DE69307452D1 - Strahlungsempfindliche Harzzusammensetzung für die Herstellung von Mikrolinsen - Google Patents

Strahlungsempfindliche Harzzusammensetzung für die Herstellung von Mikrolinsen

Info

Publication number
DE69307452D1
DE69307452D1 DE69307452T DE69307452T DE69307452D1 DE 69307452 D1 DE69307452 D1 DE 69307452D1 DE 69307452 T DE69307452 T DE 69307452T DE 69307452 T DE69307452 T DE 69307452T DE 69307452 D1 DE69307452 D1 DE 69307452D1
Authority
DE
Germany
Prior art keywords
microlenses
manufacture
resin composition
sensitive resin
radiation sensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69307452T
Other languages
English (en)
Other versions
DE69307452T2 (de
Inventor
Tsutomu Shimokawa
Atsufumi Shimada
Masayuki Endo
Nobuo Bessho
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Synthetic Rubber Co Ltd filed Critical Japan Synthetic Rubber Co Ltd
Application granted granted Critical
Publication of DE69307452D1 publication Critical patent/DE69307452D1/de
Publication of DE69307452T2 publication Critical patent/DE69307452T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00—Compositions of unspecified macromolecular compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Epoxy Resins (AREA)
DE69307452T 1992-10-22 1993-10-22 Strahlungsempfindliche Harzzusammensetzung für die Herstellung von Mikrolinsen Expired - Lifetime DE69307452T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP04284585A JP3114166B2 (ja) 1992-10-22 1992-10-22 マイクロレンズ用感放射線性樹脂組成物

Publications (2)

Publication Number Publication Date
DE69307452D1 true DE69307452D1 (de) 1997-02-27
DE69307452T2 DE69307452T2 (de) 1997-05-28

Family

ID=17680366

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69307452T Expired - Lifetime DE69307452T2 (de) 1992-10-22 1993-10-22 Strahlungsempfindliche Harzzusammensetzung für die Herstellung von Mikrolinsen

Country Status (5)

Country Link
US (1) US5432039A (de)
EP (1) EP0594452B1 (de)
JP (1) JP3114166B2 (de)
KR (1) KR100286879B1 (de)
DE (1) DE69307452T2 (de)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6190833B1 (en) * 1997-03-30 2001-02-20 Jsr Corporation Radiation-sensitive resin composition
JP3650985B2 (ja) * 1997-05-22 2005-05-25 Ｊｓｒ株式会社 ネガ型感放射線性樹脂組成物およびパターン製造法
US5858615A (en) * 1997-07-31 1999-01-12 Morton International, Inc. Hardenable photoimageable compositions
US6168898B1 (en) * 1998-02-17 2001-01-02 Isola Laminate Systems Corp. Positive acting photodielectric composition
JP3796982B2 (ja) * 1998-06-02 2006-07-12 住友化学株式会社 ポジ型レジスト組成物
JP3952484B2 (ja) * 1998-08-20 2007-08-01 Ｊｓｒ株式会社 表示パネルスペーサー用感放射線性樹脂組成物
US6617011B2 (en) * 1999-05-07 2003-09-09 Seagate Technology Llc Elastomeric lubricants for magnetic recording media
JP3931484B2 (ja) 1999-06-03 2007-06-13 住友化学株式会社 ポジ型フォトレジスト組成物
JP4678453B2 (ja) * 2000-05-31 2011-04-27 Ｄｉｃ株式会社 多価ヒドロキシ化合物とその製造方法、エポキシ樹脂組成物及びその硬化物
JP4678455B2 (ja) * 2000-06-29 2011-04-27 Ｄｉｃ株式会社 多価ヒドロキシ化合物とその製造方法、エポキシ樹脂組成物及びその硬化物
TWI297104B (de) * 2000-07-27 2008-05-21 Jsr Corp
JP4042142B2 (ja) 2000-09-08 2008-02-06 Ｊｓｒ株式会社 Ｅｌ表示素子の隔壁形成用感放射線性樹脂組成物、隔壁およびｅｌ表示素子
TW555822B (en) * 2001-03-15 2003-10-01 Jsr Corp Light diffuse reflecting film-forming composition, manufacturing method thereof, light diffuse reflecting film and liquid crystal display element
JP3901997B2 (ja) * 2001-11-27 2007-04-04 富士通株式会社 レジスト材料、レジストパターン及びその製造方法、並びに、半導体装置及びその製造方法
JP3772733B2 (ja) * 2001-11-28 2006-05-10 Ｊｓｒ株式会社 感放射線性樹脂組成物、それから形成された垂直配向型液晶表示素子の突起、およびそれを具備する液晶表示素子
US7022455B2 (en) * 2001-12-28 2006-04-04 Shipley Company, L.L.C. Photoacid-labile polymers and photoresists comprising same
EP1469346B1 (de) * 2002-01-23 2015-08-05 JSR Corporation Positive lichtempfindliche isolierende harzzusammensetzung und daraus erhaltenes ausgehärtetes objekt
EP1471540A4 (de) * 2002-01-28 2009-09-23 Jsr Corp Zusammensetzung zur bildung eines lichtempfindlichen dielektrischen materials, transferfilm, dielektrisches material und elektronische teile damit
KR100940469B1 (ko) 2002-04-18 2010-02-04 닛산 가가쿠 고교 가부시키 가이샤 포지티브형 감광성 수지 조성물 및 패턴형성방법
KR20040092550A (ko) * 2003-04-24 2004-11-04 클라리언트 인터내셔널 리미티드 레지스트 조성물 및 레지스트 제거용 유기용제
JP4127150B2 (ja) * 2003-07-31 2008-07-30 Ｊｓｒ株式会社 感放射線性樹脂組成物、層間絶縁膜およびマイクロレンズ、ならびにそれらの製造方法
JP2005179650A (ja) * 2003-11-28 2005-07-07 Sumitomo Chemical Co Ltd 硬化性樹脂組成物および該組成物を用いて形成される保護膜
JP4322205B2 (ja) * 2004-12-27 2009-08-26 東京応化工業株式会社 レジスト保護膜形成用材料およびこれを用いたレジストパターン形成方法
JP2006251464A (ja) * 2005-03-11 2006-09-21 Tokyo Ohka Kogyo Co Ltd レンズ形成用感光性樹脂組成物
JP4806988B2 (ja) * 2005-07-26 2011-11-02 Ｊｎｃ株式会社 ワニス組成物
JP5617275B2 (ja) * 2009-02-26 2014-11-05 日本ゼオン株式会社 感放射線性樹脂組成物、樹脂膜、積層体及び電子部品
JP5676179B2 (ja) 2010-08-20 2015-02-25 富士フイルム株式会社 ポジ型感光性樹脂組成物、硬化膜の形成方法、硬化膜、有機ｅｌ表示装置、及び、液晶表示装置
EP2658921B1 (de) * 2010-12-29 2016-04-06 3M Innovative Properties Company Haftkleber mit triazinepoxidvernetzungssystem
KR102059430B1 (ko) * 2011-08-09 2019-12-26 제이에스알 가부시끼가이샤 마이크로렌즈 어레이 및 입체 화상 표시 장치
DE102014208510A1 (de) 2014-05-07 2015-11-12 Bayerische Motoren Werke Aktiengesellschaft Sensorring
JP7450333B2 (ja) 2018-12-21 2024-03-15 Jsr株式会社 感放射線性樹脂組成物、及びマイクロレンズの形成方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3325022A1 (de) * 1983-07-11 1985-01-24 Hoechst Ag, 6230 Frankfurt Verfahren zur herstellung negativer kopien mittels eines materials auf basis von 1,2-chinondiaziden
CA2019693A1 (en) * 1989-07-07 1991-01-07 Karen Ann Graziano Acid-hardening photoresists of improved sensitivity
JPH03152543A (ja) * 1989-10-23 1991-06-28 Internatl Business Mach Corp <Ibm> 塩基で現像可能なネガ階調ホトレジスト
JP3092158B2 (ja) * 1989-12-01 2000-09-25 東ソー株式会社 レンズ形成用ポジ型感光材料
DE69033938T2 (de) * 1989-12-01 2002-07-18 Tosoh Corp., Shinnanyo Positiv arbeitende lichtempfindliche Zusammensetzungen zur Herstellung von Linsen
JP2583651B2 (ja) * 1990-09-28 1997-02-19 東京応化工業株式会社 ネガ型感放射線レジスト組成物
JP3003808B2 (ja) * 1991-03-14 2000-01-31 東京応化工業株式会社 マイクロレンズ及びその製造方法
US5362597A (en) * 1991-05-30 1994-11-08 Japan Synthetic Rubber Co., Ltd. Radiation-sensitive resin composition comprising an epoxy-containing alkali-soluble resin and a naphthoquinone diazide sulfonic acid ester

Also Published As

Publication number Publication date
DE69307452T2 (de) 1997-05-28
KR940009260A (ko) 1994-05-20
JPH06136239A (ja) 1994-05-17
KR100286879B1 (ko) 2001-05-02
EP0594452B1 (de) 1997-01-15
EP0594452A3 (en) 1994-06-01
EP0594452A2 (de) 1994-04-27
JP3114166B2 (ja) 2000-12-04
US5432039A (en) 1995-07-11

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