KR900006818A - 감방사선성 수지 조성물 - Google Patents

감방사선성 수지 조성물

Info

Publication number
KR900006818A
KR900006818A KR1019890014917A KR890014917A KR900006818A KR 900006818 A KR900006818 A KR 900006818A KR 1019890014917 A KR1019890014917 A KR 1019890014917A KR 890014917 A KR890014917 A KR 890014917A KR 900006818 A KR900006818 A KR 900006818A
Authority
KR
South Korea
Prior art keywords
radiation
resin composition
sensitive resin
sensitive
composition
Prior art date
Application number
KR1019890014917A
Other languages
English (en)
Other versions
KR0126914B1 (ko
Inventor
사또시 미야시따
아끼히로 야마노우찌
이꾸오 노즈에
다까오 미우라
Original Assignee
니혼 고오세이 고무 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 니혼 고오세이 고무 가부시끼가이샤 filed Critical 니혼 고오세이 고무 가부시끼가이샤
Publication of KR900006818A publication Critical patent/KR900006818A/ko
Application granted granted Critical
Publication of KR0126914B1 publication Critical patent/KR0126914B1/ko

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
KR1019890014917A 1988-10-18 1989-10-17 감방사선성 수지 조성물 KR0126914B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP63262084A JP2623778B2 (ja) 1988-10-18 1988-10-18 感放射線性樹脂組成物
JP63-262084 1988-10-18

Publications (2)

Publication Number Publication Date
KR900006818A true KR900006818A (ko) 1990-05-08
KR0126914B1 KR0126914B1 (ko) 1997-12-26

Family

ID=17370806

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019890014917A KR0126914B1 (ko) 1988-10-18 1989-10-17 감방사선성 수지 조성물

Country Status (4)

Country Link
EP (1) EP0365318B1 (ko)
JP (1) JP2623778B2 (ko)
KR (1) KR0126914B1 (ko)
DE (1) DE68913898T2 (ko)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2645587B2 (ja) * 1989-03-29 1997-08-25 富士写真フイルム株式会社 微細パターン形成材料及び微細パターン形成方法
CA2023791A1 (en) * 1989-08-24 1991-02-25 Ayako Ida Radiation-sensitive positive resist composition
DE4003025A1 (de) * 1990-02-02 1991-08-08 Hoechst Ag Strahlungsempfindliches gemisch, hiermit hergestelltes strahlungsempfindliches aufzeichnungsmaterial und verfahren zur herstellung von reliefaufzeichnungen
DE69129955T2 (de) * 1990-05-02 1998-12-24 Mitsubishi Chem Corp Photolackzusammensetzung
US5413896A (en) * 1991-01-24 1995-05-09 Japan Synthetic Rubber Co., Ltd. I-ray sensitive positive resist composition
US5371169A (en) * 1992-09-28 1994-12-06 Hoechst Celanese Corporation Novolak resin mixtures
EP0662222B1 (en) * 1992-09-28 1997-01-22 Hoechst Celanese Corporation Positive-working photoresist composition
KR100305333B1 (ko) * 1993-10-28 2001-11-22 마티네즈 길러모 감광성수지조성물및이를사용한패턴의형성방법
JP3434340B2 (ja) * 1994-03-29 2003-08-04 東京応化工業株式会社 高感度ポジ型ホトレジスト組成物
JPH0990622A (ja) * 1995-09-22 1997-04-04 Fuji Photo Film Co Ltd ポジ型フォトレジスト組成物
KR101253351B1 (ko) * 2005-01-28 2013-04-11 스미토모 베이클라이트 가부시키가이샤 노볼락형 페놀 수지의 제조방법, 노볼락형 페놀 수지 및포토레지스트용 페놀 수지 조성물

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0648381B2 (ja) * 1984-01-26 1994-06-22 三菱化成株式会社 ポジ型フオトレジスト組成物
JPS60164740A (ja) * 1984-02-06 1985-08-27 Japan Synthetic Rubber Co Ltd ポジ型感光性樹脂組成物
JPS60176034A (ja) * 1984-02-23 1985-09-10 Japan Synthetic Rubber Co Ltd ポジ型感光性樹脂組成物
JPS6035347A (ja) * 1984-06-07 1985-02-23 Toppan Printing Co Ltd ピツクアツプ
JPS61205933A (ja) * 1985-03-08 1986-09-12 Konishiroku Photo Ind Co Ltd 感光性平版印刷版
JPH0654384B2 (ja) * 1985-08-09 1994-07-20 東京応化工業株式会社 ポジ型ホトレジスト組成物
EP0227487B1 (en) * 1985-12-27 1992-07-15 Japan Synthetic Rubber Co., Ltd. Positive type radiation-sensitive resin composition
JPH0654386B2 (ja) * 1986-03-28 1994-07-20 日本合成ゴム株式会社 ポジ型感放射線性樹脂組成物
DE3751743T2 (de) * 1986-03-28 1996-11-14 Japan Synthetic Rubber Co Ltd Positiv arbeitende photoempfindliche Kunststoffzusammensetzung
JPS62229138A (ja) * 1986-03-29 1987-10-07 Nippon Zeon Co Ltd ポジ型フオトレジスト組成物
JP2555620B2 (ja) * 1987-08-21 1996-11-20 日本合成ゴム株式会社 感放射線性樹脂組成物

Also Published As

Publication number Publication date
DE68913898T2 (de) 1994-09-01
EP0365318A2 (en) 1990-04-25
DE68913898D1 (de) 1994-04-21
EP0365318B1 (en) 1994-03-16
JPH02108054A (ja) 1990-04-19
JP2623778B2 (ja) 1997-06-25
KR0126914B1 (ko) 1997-12-26
EP0365318A3 (en) 1990-11-14

Similar Documents

Publication Publication Date Title
DE68928328D1 (de) Harzzusammensetzung
BR8905204A (pt) Composicao colutoria
DE69034033T2 (de) Thermoplastische Harzzusammensetzung
DE68911242D1 (de) Kristalline Harzzusammensetzung.
KR900009865A (ko) 폴리카보네이트계 수지조성물
DE68920092D1 (de) Harzzusammensetzung.
BR8704567A (pt) Composicao de resina termofixavel
MX163730B (es) Composicion adhesiva mejorada
BR8906787A (pt) Composicao
DE68919151D1 (de) Harzzusammensetzung.
KR900007942A (ko) 폴리프로필렌 수지조성물
DE69030484D1 (de) Fotoempfindliche Harzzusammensetzung
DE68911340D1 (de) Harzzusammensetzung.
BR8901491A (pt) Composicao de resina de policarbonato
KR900006817A (ko) 레지스트 조성물
DE68918544D1 (de) Harzzusammensetzung.
DE68924798D1 (de) Harzzusammensetzung.
KR900006818A (ko) 감방사선성 수지 조성물
KR900011853A (ko) 수지 조성물
DE68911597D1 (de) Harzzusammensetzung.
KR900007946A (ko) 경화성수지조성물
BR8902491A (pt) Composicao
TR26099A (tr) Islah edilmis pestisid terkip
DE58908253D1 (de) Harzzusammensetzungen.
DE68912707D1 (de) Photopolymerisierbare Harzzusammensetzung.

Legal Events

Date Code Title Description
A201 Request for examination
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
G170 Publication of correction
FPAY Annual fee payment

Payment date: 20110920

Year of fee payment: 15

EXPY Expiration of term