DE69307452D1 - Strahlungsempfindliche Harzzusammensetzung für die Herstellung von Mikrolinsen - Google Patents
Strahlungsempfindliche Harzzusammensetzung für die Herstellung von MikrolinsenInfo
- Publication number
- DE69307452D1 DE69307452D1 DE69307452T DE69307452T DE69307452D1 DE 69307452 D1 DE69307452 D1 DE 69307452D1 DE 69307452 T DE69307452 T DE 69307452T DE 69307452 T DE69307452 T DE 69307452T DE 69307452 D1 DE69307452 D1 DE 69307452D1
- Authority
- DE
- Germany
- Prior art keywords
- microlenses
- manufacture
- resin composition
- sensitive resin
- radiation sensitive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 230000005855 radiation Effects 0.000 title 1
- 239000011342 resin composition Substances 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L101/00—Compositions of unspecified macromolecular compounds
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Materials For Photolithography (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP04284585A JP3114166B2 (ja) | 1992-10-22 | 1992-10-22 | マイクロレンズ用感放射線性樹脂組成物 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69307452D1 true DE69307452D1 (de) | 1997-02-27 |
DE69307452T2 DE69307452T2 (de) | 1997-05-28 |
Family
ID=17680366
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69307452T Expired - Lifetime DE69307452T2 (de) | 1992-10-22 | 1993-10-22 | Strahlungsempfindliche Harzzusammensetzung für die Herstellung von Mikrolinsen |
Country Status (5)
Country | Link |
---|---|
US (1) | US5432039A (de) |
EP (1) | EP0594452B1 (de) |
JP (1) | JP3114166B2 (de) |
KR (1) | KR100286879B1 (de) |
DE (1) | DE69307452T2 (de) |
Families Citing this family (31)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6190833B1 (en) * | 1997-03-30 | 2001-02-20 | Jsr Corporation | Radiation-sensitive resin composition |
JP3650985B2 (ja) * | 1997-05-22 | 2005-05-25 | Jsr株式会社 | ネガ型感放射線性樹脂組成物およびパターン製造法 |
US5858615A (en) * | 1997-07-31 | 1999-01-12 | Morton International, Inc. | Hardenable photoimageable compositions |
US6168898B1 (en) * | 1998-02-17 | 2001-01-02 | Isola Laminate Systems Corp. | Positive acting photodielectric composition |
JP3796982B2 (ja) * | 1998-06-02 | 2006-07-12 | 住友化学株式会社 | ポジ型レジスト組成物 |
JP3952484B2 (ja) * | 1998-08-20 | 2007-08-01 | Jsr株式会社 | 表示パネルスペーサー用感放射線性樹脂組成物 |
US6617011B2 (en) * | 1999-05-07 | 2003-09-09 | Seagate Technology Llc | Elastomeric lubricants for magnetic recording media |
JP3931484B2 (ja) | 1999-06-03 | 2007-06-13 | 住友化学株式会社 | ポジ型フォトレジスト組成物 |
JP4678453B2 (ja) * | 2000-05-31 | 2011-04-27 | Dic株式会社 | 多価ヒドロキシ化合物とその製造方法、エポキシ樹脂組成物及びその硬化物 |
JP4678455B2 (ja) * | 2000-06-29 | 2011-04-27 | Dic株式会社 | 多価ヒドロキシ化合物とその製造方法、エポキシ樹脂組成物及びその硬化物 |
TWI297104B (de) * | 2000-07-27 | 2008-05-21 | Jsr Corp | |
JP4042142B2 (ja) | 2000-09-08 | 2008-02-06 | Jsr株式会社 | El表示素子の隔壁形成用感放射線性樹脂組成物、隔壁およびel表示素子 |
TW555822B (en) * | 2001-03-15 | 2003-10-01 | Jsr Corp | Light diffuse reflecting film-forming composition, manufacturing method thereof, light diffuse reflecting film and liquid crystal display element |
JP3901997B2 (ja) * | 2001-11-27 | 2007-04-04 | 富士通株式会社 | レジスト材料、レジストパターン及びその製造方法、並びに、半導体装置及びその製造方法 |
JP3772733B2 (ja) * | 2001-11-28 | 2006-05-10 | Jsr株式会社 | 感放射線性樹脂組成物、それから形成された垂直配向型液晶表示素子の突起、およびそれを具備する液晶表示素子 |
US7022455B2 (en) * | 2001-12-28 | 2006-04-04 | Shipley Company, L.L.C. | Photoacid-labile polymers and photoresists comprising same |
EP1469346B1 (de) * | 2002-01-23 | 2015-08-05 | JSR Corporation | Positive lichtempfindliche isolierende harzzusammensetzung und daraus erhaltenes ausgehärtetes objekt |
EP1471540A4 (de) * | 2002-01-28 | 2009-09-23 | Jsr Corp | Zusammensetzung zur bildung eines lichtempfindlichen dielektrischen materials, transferfilm, dielektrisches material und elektronische teile damit |
KR100940469B1 (ko) | 2002-04-18 | 2010-02-04 | 닛산 가가쿠 고교 가부시키 가이샤 | 포지티브형 감광성 수지 조성물 및 패턴형성방법 |
KR20040092550A (ko) * | 2003-04-24 | 2004-11-04 | 클라리언트 인터내셔널 리미티드 | 레지스트 조성물 및 레지스트 제거용 유기용제 |
JP4127150B2 (ja) * | 2003-07-31 | 2008-07-30 | Jsr株式会社 | 感放射線性樹脂組成物、層間絶縁膜およびマイクロレンズ、ならびにそれらの製造方法 |
JP2005179650A (ja) * | 2003-11-28 | 2005-07-07 | Sumitomo Chemical Co Ltd | 硬化性樹脂組成物および該組成物を用いて形成される保護膜 |
JP4322205B2 (ja) * | 2004-12-27 | 2009-08-26 | 東京応化工業株式会社 | レジスト保護膜形成用材料およびこれを用いたレジストパターン形成方法 |
JP2006251464A (ja) * | 2005-03-11 | 2006-09-21 | Tokyo Ohka Kogyo Co Ltd | レンズ形成用感光性樹脂組成物 |
JP4806988B2 (ja) * | 2005-07-26 | 2011-11-02 | Jnc株式会社 | ワニス組成物 |
JP5617275B2 (ja) * | 2009-02-26 | 2014-11-05 | 日本ゼオン株式会社 | 感放射線性樹脂組成物、樹脂膜、積層体及び電子部品 |
JP5676179B2 (ja) | 2010-08-20 | 2015-02-25 | 富士フイルム株式会社 | ポジ型感光性樹脂組成物、硬化膜の形成方法、硬化膜、有機el表示装置、及び、液晶表示装置 |
EP2658921B1 (de) * | 2010-12-29 | 2016-04-06 | 3M Innovative Properties Company | Haftkleber mit triazinepoxidvernetzungssystem |
KR102059430B1 (ko) * | 2011-08-09 | 2019-12-26 | 제이에스알 가부시끼가이샤 | 마이크로렌즈 어레이 및 입체 화상 표시 장치 |
DE102014208510A1 (de) | 2014-05-07 | 2015-11-12 | Bayerische Motoren Werke Aktiengesellschaft | Sensorring |
JP7450333B2 (ja) | 2018-12-21 | 2024-03-15 | Jsr株式会社 | 感放射線性樹脂組成物、及びマイクロレンズの形成方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3325022A1 (de) * | 1983-07-11 | 1985-01-24 | Hoechst Ag, 6230 Frankfurt | Verfahren zur herstellung negativer kopien mittels eines materials auf basis von 1,2-chinondiaziden |
CA2019693A1 (en) * | 1989-07-07 | 1991-01-07 | Karen Ann Graziano | Acid-hardening photoresists of improved sensitivity |
JPH03152543A (ja) * | 1989-10-23 | 1991-06-28 | Internatl Business Mach Corp <Ibm> | 塩基で現像可能なネガ階調ホトレジスト |
JP3092158B2 (ja) * | 1989-12-01 | 2000-09-25 | 東ソー株式会社 | レンズ形成用ポジ型感光材料 |
DE69033938T2 (de) * | 1989-12-01 | 2002-07-18 | Tosoh Corp., Shinnanyo | Positiv arbeitende lichtempfindliche Zusammensetzungen zur Herstellung von Linsen |
JP2583651B2 (ja) * | 1990-09-28 | 1997-02-19 | 東京応化工業株式会社 | ネガ型感放射線レジスト組成物 |
JP3003808B2 (ja) * | 1991-03-14 | 2000-01-31 | 東京応化工業株式会社 | マイクロレンズ及びその製造方法 |
US5362597A (en) * | 1991-05-30 | 1994-11-08 | Japan Synthetic Rubber Co., Ltd. | Radiation-sensitive resin composition comprising an epoxy-containing alkali-soluble resin and a naphthoquinone diazide sulfonic acid ester |
-
1992
- 1992-10-22 JP JP04284585A patent/JP3114166B2/ja not_active Expired - Lifetime
-
1993
- 1993-10-21 KR KR1019930021909A patent/KR100286879B1/ko not_active IP Right Cessation
- 1993-10-22 EP EP93308429A patent/EP0594452B1/de not_active Expired - Lifetime
- 1993-10-22 US US08/139,825 patent/US5432039A/en not_active Expired - Lifetime
- 1993-10-22 DE DE69307452T patent/DE69307452T2/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE69307452T2 (de) | 1997-05-28 |
KR940009260A (ko) | 1994-05-20 |
JPH06136239A (ja) | 1994-05-17 |
KR100286879B1 (ko) | 2001-05-02 |
EP0594452B1 (de) | 1997-01-15 |
EP0594452A3 (en) | 1994-06-01 |
EP0594452A2 (de) | 1994-04-27 |
JP3114166B2 (ja) | 2000-12-04 |
US5432039A (en) | 1995-07-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |