α -甲基苯乙烯、間一甲基苯乙烯、對一 甲基苯乙烯、乙烯基甲苯、對甲氧基苯乙烯、丙烯腈、甲 基丙烯腈、氯乙烯、偏氯乙烯、丙烯醯胺、甲基丙烯醯胺 、醋酸乙烯酯、1 ，3 - 丁二烯、異戊二烯、2，3 —二 甲基一 1 ，3 — 丁二烯、苯基馬來醯亞胺、環己基馬來醯 亞胺、苄基馬來醯亞胺、Ν -琥珀醯亞胺基-3 -馬來醯 亞胺苯酸酯、Ν -琥珀醯亞胺基- 4 -馬來醯亞胺丁酸酯 、Ν -琥珀醯亞胺基- 6 -馬來醯亞胺己酸酯、Ν -琥珀 醯亞胺基一 3 -馬來醯亞胺丙酸酯、Ν -（ 9 一吖啶基） 馬來醯亞胺等。 這些當中從共聚反應性及對於鹼水溶液之溶解性的觀 本紙張尺度適用中國國家標準（CNS ) Α4規格（210X29*7公釐） (請先閱讀背面之注意事項再填寫本頁)、 1T Ρ. -17- 555822 A7 ___ B7____ 5. Description of the invention (at 20,000), sometimes it is not easy to uniformly coat the composition on the wafer, and sometimes the developability and sensitivity will decrease. (Please first Read the notes on the back and fill in this page) ia ') Copolymer Copolymer (a') can free radical compounds (al), (a2) and (a3) in a solvent in the presence of a polymerization initiator Aggregate to make. The copolymer (a ') is based on the total of the repeating units derived from the compounds (al), (a2), and (a3), and preferably contains 5 to 4% by weight, and more preferably 10 to 30% by weight. % Of constituent units derived from compound (a 1). The copolymer whose constituent unit is 5% by weight or less is difficult to dissolve in an alkaline aqueous solution, and the copolymer which exceeds 40% by weight is too soluble in an alkaline aqueous solution. Examples of the compound (a 1) include monocarboxylic acids such as acrylic acid, methacrylic acid, and butenoic acid; dicarboxylic acids such as maleic acid, fumaric acid, citraconic acid, mesaconic acid, and itaconic acid; and this Acid anhydride of dicarboxylic acid; printed by the Consumer Cooperative of Intellectual Property Bureau of the Ministry of Economic Affairs, mono (2- (meth) acrylic acid oxyethyl) succinate, phthalic acid mono (2- (meth) acrylic acid) Ethyl) esters of mono-((meth) acryloyloxyalkyl) esters of polyvalent carboxylic acids of two or more valences; ω-residue polycaprolactone mono (meth) acrylate, etc. at both terminals having Mono (meth) propionate esters of polymers of carboxyl and hydroxyl groups. Among these, acrylic acid, methacrylic acid, maleic anhydride, etc. are preferred from the viewpoints of copolymerization reactivity, solubility in an alkali aqueous solution, and ease of obtaining. These can be used individually or in combination. This paper size applies Chinese National Standard (CNS) A4 specification (210 × 297 mm) — -18- 555822 A7 B7_____ V. Description of the invention (> 6 Copolymer (a ') is based on compound (a1), (a 2) and (a 3) The total of the repeating units derived from (a) is preferably 10 to 70% by weight, more preferably 20 to 60% by weight of the constituent units derived from the compound (a2). This When the constituent unit is 10% by weight or less, the heat resistance and surface hardness of the obtained protective film or insulating film tend to decrease, and when it exceeds 70% by weight, the storage stability of the copolymer tends to decrease. a 2) Examples include: propylene acrylate, propylene methacrylate, ^ -ethyl acrylate, α-n-propyl acrylate, α-n-butyl acrylate Propyl ester, acrylic acid-3,4-butylene oxide, methacrylic acid-3,4-butyl epoxy acid, methacrylic acid-4,5-epoxy pentyl ester, methacrylic acid-4,5-epoxy pentyl ester , Acrylic acid-6,7-epoxyheptyl, Methacrylic acid-6,7-epoxyheptyl Ester, α-ethylacrylic acid-6,7-epoxyheptyl ester, o-vinyl benzyl glycidyl ether, m-vinyl T-glycidyl ether, p-vinyl benzyl glycidyl ether, etc. Among them, the copolymerization reaction is improved In view of the heat resistance and surface hardness of the obtained light-diffusing reflection film, epoxy methacrylate, methacrylic acid-6, 7-epoxyheptyl, o-vinyl benzyl glycidyl ether, Vinyl benzyl glycidyl ether, p-vinyl benzyl glycidyl ether, etc. These can be used alone or in combination. The copolymer (a ') is based on the compounds (a1), (a2), and (a3) The total number of repeating units derived from) should ideally contain 10-70% by weight, more preferably 15-50% by weight of the compound (this paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) ) (Please read the notes on the back before filling out this page), 1T IP- · Printed by the Employee Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs-19- 555822 A7 B7 V. Description of the invention () | 7 a 3) Unit. This constituent unit is 10% by weight or less In some cases, the storage stability of the copolymer (a ′) tends to decrease, and when it exceeds 70% by weight, the copolymer tends to be difficult to dissolve in an alkaline aqueous solution. The compound (a 3) includes, for example, methyl methacrylate Esters, ethyl methacrylate, n-butyl methacrylate, second butyl methacrylate, third butyl methacrylate, etc. alkyl methacrylates; acrylic acid such as methacrylate, isopropyl acrylate, etc. Alkyl esters; cyclohexyl methacrylate, 2-methylcyclohexyl methacrylate, tricyclo [5 · 2 · 1 · 0 2 6] decyl-8-yl ester (used in the technical field The names are dicyclopentyl methacrylate), dicyclopentyloxyethyl methacrylate, isofluryl methacrylate, and other cyclic alkyl methacrylates; cyclohexyl acrylate, 2-methyl Cyclohexyl acrylate, acrylic tricyclo [5.2 · 1 · 0 2 '6] decane-8-yl ester (commonly used in this technical field as dicyclopentyl acrylate), dicyclopentyloxy acrylate Acrylic ring of ethyl ester, isofluryl acrylate, etc. Alkyl esters; aryl methacrylates such as phenyl methacrylate and benzyl methacrylate; phenyl (please read the notes on the back before filling this page) Cooperative printed acid diacrylic acid allylic acid ester allyl aryl succinic acid succinyl acetic acid green propyl acetic acid acetic acid acetic acid acetic acid acetic acid acetic acid acetic acid acetic acid ethyl methanoic acid ethyl methionate 2, 2 esters; ethyl acetate, etc. Allyl 2 2 η Cyclobiheptene 2 2 2 2 2 Ν—f \ —f Cyclocyclic bibiyl methyl ethyl-I 5 5 Diheptyl 2 2 Dipropylene and methacrylic hydroxy olefins. The paper size is applicable to Chinese National Standard (CNS) A4 (210X29? Mm) -20- 555822 A7 B7 V. Description of the invention () 18 5 —Hydroxybicyclo [2.2.1] Hepta-2-ene, 5-carboxybicyclo [2.2.1] Hept-2-ene, 5-hydroxymethylbicyclo [2 · 2 · 1] Hepta-2-ene, 5 — (2 '—Hydroxyethyl) bicyclo [2. 2.1] hept-2-ene, 5-methoxybicyclo [2.2.1] hept-2-ene, 5-ethoxy Bicyclo [2.2.1] hepta-2-ene, 5,6-dimethylolbicyclo [2.2.1] hept-2-ene, 5,6-dicarboxybicyclo [2_2.1.] Hept-2-ene, 5,6-bis (hydroxymethyl) bicyclo [2.2.1] hept-2-ene, 5,6-bis (2'-hydroxyethyl) bicyclo [2. 2.1] heptane —2 —ene, 5,6-dimethoxybicyclo [2 · 2 · 1] hept-2-ene, 5,6-diethoxybicyclo [2. 2 · 1] hept-2-ene, 5 —Hydroxy-5—methylbicyclo [2.2 · 1] heptan-2-ene, 5—Hydroxy-5—ethylbicyclo [2 · 2.1.1] heptan-2-ene 5-carboxy-5—methyl Bicyclic [2.2 · 1] hept-2-ene-5 -carboxy-5 -ethylbicyclic [2 · 2 · 1] hept-2-ene 5 -hydroxymethyl-5 -methylbicyclo [2.2. 1] Geng — 2 — This paper size applies Chinese National Standard (CNS) A4 specification (210X297 mm) (Please read the notes on the back before filling this page), 1T Printed by the Intellectual Property Bureau Employee Consumer Cooperatives of the Ministry of Economic Affairs-21 -555822 Α7 Β7 V. Description of the invention (> 9 ene, 5-carboxyl-6-methylbis Ring [2. 2 · 1] Heptan-2-yl, 5-carboxyl-6-ethylbicyclo [2 · 2 · 1] Heptan-2-yl, 5,6-dicarboxybicyclic [2 · 2 · 1] Hepta-2-ene anhydride (fluorene * anhydride), 5 -residue-5 -ethylbicyclo [2.2.1] hepta-2 -animated% 5-third-butoxycarboxybicyclo [2.2 · 1] heptane 2-enes, 5,6-bis (cyclohexyloxycarbonyl) bicyclic [2 · 2 · 1] bicyclic unsaturated compounds such as hept-2-ene; and styrene, α-methylstyrene, m- Monomethylstyrene, p-methylstyrene, vinyl toluene, p-methoxystyrene, acrylonitrile, methacrylonitrile, vinyl chloride, vinylidene chloride, acrylamide, methacrylamide, acetic acid Vinyl ester, 1,3-butadiene, isoprene, 2,3-dimethyl-1,3-butadiene, phenylmaleimide, cyclohexylmaleimide, benzyl Maleimide, N-succinimide-3-maleimide benzoate, N-succinimide-4-maleimide butyrate, N-succinimide -6-maleimide hexanoate, N-succinimide-imino-3 -Maleimide propionate, N- (9-acridinyl) maleimide and the like. From the viewpoints of copolymerization reactivity and solubility to alkali aqueous solution, the paper size applies the Chinese National Standard (CNS) A4 specification (210X29 * 7 mm) (Please read the precautions on the back before filling this page)

、1T 經濟部智慧財產局員工消費合作社印製 -22- 555822 A7 B7 五、發明説明（如 (請先閱讀背面之注意事項再填寫本頁) 點來看，較佳者爲苯乙烯、第三丁基甲基丙烯酸酯、甲基 丙烯酸二環戊基氧基乙酯、對甲氧基苯乙烯、2 -甲基環 己基丙烯酸酯、1 ，3 — 丁二烯、雙環〔2 · 2 . 1〕庚 - 2 -烯、苯基馬來醯亞胺、環己基馬來醯亞胺等。 三環〔5 · 2 · 1 · 02’ 6〕癸烷一 8 -基丙烯酸酯 、甲基甲基丙烯酸酯、2 -羥乙基甲基丙烯酸酯、正丁基 甲基丙烯酸酯等。這些可單獨或組合使用。 共聚物（a ’ ）之較佳實例可列舉如： 苯乙烯/曱基丙烯酸/甲基丙烯酸環氧丙酯共聚物' 1 ，3 - 丁二烯/苯乙烯/甲基丙烯酸/甲基丙烯酸環氧 丙酯共聚物、苯乙烯/甲基丙烯酸/甲基丙烯酸環氧丙酯 /三環〔5 . 2 · 1 . 02’6〕癸烷一 8 —甲基丙烯酸酯 共聚物、1 ，3 - 丁二烯/苯乙烯/甲基丙烯酸/甲基丙 烯酸環氧丙酯/三環〔5 · 2 · I1· 02’6〕癸烷一 8-甲基丙烯酸酯共聚物、苯乙烯/甲基丙烯酸/甲基丙烯酸 環氧丙酯/對乙烯基苄基縮水甘油醚/三環〔 5 · 2 . 1 . 〇2’ 6〕癸烷—8 -甲基丙烯酸酯共聚物、 經濟部智慧財產局員工消費合作社印製 苯乙烯/甲基丙烯酸/甲基丙烯酸環氧丙酯/環己基馬來 醯亞胺共聚物、苯乙烯/甲基丙烯酸/甲基丙烯酸環氧丙 酯/苯基馬來醯亞胺共聚物、苯乙儲/甲基丙烯酸/三環 〔5 . 2 . 1 · 〇2’6〕癸烷一 8 —甲基丙烯酸酯/環己 基馬來醯亞胺共聚物、苯乙烯/甲基丙烯酸/三環〔 5 · 2 · 1 . 〇2’6〕癸烷—8 -基甲基丙烯酸酯/苯基 馬來醯亞胺共聚物等’這些當中較佳者爲苯乙_/甲基丙 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 555822 A7 _ __B7____ 五、發明説明（匕 (請先閲讀背面之注意事項再填寫本頁) 烯酸/甲基丙烯酸環氧丙酯/三環〔5 · 2 · 1 · 02’6 〕癸烷- 8 -甲基丙烯酸酯共聚物、苯乙烯/甲基丙烯酸 /甲基丙烯酸環氧丙酯/環己基馬來醯亞胺共聚物、1’ 3〜丁二烯/苯乙烯/甲基丙烯酸/甲基丙烯酸環氧丙酯 /三環〔5 · 2 · 1 · 02’ 6〕癸烷一 8 -甲基丙烯酸酯 共聚物、苯乙烯/甲基丙烯酸/甲基丙烯酸環氧丙酯/對 乙烯基芣基縮水甘油醚/三環〔5 · 2 · 1 · 0 2 ’ 6〕癸 烷- 8 -基甲基丙烯酸酯共聚物、苯乙烯/甲基丙烯酸/ 三環〔5 . 2 . 1 · 02’6〕癸烷—8 —基甲基丙烯酸酯 /苯基馬來醯亞胺共聚物。 共聚物（a’ ）之聚苯乙烯換算重量平均分子量（以 下稱爲「Mw」）理想爲2，000〜100，000的 範圍，更理想爲5，000〜50，000的範圍。Mw 爲2，0 0 0以下時，有時顯影性及殘膜率等會降低，或 圖案形狀、耐熱性等會降低，而超過1 〇 〇，〇 〇 〇時， 感度降低或圖案形狀變差。 如上述共聚物（a’ ）係具有羧基及/或羧酸酐基即 經濟部智慧財產局員工消費合作社印製 環氧基，且對於鹼水溶液具有適當之溶解性，即使未特別 倂用硬化劑也可輕易藉由加熱硬化。 含有上述共聚物（a ’ ）之感放射線性樹脂組成物在 顯影時不會產生顯影殘留，膜減少，可輕易形成所定之圖 案形狀。 製造共聚物（a’ ）所使用之溶媒可使用與製造鹼可 溶性樹脂（a )所使用之前述之相同溶媒。 本紙張尺度適用中國國家標準（CNS M4規格（210X297公釐) " ~ 555822 A7 B7 五、發明説明（Ϊ2 (b ) 1，2 -醌二疊氮化合物 本發明使用之（b) 1 ，2 -醌二疊氮化合物可使用 具有放射線照射產生羧酸之1 ，2 -醌二疊氮化合物，例 如有1 ，2 —苯醌二疊氮磺酸酯、1 ，2 -萘醌二疊氮磺 酸酯、1 ，2 -苯醌二疊氮磺酸醯胺、1 ，2 -萘醌二疊 氮磺酸醯胺等。 這些之具體例有2，3，4 一三羥基二苯甲酮一 1 ， 2 -萘醌二疊氮—4 一磺酸酯、2，3，4 —三羥基二苯 甲酮一 1 ，2 —萘醌二疊氮一 5 -磺酸酯、2 ，4，6 — 三羥基二苯甲酮一 1 ，2 —萘醌二疊氮一 4 一磺酸酯、2 ，4，6 —三羥基二苯甲酮一 1 ，2 -萘醌二疊氮一 5 — 磺酸酯等之三羥基二苯甲酮之1 ，2 -萘醌二疊氮一 4 一 磺酸酯類； 2，2’ ，4，4’一四羥基二苯甲酮一 1，2 -萘 醌二疊氮—4 —磺酸酯、2，2’ ，4，4’—四羥基二 苯甲酮—1 ，2 -萘醌二疊氮一 5 -磺酸酯、2，3，4 ，3’ 一四羥基二苯甲酮一 1 ，2 —萘醌二疊氮一 4 一磺 酸酯、2，3 ，4，3’ 一四羥基二苯甲酮一 1，2 —萘 醌二疊氮一 5 —磺酸酯、2，3，4，4’ 一四羥基二苯 甲酮一 1 ，2 —萘醌二疊氮—4 一磺酸酯、2 ，3，4， 4’ 一四羥基二苯甲酮一 1 ，2 -萘醌二疊氮一 5 -磺酸 酉旨、2，3，4，2’ 一四羥基一4’ 一甲基二苯甲酮一 1，2 —萘醌二疊氮一 4 —磺酸酯、2，3，4，2’ 一 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐〉 (請先閲讀背面之注意事項再填寫本頁) 衣.Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs-22- 555822 A7 B7 V. Description of the invention (eg (Please read the notes on the back before filling this page) From the point of view, the better is styrene, the third Butyl methacrylate, dicyclopentyloxyethyl methacrylate, p-methoxystyrene, 2-methylcyclohexyl acrylate, 1,3-butadiene, bicyclic [2.2.1] heptane -2 -ene, phenylmaleimide, cyclohexylmaleimide, etc. Tricyclic [5 · 2 · 1 · 02 '6] decane-8-yl acrylate, methmethacrylate , 2-hydroxyethyl methacrylate, n-butyl methacrylate, etc. These can be used alone or in combination. Preferred examples of the copolymer (a ') can be listed as: styrene / fluorenyl acrylic acid / methacrylic acid ring Oxypropylene ester copolymer '1, 3-butadiene / styrene / methacrylic acid / glycidyl methacrylate copolymer, styrene / methacrylic acid / glycidyl methacrylate / tricyclic [5 2 · 1. 02'6] decane-8-methacrylate copolymer, 1,3-butadiene / styrene / methyl Enoic acid / glycidyl methacrylate / tricyclic [5 · 2 · I1 · 02'6] decane-8-methacrylate copolymer, styrene / methacrylic acid / glycidyl methacrylate / P-vinylbenzyl glycidyl ether / tricyclic [5 · 2. 1. 1.02 '6] decane-8-methacrylate copolymer, printed by styrene / formaldehyde in the Consumer Cooperative of Intellectual Property Bureau of the Ministry of Economic Affairs Acrylic acid / glycidyl methacrylate / cyclohexyl maleimide copolymer, styrene / methacrylic acid / glycidyl methacrylate / phenyl maleimide copolymer, styrene ethyl ester / Methacrylic acid / tricyclo [5.2.1. 〇2'6] decane-8-methacrylate / cyclohexylmaleimide copolymer, styrene / methacrylic acid / tricyclic [5 · 2 · 1. 〇2'6] decane-8-yl methacrylate / phenylmaleimide copolymer, etc. 'The better of these is phenylethyl methacrylate / methyl propylene. Standard (CNS) A4 specification (210X297 mm) 555822 A7 _ __B7____ 5. Description of the invention (knife (please read the notes on the back before filling this page) Glycidyl acrylate / tricyclic [5 · 2 · 1 · 02'6] Decane-8-methacrylate copolymer, styrene / methacrylic acid / glycidyl methacrylate / cyclohexyl malay Fluorene imine copolymer, 1 '3 ~ butadiene / styrene / methacrylic acid / glycidyl methacrylate / tricyclic [5 · 2 · 1 · 02' 6] decane-8-methacrylic acid Ester copolymer, styrene / methacrylic acid / glycidyl methacrylate / p-vinylfluorenyl glycidyl ether / tricyclic [5 · 2 · 1 · 0 2 '6] decane-8-ylmethyl Acrylate copolymer, styrene / methacrylic acid / tricyclic [5.2.1.02'6] decane-8-yl methacrylate / phenylmaleimide copolymer. The polystyrene equivalent weight average molecular weight (hereinafter referred to as "Mw") of the copolymer (a ') is preferably in the range of 2,000 to 100,000, and more preferably in the range of 5,000 to 50,000. When Mw is 2,000 or less, the developability and the residual film rate may be reduced, or the pattern shape, heat resistance, etc. may be reduced. When Mw is more than 10,000, the sensitivity may be reduced or the pattern shape may be deteriorated. . For example, the above-mentioned copolymer (a ') has a carboxyl group and / or a carboxylic anhydride group, which is an epoxy group printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, and has appropriate solubility for alkaline aqueous solutions, even if a hardener is not particularly used. Can be easily hardened by heating. The radiation-sensitive resin composition containing the above-mentioned copolymer (a ') does not cause development residues during development, reduces the film, and can easily form a predetermined pattern shape. As the solvent used for producing the copolymer (a '), the same solvents as those used for producing the alkali-soluble resin (a) can be used. This paper size applies to Chinese national standard (CNS M4 specification (210X297 mm) " ~ 555822 A7 B7 V. Description of the invention (Ϊ2 (b) 1,2-quinonediazide compound (b) 1 and 2 used in the present invention As the quinonediazide compound, there can be used 1,2-quinonediazide compounds which generate carboxylic acids by radiation irradiation, for example, 1,2-benzoquinonediazide sulfonate, and 1,2-naphthoquinonediazidesulfonate. Acid esters, 1,2-benzoquinonediazidesulfonamide, 1,2-naphthoquinonediazidesulfonamide, and the like. Specific examples of these are 2,3,4-trihydroxybenzophenone- 1, 2-naphthoquinonediazide-4 monosulfonate, 2,3,4-trihydroxybenzophenone-1,2-naphthoquinonediazide-5-sulfonate, 2,4,6 — Trihydroxybenzophenone-1,2-naphthoquinonediazide-4 monosulfonate, 2,4,6-trihydroxybenzophenone-1,2-naphthoquinonediazide-5—sulfone 1,2-naphthoquinonediazide-4 monosulfonates; 2,2 ', 4,4'-tetrahydroxybenzophenone-1,2-naphthalene Quinonediazide-4-sulfonate, 2,2 ', 4,4'-tetrahydroxyl Benzophenone—1,2-naphthoquinonediazide-5—sulfonate, 2,3,4,3′-tetrahydroxybenzophenone—1,2—naphthoquinonediazide—4— Sulfonate, 2,3,4,3'-tetrahydroxybenzophenone-1,2-naphthoquinonediazide-5-sulfonate, 2,3,4,4'-tetrahydroxybenzophenone Ketone-1,2-naphthoquinonediazide-4 monosulfonate, 2,3,4,4'-tetrahydroxybenzophenone-1,2-naphthoquinonediazide-5-sulfonic acid , 2,3,4,2'-tetrahydroxy-4'-methylbenzophenone-1,2-naphthoquinonediazide-4-sulfonate, 2,3,4,2 'a paper The dimensions are applicable to China National Standard (CNS) A4 specifications (210X297 mm) (Please read the precautions on the back before filling this page).

、1T 經濟部智慧財產局員工消費合作社印製 -25- 555822 A7 B7 五、發明説明（）23 四羥基一 4’ —甲基二苯甲酮—1 ，2 —萘醌二疊氮—5 —磺酸酯、2，3，4，4’ —四羥基—3’ 一甲氧基二 (請先閲讀背面之注意事項再填寫本頁) 苯甲酮一 1 ，2 —萘醌二疊氮一 4 一磺酸酯、2，3，4 ，4’ 一四羥基一3’ —甲氧基二苯甲酮一 1 ，2 —萘醌 二疊氮一 5 —磺酸酯等之四羥基二苯甲酮之1 ，2 —萘醌 二疊氮一 4 一磺酸酯； 2，3，4，2’ ，6’—五羥基二苯甲酮—1，2 一萘醌二疊氮—4 —磺酸酯、2，3，4，2’ ，6’ — 五羥基二苯甲酮一 1 ，2 -萘醌二疊氮一 5 -磺酸酯等之 五羥基二苯甲酮之1，2 -萘醌二疊氮一 4 一磺酸酯； 2，4，6，3’ ，4’ 5’ 一六羥基二苯甲酮—1 ，2_萘醌二疊氮—4 一磺酸酯、2，4，6，3’ ， 4’ ，5’ 一六羥基二苯甲酮一 1 ，2 —萘醌二疊氮—5 一磺酸酯、3，4，5，3’ ，4’ 5’ —六羥基二苯甲 嗣一 1，2 -蔡醒二疊氮一 4 一礦酸酯、3，4，5， 3’ ，4’ 5’ 一六羥基二苯甲酮一 1，2 —萘醌二疊氮 經濟部智慧財產局員工消費合作社印製 一 5 -磺酸酯等之六羥基二苯甲酮之1 ，2 —萘醌二疊氮 一 4 —磺酸酯： 雙（2，4 一二羥苯基）甲烷一 1 ，2 —萘醌二疊氮 —4 —磺酸酯、雙（2，4 —二羥苯基）甲烷—1 ，2 - 萘醌二疊氮一 5 -磺酸酯、雙（對羥苯基）甲烷一 1 ，2 一萘醌二疊氮—4 一磺酸酯、雙（對羥苯基）甲烷一 1 ， 2 -萘醌二疊氮一 5 -磺酸酯、三（對羥苯基）甲烷—1 ，2 -萘醌二疊氮一 4 一磺酸酯、三（對羥苯基）甲烷一 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） -26- 555822 A7 B7 五、發明説明（>4 1 ，2 -萘醌二疊氮一 5 —磺酸酯、1 ，1 ，1—三（對 羥苯基）乙烷一 1 ，2 —萘醌二疊氮一 4 一磺酸酯、1， 1 ，1 一三（對羥苯基）乙烷—1 ，2-萘醌二疊氮一 5 _磺酸酯、雙（2，3，4 一三羥苯基）甲烷一 1 ，2 -萘醌二疊氮一 4 一磺酸酯、雙（2，3，4 一三羥苯基） 甲烷一 1 ，2 -萘醌二疊氮—5 —磺酸酯、2 ，2 —雙（ 2，3，4 一三羥苯基）丙烷一 1，2 -萘醌二疊氮一 4 -磺酸酯、2，2 —雙（2，3，4 一三羥苯基）丙烷— 1 ，2 —萘醌二疊氮—5 —磺酸酯、1 ，1 ，3 —三（2 ，5 -二甲基一 4 —羥苯基）—3 —苯基丙烷一 1 ，2-萘醌二疊氮—4 一磺酸酯、1 ，1，1—三（2，5_二 甲基一 4 一羥苯基）一 3 -苯基丙烷一 1 ，2 -萘醌二疊 氮—5 —磺酸酯、4，4’ —〔1—〔4 —〔1—〔4 — 羥苯基〕一 1—甲基乙基〕苯基〕亞乙基〕顰酚一 1 ，2 一萘醌二疊氮一4一磺酸酯、4，4’ -(1-(4-( 1 一〔4 一羥苯基〕—1—甲基乙基〕苯基〕亞乙基〕雙 酚一 1 ，2 -萘醌二疊氮一 5 -磺酸酯、雙（2，5 —二 甲基一 4 一羥苯基）—2 -羥苯基甲烷一 1 ，2 -萘醌二 疊氮—4 一磺酸酯、雙（2，5 -二甲基一 4 一羥苯基） 一 2 -羥苯基甲烷一 1 ，2 -萘醌二疊氮一 5 -磺酸酯、 3，3，3， ，3，一四甲基一1，1， 一螺二一5, 6，7，5’ ，6’ ，7’一 己醇—1，2 -萘醌二疊氮 —4 —磺酸酯、3，3，3’ ，3’一四甲基一1，1’ —螺二 一 5，6，7,5, ，6， ，7，—己醇—1， 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） (請先閲讀背面之注意事項再填寫本頁) 衣· 經濟部智慧財產局員工消費合作社印製 -27- 555822 A 7 B7 五、發明説明（>5 2 —萘醌二疊氮一 5 —磺酸酯、2，2，4 一三甲基一 7 ，2’ ，4’ 一三羥基黃烷—1，2-萘醌二疊氮一4— 磺酸酯、2，2，4 —三甲基—7,2， ，4’ —三羥基 黃烷一 1 ，2 —萘醌二疊氮一 5 —磺酸酯等之（聚羥苯基 )烷之一 1，2 -萘醌二疊氮磺酸酯。 除了這些化合物外可使用下述所載之1 ，2 -醌二 疊氮化合物 ’ J. Kosar “Light-Sensitive Systems” 3 3 9〜3 52( 1 965)、John Wiley&Sons 社（New York) W. S. De Fores 著” Photoresist” 50( 1 975)McGraw-Hill， Inc. (New York) o 這些可使用以其一部分或全量與上述（a )驗可溶性 樹脂反應形成縮合物的形態。 也可使用上述之1 ，2 -萘醌二疊氮磺酸自旨類之酯鍵 改爲醯胺鍵之1 ，2 -萘醌二疊氮磺酸醯胺類，例如有2 ，3，4 —三羥基二苯甲酮—1 ，2 —萘醌二疊氮—5 — 磺酸醯胺等。 其中從鹼可溶性樹脂之溶解禁止的效果來看，較佳者 爲2，3 ，4 一三羥基二苯甲酮一 1 ，2 —萘醌二疊氮一 4 一磺酸酯、2，3 ，4，4’ 一四羥基二苯甲酮—1， 2 —萘醒二疊氮一 4 一磺酸酯、2，2’ ，4，4’ 一四 經基一本甲國一 1 ，2 —察醌二疊氮一 4 一擴酸酯、雙（ 2，4 一二羥苯基）甲烷—1 ，2 —萘醌二疊氮—4 —磺 酸酯、1 ，1 ，3 -三（2，5 —二甲基—4 —羥苯基） —3—苯基丙烷一 1，2 -萘醌二疊氮一 5 -磺酸酯、1 本紙張尺度適用中國國家榡準（CNS ) Α4規格（210Χ297公釐） (請先閱讀背面之注意事項再填寫本頁) 衣·Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, 1T-25- 555822 A7 B7 V. Description of the invention () 23 Tetrahydroxy-1 4 '—methylbenzophenone-1, 2 —naphthoquinonediazide-5 — Sulfonate, 2,3,4,4 '—tetrahydroxy-3'-methoxydi (Please read the precautions on the back before filling this page) Benzophenone-1, 2-naphthoquinonediazide-1 4-monosulfonate, 2,3,4,4'-tetrahydroxy- 3'-methoxybenzophenone-1,2-naphthoquinonediazide-5-sulfonate 1,2-naphthoquinonediazide-4 monosulfonate; 2,3,4,2 ', 6'-pentahydroxybenzophenone—1,2-naphthoquinonediazide-4— Sulfonates, 2,3,4,2 ', 6' — Pentahydroxybenzophenone-1,2-naphthoquinonediazide-5-sulfonate -Naphthoquinonediazide-4 monosulfonate; 2,4,6,3 ', 4'5'hexahexahydroxybenzophenone-1, 2-naphthoquinonediazide-4 monosulfonate, 2,4,6,3 ', 4', 5 'hexahydroxybenzophenone-1,2-naphthoquinonediazide-5 a Acid esters, 3,4,5,3 ', 4' 5 '—hexahydroxydibenzofluorene-1,2-Cai Xingdiazide-4 monomine esters, 3,4,5,3', 4 '5' Hexahydroxybenzophenone-1,2-naphthoquinonediazide Printed by the Consumer Cooperative of Intellectual Property Bureau of the Ministry of Economic Affairs Employee Co-operative Society of Hexahydroxybenzophenone 1,2-naphthalene Quinonediazide 4-sulfonate: bis (2,4-dihydroxyphenyl) methane-1,2-naphthoquinonediazide-4-sulfonate, bis (2,4-dihydroxyphenyl) ) Methane—1,2-naphthoquinonediazide-5—sulfonate, bis (p-hydroxyphenyl) methane—1,2—naphthoquinonediazide-4 monosulfonate, bis (p-hydroxyphenyl) ) Methane-1,2-naphthoquinonediazide-5-sulfonate, tris (p-hydroxyphenyl) methane-1,2-naphthoquinonediazide-4 monosulfonate, tris (p-hydroxyphenyl) ) Methane paper size applies Chinese National Standard (CNS) A4 specification (210X297 mm) -26- 555822 A7 B7 V. Description of the invention (> 4 1,2 Naphthoquinonediazide-5 —sulfonate, 1,1,1-tris (p-hydroxyphenyl) ethane-1,2-naphthoquinone One 4-monosulfonate, 1, 1, 1,1-tris (p-hydroxyphenyl) ethane-1, 2-naphthoquinonediazide-5_sulfonate, bis (2,3,4-trihydroxybenzene) Methyl) methane-1,2-naphthoquinonediazide-4 monosulfonate, bis (2,3,4-trihydroxyphenyl) methane-1,2-naphthoquinonediazide-5-sulfonate , 2, 2-bis (2,3,4-trihydroxyphenyl) propane-1,2-naphthoquinonediazide-4-sulfonate, 2,2-bis (2,3,4-trihydroxyl Phenyl) propane—1,2-naphthoquinonediazide-5—sulfonate, 1,1,3-tris (2,5-dimethyl-1—4-hydroxyphenyl) —3—phenylpropane— 1,2-naphthoquinonediazide-4 monosulfonate, 1,1,1-tris (2,5_dimethyl-4 monohydroxyphenyl) -3-phenylpropane-1,2-naphthalene Quinonediazide-5 sulfonate, 4,4 '— [1— [4 — [1— [4-hydroxyphenyl] —1-methylethyl] phenyl] ethylene]] phenol 1,2 mononaphthoquinonediazide-4 monosulfonate, 4,4 '-(1- (4- (1- [4-hydroxyphenyl] -1-methylethyl] phenyl] ethylene Bisphenol-1,2-naphthoquinonediazide 5-sulfonate, bis (2,5-dimethyl-4 monohydroxyphenyl) -2-hydroxyphenylmethane-1, 2-naphthoquinonediazide-4 monosulfonate, bis (2, 5-dimethyl-1, 4-hydroxyphenyl), 2-hydroxyphenylmethane, 1, 2-naphthoquinonediazide, 5-sulfonate, 3,3,3,, 3, tetramethyl-1 1,1,1-spirobi 5,6,7,5 ', 6', 7'-hexanol—1,2-naphthoquinonediazide-4—sulfonate, 3,3,3 ', 3' Tetramethyl-1,1 '—spirobione 5,6,7,5,, 6,, 7, —hexanol-1, This paper size applies to China National Standard (CNS) A4 (210X297 mm) (Please read the notes on the back before filling out this page) Printed by the Consumers' Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs and Clothing-27- 555822 A 7 B7 V. Description of the invention (> 5 2 —naphthoquinonediazide 5 — Sulfonate, 2,2,4 trimethyl-7,2 ', 4'-trihydroxyflavan-1,2-naphthoquinonediazide-4, sulfonate, 2,2,4-tris Methyl-7,2,, 4'-trihydroxyflavan-1,2-naphthoquinonediazide-5-sulfonate, etc. (polyhydroxyphenyl) One 1,2 - naphthoquinone diazide sulfonic acid ester. In addition to these compounds, the following 1,2-quinonediazide compounds can be used: 'J. Kosar "Light-Sensitive Systems" 3 3 9 ~ 3 52 (1 965), John Wiley & Sons (New York) WS De Fores, "Photoresist" 50 (1 975) McGraw-Hill, Inc. (New York) o These can be used in the form of a condensate formed by reacting part or all of them with the above-mentioned (a) soluble resin. It is also possible to use the above-mentioned 1,2-naphthoquinonediazidesulfonic acid ester linkages instead of 1,2-naphthoquinonediazidesulfonic acid amidines, for example, 2,3,4 —Trihydroxybenzophenone — 1, 2-naphthoquinonediazide — 5 —sulfonamide and the like. Among them, in view of the effect of prohibiting the dissolution of the alkali-soluble resin, the preferred one is 2,3,4-trihydroxybenzophenone-1,2-naphthoquinonediazide-4 monosulfonate, 2,3, 4,4'-tetrahydroxybenzophenone—1,2-naphthalene diazide-4 monosulfonate, 2,2 ', 4,4' Tetrahydrobenzylbenzylone 1,2 — Chloroquinonediazide-4 monoate, bis (2,4-dihydroxyphenyl) methane-1, 2-naphthoquinonediazide-4-sulfonate, 1,1,3-tris (2 , 5-Dimethyl-4-Hydroxyphenyl) 3-Phenylpropane-1,2-naphthoquinonediazide-5-sulfonate, 1 This paper size applies to China National Standard (CNS) A4 specifications (210 × 297 mm) (Please read the precautions on the back before filling in this page)

、1T 經濟部智慧財產局員工消費合作社印製 -28- 555822 Α7 Β7 五、發明説明（）26 ，1 ，3 -三（2，5 一二甲基一 4 —羥苯基）一 3 —苯 基丙烷一 1 ，2 -萘醌二疊氮一 4 —磺酸酯' 4，4， 一 〔1—〔4 一〔 1 一〔4 —羥苯基〕—1 一甲基乙基〕苯 基〕亞乙基〕雙酌一 1 ’ 2 一奈酿一疊氮一 4 一磺酸酯、 4，4， 一〔1 一〔4 一〔1—〔4 一羥苯基〕一 1—甲 基乙基〕苯基〕亞乙基〕雙酣一 1 ，2 -萘醌二疊氮一 5 —磺酸酯、2，2，4 一三甲基—7，2， ，4，—三經 基黃烷一 1 ，2 —萘酿二疊氮一 5 —磺酸酯、2，2，4 一三甲基—7，2， ，4’ 一三羥基黃烷一 1 ，2 -萘醌 二疊氮一 4 一磺酸酯、1 ’ 1 ’ i —三（對羥苯基）乙烷 一 1 ，2 —萘醌二疊氮一 4 一磺酸酯、1 ，1 ，1—三（ 對羥苯基）乙烷一 1，2 一萘醌二疊氮一 5 —磺酸酯。 上述之1 ，2 -酿二疊氮化合物可單獨使用或混合二 種以上使用。 (b) 1 ，2 -酿二疊氮化合物之添加量係對於（a )鹼可溶性樹脂或共聚物（a ’ ）1 〇 〇重量份時，添加 5〜1 0 0重量份，更理想爲1 〇〜5 〇重量份。此添加 量低於5重量份時，1 ’ 2 一醌二疊氮化合物吸收放射線 所生成之羧酸量較少，不易形成圖案。又超過1 0 0重量 份時，很難以短時間之紫外線照射使所有添加之1 ，2 -醌二疊氮化合物分解，有時利用由鹼性水溶液所構成之顯 影液之顯影困難。 本發明之組成物中，主要爲了提高感度時，可添加對 於1 ，2 -醌二疊氮化合物之增感劑。增感劑例如有2 Η 本紙張尺度適用中國國家標準（CNS ) Α4規格（210 X297公釐） (請先閲讀背面之注意事項再填寫本頁) 訂 經濟部智慧財產局員工消費合作社印製 -29- 555822 A7 B7 五、發明説明（\ί 〜吡啶—（3，2 — b) — 1 ，4 —噁嗪-3 (4Η) -酮類、1〇H — 口比 B定一（3 ，2 — b) — （1 ，4) 一苯 並噻嗪類、尿11坐類、乙內醯尿類、丙二隨尿類、甘氨酸酐 類、1 -羥基苯並三唑類、阿尿類、順丁醯二胺類等。這 些增感劑之使用量係對於1，2 -醌二疊氮化合物1 〇 〇 重量份時，理想爲使用1 〇 〇重量份以下，理想爲4〜 6 0重量份。 (c)分子內具有2個以上之環氧基之化合物 本發明使用之分子內具有2個以上環氧基之化合物例 如有 Epycoat 1001、1〇〇2、1003、1004 、：1007、1009、1〇1〇、828 (油化 Shell Εροχ (股）製）等之雙酣A型環氧樹脂市售品，Epycoat 8 0 7 (油化Shell Epox (股）製）等之雙酚F型環氧樹脂 市售品，Epycoat 1 5 2、1 5 4 (油化 Shell Epox (股 )製）、EPPN 20 1、202 (日本化藥（股）製 )等之苯酚酚醛型環氧樹脂市售品，E0CN - 1 0 2、 103S、l〇4S、1020、1025、1027 ( 曰本化藥（股）製）、Epycoat 1 8 0 S 7 5 (油化ShellPrinted by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, -28- 555822 Α7 Β7 V. Description of the invention () 26,1,3-tris (2,5 dimethyl-4 4-hydroxyphenyl) -3-benzene Propane-1,2-naphthoquinonediazide-4-sulfonate'4,4,1- [1- [4-a [1- [4-hydroxyphenyl] -1 monomethylethyl] phenyl ] Ethylene] bis (1'2) -nazine-azide-4 (4) sulfonate, 4,4, 1 [1 1 [4 1 [1-[4 -hydroxyphenyl]-1 -methyl Ethyl] phenyl] ethylene] bisfluorene-1,2-naphthoquinonediazide-5-sulfonate, 2,2,4-trimethyl-7,2,4,4-trisyl Flavane-1,2-naphthalene-diazide-5-sulfonate, 2,2,4-trimethyl-7,2,, 4'-trihydroxyflavan-1,2-naphthoquinone diazide Nitrogen-4 monosulfonate, 1 '1'i-tris (p-hydroxyphenyl) ethane-1, 2-naphthoquinonediazide-4 monosulfonate, 1,1,1-tris (p-hydroxyl Phenyl) ethane-1,2-naphthoquinonediazide-5-sulfonate. The above 1,2-diazide compounds can be used alone or in combination of two or more. (b) The amount of 1,2-diazide compound added is 5 to 100 parts by weight, more preferably 1 to 100 parts by weight of (a) the alkali-soluble resin or copolymer (a '). 〇 ~ 5 〇 Parts by weight. When the added amount is less than 5 parts by weight, the amount of carboxylic acid generated by 1 '2 monoquinonediazide compound absorbing radiation is small, and it is difficult to form a pattern. When it exceeds 100 parts by weight, it is difficult to decompose all the added 1,2-quinonediazide compounds by short-term ultraviolet irradiation, and sometimes it is difficult to develop using a developing solution composed of an alkaline aqueous solution. In the composition of the present invention, a sensitizer for a 1,2-quinonediazide compound may be added for the purpose of improving sensitivity. For example, there are 2 sensitizers. This paper size is applicable to the Chinese National Standard (CNS) A4 specification (210 X297 mm) (Please read the precautions on the back before filling this page.) Order printed by the Intellectual Property Bureau Employee Consumer Cooperatives- 29- 555822 A7 B7 V. Description of the invention (\ ί ~ pyridine— (3, 2 — b) — 1, 4, 4-oxazine-3 (4Η) -ones, 10H—the ratio is fixed to B (3, 2 — b) — (1,4) monobenzothiazines, urine 11 sittings, hydantoin urine, malondiuria, glycine anhydrides, 1-hydroxybenzotriazoles, diuretics Cis-butanediamines, etc. The amount of these sensitizers used is 1,000 parts by weight of the 1,2-quinonediazide compound, preferably 1,000 parts by weight or less, and preferably 4 to 60. (C) Compounds having two or more epoxy groups in the molecule Compounds having two or more epoxy groups in the molecule used in the present invention include, for example, Epycoat 1001, 1002, 1003, 1004, 1007, 1009, 1010, 828 (made by Shell Chemical Co., Ltd.) and other commercial products of Shuang A-type epoxy resin, Epycoat 8 0 7 (Petrochemical Shell Epox ( Bisphenol F-type epoxy resin commercially available), Epycoat 1 5 2, 1 5 4 (made by Shell Chemicals Epox Co., Ltd.), EPPN 20 1, 202 (made by Nippon Kayaku Co., Ltd.) And other commercially available phenolic novolac epoxy resins, E0CN-1 0 2, 103S, 104S, 1020, 1025, 1027 (manufactured by Benchem Corporation), Epycoat 1 8 0 S 7 5 (Oilization Shell

Epox (股）製）等之甲階酚醛型環氧樹脂市售品，C Y — 175、177、179( Ciba gaigy A.G·製）、E R L — 4234、4299、4221、4206 (U.C.C (股）製）、Shodine 5 0 9 (昭和電工（股）製）、 Aldalite CY— 182、192、184( Ciba gaigy (公 本紙張尺度適用中國國家標準（CNS ) Α4規格（210X297公釐） (請先閲讀背面之注意事項再填寫本頁) 訂 經濟部智慧財產局員工消費合作社印製 •30- 555822 A7 B7 五、發明説明（^8 (請先閲讀背面之注意事項再填寫本頁) 司）製）、Epyclone 200、400 (大日本油墨（股） 製）、Epycoat 8 7 1、8 7 2 (油化 Shell Εροχ (股） 製）、ED - 5 6 6 1、5 6 6 2 (Ceraneedscoating (股 )製）等之環脂肪族環氧樹脂市售品，Epolite 1 0 0 M F (共榮社油脂化學工業（股）製）、Epyol Τ Μ P (曰本 油脂（股）製）等之脂肪族聚縮水甘油醚市售品。 這些化合物中，從顯影性及反射凹凸之形狀控制的觀 點來看，較佳爲使用雙酚Α型環氧樹脂、雙酚F型環氧樹 脂、苯酚醛淸漆型環氧樹脂、酚醛淸漆型環氧樹脂、脂族 型聚縮水甘油醚類。 除上述環氧化合物外，例如可使用雙酚A、雙酚F之 縮水甘油醚之化合物。 經濟部智慧財產局員工消費合作社印製 分子內具有2個以上環氧基之化合物之添加量係對於 (a )鹼可溶性樹脂1 〇 〇重量份時，添加1〜1 〇 〇重 量份，更理想爲5〜5 0重量份。由含有此範圍之分子內 具有2個以上環氧基之化合物之組成物所形成之硬化物爲 耐熱性或密著性優異者。分子內具有2個以上環氧基之化 合物之添加量低於1重量份時，與放射線照射於（b ) 1 ，2 -醌二疊氮化合物所生成之羧酸之反應不易充分進行 ，由這種組成物所形成之硬化膜有時耐熱性、耐溶劑性不 良。又超過1 0 0重量份時，組成物整體之軟化點降低， 在形成光擴散反射膜所用之圖案時知加熱處理中，很難維 持形狀。 上述之（a )鹼可溶性樹脂中，使用共聚單體之含環 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） -31 - 555822 A7 B7 五、發明説明（>9 氧基不飽和單體時，可稱爲「分子內具有2個以上環氧基 之化合物」，但是在鹼可溶性方面與（c )成分不同。 (d )成分 本發明使用之（d )成分係以下述式（1 )Epoxy (shares)) and other phenolic epoxy resins commercially available, CY — 175, 177, 179 (manufactured by Ciba Gaigy AG), ERL — 4234, 4299, 4221, 4206 (UCC (shares)) , Shodine 5 0 9 (Showa Denko Co., Ltd.), Aldalite CY— 182, 192, 184 (Ciba gaigy (The size of the original paper applies the Chinese National Standard (CNS) Α4 specification (210X297 mm)) (Please read the back Please fill in this page for the matters needing attention) Order printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs • 30- 555822 A7 B7 V. Invention Description (^ 8 (Please read the notes on the back before filling this page)), Epyclone 200, 400 (made by Dainippon Ink (stock)), Epycoat 8 7 1, 8 7 2 (made by Petrochemical Shell Εροχ (stock)), ED-5 6 6 1, 5 6 6 2 (made by Ceraneedscoating (stock)) Commercial products such as cycloaliphatic epoxy resins, etc., aliphatic polyglycidols such as Epolite 1 0 0 MF (Kyoeisha Oil Chemical Industry Co., Ltd.), Epyol Τ Μ P (Yueben Oils and Fats Co., Ltd.) Ether is commercially available. Among these compounds, from the viewpoints of developability and shape control of reflection irregularities It is preferable to use bisphenol A epoxy resin, bisphenol F epoxy resin, phenolic epoxy resin, phenolic epoxy resin, and aliphatic polyglycidyl ether. In addition to epoxy compounds, for example, glycidyl ether compounds of bisphenol A and bisphenol F can be used. The amount of compounds with two or more epoxy groups in the molecule printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs is for (a ) When the alkali-soluble resin is 1,000 parts by weight, 1 to 1,000 parts by weight is added, and more preferably 5 to 50 parts by weight. It is composed of a composition containing a compound having two or more epoxy groups in the molecule in this range. The formed hardened product is excellent in heat resistance or adhesion. When the addition amount of the compound having two or more epoxy groups in the molecule is less than 1 part by weight, it is irradiated with radiation (b) 1,2-quinonediazide The reaction of the carboxylic acid produced by the compound is not easy to proceed sufficiently, and the cured film formed from such a composition may have poor heat resistance and solvent resistance. When it exceeds 100 parts by weight, the softening point of the entire composition decreases. Used to form a light-diffusing reflective film It is known that it is difficult to maintain the shape during the heat treatment. (A) In the above-mentioned alkali-soluble resin, the size of the ring-containing paper using comonomers is compliant with China National Standard (CNS) A4 (210X297 mm) -31- 555822 A7 B7 V. Description of the invention (> 9-oxy unsaturated monomers can be called "compounds with two or more epoxy groups in the molecule", but they are different from (c) in terms of alkali solubility. (d) Component The component (d) used in the present invention is represented by the following formula (1)

(請先閲讀背面之注意事項再填寫本頁) (1) 〔式中R1〜R6可相同或不同，分別爲氫原子或 一 CH2 OR基，R係表示氫原子或碳數1〜6之烷基〕表 示之化合物。 這種化合物例如有六羥甲基三聚氰胺、六羥丁基三聚 氰胺、部分羥甲基化三聚氰胺及其烷基化物、四羥甲基苯 並鳥糞胺、部分羥甲基化苯並鳥糞胺及其烷基化物等。 經濟部智慧財產局員工消費合作社印製 這種化合物之市售品例如有Simel 3 0 0、3 0 1、 303、370、325、325、701、266、 267、238、1141、272、202、1156 、1158、1123、1170、1174、 UFR65、300 (以上爲三井 Sianzmid (股）製）、 Nikalac Mx—750、— 032、—706、— 708 、一4 0 、— 3 1 、Nikalac M s — 1 1 ' Nikalac M w 本紙張尺度適用中國國家標準（CNS 規格U10X297公釐） -32- 555822 A 7 Β7 五、發明説明（如 一 3 0 (以上爲三和chemicai公司製）等。 本：發明之使用之（d )成分之添加量係係對於（a ) 驗可溶性樹脂1 〇 〇重量份時，添加1〜1 〇 〇重量份， 更理想爲5〜5 0重量份。此範圍之添加量可形成良好形 .狀之粗縫面’且可得到對於鹼具有適當之溶解性之組成物 )成分 本發明使用之（e )成分係以下述式（2 ex. (請先閲讀背面之注意事項再填寫本頁)(Please read the precautions on the back before filling in this page) (1) [wherein R1 ~ R6 may be the same or different, and they are hydrogen atom or a CH2 OR group, respectively, and R is a hydrogen atom or an alkane having 1 to 6 carbon atoms. Group]. Such compounds are, for example, hexamethylolmelamine, hexamethylolmelamine, partially methylolated melamine and its alkylates, tetramethylolbenzoguanamine, partially methylolated guanamine, and Its alkylate and so on. Commercial products printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, such as Simel 3 0 0, 3 0 1, 303, 370, 325, 325, 701, 266, 267, 238, 1141, 272, 202, 1156, 1158, 1123, 1170, 1174, UFR65, 300 (the above is made by Mitsui Sianzmid (stock)), Nikalac Mx—750, — 032, —706, — 708, — 4 0, — 3 1, Nikalac M s — 1 1 'Nikalac M w This paper size is applicable to Chinese national standard (CNS specification U10X297 mm) -32- 555822 A 7 Β7 5. Description of the invention (such as 1-3 (the above is made by Sanwa chemicai company), etc. The amount of the component (d) used is 1 to 100 parts by weight, and more preferably 5 to 50 parts by weight when the soluble resin in (a) is tested in an amount of 1,000 parts by weight. The amount of addition in this range may be It has a good shape and a rough surface, and a composition with proper solubility in alkali can be obtained.) The component (e) used in the present invention is represented by the following formula (2 ex. (Please read the precautions on the back side before (Fill in this page)

(2) 訂 〔式中X係表示鹵素，A係CX 3或以下述式(2) Order [where X is halogen, A is CX 3 or

Ac/e ,· 經濟部智慧財產局貝工消費合作社印製 (B)Ac / e, Printed by Shelley Consumer Cooperatives, Bureau of Intellectual Property, Ministry of Economy (B)

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—CN—CN

或or

(B)r (Β)Γ 本紙張尺度適用中國國家標準（CNS 規格< 210X297公釐） -33- 555822 A7 B7 五、發明説明（）31 表示之基，B、D及E係分別爲氫原子、碳數1〜 10之烷基、芳基、烷氧基或硫烷基、碳數1〜12之芳 基羥基或硫芳基、鹵原子、氰基、硝基、含有碳數1〜 10之烷基之二級胺基、羧基、羥基、碳數1〜10之烷 基、碳數1〜10之氧代烷基或氧代芳基、碳數1〜20 之烷氧基羰基或烷基羰基氧基，m爲〇〜5之整數〕表示 之化合物。 這種化合物例如有 2，4，6 —三（三氯甲基）—s —三嗪、2 —苯基 一 4，6 —雙（三氯曱基）一 s -三嗪、 2 - （4 一氯苯基）—4，6 —雙（三氯甲基）一 S 一三嗪、2 — (3 —氯苯基）—4，6 -雙（三氯甲基） 一 S -三嗪、2 -（2 -氯苯基）—4，6 -雙（三氯甲 基）—S -三嗪、2_ (4 —甲氧基苯基）一 4，6 -雙 (三氯甲基）一 S -三嗪、2 -（3 —甲氧基苯基）一 4 ，6 -雙（三氯甲基）一 S —三嗪、2 — （2 -甲氧基苯 基）一 4 ，6 -雙（三氯甲基）一 S —三嗪、2— (4 — 甲基苯硫基）一 4，6 -雙（三氯甲基）—S—三嗪、2 一（3 —甲基苯硫基）一 4，6 —雙（三氯甲基）一 S — 三嗪、2 -（2 —甲基苯硫基）—4，6——雙（三氯甲 基）—S —三嗪、2 — (4 —甲氧基萘基）—4，6 -雙 (三氯曱基）一 S -三嗪、2 -（3 —甲氧基萘基）一 4 ，6 -雙（三氯甲基）—S —三嗪、2 — （2 —甲氧基萘 基）一 4 ，6 —雙（三氯甲基）一 S —三嗪、2 -（4 — 本紙張尺度適用中國國家標準（CNS > Α4規格< 210Χ297公釐〉 (請先閲讀背面之注意事項再填寫本頁) 訂 Ρ. 經濟部智毪財產局8工消费合作社印製 -34- 555822 A7 _____ΕΊ_ 五、發明説明（）32 甲氧基一y3 -苯乙烯基）—4，6 —雙（三氯曱基）一 s —三嗪、2 — （3 —甲氧基一 /3 —苯乙烯基）一4，6 — 雙（二氯甲基）一 S —三嗪、2 —（2 —甲氧基一石一苯 乙嫌基）一4 ，6 —雙（三氯甲基）一S —三嗪、2—( 3 ’ 4 ，5 —三甲氧基一沒一苯乙烯基）一 4，6 —雙（ 二氯甲基）—S—三嗪、2 —（4 —甲硫基一々一苯乙烯 基）一4，6 -雙（三氯甲基）—S 一三嗪、2 -（3 — 甲硫基一—苯乙烯基）一 4 ，6 —雙（三氯甲基）一 s —三嗪、2 — (2 —甲硫基一 /3 —苯乙烯基）一4 ，6 — 雙（三氯甲基）一S—三嗪等。 其中較佳者爲2 -（3 -氯苯基）一 4，6 -雙（三 氯甲基）—S—三嗪、2 -（4 —甲氧基苯基）一4，6 〜雙（三氯甲基）—S -三嗪、2 —（4 一甲基苯硫基） —4 ’ 6 —雙（三氯甲基）一 s —三嗪、2 — （4 —甲氧 基一々一苯乙烯基）一 4，6 —雙（三氯甲基）一 S -三 嗪、2 — （4 一甲氧基萘基）—4，6 —雙（三氯甲基） 〜 S -二嗦。 (e )成分之添加量係對於（a )鹼可溶性樹脂 100重量份時，添加0.〇〇1〜10重量份，更理想 爲〇 · 0 1〜5重量份。此範圍之添加量可形成良好之凹 凸形狀，且可得到耐熱性、耐溶劑性優異之硬化膜。 (f )成分 本發明使用之（f )成分係以下述式（3 ) 本紙張尺度適用中國國家標準（CNS ) A4規格（210Χ297公釐） (請先閲讀背面之注意事項再填寫本頁)(B) r (Β) Γ This paper size applies to Chinese national standards (CNS specifications < 210X297 mm) -33- 555822 A7 B7 V. Description of the invention () The base indicated by 31, B, D and E are hydrogen Atoms, alkyl, aryl, alkoxy or sulfanyl groups having 1 to 10 carbon atoms, arylhydroxy or thioaryl groups having 1 to 12 carbon atoms, halogen atoms, cyano, nitro, containing 1 to 10 carbon atoms Secondary alkyl group of 10 alkyl group, carboxyl group, hydroxyl group, alkyl group of 1 to 10 carbon atoms, oxoalkyl or oxoaryl group of 1 to 10 carbon atoms, alkoxycarbonyl group of 1 to 20 carbon atoms or Alkylcarbonyloxy, m is an integer of 0 to 5]. Such compounds include, for example, 2,4,6-tris (trichloromethyl) -s-triazine, 2-phenyl-4,6-bis (trichlorofluorenyl) -s-triazine, 2- (4 Monochlorophenyl) -4,6-bis (trichloromethyl) -S-triazine, 2- (3-chlorophenyl) -4,6-bis (trichloromethyl) -S-triazine, 2- (2-chlorophenyl) -4,6-bis (trichloromethyl) -S-triazine, 2- (4-methoxyphenyl)-4,6-bis (trichloromethyl)- S-triazine, 2- (3-methoxyphenyl) -4,6-6-bis (trichloromethyl) -S-triazine, 2- (2-methoxyphenyl) -4,6- Bis (trichloromethyl) -S-triazine, 2- (4-methylphenylthio) -4,6-bis (trichloromethyl) -S-triazine, 2-mono (3-methylbenzene Thio) -4,6-bis (trichloromethyl) -S-triazine, 2- (2-methylphenylthio) -4,6-bis (trichloromethyl) -S-triazine , 2- (4-methoxynaphthyl) -4,6-bis (trichlorofluorenyl) -S-triazine, 2- (3-methoxynaphthyl) -4,6-bis (trichloro Methyl) —S —triazine, 2 — (2 —Methoxynaphthyl) —4,6—bis (trichloromethyl) —S—triazine, 2— (4 — This paper size applies to the Chinese National Standard (CNS > A4 Specification < 210 × 297 mm) ( Please read the precautions on the back before filling this page) Order P. Printed by the 8th Industrial Cooperative Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs-34- 555822 A7 _____ ΕΊ_ 5. Description of the invention () 32 methoxy-y3-styrene-based) —4,6 —bis (trichlorofluorenyl) -s—triazine, 2— (3-methoxy-1 / 3-styryl) —4,6—bis (dichloromethyl) —S—tri Hydrazine, 2- (2-methoxy-methyl-phenylethylethyl) -4,6-bis (trichloromethyl) -S-triazine, 2- (3'4, 5-trimethoxy-one-one Styryl) -4,6-bis (dichloromethyl) -S-triazine, 2- (4-methylthio-fluorenyl-styryl) -4,6-bis (trichloromethyl) -S Monotriazine, 2- (3-methylthio-styryl) -4,6-bis (trichloromethyl) -s-triazine, 2- (2-methylthio-1 / 3-styrene Radical) -4,6 —bis (trichloromethyl) -S— Azine, etc. Among them, 2- (3-chlorophenyl) -4,6-bis (trichloromethyl) -S-triazine, 2- (4-methoxyphenyl) -4,6 are preferred. ~ Bis (trichloromethyl) —S-triazine, 2— (4-methylphenylthio) —4 ′ 6—bis (trichloromethyl) —s—triazine, 2— (4—methoxy -Mono-, mono-styryl) -4,6-bis (trichloromethyl) -S-triazine, 2- (4-monomethoxynaphthyl) -4,6-bis (trichloromethyl) ~ S -Erji. (e) The component is added in an amount of 0.0001 to 10 parts by weight, and more preferably 0 to 1 to 5 parts by weight, with respect to (a) 100 parts by weight of the alkali-soluble resin. An addition amount within this range can form a good convexoconvex shape, and a cured film having excellent heat resistance and solvent resistance can be obtained. (f) Composition The (f) composition used in the present invention is expressed by the following formula (3) The paper size applies the Chinese National Standard (CNS) A4 specification (210 × 297 mm) (Please read the precautions on the back before filling this page)

、1T f 經濟部智慧財產局員工消費合作社印製 •35- 555822 A7 ________B7_ 五、發明説明（ (A ) η Z + Υ - ( ’ 2係硫原子 s F 6、對甲 η爲2或3〕 (請先閲讀背面之注意事項再填寫本頁) 〔式中Α之定義係與上述式（2 )相同 或碘原子，Y 係 Bf4、pf6、SbF6、j 苯磺酸鈉、三氟甲烷磺酸鈉或三氟乙酸酯， 表示之化合物。 這種化合物例如有 經濟部智慧財產局員工消资合作社印製 二苯基碘鑰四氟硼酸酯、二苯基碘鑰六氟膦酸酯、二 本基碘鑰/、氟砷酸酯、二苯基碘鑰三氟甲院磺酸酯、二苯 基碘纟羽一氟乙酸酉旨、二苯基确鑰對甲苯磺酸酯、4 一甲氧 基苯基苯基碘鑰六氟硼酸酯、4 一甲氧基苯基苯基碘鑰六 氟膦酸酯、4 -甲氧基苯基苯基碘鐡六氟砷酸酯、4 一甲 氧基苯基苯基碘鑰三氟甲烷磺酸酯、4 一甲氧基苯基苯基 碘鑰三氟乙酸酯、4 -甲氧基苯基苯基碘鑰一對一甲苯磺 酸酯、雙（4 一第三丁基苯基）碘鑰四氟硼酸酯、雙（4 -第三丁基苯基）碘鑰六氟磷酸酯、雙（4 一第三丁基苯 基）碘鑰六氟胂酸酯、雙（4 -第三丁基苯基）碘鑰三氟 甲烷碘酸酯、雙（4 -第三丁基苯基）碘鑰三氟乙酸酯、 雙（4 -第三丁基苯基）碘鑰對甲苯磺酸酯等之二芳基碘 銷鹽；三苯基銃四氟硼酸酯、三苯基銃六氟膦酸酯、三苯 基銃六氟胂酸酯、三苯基銃三氟甲烷磺酸酯、三苯基銃三 氟乙酸酯、三苯基銃-對-甲苯磺酸酯、4 -甲氧基苯基 二苯基銃四氟硼酸酯、4 -甲氧基苯基二苯基銃六氟膦酸 本紙張尺度適用中國國家標準（CNS ) Α4規格（210Χ297公釐） -36- 555822 經濟部智慧財產局員工消費合作社印製 A7 _____ B7五、發明説明（）34 醒、4 -甲氧基苯基二苯基銃六氟砷酸酯、4 一甲氧基苯 基二苯基疏三氟甲烷磺酸酯、4 -甲氧基苯基二苯基硫三 氣乙酸酯、4 -甲氧基苯基二苯基銃一對一甲苯磺酸酯、 4 -苯基硫代苯基二苯基銃四氟硼酸酯、4 一甲基硫代苯 基二苯基硫六氟膦酸酯、4 -苯基硫代苯基二苯基銃六氟 胂酸酯、4 -苯基硫代苯基二苯基毓三氟甲烷磺酸酯、4 -苯基硫代苯基二苯基銃三氟乙酸酯、4 一苯基硫代苯基 二苯基銃一對-甲苯磺酸酯等之三芳基銃鹽等。 這些化合物中，較佳者爲 二苯基碘鑰三氟乙酸酯、二苯基碘鑰三氟甲苯磺酸酯 、4 -甲氧基苯基苯基碘鑰三氟甲苯磺酸酯、4 一甲氧基 苯基苯基碘鑰三氟乙酸酯、三苯基銃三氟甲烷磺酸酯、三 苯基銃三氟乙酸酯、4 -甲氧基苯基二苯基銃三氟甲烷磺 酸酯、4 -甲氧基苯基二苯基锍三氟乙酸酯、4 -苯基硫 代苯基二苯基銃三氟甲苯磺酸酯、4 一苯基硫代苯基二苯 基銃三氟乙酸酯等。 (f )成分之添加量係對於（a )鹼可溶性樹脂 100重量份時，通常添加0.001〜10重量份，更 理想爲0 . 0 1〜5重量份。此範圍之添加量可形成良好 之凹凸形狀，且可得到耐熱性、耐溶劑性優異之硬化膜。 本發明之光擴散反射膜形成用組成物係含有以下述任 一組合之各成分爲必須成分者。 (1 ) ( a )鹼可溶性樹脂、（b ) 1 ，2 —醌二疊 氮化合物及（c )分子內具有2個以上之環氧基之化合物 (請先閲讀背面之注意事項再填寫本頁) 衣. 訂 •IP-· 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） -37- 555822 A7 B7 五、發明説明（）35 〇 (2 ) ( a )鹼可溶性樹脂、（b ) 1 ，2 —醌二疊 氮化合物、（d)以上述式（1)表示之化合物及（e) 以上述式（2 )表示之化合物。 (3 ) ( a )鹼可溶性樹脂、（b ) 1，2 —醌二疊 氮化合物、（d )以上述式（1 )表示之化合物及（f ) 以上述式（3 )表示之化合物。 (4 ) ( a )鹼可溶性樹脂、（b ) 1 ，2 -醌二疊 氮化合物及（c )分子內具有2個以上之環氧基之化合物 、（d)以上述式（1)表示之化合物及（e)以上述式 (2 )表示之化合物。 (5 ) ( a ’ ) ( a 1 )不飽和羧酸及/或不飽和羧 酸酐、（a2)含有環氧基之不飽和化合物及（a3)其 他之烯烴系不飽和化合物之共聚物及（b) 1 ，2 -醌二 疊氮化合物。 其他之添加劑 本發明之光擴散反射膜形成用組成物只要含有以上述 組合之各成分爲必須成分，即可發揮充分的功能，但是上 述（1 )〜（4 )之組成物必要時可含有其他之添加劑， 例如增感劑、界面活性劑、接著助劑、保存安定劑及消泡 劑等。 上述（5 )之組成物必要時可含有感熱性酸生成物、 至少具有一個乙烯性不飽和雙鍵之聚合性化合物、環氧樹 脂、密著助劑及界面活性劑。 本紙張尺度適用中國國家標準（CNS ) Α4規格（210 X 297公釐） (請先閲讀背面之注意事項再填寫本頁) 衣·1T f Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs • 35- 555822 A7 ________B7_ V. Description of the invention ((A) η Z + Υ-('2 series sulfur atom s F 6, p-η = 2 or 3) (Please read the notes on the back before filling this page) [In the formula, the definition of A is the same as the above formula (2) or iodine atom, and Y is Bf4, pf6, SbF6, j sodium benzenesulfonate, trifluoromethanesulfonic acid Sodium or trifluoroacetate. Compounds such as diphenyliodine tetrafluoroborate, diphenyliodine hexafluorophosphonate, Dibenzyl iodide /, fluoroarsenate, diphenyliodine trifluoromethane sulfonate, diphenyliodine hydrazone monofluoroacetate, diphenyl isocyanate p-toluenesulfonate, 4 a Methoxyphenylphenyliodonium hexafluoroborate, 4 monomethoxyphenylphenyliodonium hexafluorophosphonate, 4-methoxyphenylphenyliodonium hexafluoroarsenate, 4 Monomethoxyphenylphenyliodotrifluoromethanesulfonate, 4 monomethoxyphenylphenyliodotrifluoromethanesulfonate, 4-methoxyphenylphenyliodotrifluorotoluene Ester, bis (4-third-butylphenyl) iodokey tetrafluoroborate, bis (4-third-butylphenyl) iodokey hexafluorophosphate, bis (4-third-butylphenyl) Iodine key hexafluorophosphonate, bis (4- third butylphenyl) iodokey trifluoromethane iodoate, bis (4- third butylphenyl) iodokey trifluoroacetate, bis (4 -Third butyl phenyl) iodine p-toluenesulfonate and other diaryl iodide salts; triphenylsulfonium tetrafluoroborate, triphenylsulfonium hexafluorophosphonate, triphenylsulfonium hexafluoride Phosphonate, triphenylsulfonium trifluoromethanesulfonate, triphenylsulfonium trifluoroacetate, triphenylsulfonium-p-toluenesulfonate, 4-methoxyphenyldiphenylsulfonium tetrafluoro Borate, 4-methoxyphenyldiphenylphosphonium hexafluorophosphonic acid This paper is sized to the Chinese National Standard (CNS) A4 specification (210 × 297 mm) -36- 555822 Printed by the Consumer Cooperative of Intellectual Property Bureau, Ministry of Economic Affairs A7 _____ B7 V. Description of the invention (34) Xing, 4-methoxyphenyldiphenylsulfonium hexafluoroarsenate, 4-monomethoxyphenyldiphenylsulfofluoromethanesulfonate, 4-methyl Oxyphenyl diphenyl thiotriacetate, 4- Methoxyphenyldiphenylsulfonium tol-toluenesulfonate, 4-phenylthiophenyldiphenylsulfonium tetrafluoroborate, 4-methylthiophenyldiphenylthiohexafluorophosphine Acid ester, 4-phenylthiophenyldiphenylsulfonium hexafluorophosphonate, 4-phenylthiophenyldiphenylene trifluoromethanesulfonate, 4-phenylthiophenyldiphenyl Triarylsulfonium salts such as tris (trifluoroacetate), 4-monophenylthiophenyldiphenyl (p-toluenesulfonate), etc. Among these compounds, diphenyliodine trifluoro is preferred. Acetate, diphenyliodotrifluorotoluenesulfonate, 4-methoxyphenylphenyliodotrifluorotoluenesulfonate, 4-monomethoxyphenylphenyliodotrifluorotoluenesulfate , Triphenylsulfonium trifluoromethanesulfonate, triphenylsulfonium trifluoroacetate, 4-methoxyphenyldiphenylsulfonium trifluoromethanesulfonate, 4-methoxyphenyldiphenyl Fluorene trifluoroacetate, 4-phenylthiophenyldiphenylfluorene trifluorotoluenesulfonate, 4-monophenylthiophenyldiphenylfluorene trifluoroacetate, and the like. (f) The amount of the component added to (a) 100 parts by weight of the alkali-soluble resin is usually 0.001 to 10 parts by weight, and more preferably 0.01 to 5 parts by weight. An addition amount within this range can form a good uneven shape, and a cured film having excellent heat resistance and solvent resistance can be obtained. The composition for forming a light diffusive reflection film of the present invention contains those in which each of the following combinations is an essential component. (1) (a) Alkali-soluble resin, (b) 1,2-quinonediazide compound, and (c) compound with more than two epoxy groups in the molecule (please read the precautions on the back before filling this page) ) Clothing. Customized • IP- · This paper size applies to Chinese National Standard (CNS) A4 (210X297 mm) -37- 555822 A7 B7 V. Description of the invention () 35 〇 (2) (a) Alkali soluble resin, ( b) a 1,2-quinonediazide compound, (d) a compound represented by the above formula (1), and (e) a compound represented by the above formula (2). (3) (a) an alkali-soluble resin, (b) a 1,2-quinonediazide compound, (d) a compound represented by the above formula (1), and (f) a compound represented by the above formula (3). (4) (a) an alkali-soluble resin, (b) a 1,2-quinonediazide compound, and (c) a compound having two or more epoxy groups in the molecule, (d) represented by the above formula (1) The compound and (e) a compound represented by the above formula (2). (5) (a ') (a1) copolymers of unsaturated carboxylic acids and / or unsaturated carboxylic anhydrides, (a2) unsaturated compounds containing epoxy groups and (a3) other olefinic unsaturated compounds, and ( b) 1,2-quinonediazide. Other Additives The composition for forming a light diffusive reflection film of the present invention can perform sufficient functions as long as it contains the components of the above combination as essential components, but the above-mentioned compositions of (1) to (4) may contain other components as necessary. Additives, such as sensitizers, surfactants, adhesives, storage stabilizers and defoamers. The composition of the above (5) may contain a thermosensitive acid product, a polymerizable compound having at least one ethylenically unsaturated double bond, an epoxy resin, an adhesion promoter, and a surfactant, if necessary. This paper size applies to China National Standard (CNS) Α4 size (210 X 297 mm) (Please read the precautions on the back before filling this page) Clothing ·

、1T 經濟部智慧財產局員工消費合作社印製 -38- 555822 A7 -^ 五、發明説明（）36 增感劑 組成物含有（e)成分或（f)成分時，可適當倂用 增慼劑。 這種增感劑例如有在第3位置及/或第7位置上具有 取代基之香豆素類、黃酮類、二苄叉丙酮類、二芣叉環己 烷類、芳基丙烯醯芳烴類、咕噸類、硫咕噸類、叶啉、吖 啶類等。 增感劑之使用比例係對於鹼可溶性樹脂1 0 0重量份 時，通常使用2 0重量份以下，更理想爲1 0重量份以下 〇 界面活性劑 本發明之組成物中，爲了改善塗佈性例如防止條紋或 乾燥塗膜形成後之放射線照射部之顯影性時，可添加界面 活性劑。界面活性劑例如聚氧乙烯月桂基醚、聚氧乙烯硬 脂基醚、聚氧乙烯油基醚等聚氧乙烯烷基醚類，聚氧乙烯 辛基苯基醚、聚氧乙烯壬基苯基醚等聚氧乙烯芳基醚類， 聚乙二醇二月桂酸酯、聚乙二醇二硬脂酸酯等之聚乙二醇 二烷基脂類等之非離子系界面活性劑；E F T〇P E F 301、EF303，EF352 (新秋田化成（股）製 造）、Megafac ?171、172、173(大曰本油墨工 業（股）製造），Flolard FC430、FC431 (住 友 3 Μ (股）製造），Asahi guard A G 7 1 0 ' Surflon S-382、SC— 101、SC-102、SC -107、SC-104、SC-105、SC-106 ( 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） (請先閲讀背面之注意事項再填寫本頁)、 1T Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs-38- 555822 A7-^ V. Description of the Invention (36) When the sensitizer composition contains the component (e) or (f), it can be used appropriately . Such sensitizers include, for example, coumarins, flavones, dibenzylidene acetones, dioxanylcyclohexanes, arylpropenes, and aromatic hydrocarbons having a substituent at the third position and / or the seventh position. , Gutton, Sulfur, Folin, Acridine, etc. The sensitizer is used in an amount of 100 parts by weight with respect to the alkali-soluble resin, usually 20 parts by weight or less, more preferably 10 parts by weight or less. Surfactant In the composition of the present invention, in order to improve coating properties For example, in order to prevent streaks or developability of a radiation irradiated portion after formation of a dry coating film, a surfactant may be added. Surfactants such as polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, polyoxyethylene oleyl ether and other polyoxyethylene alkyl ethers, polyoxyethylene octylphenyl ether, polyoxyethylene nonylphenyl Non-ionic surfactants such as polyoxyethylene aryl ethers such as ethers, polyethylene glycol dialkyl esters such as polyethylene glycol dilaurate and polyethylene glycol distearate; EFT. PEF 301, EF303, EF352 (manufactured by Shin Akita Kasei Co., Ltd.), Megafac ® 171, 172, 173 (manufactured by Daiyoshi Ink Industry Co., Ltd.), Flolard FC430, FC431 (manufactured by Sumitomo 3 M (shares)), Asahi guard AG 7 1 0 'Surflon S-382, SC-101, SC-102, SC-107, SC-104, SC-105, SC-106 (This paper size applies to China National Standard (CNS) A4 specification (210X297) Li) (Please read the notes on the back before filling in this page)

、1T 經濟部智慧財產局員工消費合作社印製 -39- 555822 A7 B7 五、發明説明（）37 旭玻璃（股）製造）等之氟系界面活性劑；有機矽氧烷聚 合物KP341 (信越化學工業（股）製造）、丙烯酸系 或甲基丙烯酸系（共）聚合物Polyflow N〇· 5 7、 9 5 (共榮社化學（股）製造）等。這些界面活性劑之配 合量係組成物之固形份時，通常使用2重量份以下，更理 想爲1重量份以下。 感熱性酸生成物 使用感熱性酸生成物係爲了提高耐熱性或硬度。其具 體例有氟化銻類，市售品有Saneit S I — L 8 0、Saneit S I — L 1 1 〇、Saneit SI— LI 50(以上爲三新化 學工業（股）製）等。 感熱性酸生成物之使用比例係對於共聚物（a ’ ) 1 0 0重量份時，理想爲2 0重量份以下，更理想爲、5重 量份以下。 超過2 0重量份時，會產生析出物，有時不易形成圖 至少具有一個乙烯性不飽和雙鍵之聚合性化合物 至少具有一個乙烯性不飽和雙鍵之聚合性化合物可使 用例如單官能（甲基）丙烯酸酯、2官能（甲基）丙烯酸 酯或3官能以上之（甲基）丙烯酸酯，其中以3官能以上 之（甲基）丙烯酸酯。 上述單官能（甲基）丙燃酸酯例如有2 -羥乙基（甲 基）丙烯酸酯、卡必醇（甲基）丙烯酸酯、異* * (甲基 )丙烯酸酯、3 -甲氧基丁基（甲基）丙烯酸酯、2 -（ 本紙張尺度適用中國國家標準（CNS ) Α4規格（210Χ297公釐） (請先閱讀背面之注意事項再填寫本頁) 訂 經濟部智慧財產局員工消費合作社印製 -40- 555822 A7 -- B7 ___ 五、發明説明（te 甲基）丙烯醯氧基乙基- 2 -羥丙基苯二甲酸酯等。Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs of the 1T-39- 555822 A7 B7 V. Fluorochemical surfactants such as 37 (manufactured by Asahi Glass Co., Ltd.); organic silicone polymer KP341 (Shin-Etsu Chemical Co., Ltd.) Industrial (stock) manufacturing), acrylic or methacrylic (co) polymer Polyflow No. 5, 7, 9 5 (Kyoeisha Chemical Co., Ltd.) and so on. When the compounding amount of these surfactants is the solid content of the composition, usually 2 parts by weight or less is used, and more preferably 1 part by weight or less. Thermal acid product The thermal acid product is used to improve heat resistance and hardness. Specific examples include antimony fluoride, and commercially available products include Saneit S I — L 8 0, Saneit S I — L 1 1 0, Saneit SI — LI 50 (the above are made by Sanxin Chemical Industry (stock)) and so on. The use ratio of the thermosensitive acid product is preferably 20 parts by weight or less, and more preferably 5 parts by weight or less when the copolymer (a ') is 100 parts by weight. When it exceeds 20 parts by weight, a precipitate may be generated, and a polymerizable compound having at least one ethylenically unsaturated double bond may not be easily formed. A polymerizable compound having at least one ethylenically unsaturated double bond may be used. Group) acrylate, bifunctional (meth) acrylate, or trifunctional or higher (meth) acrylate, among which trifunctional or higher (meth) acrylate. Examples of the monofunctional (meth) propionate include 2-hydroxyethyl (meth) acrylate, carbitol (meth) acrylate, iso ** (meth) acrylate, and 3-methoxy Butyl (meth) acrylate, 2-(This paper size applies to Chinese National Standard (CNS) A4 specifications (210 × 297 mm) (Please read the precautions on the back before filling this page) Printed by the cooperative -40- 555822 A7-B7 ___ 5. Description of the invention (te meth) acryloxyethyl-2-hydroxypropyl phthalate, etc.

這些巾售品例如有Alo nix Μ - 1 0 1、同Μ-ΐ 1 1 、 同 Μ— 1 14 ( 東亞合成 （股） 製 ） 、 KAYARAD HDDA TC— 110S、同 TC— 120S (日本化藥（ 股）製）、Biscot 158、同2311、（大阪有機化學 I業（股）製）等。 上述2官能（甲基）丙烯酸酯例如有乙二醇二（甲基 )丙烯酸酯、1 ，6 —己二醇二（甲基）丙烯酸酯、1 ， 9 一壬二醇二（甲基）丙烯酸酯、聚丙二醇二（甲基）丙 烯酸酯、四乙二醇二（甲基）丙烯酸酯、雙苯氧基乙醇芴 二丙烯酸酯等。其市售品可列舉如Alonix Μ - 2 1 0 ' 同Μ— 240、同Μ— 6200 (東亞合成（股）製）、 KAYARAD HDDA、同 HX— 220、同 R — 604 (曰本 化藥（股）製）、Biscot 260、同 312、同—· 3 3 5HP (大阪有機化學工業（股）製）等。 上述3官能以上之（甲基）丙烯酸酯例如有三羥甲基 丙烷三（甲基）丙烯酸酯、季戊四醇三（甲基）丙烯酸酯 、三（（甲基）丙烯醯氧基乙基）磷酸酯、季戊四醇四（ 甲基）丙烯酸酯、二季戊四醇五（甲基）丙烯酸酯、二季 戊四醇六（曱基）丙烯酸酯等。其市售品可列舉如Al〇nix Μ— 309 、同 Μ — 400、同 Μ— 402、同 Μ — 405、同 Μ— 450、同 Μ — 7100、同 Μ — 8〇30、同Μ — 8060 (東亞合成（股）製）、 KAYARAD TMPTA、同 DPHA' 同 DPCA — 20 、同 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公ϋ * ' — ~ -41 - (請先閱讀背面之注意事項再填寫本頁) 衣· 、1Τ 經濟部智慧財產局員工消費合作社印製 555822 A7 B7 ____ 五、發明説明（）39 DPCA— 30 、同 DPCA — 60、同 DPCA — 1 2 0 (日本化藥（股）製）、Biscot 2 9 5、同 3 0 0、 同360 、同GPT、同3PA、同40〇 (大阪有機化 學工業（股）製）等。 這些單官能、2官能或3官能以上之（甲基）丙烯酸 酯可單獨或組合使用。 此聚合性化合物之使用比例係對於共聚物（a ’ ） 1 0 0重量份時，使用5 0重量份以下，更理想爲3 0重 量份以下。 含有這種比例之聚合性化合物時，可提高由本發明之 感放射線性樹脂組成物所得之保護膜或絕緣膜之耐熱性及 表面硬度等。超過50重量份時，共聚物（a’ ）對於鹼 可溶性樹脂之相溶性不佳，塗佈時產生粗糙膜。 環氧樹脂 環氧樹脂只要不影響相溶性，則無限定’較佳者爲雙 酚A型環氧樹脂、酚醛淸漆型環氧樹脂、甲酣酣醛淸漆型 環氧樹脂、環狀脂肪族環氧樹脂、環氧丙酯型環氧樹脂、 環氧丙胺型環氧樹脂、雜環型環氧樹脂、將環氧丙基甲基 丙烯酸酯共聚之樹脂等。 其中較佳者違雙酚A型環氧化合物、甲酚酚醛淸漆型 環氧樹脂、環氧丙酯型環氧樹脂等。 環氧樹脂之使用比例係對於共聚物（a ’ ）1 〇 〇重 量份時，使用3 0重量份以下較佳。 含有這種比例之聚環氧樹脂時，可提高由本發明之感 本紙張尺度適用中國國家標準（CNS ) Α4規格（210Χ297公釐） (請先閲讀背面之注意事項再填寫本頁)These towel products are, for example, Alo nix Μ-101, the same Μ-ΐ 1 1, the same M-11 (made by East Asia Synthesis Co., Ltd.), KAYARAD HDDA TC-110S, the same TC-120S (Japanese Chemicals ( Share) system), Biscott 158, same as 2311 (Osaka Organic Chemical Industry I Co., Ltd.) and so on. Examples of the bifunctional (meth) acrylate include ethylene glycol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, and 1, 9-nonanediol di (meth) acrylic acid. Esters, polypropylene glycol di (meth) acrylate, tetraethylene glycol di (meth) acrylate, bisphenoxyethanol, diacrylate, and the like. The commercially available products can be exemplified by Alonix Μ-2 1 0 ′ same M-240, same M-6200 (manufactured by East Asia Synthetic), KAYARAD HDDA, same HX-220, and R-604 (the original chemical ( Share) system), Biscot 260, same 312, same— · 3 3 5HP (Osaka Organic Chemical Industry (stock) system), etc. Examples of the trifunctional or higher (meth) acrylate include trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, tri ((meth) acryloxyethyl) phosphate, Pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (fluorenyl) acrylate and the like. The commercially available products can be exemplified by Alonix M-309, the same M-400, the same M-402, the same M-405, the same M-450, the same M- 7100, the same M-8030, and the same M-8060. (East Asian Synthesis (stock) system), KAYARAD TMPTA, same as DPHA 'and DPCA — 20, same paper size as China National Standard (CNS) A4 specification (210X297 public ϋ *' — ~ -41-(Please read the back Note: Please fill in this page again.) Clothing, 1T Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs Consumer Cooperatives 555822 A7 B7 ____ V. Description of Invention () 39 DPCA-30, same as DPCA-60, same as DPCA-60 Pharmaceutical (stock) system, Biscott 2 95, same 300, same 360, same GPT, same 3PA, same as 40 (made by Osaka Organic Chemical Industry Co., Ltd.), etc. These are monofunctional, bifunctional or trifunctional The above (meth) acrylates may be used singly or in combination. When the polymerizable compound is used in a proportion of 100 parts by weight of the copolymer (a ′), 50 parts by weight or less is used, and 30 parts by weight is more preferable. When the polymerizable compound is contained in this proportion, The heat resistance and surface hardness of the protective film or insulating film obtained from the radiation-sensitive resin composition. When it exceeds 50 parts by weight, the compatibility of the copolymer (a ') to the alkali-soluble resin is not good, and a rough film is generated during coating. Epoxy resins Epoxy resins are not limited as long as they do not affect compatibility. Preferred are bisphenol A epoxy resin, phenolic epoxy resin, formaldehyde epoxy resin, and ring. Aliphatic epoxy resin, propylene oxide epoxy resin, propylene oxide epoxy resin, heterocyclic epoxy resin, resin in which propylene methacrylate is copolymerized, etc. A phenol A epoxy compound, a cresol novolac epoxy resin, a propylene oxide epoxy resin, etc. The epoxy resin is used in an amount of 1,000 parts by weight with respect to the copolymer (a ′), and 3 is used. 0 parts by weight or less is preferred. When the polyepoxy resin is contained in this proportion, the feeling of the present invention can be improved. The paper size applies the Chinese National Standard (CNS) A4 specification (210 × 297 mm) (please read the precautions on the back first) (Fill in this page)

、1T 經濟部智慧財產局員工消費合作社印製 -42- 555822 A7 ____B7___ 五、發明説明（）w (請先閲讀背面之注意事項再填寫本頁) 放射線性樹脂組成物所得之保護膜或絕緣膜之耐熱性及表 面硬度等。超過30重量份時，共聚物（a，）對於鹼可 溶性樹脂之相溶性不佳，無法得到充分之塗膜形成能力。 共聚物（a’ ）也可說是「環氧樹脂」，但是在具有 鹼可溶性及需要較高分子量方面則與環氧樹脂不同。 接著助劑 爲了提高與基體之接著性可使用接著助劑。這種接著 助劑可使用官能性矽烷偶合劑，例如具有甲基丙烯醯氧基 、異氰酸酯基、環氧基等之反應性取代基之矽烷偶合劑。 具體而言例如有三甲氧基矽烷基苯甲酸、r -甲基丙烯醯 氧丙基三甲氧基矽烷、乙烯基三乙烯醯氧基矽烷、乙烯基 三甲氧基矽烷、乙烯基三氯矽烷、r -異氰酸酯基丙基三 乙氧基矽烷、r -環氧丙氧基丙基三甲氧基矽烷、A 一（ 3，4 一環氧基環己基）乙基三甲氧基矽烷等。 經濟部智慧財產局員工消費合作社印製 這種接著助劑在上述（1 )〜（4 )之組成物中，對 於固形份1 0 0重量份時，或在（5 )之組成物中，對於 共聚物（a’ ）1〇〇重量份時，可使用20重量份以下 ，更理想爲1 0重量份以下。接著助劑的量超過2 0重量 份時，有時易產生顯影殘留的情形。 光擴散反射膜形成用組成物之調製 本發明之光擴散反射膜形成用組成物係溶解於適當之 溶劑，在溶解的狀態使用較佳。此時所使用之溶劑例如可 使用溶解組成物之各成分，且與各成分不反應，具有適當 蒸氣壓者。 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） -43- 555822 A7 B7 五、發明説明（h 具體而言，例如有甲醇、乙醇等醇類，四氫呋喃類等 之醚類；乙二醇單甲醚、乙二醇單乙醚等之甘醇醚類；甲 基乙二醇乙醚乙酸酯、乙基乙二醇乙醚乙酸酯等之乙二醇 乙醚乙酸酯類；二乙二醇單甲醚、二乙二醇單乙醚、二乙 二醇二甲醚等之二乙二醇類；丙二醇甲醚、丙一醇乙醚、 丙二醇丙醚、丙二醇丁醚等之丙二醇單烷基酸類；丙二醇 甲醚乙酸酯、丙二醇乙醚乙酸酯、丙二醇丙醚乙酸酯、丙 二醇丁醚乙酸酯等之丙二醇烷基醚乙酸酯類；丙二醇甲醚 丙酸酯、丙二醇乙基醚丙酸酯、丙二醇丙基酿丙酸酯、丙 二醇丁基醚丙酸酯等之丙二醇烷基醚乙酸酯類；甲苯、二 甲苯等之芳香族烴類；甲乙基酮、環己酮、4 一羥基- 4 -甲基一 2 —戊酮等之酮類；及乙酸甲酯、乙酸乙酯、乙 酸丙酯、乙酸丁酯、2 -羥基丙酸乙酯、2 -羥基—2 -甲基丙酸甲酯、2 -羥基- 2 -甲基丙酸乙酯、羥基乙酸 甲酯、羥基乙酸乙酯、羥基乙酸丁酯、乳酸甲酯、乳酸乙 酯、乳酸丙酯、乳酸丁酯、3 -羥基丙酸甲酯、3 -羥基 丙酸乙酯、3 -羥基丙酸丙酯、3 -羥基丙酸丁酯、2 -羥基一 3 —甲基丁烷酸甲酯、甲氧基乙酸甲酯、甲氧基乙 酸乙酯、甲氧基乙酸丙酯、甲氧基乙酸丁酯、乙氧基乙酸 甲酯、乙氧基乙酸乙酯、乙氧基乙酸丙酯、乙氧基乙酸丁 酯、丙氧基乙酸甲酯、丙氧基乙酸乙酯、丙氧基乙酸丙酯 、丙氧基乙酸丁酯、丁氧基乙酸甲酯、丁氧基乙酸乙酯、 丁氧基乙酸丙酯、丁氧基乙酸丁酯、2 -甲氧基丙酸甲酯 、2 —甲氧基丙酸乙酯、2 -甲氧基丙酸丙酯、2 -甲氧 本紙張尺度適用中國國家標準（CNS ) Α4規格（210Χ297公釐） (請先閲讀背面之注意事項再填寫本頁) 衣.、 1T Printed by the Consumer Cooperative of Intellectual Property Bureau of the Ministry of Economic Affairs-42- 555822 A7 ____B7___ V. Description of the invention () w (Please read the precautions on the back before filling this page) Protective film or insulating film obtained from radiation resin composition Heat resistance and surface hardness. When it exceeds 30 parts by weight, the copolymer (a,) has poor compatibility with the alkali-soluble resin, and a sufficient coating film forming ability cannot be obtained. The copolymer (a ') can also be said to be an "epoxy resin", but is different from an epoxy resin in that it has alkali solubility and requires a higher molecular weight. Adhesive Auxiliary agents can be used to improve adhesion to the substrate. As such an adjuvant, a functional silane coupling agent such as a silane coupling agent having a reactive substituent such as a methacryloxy group, an isocyanate group, or an epoxy group can be used. Specific examples include trimethoxysilylbenzoic acid, r-methacryloxypropyltrimethoxysilane, vinyltrivinyloxysilane, vinyltrimethoxysilane, vinyltrichlorosilane, r -Isocyanatopropyltriethoxysilane, r-glycidoxypropyltrimethoxysilane, A- (3,4-epoxycyclohexyl) ethyltrimethoxysilane and the like. Printed by the Consumers' Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs in the composition of (1) to (4) above, when the solid content is 100 parts by weight, or in the composition of (5), When the copolymer (a ') is 100 parts by weight, 20 parts by weight or less can be used, and more preferably 10 parts by weight or less. When the amount of the adjuvant exceeds 20 parts by weight, there may be a case where a development residue is liable to occur. Preparation of Composition for Forming Light Diffusion Reflective Film The composition for forming light diffusive reflective film of the present invention is dissolved in a suitable solvent, and is preferably used in a dissolved state. As the solvent to be used at this time, for example, it is possible to use a component which dissolves each component of the composition and does not react with each component and has an appropriate vapor pressure. This paper size applies to Chinese National Standard (CNS) A4 (210X297 mm) -43- 555822 A7 B7 5. Description of the invention (h Specifically, for example, alcohols such as methanol and ethanol, and ethers such as tetrahydrofuran; B Glycol ethers such as glycol monomethyl ether, ethylene glycol monoethyl ether; ethylene glycol ethers such as methyl ethylene glycol ether acetate, ethyl ethylene glycol ether acetate; diethylene glycol Diethylene glycols such as monomethyl ether, diethylene glycol monoethyl ether, and diethylene glycol dimethyl ether; propylene glycol monoalkyl ethers such as propylene glycol methyl ether, glyceryl ether, propylene glycol propyl ether, and propylene glycol butyl ether ; Propylene glycol methyl ether acetate, propylene glycol ethyl ether acetate, propylene glycol propyl ether acetate, propylene glycol butyl ether acetate and other propylene glycol alkyl ether acetates; propylene glycol methyl ether propionate, propylene glycol ethyl ether propionic acid Esters, propylene glycol propyl propionate, propylene glycol butyl ether propionate and other propylene glycol alkyl ether acetates; aromatic hydrocarbons such as toluene and xylene; methyl ethyl ketone, cyclohexanone, 4-monohydroxy- Ketones such as 4-methyl-2-pentanone; and methyl acetate, Ethyl acetate, propyl acetate, butyl acetate, ethyl 2-hydroxypropionate, methyl 2-hydroxy-2-methylpropionate, ethyl 2-hydroxy-2-methylpropionate, methyl glycolate , Ethyl hydroxyacetate, butyl glycolate, methyl lactate, ethyl lactate, propyl lactate, butyl lactate, methyl 3-hydroxypropionate, ethyl 3-hydroxypropionate, propyl 3-hydroxypropionate , Butyl 3-hydroxypropionate, methyl 2-hydroxy-3-methylbutanoate, methyl methoxyacetate, ethyl methoxyacetate, propyl methoxyacetate, butyl methoxyacetate , Methyl ethoxyacetate, ethyl ethoxyacetate, propyl ethoxyacetate, butyl ethoxyacetate, methyl propoxyacetate, ethyl propoxyacetate, propyl propoxyacetate, Butyl propoxyacetate, methyl butoxyacetate, ethyl butoxyacetate, propyl butoxyacetate, butyl butoxyacetate, methyl 2-methoxypropionate, 2-methoxy Ethyl propionate, 2-methoxypropionate, 2-methoxy This paper is sized for China National Standard (CNS) A4 (210 × 297 mm) (Please read the precautions on the back first Complete this page) clothing.

、1T 經濟部智慧財產局員工消費合作社印製 -44- 555822 A7 ___ B7 五、發明説明（k (請先閲讀背面之注意事項再填寫本頁) 基丙酸丁酯、2 -乙氧基丙酸甲酯、2 -乙氧基丙酸乙酯 、2 —乙氧基丙酸丙酯、2 -乙氧基丙酸丁酯、2 -丁氧 基丙酸甲酯、2 -丁氧基丙酸乙酯、2 -丁氧基丙酸丙酯 、2 —丁氧基丙酸丁酯、3 —甲氧基丙酸甲酯、3 —甲氧 基丙酸乙酯、3 -甲氧基丙酸丙酯、3 -甲氧基丙酸丁酯 、3 —乙氧基丙酸甲酯、3 —乙氧基丙酸乙酯、3 —乙氧 基丙酸丙酯、3 -乙氧基丙酸丁酯、3 -丙氧基丙酸甲酯 、3 -丙氧基丙酸乙酯、3 -丙氧基丙酸丙酯、3 -丙氧 基丙酸丁酯、3 -丁氧基丙酸甲酯、3 -丁氧基丙酸乙酯 、3 —丁氧基丙酸丙酯、3 -丁氧基丙酸丁酯等之酯類。 這些溶劑中，從溶解性，與各成分間之反應性及塗膜 形成之容易度觀點來看，甘醇醚類、乙二醇烷基醚乙酸酯 類、酯類及二乙二醇醇類較佳。 經濟部智慧財產局員工消費合作社印製 前述溶劑也可倂用高沸點溶劑。可倂用之高沸點溶劑 例如有N —甲基甲醯胺、N，N -二甲基甲醯胺、N —甲 基甲醯苯胺、N -甲基乙醯苯胺、N，N —二甲基乙醯胺 、N-甲基吡咯烷酮、二甲基亞硕、苄基乙基醚、二己基 醚、乙醯丙酮、異佛爾酮、己酸、辛酸、1 一辛醇、1 — 壬醇、苄醇、醋酸苄酯、苯甲酸乙酯、草酸二乙酯、順丁 烯二酸二乙酯、r 一丁內酯、碳酸乙烯酯、碳酸丙烯酯、 苯基二乙二醇乙酸酯等。 本發明之光擴散反射膜形成用組成物使用上述之溶劑 ，使組成物之各成分溶解於溶劑中，調製固形份濃度成爲 2 0〜4 0 w t %。必要時可使用孔徑〇 . 2 // m之過濾 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） -45- 555822 A7 B7 五、發明説明（妇 器過濾後再使用。 光擴散反射膜之形成 (請先閱讀背面之注意事項再填寫本頁) 接著敘述使用本發明之光擴散反射膜形成用組成物形 成本發明之光擴散反射膜的方法。塗佈方法可採用例如有 噴霧法、輥塗佈法、輥塗佈法等各種方法。 預烘烤之條件係視各成分之種類、使用比例等而異， 較佳爲7 0〜9 0 °C，進行1〜1 5分鐘的條件最佳。 其次對於欲烘烤後之塗膜介於所定圖案光罩，照射紫 外線等之放射線，繼之藉由顯影液顯影去除不需要部分， 形成所定圖案。顯影方法可使用盛液體法、浸漬法、噴灑 法等，顯影時間通常爲3 0〜1 8 0秒。 上述顯影液可使用鹼水溶液，例如氫氧化鈉、氫氧化 鉀、碳酸鈉、矽酸鈉、偏矽酸鈉、氨水等無機鹼類；乙基 胺、正一丙基胺等一級胺類；二乙胺、二-正-丙基胺等 二級胺類；三甲胺、甲基二乙胺、二甲基乙胺、三乙基胺 等之三級胺類；二甲基乙醇胺、三乙醇胺等醇胺類；吡咯 、六氫吡啶、N -甲基哌嗪、N -甲基吡咯烷、1 ，8 — 經濟部智慧財產局員工消費合作社印製 二氮雜雙環〔5 · 4 · 0〕— 7-十一烯、1 ，5 -二氮 雜雙環〔4 · 3 · 0〕一 5 -壬烯等環狀三級胺類；吡啶 、三甲基毗啶、二甲基吡啶、喹啉等之芳香族三級胺類； 氫氧化四甲基銨、氫氧化四乙基銨、膽鹼等之第4級銨鹽 之水溶液。又上述鹼水溶液中添加適量甲醇、乙醇等之水 溶性有機溶媒及/或界面活性劑之水溶液也可作爲顯影液 使用。 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） •46- 555822 A7 B7 五、發明説明（）44 (請先閲讀背面之注意事項再填寫本頁) 顯影後，以流水洗淨3 0 - 9 0秒去除不要的部分， 經壓縮空氣或壓縮氮氣風乾，形成圖案。形成後之圖案照 射紫外線等之放射線，此圖案以加熱盤、烤箱等之加熱裝 置，並以所定溫度例如1 5 0〜2 5 0 °C、所定時間例如 在加熱盤上爲5〜3 0分鐘，在烤箱內爲3 0〜9 0分鐘 之加熱處理，可得到光擴散反射膜用之具有適當粗糙面之 圖案狀塗膜。 接著，藉由金屬蒸鍍可形成本發明之光擴散反射膜。 此時蒸鍍所用之金屬並無特別限制，但使用在可見光領域 中具有高反射率之金屬爲佳。就此觀點而言以含有鋁、銀 及其中至少一種之合金爲佳。 又，上述所形成之光擴散反射膜係反映具有蒸鍍金屬 之前之圖案的粗糙面。 此時各單位圖案之形狀係以底面爲平面之凸透鏡形狀 爲佳。由上面觀察單位圖案時，理想爲圓形或略圓形，直 徑爲1〜3〇// m，更理想爲5〜2 0 // m。 各單位圖案之斷面形狀理想爲如圖1 ( A )之形狀， 經濟部智慧財產局員工消費合作社印製 其高度爲0 · 1〜5//Π1，更理想爲0 . 2〜3//m。 液晶顯示元件 接著說明本發明之液晶顯示元。 本發明之液晶顯示元件具有如上述般形成之光擴散反 射膜。 液晶元件之構造可爲適當之構造，例如第2圖所示， 基板1上形成本發明之光擴散反射膜2 3與彩色濾光片層 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） -47- 555822 A 7 B7 五、發明説明（）45 (請先閲讀背面之注意事項再填寫本頁) 4，具有介於配向膜7、液晶層8之對向之配向膜9、對 向之透明電極1 0及對向基板1 1的構造。如第2圖所示 ，下部基板側可設置透明電極6，構成光擴散反射膜2 3 之金屬層3可具有電極之功能。又，視需要亦可於偏光板 1 2或彩色濾光片層4上形成保護膜5。2爲圖案狀塗膜 〇 其他構造例如第3圖所示，基板1上形成本發明之光 擴散反射膜2 3 ，具有介於配向膜7、液晶層8之對向之 配向膜9、對向之透明電極1 0、彩色濾光片層4及對向 基板1 1的構造。此時如第3圖所示，彩色濾光片層4之 下方具有對向透明電極6的構造，或彩色濾光片層4之上 方具有對向透明電極的構造。視需要亦可於偏光板1 2或 彩色濾光片層4之下方形成保護膜5。1 3爲TFT元件 〇 第3圖之構造中，構成光擴散反射膜2 3之金屬層3 擔任電極之機能。下部基板側可另外設置電極。 經濟部智慧財產局員工消費合作社印製 實施例 以下藉由實施例更詳細說明本發明，但本發明並非限 定於這些實施例者。「％」係表示「重量％」。 合成例1 (樹脂a - 1之合成） 將第三丁氧基苯乙烯176g (〇 · imol)及偶 氮雙丁腈5 · 8 g ( 0 · 0 4 m 〇 1 )投入具備冷卻管、 攪拌機及溫度計之燒瓶內，添加丙二醇單甲醚2 5 0 m 1 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） -48- 555822 A7 _ B7 五、發明説明（>6 (請先閲讀背面之注意事項再填寫本頁) 溶解之，以7 5 °C聚合4小時。將5重量％硫酸水溶液 5 ◦ g與製得之聚第二丁氧基苯乙燒溶液混合，以1 〇 〇 °C進行水解反應3小時。接著添加丙二醇單甲醚乙酸酯 5 0 0 m 1後，使用去離子水1 〇 〇 〇 m 1洗淨3次。其 後將有機層減壓去溶劑，真空乾燥得到M w 2 4，0 0 0 之鹼可溶性樹脂（聚羥基苯乙烯）。此鹼可溶性樹脂爲樹 月旨a - 1 〇 合成例2 (樹脂a — 2之合成） 將間甲酣57g (〇 · 6m〇l)、對甲酣38g ( 〇· 4m〇l) 、37重量％甲醛水溶液75 · 5g (甲 經濟部智慧財產局員工消費合作社印製 醛0 _ 93m〇l)、草酸二水合物〇63g ( 0.005m〇l)、甲基異丁酮264g投入具備冷卻 管、攪拌機及溫度計之燒瓶內，然後將燒瓶浸漬於油浴中 ，反應液回流、攪拌下進行聚縮合4小時。接著以3小時 使油浴溫度上升，燒瓶內減壓至3 0〜5 0 m m H g除去 揮發成分，將熔融之樹脂降至室溫回收。此溶解於醋酸乙 酯中使樹脂成分成爲3 0 %後，添加此溶液重量之1 · 3 倍量之甲醇與0 · 9倍量之水，攪拌後放置。接著取出分 離成兩層之下層予以濃縮、乾燥得到M w 8，0 0 〇之鹼 可溶性樹脂（酚醛樹脂）。此鹼可溶性樹脂爲樹脂a - 2 合成例3 (共聚物（a ’ 一 1 )之合成） 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） -49- 555822 A7 B7 五、發明説明（）47 將2，2’ 一偶氮雙（2，4 一二甲基戊腈）8重量 份、二乙二醇乙基甲醚2 2 0重量份投入具備冷卻管、攪 拌機之燒瓶內。接著添加苯乙烯2 〇重量份、甲基丙烯酸 2 0重量份、甲基丙烯酸環氧丙酯4 〇重量份及甲基丙燃 酸三環〔5 · 2 · 1 · 〇2’ 6〕癸烷一 8-酯20重量份 ’再以氮取代後，開始緩慢攪拌。使溶液溫度上升至7 0 °C，此溫度保持4小時得到含有共聚物（a， 一 1 )之聚 合物溶液。製得之聚合物溶液之固形份濃度爲3 0 · 6重 量％。又共聚物（a’ 一 1)換算成聚苯乙烯之重量平均 份子量爲7，000。 合成例4 (共聚物（a’ 一 2)之合成） 將2，2’ 一偶氮雙（2，4 —二甲基戊腈）8重量 份及二乙二醇乙基曱醚2 2 0重量份投入具備冷卻管、攪 拌機之燒瓶內。接著添加苯乙烯2 0重量份、甲基丙烯酸 2 0重量份、甲基丙烯酸環氧丙酯4 0重量份及甲基丙烯 酸三環〔5 . 2 _ 1 · 02’ 6〕癸烷-8 —酯20重量份 及苯基馬來醯亞胺1 0重量份，再以氮取代後，開始緩慢 攪拌。使溶液溫度上升至7 0 °C，此溫度保持5小時得到 含有共聚物（a’ - 2)之聚合物溶液。製得之聚合物溶 液之固形份濃度爲3 1 · 0重量％。又共聚物（a’ 一 2 )換算成聚苯乙烯之重量平均份子量爲1 2，000。 合成例5 (共聚物（a’ 一 3)之合成） 本紙張尺度適用中國國家標準（CNS ) A4規格（210X 297公着） (請先閱讀背面之注意事項再填寫本頁) 訂 經濟部智慧財產局員工消費合作社印製 -50- 555822 A7 B7 五、發明説明（）½ (請先閲讀背面之注意事項再填寫本頁) 將2，2’ 一偶氮雙（2，4 一二甲基戊腈）8重量 份及二乙二醇乙基甲醚2 2 0重量份投入具備冷卻管、攪 拌機之燒瓶內。接著添加苯乙烯1 〇重量份 '甲基丙烯酸 2 0重量份、甲基丙烯酸環氧丙酯3 0重量份、對乙烯基 苄基環氧丙醚1 5重量份及甲基丙烯酸三環〔 5 · 2 · 1 . 02’ 6〕癸烷一 8 -酯25重量份，再以氮 取代後，開始緩慢攪拌。使溶液溫度上升至7 0 °C，此溫 度保持6小時得到含有共聚物（a ’ - 3 )之聚合物溶液 。製得之聚合物溶液之固形份濃度爲31·0重量％。又 共聚物（a’ - 3)換算成聚苯乙烯之重量平均份子量爲 2 0，〇 0 0 〇 合成例6 (共聚物（a’ — 4)之合成） 經濟部智慧財產局員工消費合作社印製 將2 ，2’ 一偶氮雙（2，4 一二甲基戊腈）8重量 份及二乙二醇乙基甲醚2 2 0重量份投入具備冷卻管、攪 拌機之燒瓶內。接著添加苯乙烯1 0重量份、甲基丙烯酸 2 0重量份、甲基丙烯酸環氧丙酯4 0重量份、甲基丙烯 酸三環〔5 · 2 · 1 · 02’ 6〕癸烷一 8 —酯15重量份 及苯基馬來醯亞胺1 0重量份，再以氮取代後，再添加1 ，3 - 丁二烯5重量份，開始緩慢攪拌。使溶液溫度上升 至7 0 t，此溫度保持5小時得到含有共聚物（a ’ - 4 )之聚合物溶液。製得之聚合物溶液之固形份濃度爲 31 · 2重量％。又共聚物（a， 一 4)換算成聚苯乙烯 之重量平均份子量爲10，000。 本紙張尺度適用中國國家標準（CNS ) A4規格（210X 297公釐） 51 - 555822 A7 B7_ 五、發明説明（>9 實施例1 混合（a)成分之樹脂a — 1 100重量份，（b )成分：1 ，1 ，3 -三（2 ，5_二甲基一4 —羥苯基 )—3 —苯基丙烷（1 _ Omo 1)與1 ，2_萘醌二疊 氮一 5 —磺酸氯（1 . 9mo 1)之縮合物（1 ，1，3 —三（2 ，5 -二甲基一 4 一羥苯基）一 3 —苯基丙烷一 1 ，2 —萘醌二疊氮一 5 -磺酸酯）30重量份，(c ) 成分：Epycoat 8 2 8 (油化 Shell Epox (股）製） 2 0 . 0重量份，Megafac F 1 7 2 (大日本油墨（株） 製）0·05重量份後，以3-甲氧基丙酸甲酯稀釋、溶 解使整體之固形份濃度成爲3 0 %後，以孔徑〇 . 2 // m 之薄膜過濾器過濾調製光擴散反射膜形成用組成物之溶液 〇 (I)具有圖案之粗糙面之形成 於玻璃基板上，使用旋轉塗佈器將上述組成物溶液後 ，藉由加熱板於5 0 °C下進行3分鐘預烘烤形成膜厚 2 · 0 // m之塗膜。 對於上述製得之塗膜介於5 // m方形之殘留圖案光罩 ，照射3 6 5 n m之強度爲1 〇 m W/ c m 2之紫外線7秒 。然後’使用四甲基氫氧化銨水溶液以2 5 °C顯影3 0秒 鐘’使用純水沖洗。再照射3 6 5 n m之強度爲1 〇 m W / c m 2之紫外線3 〇秒後，使用烤箱以2 2 〇 t加熱6 〇 分鐘，形成具有圖案之粗糙面。 本紙張尺度適财酬家標準（CMS ) A4規格（21GX297公釐) ~ 一 -52- (請先閲讀背面之注意事項再填寫本頁) 衣· 訂 經濟部智慧財產局員工消費合作社印製 555822 A7 B7 五、發明説明（知 (II) 解像度之評價 以上述（I )製得之圖案中，可分辨殘留圖案時，評 (請先閲讀背面之注意事項再填寫本頁) 價爲良好’無法分辨殘留圖案時，評價爲不良。結果如表 1所示。 (III) 圖案斷面形狀之評價 使用掃瞄型電子顯微鏡觀察圖案之斷面形狀的結果， 相當於圖1所示之A〜C之哪一種形狀如圖1所示。如A 所示’形成底面爲平面之凸透鏡狀之圖案時，表示圖案形 狀良好，如B或C所示，圖案邊緣形成垂直或圓錐狀時， 表示圖案形狀不良。 此時之圖案之直徑及高度如表1所示。使用掃瞄型電 子顯微鏡觀察評價圖案之直徑及高度。 (I V )耐熱性之評價 將上述（I )形成之圖案於烘箱中以2 5 0 t加熱 6 0分鐘。此時之厚度變化率如表1所示。此値之絕對値 在加熱前後爲5 %以內時，評價爲耐熱性良好。 (V )耐溶劑性之評價 經濟部智慧財產局員工消費合作社印製 將上述（I )形成之圖案浸漬於溫度控制爲2 5 °C之 二甲基亞硕中2 0分鐘後，測定因浸漬所產生之膜厚變化 。結果如表1所示。此値之絕對値在5 %以內時，評價耐 溶劑性良好。 (V I )光擴散反射膜之形成 如上述（I )形成之粗糙面上，藉由真空蒸鍍裝置形 成1 ’ 5 Ο Ο A之鋁膜（如此所形成之玻璃基板上具有光 本紙張尺度適用中國國家標準（CNS ) A4規格（210 X 297公釐） -53- 555822 A7 B7 五、發明説明（ 散射膜，其上具有鋁膜之基板，以下稱爲鋁蒸鍍基板）。 (VII)密著性 (請先閲讀背面之注意事項再填寫本頁) 依據 J IS K— 5400 (1900) 8 . 5 之密 著性試驗之8 · 5 · 2之棋盤格子膠帶法，以切割刀將上 述形成之鋁蒸鍍基板上形成1 0 0個之棋盤格子，進行密 著性試驗。此時，殘留之棋盤格子數如表1所示。 實施例2 混合（a)成分之樹脂a - 1 100重量份，（b )成分·· 1 ，1 ，3 —三（2，5 —二甲基—4 —羥苯基 )一 3 —苯基丙院（1 · 〇mo 1)與1 ，2 —萘酿二疊 氮一 5_磺酸氯（1 . 9mo 1)之縮合物（1 ，1 ，3 一三（2，5 -二甲基一 4 —羥苯基）一 3 -苯基丙烷一 1 ，2 -萘醌二疊氮—5 -磺酸酯）30重量份，（c) 成分：Epycoat 8 2 8 (油化 Shell Epox (股）製） 20 · 0重量份，（d)成分：三井Sianzmid (股）製Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs-44- 555822 A7 ___ B7 V. Description of the invention (k (please read the precautions on the back before filling this page) Butyl propyl propionate, 2-Ethoxy propionate Methyl ester, ethyl 2-ethoxypropionate, propyl 2-ethoxypropionate, butyl 2-ethoxypropionate, methyl 2-butoxypropionate, 2-butoxypropionate Ethyl acetate, propyl 2-butoxypropionate, butyl 2-butoxypropionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, 3-methoxypropionate Propyl ester, butyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, propyl 3-ethoxypropionate, 3-ethoxypropionate Acid butyl ester, methyl 3-propoxypropionate, ethyl 3-propoxypropionate, propyl 3-propoxypropionate, butyl 3-propoxypropionate, 3-butoxypropion Esters of methyl esters, ethyl 3-butoxypropionate, propyl 3-butoxypropionate, butyl 3-butoxypropionate, etc. Among these solvents, from the solubility, between the components From the viewpoints of reactivity and ease of coating film formation, glycol ethers, glycol alkyl ether acetic acid Esters, esters, and diethylene glycol alcohols are preferred. The aforementioned solvents printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs can also use high-boiling solvents. High-boiling solvents that can be used are, for example, N-methylformamidine Amine, N, N-dimethylformamide, N-methylformanilide, N-methylacetanilide, N, N-dimethylacetamide, N-methylpyrrolidone, dimethylimine Shuo, benzyl ethyl ether, dihexyl ether, acetone acetone, isophorone, hexanoic acid, octanoic acid, 1-octanol, 1-nonanol, benzyl alcohol, benzyl acetate, ethyl benzoate, oxalate di Ethyl acetate, diethyl maleate, r-butyrolactone, ethylene carbonate, propylene carbonate, phenyl diethylene glycol acetate, etc. The composition for forming a light-diffusing reflective film of the present invention uses the above Solvent, so that each component of the composition is dissolved in the solvent, and the solid content concentration is adjusted to 20 ~ 40 wt%. If necessary, a filter with a pore size of 0.2 // m can be used. The paper size is applicable to Chinese National Standards (CNS) A4 specifications (210X297 mm) -45- 555822 A7 B7 V. Description of the invention (used after filtering by women's organs. Optical expansion Formation of a reflective film (please read the precautions on the back before filling out this page) Next, the method for forming the light diffusing reflective film of the present invention using the composition for forming a light diffusing reflective film of the present invention will be described. The coating method can be, for example, spraying Methods, roll coating methods, roll coating methods, etc. The conditions for pre-baking vary depending on the type of each component, the proportion of use, etc., preferably 70 to 90 ° C for 1 to 15 minutes The conditions are the best. Secondly, the coating film to be baked is interposed between a mask with a predetermined pattern, and radiation such as ultraviolet rays is irradiated, and then unnecessary portions are developed by a developing solution to form a predetermined pattern. As the developing method, a liquid holding method, a dipping method, a spraying method, or the like can be used, and the developing time is usually 30 to 180 seconds. The above developing solution may use an alkaline aqueous solution, such as inorganic hydroxides such as sodium hydroxide, potassium hydroxide, sodium carbonate, sodium silicate, sodium metasilicate, ammonia, etc .; primary amines such as ethylamine, n-propylamine; Secondary amines such as ethylamine, di-n-propylamine; tertiary amines such as trimethylamine, methyldiethylamine, dimethylethylamine, triethylamine; dimethylethanolamine, triethanolamine, etc. Alcohol amines; pyrrole, hexahydropyridine, N-methylpiperazine, N-methylpyrrolidine, 1, 8 — printed diazabicyclo [5 · 4 · 0] — Cyclic tertiary amines such as 7-undecene, 1,5-diazabicyclo [4 · 3 · 0]-5-nonene; pyridine, trimethylpyridine, dimethylpyridine, quinoline, etc. Aromatic tertiary amines; aqueous solutions of fourth-order ammonium salts such as tetramethylammonium hydroxide, tetraethylammonium hydroxide, and choline. Further, an aqueous solution obtained by adding an appropriate amount of a water-soluble organic solvent such as methanol, ethanol, and / or a surfactant to the alkaline aqueous solution can also be used as a developing solution. This paper size applies Chinese National Standard (CNS) A4 (210X297 mm) • 46- 555822 A7 B7 V. Description of the invention () 44 (Please read the precautions on the back before filling this page) After developing, wash with running water Remove unnecessary parts in 30-90 seconds, and air dry with compressed air or compressed nitrogen to form a pattern. The formed pattern is irradiated with radiation such as ultraviolet rays. This pattern is heated by a heating device such as a heating plate, an oven, etc., and the predetermined temperature is, for example, 150 to 250 ° C, and the predetermined time is, for example, 5 to 30 minutes on a heating plate. The heating treatment in the oven for 30 to 90 minutes can obtain a pattern-like coating film with a suitable rough surface for a light diffusion reflection film. Then, the light-diffusion reflection film of the present invention can be formed by metal evaporation. The metal used for the evaporation at this time is not particularly limited, but it is preferable to use a metal having a high reflectance in the visible light field. From this viewpoint, an alloy containing at least one of aluminum, silver, and the like is preferable. The light-diffusion reflection film formed as described above reflects a rough surface having a pattern before the metal is vapor-deposited. In this case, the shape of each unit pattern is preferably a convex lens shape having a bottom surface as a plane. When the unit pattern is viewed from above, it is preferably circular or slightly circular, with a diameter of 1 to 30 // m, and more preferably 5 to 20 / m. The cross-sectional shape of each unit pattern is ideally as shown in Figure 1 (A). The height is 0 · 1 ~ 5 // Π1 printed by the consumer cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, and more preferably 0.2 ~ 3 // m. Liquid crystal display element Next, the liquid crystal display element of the present invention will be described. The liquid crystal display element of the present invention has a light-diffusing reflective film formed as described above. The structure of the liquid crystal element may be a suitable structure. For example, as shown in FIG. 2, the light diffusing reflection film 23 and the color filter layer of the present invention are formed on the substrate 1. The paper dimensions are applicable to China National Standard (CNS) A4 specifications (210X297). (Mm) -47- 555822 A 7 B7 V. Description of the invention () 45 (Please read the precautions on the back before filling out this page) 4. It has an alignment film between the alignment film 7 and the liquid crystal layer 8. The structure of the opposite transparent electrode 10 and the opposite substrate 11. As shown in FIG. 2, a transparent electrode 6 may be provided on the lower substrate side, and the metal layer 3 constituting the light diffusion reflection film 2 3 may have an electrode function. If necessary, a protective film 5 may be formed on the polarizing plate 12 or the color filter layer 4. 2 is a pattern-like coating film. Other structure examples are shown in FIG. 3, and the light diffusion reflection of the present invention is formed on the substrate 1. The film 2 3 has a structure between the alignment film 7, the alignment film 9 facing the liquid crystal layer 8, the transparent electrode 10 facing the color film, the color filter layer 4, and the opposite substrate 11. At this time, as shown in Fig. 3, the structure below the color filter layer 4 has an opposed transparent electrode 6, or the structure above the color filter layer 4 has an opposed transparent electrode. If necessary, a protective film 5 may be formed under the polarizing plate 12 or the color filter layer 4. 13 is a TFT element. In the structure of FIG. 3, the metal layer 3 constituting the light diffusion reflection film 23 serves as an electrode. function. An electrode may be provided on the lower substrate side. Printed by the Consumers' Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs Examples The present invention will be described in more detail by the following examples, but the present invention is not limited to those examples. "%" Means "weight%." Synthesis Example 1 (Synthesis of Resin a-1) 176 g (0.3 μmol) of tertiary butoxystyrene and 5.8 g (0.44 m 〇1) of azobisbutyronitrile were put into a cooling tube and a stirrer And thermometer in the flask, add propylene glycol monomethyl ether 2.50 m 1 This paper size applies Chinese National Standard (CNS) A4 specification (210X297 mm) -48- 555822 A7 _ B7 V. Description of the invention (> 6 (Please Read the precautions on the back before filling in this page) Dissolve and polymerize at 75 ° C for 4 hours. Mix 5 wt% sulfuric acid aqueous solution 5 ◦ g with the prepared polybutoxybenzyl alcohol solution. The hydrolysis reaction was performed at OO ° C for 3 hours. Then, propylene glycol monomethyl ether acetate 5000 m 1 was added, and then washed 3 times with deionized water 1000 m 1. Thereafter, the organic layer was depressurized to remove the solvent. And vacuum drying to obtain an alkali-soluble resin (polyhydroxystyrene) of Mw 2 4, 0 0. This alkali-soluble resin is Shuyuezhi a-1 0 Synthesis Example 2 (Synthesis of Resin a-2) 57g (0.6 mol), paraformam 38g (0.4 mol), 37% by weight aqueous formaldehyde solution 75.5g (Ministry of Economic Affairs Bureau Consumer Consumption Co., Ltd. printed aldehydes 0-93mOl), oxalic acid dihydrate 063g (0.005mOl), and 264g of methyl isobutyl ketone were put into a flask equipped with a cooling tube, a stirrer and a thermometer, and then the flask was immersed in In the oil bath, the reaction solution was refluxed and stirred for 4 hours. Then, the temperature of the oil bath was raised for 3 hours, and the pressure in the flask was reduced to 30 to 50 mm H g to remove volatile components, and the molten resin was lowered to the chamber. The temperature is recovered. After dissolving in ethyl acetate to make the resin content 30%, add 1 · 3 times the amount of methanol and 0 · 9 times the amount of water in the weight of the solution, stir and place. Then take out and separate into two layers The lower layer is concentrated and dried to obtain an alkali-soluble resin (phenol resin) of Mw 8, 0 0. This alkali-soluble resin is resin a-2 Synthesis Example 3 (Synthesis of copolymer (a'-1)) Paper size Applicable to China National Standard (CNS) A4 specification (210X297 mm) -49- 555822 A7 B7 V. Description of the invention (47) The weight of 2,2'-azobis (2,4-dimethylvaleronitrile) 8 parts by weight 2, 2 0 parts by weight of diethylene glycol ethyl methyl ether is equipped with cooling Into the flask of the blender, then add 20 parts by weight of styrene, 20 parts by weight of methacrylic acid, 40 parts by weight of propylene methacrylate, and tricyclomethylpropionate [5 · 2 · 1 · 〇 After 20 'parts by weight of 2' 6] decane-8-ester was replaced with nitrogen, slow stirring was started. The temperature of the solution was raised to 70 ° C, and the temperature was maintained for 4 hours to obtain a polymer solution containing the copolymer (a,-1). The obtained polymer solution had a solid content concentration of 30.6% by weight. The weight average molecular weight of the copolymer (a'-1) converted to polystyrene was 7,000. Synthesis Example 4 (Synthesis of Copolymer (a'-12)) 8 parts by weight of 2,2'-azobis (2,4-dimethylvaleronitrile) and diethylene glycol ethyl ether 2 2 0 A part by weight is put into a flask equipped with a cooling tube and a stirrer. Next, 20 parts by weight of styrene, 20 parts by weight of methacrylic acid, 40 parts by weight of propylene methacrylate, and tricyclic methacrylate [5. 2 — 1 · 02 '6] decane-8 — 20 parts by weight of the ester and 10 parts by weight of the phenylmaleimide were substituted with nitrogen, and then slowly stirred. The temperature of the solution was raised to 70 ° C, and the temperature was maintained for 5 hours to obtain a polymer solution containing the copolymer (a '-2). The solid content concentration of the obtained polymer solution was 3 1 · 0% by weight. The weight average molecular weight of the copolymer (a'-12) in terms of polystyrene was 12,000. Synthesis Example 5 (Synthesis of Copolymer (a'-13)) This paper size is applicable to Chinese National Standard (CNS) A4 (210X 297) (Please read the precautions on the back before filling this page) Printed by the Consumer Cooperative of the Property Bureau -50- 555822 A7 B7 V. Description of the invention () ½ (Please read the notes on the back before filling this page) Put 2,2'-azobis (2,4-dimethyl) 8 parts by weight of valeronitrile) and 220 parts by weight of diethylene glycol ethyl methyl ether were put into a flask equipped with a cooling tube and a stirrer. Next, 10 parts by weight of styrene, 20 parts by weight of methacrylic acid, 30 parts by weight of propylene methacrylate, 15 parts by weight of p-vinyl benzyl glycidyl ether, and tricyclic methacrylate were added [5 · 2 · 1. 02 '6] 25 parts by weight of decane-8-ester, and then substituted with nitrogen, and then slowly stirred. The temperature of the solution was raised to 70 ° C, and the temperature was maintained for 6 hours to obtain a polymer solution containing a copolymer (a '-3). The solid content concentration of the obtained polymer solution was 31.0% by weight. Copolymer (a '-3) converted to polystyrene by weight average molecular weight was 20,000. Synthesis Example 6 (Synthesis of copolymer (a'-4)) Employees ’Cooperatives, Intellectual Property Bureau, Ministry of Economic Affairs 8 parts by weight of 2,2'-azobis (2,4-dimethylvaleronitrile) and 220 parts by weight of diethylene glycol ethyl methyl ether were printed into a flask equipped with a cooling tube and a stirrer. Next, 10 parts by weight of styrene, 20 parts by weight of methacrylic acid, 40 parts by weight of propylene methacrylate, and tricyclic methacrylate [5 · 2 · 1 · 02 '6] decane-8— After 15 parts by weight of the ester and 10 parts by weight of the phenylmaleimide, 5 parts by weight of 1,3-butadiene was added after nitrogen substitution, and the stirring was started slowly. The temperature of the solution was raised to 70 t, and the temperature was maintained for 5 hours to obtain a polymer solution containing a copolymer (a '-4). The resulting polymer solution had a solids concentration of 31.2% by weight. The weight average molecular weight of the copolymer (a, 1-4) converted to polystyrene was 10,000. This paper size applies the Chinese National Standard (CNS) A4 specification (210X 297 mm) 51-555822 A7 B7_ V. Description of the invention (> 9 Example 1 Compound (a) component resin a — 1 100 parts by weight, (b ) Ingredients: 1, 1, 3-tris (2, 5-dimethyl-1, 4-hydroxyphenyl), 3-phenylpropane (1-Omo 1) and 1, 2-naphthoquinonediazide-5 — Condensate of chlorosulfonic acid (1.9 mo 1) (1,1,3-tris (2,5-dimethyl-4 monohydroxyphenyl) -3-phenylpropane-1,2-naphthoquinone diammonium Nitrogen 5 -sulfonic acid ester) 30 parts by weight, (c) Ingredient: Epycoat 8 2 8 (manufactured by Shell Chemicals Epox Co., Ltd.) 2 0. 0 parts by weight, Megafac F 1 7 2 (Danippon Ink Co., Ltd.) Manufactured by 0.05 parts by weight, diluted with methyl 3-methoxypropionate, dissolved to make the solid content concentration of the whole 30%, and filtered with a membrane filter having a pore size of 0.2 // m to modulate light diffusion A solution of the composition for forming a reflective film (I) The patterned rough surface is formed on a glass substrate. After the solution of the composition is formed using a spin coater, it is preheated at 50 ° C for 3 minutes by a hot plate. Baking formation Coating film with a film thickness of 2 · 0 // m. For the residual pattern mask with a coating layer of 5 // m square prepared as described above, ultraviolet light with an intensity of 10 6 W / cm 2 at 3 6 5 nm was irradiated. Seconds. Then 'developed with a tetramethylammonium hydroxide aqueous solution at 25 ° C for 30 seconds' and rinsed with pure water. Then irradiated with ultraviolet light having an intensity of 10 m W / cm 2 at 3 65 nm for 30 seconds. , Use an oven to heat for 2 minutes at 2 200 t to form a rough surface with a pattern. The paper size is suitable for financial standards (CMS) A4 specification (21GX297 mm) ~ 1-52- (Please read the note on the back first Please fill in this page for further details.) Clothing and order Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs, Consumer Cooperatives 555822 A7 B7 V. Description of the Invention Evaluation (please read the precautions on the back before filling this page) The price is good, when the residual pattern cannot be distinguished, the evaluation is not good. The results are shown in Table 1. (III) The evaluation of the shape of the cross-section of the pattern uses scanning electronics As a result of observing the cross-sectional shape of the pattern through a microscope, it corresponds to A ~ shown in FIG. 1 Which shape of C is shown in Figure 1. As shown in A, when a convex lens-like pattern with a flat bottom surface is formed, it indicates that the shape of the pattern is good. As shown in B or C, when the edge of the pattern is vertical or conical, it indicates the pattern. The shape is bad. The diameter and height of the pattern at this time are shown in Table 1. The diameter and height of the evaluation pattern were observed using a scanning electron microscope. (I V) Evaluation of heat resistance The pattern formed by the above (I) was heated in an oven at 250 t for 60 minutes. The thickness change rate at this time is shown in Table 1. This absolute value is evaluated as good heat resistance when it is within 5% before and after heating. (V) Evaluation of solvent resistance Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs The pattern formed by (I) above was immersed in dimethylaso at a temperature controlled at 25 ° C for 20 minutes, and then measured for immersion The resulting film thickness changes. The results are shown in Table 1. When the absolute value is less than 5%, the solvent resistance is evaluated to be good. (VI) The light diffuse reflection film is formed on the rough surface formed as described in (I) above, and an aluminum film of 1 '5 〇A is formed by a vacuum evaporation device. China National Standard (CNS) A4 specification (210 X 297 mm) -53- 555822 A7 B7 V. Description of the invention (Scattering film, substrate with aluminum film on it, hereinafter referred to as aluminum evaporation substrate). (VII) Dense Adhesiveness (please read the precautions on the back before filling this page) According to J IS K-5400 (1900) 8. 5 Adhesion Test of the checkerboard grid tape method, use the cutting knife to form the above 100 checkerboard grids were formed on the aluminum vapor-deposited substrate, and the adhesion test was performed. At this time, the number of checkerboard grids remaining is shown in Table 1. Example 2 Compound (a) component resin a-1 100 weight Parts, (b) ingredients ... 1,1,3-tris (2,5-dimethyl-4-hydroxyphenyl) -3-phenylpropanone (1 · 〇mo 1) and 1,2-naphthalene Condensate of diazide- 5-sulfonic acid chloride (1.9 mo 1) (1,1,3-tris (2,5-dimethyl-4-hydroxyphenyl) -3-phenyl 30 parts by weight of alkane-1,2-naphthoquinonediazide-5-sulfonate), (c) Ingredients: Epycoat 8 2 8 (manufactured by Shell Epox, Inc.) 20.0 parts by weight, (d) Composition: Mitsui Sianzmid (stock) system

Sim el 3 0 0 20 · 0 重量份，（e)成分：2 — (4 經濟部智慈財產局員工消費合作社印製 一甲氧基一万一苯乙烯基）一4，6 —雙（三氯甲基）一 S —三嗪〇 · 2重量份，界面活性劑：Megafac F 1 7 2 (大日本油墨（株）製）〇 . 05重量份後，以3 -甲氧 基丙酸甲酯稀釋、溶解使整體之固形份濃度成爲3 0 %後 ’以孔徑0 · 2 /z m之薄膜過濾器過濾調製本發明之組成 物溶液，與實施例1同樣評價。結果如表1所示。 本紙張尺度適用中國國家標準（CNS ) A4規格（210X29<7公釐） -54- 555822 A7 B7 五、發明説明（ 實施例3 除了使用樹脂a - 2取代實施例1中之樹脂a - 1外 ’其餘與貫施例1相同調製組成物溶液，同樣評價。結果 如表1所示。 實施例4 除了使用樹脂a - 2取代實施例2中之樹脂a - 1外 ’其餘與實施例2相同調製組成物溶液，同樣評價。結果 如表1所示。 實施例5 混合（a )成分之樹脂a 一 1 1 〇 0重量份，（b )成分·· 1 ，1 ，3 -三（2，5 -二甲基—4 —羥苯基 )一 3 -苯基丙烷（1 . 〇m〇 1)與1 ，2 -萘醌二疊 氮一 5_磺酸氯（1 . 9mo 1)之縮合物（1 ，1，3 一三（2 ，5 —二甲基—4 —羥苯基）—3 —苯基丙烷— 1 ，2 -萘醌二疊氮一 5 —磺酸酯）30重量份，（c) 成分：Epycoat 8 2 8 (油化 Shell Epox (股）製） 1 0 · 0重量份，（d)成分：三井Sianzmid (股）製 Simel 3 0 0 20.0 重量份，（e)成分：2— (4 一甲氧基一 /3 —苯乙烯基）一 4，6 —雙（三氯甲基）一 S —三嗪〇 · 2重量份，界面活性劑：Megafac F 1 7 2 (大日本油墨（株）製）〇 · 05重量份後，以3 -甲氧 基丙酸甲酯稀釋、溶解使整體之固形份濃度成爲3 0 %後 本紙張尺度適用中國國家標準（CNS ) A4規格（210 X297公釐） (請先閲讀背面之注意事項再填寫本頁) 衣. 、11 經濟部智慧財產局員工消費合作社印製 -55- 555822 A7 ___B7 五、發明説明（to ，以孔徑0 · 2 # m之薄膜過濾器過濾調製本發明之組成 物溶液，與實施例1同樣評價。結果如表1所示。 表1 解像度 耐熱性 耐溶劑性 斷面形狀 密著性 (%) (%) 形狀 高度 直徑 (Mm) (Mm) 實施例1 良好 -4.0 +4.2 A 0.3 10 100 實施例2 良好 -4.5 +4.2 A 0.7 10 100 實施例3 良好 -4.1 +3.9 A 0.7 12 100 實施例4 良好 •4.5 +4.1 A 1.0 15 100 實施例5 良好 -3.3 +2.6 A 0.5 8 100 (請先閲讀背面之注意事項再填寫本頁) 實施例6 光擴散特性之評價 經濟部智慧財產局員工消費合作社印製 使用實施例1調製之光擴散反射膜形成用組成物，依 據實施例1之（I )具有圖案之粗糙面之形成步驟，及（ V I )光擴散反射膜之形成步驟，使圖案之下部直徑1 〇 //m、高度〇 . 3 //m之底面爲平面之凸透鏡狀之圖案在 玻璃基板上形成最緊密充塡配置。然後依據實施例1之（ V I )光擴散反射膜之形成步驟形成1，5 Ο Ο A之鋁膜 ，得到光擴散反射膜。對於此處所得之光擴散反射膜使用 3次元變角光度計（（股）村上色彩技術硏究所製）測定 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） -56- 555822 A7 B7 五、發明説明（>4 由一 1 0 °至7 0 °改變角度測定3 0 °入射時之散射特性 。結果如圖4所示。 (請先閱讀背面之注意事項再填寫本頁) 實施例7 使用實施例2調製之光擴散反射膜形成用組成物，依 據實施例1之（I )具有圖案之粗糙面之形成步驟，及（ V I )光擴散反射膜之形成步驟，使圖案之下部直徑1 〇 #m、高度〇 · 3 //m之底面爲平面之凸透鏡狀之圖案在 玻璃基板上形成最緊密充塡配置。然後依據實施例1之（ V I )光擴散反射膜之形成步驟形成1，5 Ο Ο A之鋁膜 ，得到光擴散反射膜。對於此處所得之光擴散反射膜使用 3次元變角光度計（（股）村上色彩技術硏究所製）測定 由一 1 0 °至7 0 °改變角度測定3 0 °入射時之散射特性 。結果如圖5所示。 實施例8 經濟部智慧財產局員工消費合作社印製 混合合成例3所製得之聚合物溶液（相當於共聚物（ a’ — 1)100 重量份），（b)成分：2，3，4， 4’ —四羥基二苯甲酮（1 · Omo 1 )與1 ，2 —萘醌 二疊氮一4 一磺酸氯（2 · Omo 1)之縮合物（2，3 ，4，4’ 一四羥基二苯甲酮一 1 ，2 -萘醌二疊氮—4 -磺酸酯）3 0重量份，以二乙二醇乙基甲醚溶解使整體 之固形份濃度成爲3 0重量％後，以孔徑0 . 2 // m之薄 膜過濾器過濾調製感放射線性樹脂組成物之溶液。與實施 本紙張尺度適用中國國家標準（CNS ) A4規格（210X 297公釐） -57- 555822 A7 B7 五、發明説明（te 例1同樣評價。結果如表2所示。 (請先閲讀背面之注意事項再填寫本頁} 實施例9 除了使用含有共聚物（a， - 2)之聚合物溶液取代 實施例8中之含有共聚物（a， - 1)之聚合物溶液外， 其餘與實施例8相同調製組成物溶液，同樣評價。結果如 表2所示。 實施例1 0 除了使用含有共聚物（a， - 3)之聚合物溶液取代 實施例8中之含有共聚物（a， - 1)之聚合物溶液外， 其餘與實施例8相同調製組成物溶液，同樣評價。結果如 表2所示。 實施例1 1 除了使用含有共聚物（a， - 4)之聚合物溶液取代 經濟部智慧財產局員工消費合作社印製 實施例8中之含有共聚物（a， 一 1)之聚合物溶液外， 其餘與實施例8相同調製組成物溶液，同樣評價。結果如 表2所示。 實施例1 2 除了使用實施例1 1中之（b )成分：1 ，1 ，3〜 三（2，5 -二甲基—4 —羥苯基—3 -苯基）丙烷（ 1 . 0 m ο 1 )與1，2 -萘醌二疊氮一 5 —磺酸氯（ 本紙張尺度適用中國國家標準（CNS ) A4規格（210 X297公釐） -58- 555822 A7 B7 五、發明説明（>6 1 · 9mo 1)之縮合物（1 ，1，3 —三（2，5 —二 甲基一 4 一經本基）一 3 -本基丙燒一 1 ，2 -萘醌二疊 氮〜5 -磺酸酯）3 〇重量份外，其餘與實施例丨丨同樣 調製組成物溶液，同樣評價。結果如袠2所示。 表2 解像度 斷面形狀 耐熱性 耐溶劑性 密著性 形狀 高度 直徑 (μιη) (Mm) 實施例8 良好 A 1.5 12 -3.0 +4.5 100 實施例9 良好 A 1.5 11 -3.1 +5.0 100 實施例10 良好 A 1.8 10 -4.0 +5.0 100 實施例11 良好 A 1.9 13 -3.0 +3.0 100 實施例12 良好 A 1.7 11 -3.2 +3.5 100 實施例1 3 光擴散特性之評價 使用實施例8調製之光擴散反射膜形成用組成物，依 據實施例1之（I )具有圖案之粗糙面之形成步驟，及（ V I )光擴散反射膜之形成步驟，使圖案之下部直徑1 〇 //m、高度〇 . 3 之底面爲平面之凸透鏡狀之圖案在 玻璃基板上形成最緊密充塡配置。然後依據實施例1之（ V I )光擴散反射膜之形成步驟形成1，5 Ο Ο A之鋁膜 本紙張尺度適用中國國家標準（CNS ) A4規格（210X 297公釐） (請先閲讀背面之注意事項再填寫本頁)Sim el 3 0 0 20 · 0 parts by weight, (e) Ingredients: 2 — (4 printed by a consumer cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, monomethoxy 11,000 styryl), 4, 6, — double (three Chloromethyl) -S-triazine 0.2 parts by weight, surfactant: Megafac F 1 7 2 (manufactured by Dainippon Ink Co., Ltd.) 0.05 parts by weight, and then methyl 3-methoxypropionate The composition solution of the present invention was prepared by filtering and preparing the composition solution of the present invention with a membrane filter having a pore size of 0 · 2 / zm after diluting and dissolving so that the overall solid content concentration became 30%, and evaluated in the same manner as in Example 1. The results are shown in Table 1. This paper size applies the Chinese National Standard (CNS) A4 specification (210X29 < 7 mm) -54- 555822 A7 B7 V. Description of the invention (Example 3 except that resin a-2 is used instead of resin a-1 in Example 1 'The rest was prepared in the same manner as in Example 1. The composition solution was evaluated the same. The results are shown in Table 1. Example 4 was the same as Example 2 except that resin a-2 was used instead of resin a-1 in Example 2.' A composition solution was prepared and evaluated in the same manner. The results are shown in Table 1. Example 5 The resin a (a) component was mixed with 1 1 100 parts by weight, and (b) the component was · 1, 1, 3-three (2, Condensation of 5-dimethyl-4-hydroxyphenyl) 3-phenylpropane (1.0 mol) with 1,2-naphthoquinonediazide-5-sulfonic acid chloride (1.9 mo 1) (1,1,3,3-tris (2,5-dimethyl-4-hydroxyphenyl) -3-phenylpropane-1,2-naphthoquinonediazide-5-sulfonate) 30 parts by weight (C) Ingredient: Epycoat 8 2 8 (manufactured by Shell Epox Co., Ltd.) 1 0 · 0 parts by weight, (d) ingredient: Mitsui Sianzmid (shares) Simel 3 0 0 20.0 parts by weight, (e) ingredient :twenty four Monomethoxy-1 / 3-styryl) -4,6-bis (trichloromethyl) -S-triazine 0.2 parts by weight, surfactant: Megafac F 1 7 2 (Danippon Ink Co., Ltd. )). 05 parts by weight, diluted with methyl 3-methoxypropionate, dissolved to make the overall solid content concentration 30%. This paper size applies Chinese National Standard (CNS) A4 (210 X297). Li) (Please read the precautions on the back before filling this page). 11 Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs-55- 555822 A7 ___B7 V. Description of the invention (to, with aperture 0 · 2 # m 之A membrane filter was used to filter and prepare the composition solution of the present invention, and evaluated in the same manner as in Example 1. The results are shown in Table 1. Table 1 Resolution Heat Resistance Solvent Resistance Cross Section Shape Adhesion (%) (%) Shape Height Diameter ( Mm) (Mm) Example 1 Good -4.0 +4.2 A 0.3 10 100 Example 2 Good -4.5 +4.2 A 0.7 10 100 Example 3 Good -4.1 +3.9 A 0.7 12 100 Example 4 Good • 4.5 +4.1 A 1.0 15 100 Example 5 Good -3.3 +2.6 A 0.5 8 100 (Please read the note on the back first (Please fill in this page again for the matters needing attention) Example 6 Evaluation of Light Diffusion Characteristics Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, using the composition for forming a light diffusing reflective film prepared in Example 1, with a pattern in accordance with (I) of Example 1 The step of forming a rough surface and the step of forming a (VI) light-diffusing reflection film make the bottom surface of the pattern with a diameter of 1 / m and a height of 0.3 / m and a flat convex lens-like pattern on the glass substrate Forms the tightest filling configuration. Then, according to the (V I) light diffusion and reflection film forming step of Example 1, an aluminum film of 1,500 Å was formed to obtain a light diffusion and reflection film. The light diffusion reflection film obtained here was measured using a 3-dimensional variable-angle photometer (made by Murakami Color Technology Research Co., Ltd.). The paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) -56- 555822 A7 B7 V. Explanation of the invention (> 4 Change the angle from 10 ° to 70 ° to measure the scattering characteristics at 30 ° incidence. The results are shown in Figure 4. (Please read the precautions on the back before filling this page ) Example 7 Using the composition for forming a light-diffusing reflective film prepared in Example 2 according to (1) the step of forming a patterned rough surface and the (VI) step of forming a light-diffusing reflective film in Example 1, The lower part has a diameter of 〇 # m and a height of 0.3. // m. The bottom surface is a flat convex lens-shaped pattern on the glass substrate to form the most compact filling configuration. Then according to (VI) of Example 1, the formation of a light-diffusing reflective film In the step, an aluminum film of 1, 5 〇 A was formed to obtain a light diffusion reflection film. The light diffusion reflection film obtained here was measured using a 3-dimensional variable angle photometer (made by Murakami Color Technology Research Co., Ltd.). 0 ° to 7 0 ° change The scattering characteristics at 30 ° incidence were measured. The results are shown in Figure 5. Example 8 The polymer solution (equivalent to the copolymer (a ') — 1) 100 parts by weight), (b) Ingredients: 2, 3, 4, 4 '—tetrahydroxybenzophenone (1 · Omo 1) and 1, 2-naphthoquinonediazide-4 monosulfonic acid chloride (2 · Omo 1) condensate (2,3,4,4'-tetrahydroxybenzophenone-1,2-naphthoquinonediazide-4-sulfonate) 30 parts by weight of diethyl After the glycol ethyl methyl ether is dissolved so that the overall solid content concentration becomes 30% by weight, the solution of the radiation-sensitive resin composition is filtered by a membrane filter with a pore size of 0.2 // m. It is applicable to China in the implementation of this paper scale National Standard (CNS) A4 Specification (210X 297 mm) -57- 555822 A7 B7 V. Description of Invention (te Example 1 is also evaluated. The results are shown in Table 2. (Please read the precautions on the back before filling in this page) Example 9 Instead of using the polymer solution containing copolymer (a,-2) instead of the polymer containing copolymer (a,-1) in Example 8, Except for the polymer solution, the rest of the composition solution was prepared in the same manner as in Example 8 and evaluated the same. The results are shown in Table 2. Example 10 Except that the polymer solution containing the copolymer (a,-3) was used instead of the polymer solution in Example 8. Except for the polymer solution containing the copolymer (a,-1), the rest of the composition solution was prepared in the same manner as in Example 8 and evaluated similarly. The results are shown in Table 2. Example 1 1 Except using the copolymer (a,-4) ) Instead of the polymer solution containing the copolymer (a, -1) printed in Example 8 by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, the rest of the composition solution was prepared in the same manner as in Example 8 and evaluated similarly. The results are shown in Table 2. Example 1 2 In addition to using the component (b) in Example 11: 1, 1, 3 ~ tris (2,5-dimethyl-4-hydroxyphenyl-3-phenyl) propane (1.0 m ο 1) and 1,2-naphthoquinonediazide-5—sulfonic acid chloride (This paper size applies the Chinese National Standard (CNS) A4 specification (210 X297 mm) -58- 555822 A7 B7 V. Description of the invention (> 6 1 · 9mo 1) condensate (1,1,3-tris (2,5-dimethyl-1,4 once the base) -3 -benzyl propylene -1,2, naphthoquinonediazide ~ 5-Sulfonate) 30% by weight, the rest were prepared in the same manner as in Example 丨 丨 and evaluated the same. The results are shown in 袠 2. Table 2 Resolution Cross-sectional shape Heat resistance Solvent resistance Adhesiveness High shape Diameter (μm) (Mm) Example 8 Good A 1.5 12 -3.0 +4.5 100 Example 9 Good A 1.5 11 -3.1 +5.0 100 Example 10 Good A 1.8 10 -4.0 +5.0 100 Example 11 Good A 1.9 13 -3.0 +3.0 100 Example 12 Good A 1.7 11 -3.2 +3.5 100 Example 1 3 Evaluation of light diffusion characteristics The composition for forming a light diffusing reflective film prepared in Example 8 was used. According to (I) a step of forming a rough surface having a pattern and (VI) a step of forming a light-diffusing reflective film according to Example 1, the bottom surface of the pattern having a diameter of 1 / m and a height of 0.3 is a flat surface The convex lens-like pattern is formed on the glass substrate to form the most compact filling configuration. Then, according to the step (VI) of Example 1 for forming the light-diffusing reflective film, an aluminum film of 1, 5 〇 A is formed. The paper dimensions are in accordance with Chinese national standards (CNS ) A4 size (210X 297mm) (Please read the notes on the back before filling this page)

、1T 經濟部智慧財產局員工消費合作社印製 -59- 555822 A7 ___B7_ 五、發明説明（）57 ’得到光擴散反射膜。對於此處所得之光擴散反射膜使用 3次元變角光度計（（股）村上色彩技術硏究所製）測定 由一 1 0 °至7 0 °改變角度測定3 0 °入射時之散射特性 。結果如圖6所示。 實施例1 4 使用實施例9調製之光擴散反射膜形成用組成物，依 據實施例1之（I )具有圖案之粗糙面之形成步驟，及（ V I )光擴散反射膜之形成步驟，使圖案之下部直徑1 〇 /zm、高度〇 · 3 //m之底面爲平面之凸透鏡狀之圖案在 玻璃基板上形成最緊密充塡配置。然後依據實施例1之（ V I )光擴散反射膜之形成步驟形成1 ，5 Ο Ο A之鋁膜 ’得到光擴散反射膜。對於此處所得之光擴散反射膜使用 3次元變角光度計（（股）村上色彩技術硏究所製）測定 由一 1 0 °至7 0 °改變角度測定3 0 °入射時之散射特性 。結果如圖7所示。 【發明之效果】 依據本發明係提供用於光擴散反射膜用之具有粗糙面 ，且與基板之密著性、耐熱性、耐溶劑性、凹凸形狀之控 制性優異，可容易形成反射型或半透過型之液晶顯示元件 之光擴散反射膜用之膜的組成物。 此外，本發明係提供具有由上述組成物所形成之膜的 光散射功能優異之光擴散反射膜、及具有該光擴散反射膜 I紙張尺度適用中國國家標準（CNS ) A4規格（210X29?公釐) (請先閱讀背面之注意事項再填寫本頁) 衣.Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs of the 1T. -59- 555822 A7 ___B7_ V. Description of the invention () 57 ′ The light diffusion reflection film was obtained. The light-diffusion reflection film obtained here was measured using a three-dimensional variable-angle photometer (manufactured by Murakami Color Technology Co., Ltd.) to measure the scattering characteristics at 30 ° from a 10 ° to 70 ° angle change. The results are shown in Figure 6. Example 1 4 The composition for forming a light-diffusing reflective film prepared in Example 9 was used according to (I) the step of forming a patterned rough surface and the (VI) step of forming a light-diffusing reflective film in Example 1 to pattern The lower part has a diameter of 0 / zm and a height of 0.3 / m. The bottom surface is a flat convex lens-like pattern, which forms the most compact filling configuration on the glass substrate. Then, according to the (V I) light diffusion and reflection film forming step of Example 1, an aluminum film of 1,500 A is formed to obtain a light diffusion and reflection film. The light-diffusion reflection film obtained here was measured using a three-dimensional variable-angle photometer (manufactured by Murakami Color Technology Co., Ltd.) to measure the scattering characteristics at 30 ° from a 10 ° to 70 ° angle change. The results are shown in Figure 7. [Effects of the Invention] According to the present invention, there is provided a rough surface for a light-diffusing reflective film, and excellent adhesion to a substrate, heat resistance, solvent resistance, and controllability of uneven shapes, and can be easily formed into a reflective type or Composition of a film for a light-diffusive reflection film of a transflective liquid crystal display element. In addition, the present invention provides a light-diffusing reflective film having a light-scattering function with a film formed of the composition, and a paper with the light-diffusing reflective film I. Applicable to China National Standard (CNS) A4 specification (210X29? Mm) ) (Please read the precautions on the back before filling this page).

、1T 經濟部智慧財產局員工消費合作社印製 -60- 555822 A7 B7 五、發明説明（知 之液晶顯示元件 (請先閱讀背面之注意事項再填寫本頁) 衣.Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs of 1T -60- 555822 A7 B7 V. Description of the invention (Knowledge of liquid crystal display elements (please read the precautions on the back before filling this page).

、1T 經濟部智慧財產局員工消費合作社印製 本紙張尺度適用中國國家標準（CNS ) Α4規格（210Χ297公釐） -61 -、 1T Printed by the Consumer Cooperative of Intellectual Property Bureau of the Ministry of Economic Affairs This paper size applies to China National Standard (CNS) Α4 specification (210 × 297 mm) -61-

Claims (1)

555822 口 本 A8 B8 C8 D8 六、申請專利範圍 1 1 · 一種光擴散反射膜形成用組成物，其特徵係含有 (a )驗可洛性樹脂、（b ) 1 ，2 - @1二疊氮化合物及 (c )分子內具有2個以上之環氧基之化合物。 2 · —種光擴散反射膜形成用組成物，其特徵係含有 (a )鹼可溶性樹脂、（b ) 1，2 -醌二疊氮化合物、 (d )以下述式（1 ) Ri 、N555822 Mouthbook A8 B8 C8 D8 VI. Patent application scope 1 1 · A composition for forming a light diffusion reflective film, which is characterized by containing (a) a coulosic resin, (b) 1, 2-@ 1 diazide The compound and (c) a compound having two or more epoxy groups in the molecule. 2-A composition for forming a light-diffusing reflective film, characterized in that it contains (a) an alkali-soluble resin, (b) a 1,2-quinonediazide compound, and (d) the following formula (1) Ri, N (l) --------II (請先閲讀背面之注意事項再填寫本頁) 訂 經濟部智慧財產局員工消費合作社印製 〔式中R1〜R6可相同或不同，分別爲氫原子或 一 CHsOR基，R係表示氫原子或碳數1〜6之烷基〕表 示之化合物及 (e )以下述式（2 )(l) -------- II (Please read the notes on the back before filling this page) Order printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs [where R1 ~ R6 can be the same or different, respectively, hydrogen Atom or a CHsOR group, R is a compound represented by a hydrogen atom or an alkyl group having 1 to 6 carbon atoms] and (e) is represented by the following formula (2) (2) 〔式中X係表示鹵素，A係CX3或以下述式 本紙張纽適用巾關家標準（CNS )八4祕（210X297公釐） -62- 555822 A8 B8 C8 D8 六、申請專利範圍 2 (B)(2) [where X is halogen, A is CX3 or the following formula is applicable to the paper towel family standard (CNS), 8th secret (210X297 mm) -62- 555822 A8 B8 C8 D8 6. Application scope 2 (B) 或or (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製(Please read the notes on the back before filling out this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 表示之基，B、D及E係分別爲氫原子、碳數1〜1 〇之 院基 '芳基、烷氧基或硫烷基、碳數6〜1 2之芳基羥基 或硫芳基'鹵原子、氰基、硝基、碳數1〜1〇之烷基所 含有之二級胺基、羧基、羥基、碳數1〜1 0之氧代烷基 代芳基、碳數1〜2 0之烷氧基羰基或烷基羰基氧基 ’ 111爲1〜5之整數〕表示之化合物。 3 _ —種光擴散反射膜形成用組成物，其特徵係含有 (a )鹼可溶性樹脂、（b ) 1 ，2 -醌二疊氮化合物、 (d )以下述式（1 ) rI (1) 本紙張尺度適用中國國家標準（CMS ) A4規格（210 X 297公釐） -63 - 555822 A8 B8 C8 D8 六、申請專利範圍 3 (請先閲讀背面之注意事項再填寫本頁) 〔式中Ri〜R6可相同或不同，分別爲氫原子或 一 CHsOR基’ R係表示氫原子或碳數1〜6之烷基〕表 示之化合物，及（f )以下述式（3) (A ) n Z + Y - ( 3 ) 〔式中Α之定義係與上述式（2 )相同，Ζ係硫原子或碘 原子，Y係BF4、PF6、SbF6、AsF6、對甲苯磺 酸鈉、三氟甲烷磺酸鈉或三氟乙酸酯，^爲2或3〕表示 之化合物。 4 · 一種光擴散反射膜形成用組成物，其特徵係含有 (a ’ ）（ a 1 )不飽和羧酸及/或不飽和羧酸酐、（ a 2 )含有環氧基之不飽和化合物、及（a 3 )其他之烯 烴系不飽和化合物之共聚物，及（b) 1 ，2 -醌二疊氮 化合物。 5 · —種光擴散反射膜之形成方法，其特徵係 經濟部智慧財產局員工消費合作社印製 (1 )在基體之表面上塗佈申請專利範圍第1〜4項 中任一項之光擴散反射膜形成用組成物形成塗膜， (2 )將塗膜預烘烤， (3 )塗膜介於圖案光罩照射放射線， (4 )以鹼顯影液使具有圖案潛像之塗膜顯影，形成 圖案膜。 6 · —種光擴散反射膜’其特徵係具有由申請專利範 圍第1〜4項中任一項之光擴散反射膜形成用組成物所形 本紙張尺度適用中國國家標準（CNS ) A4規格（X 297公釐） 555822 A8 B8 C8 D8 六、申請專利範圍 4 成之圖案。 7 .如申請專利範圍第6項之光擴散反射膜，其中由 光擴散反射膜形成用組成物所形成之單位圖案之直徑爲1 〜3 0 // m 〇 8 · —種液晶顯示元件，其特徵係具有如申請專利範 圍第6項之光擴散反射膜。 (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 本紙張尺度適用中國國家標準（CNS ) A4規格（210 X 297公釐） -65-B, D and E are a hydrogen atom, a radical 'aryl, alkoxy or sulfanyl having 1 to 10 carbon atoms, an arylhydroxyl or thioaryl having 6 to 12 carbon atoms, respectively. 'Halogen atom, cyano, nitro, secondary amine group containing 1 to 10 carbon atoms, carboxyl group, hydroxyl group, oxo alkyl aryl group having 1 to 10 carbon atoms, 1 to 10 carbon atoms A compound represented by an alkoxycarbonyl group or an alkylcarbonyloxy group of '0 is an integer of 1 to 5]. 3 — — A composition for forming a light-diffusing reflective film, characterized in that it contains (a) an alkali-soluble resin, (b) 1,2-quinonediazide compound, and (d) represented by the following formula (1) rI (1) This paper size applies the Chinese National Standard (CMS) A4 specification (210 X 297 mm) -63-555822 A8 B8 C8 D8 VI. Application for patent scope 3 (Please read the precautions on the back before filling this page) [In the formula Ri ~ R6 may be the same or different, and are each a hydrogen atom or a CHsOR group; R is a compound represented by a hydrogen atom or an alkyl group having 1 to 6 carbon atoms; and (f) is represented by the following formula (3) (A) n Z + Y-(3) [wherein the definition of A is the same as the above formula (2), Z is a sulfur atom or iodine atom, Y is BF4, PF6, SbF6, AsF6, sodium p-toluenesulfonate, trifluoromethanesulfonic acid Sodium or trifluoroacetate, ^ is 2 or 3]. 4. A composition for forming a light-diffusing reflective film, comprising (a ') (a1) an unsaturated carboxylic acid and / or an unsaturated carboxylic acid anhydride, (a2) an unsaturated compound containing an epoxy group, and (A 3) copolymers of other olefinic unsaturated compounds, and (b) 1,2-quinonediazide compounds. 5 · A method for forming a light-diffusing reflective film, which is printed by the consumer cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs (1) The surface of the substrate is coated with light-diffusion in any one of the scope of patent applications 1 to 4 The composition for forming a reflective film forms a coating film, (2) pre-bake the coating film, (3) irradiate the coating film with a patterned photomask, and (4) develop the coating film having a latent image of the pattern with an alkali developing solution, Forming a pattern film. 6 · —A kind of light-diffusing reflective film 'characterized by having a composition for forming a light-diffusing reflective film according to any one of claims 1 to 4 in the scope of the patent application. The paper size is applicable to Chinese National Standard (CNS) A4 specifications ( X 297 mm) 555822 A8 B8 C8 D8 VI. Patterns with a patent scope of 40%. 7. The light-diffusion reflection film according to item 6 of the application, wherein the diameter of the unit pattern formed by the composition for forming a light-diffusion reflection film is 1 to 3 0 // m 〇8. A liquid crystal display element, The feature is a light-diffusing reflective film as described in item 6 of the scope of patent application. (Please read the notes on the back before filling out this page) Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs This paper applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) -65-
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