DE69326598D1 - Lichtempfindliche harzzusammensetzung - Google Patents
Lichtempfindliche harzzusammensetzungInfo
- Publication number
- DE69326598D1 DE69326598D1 DE69326598T DE69326598T DE69326598D1 DE 69326598 D1 DE69326598 D1 DE 69326598D1 DE 69326598 T DE69326598 T DE 69326598T DE 69326598 T DE69326598 T DE 69326598T DE 69326598 D1 DE69326598 D1 DE 69326598D1
- Authority
- DE
- Germany
- Prior art keywords
- resin composition
- light sensitive
- sensitive resin
- light
- composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
- C08G18/81—Unsaturated isocyanates or isothiocyanates
- C08G18/8141—Unsaturated isocyanates or isothiocyanates masked
- C08G18/815—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen
- C08G18/8158—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen with unsaturated compounds having only one group containing active hydrogen
- C08G18/8175—Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen with unsaturated compounds having only one group containing active hydrogen with esters of acrylic or alkylacrylic acid having only one group containing active hydrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
- C08G18/72—Polyisocyanates or polyisothiocyanates
- C08G18/77—Polyisocyanates or polyisothiocyanates having heteroatoms in addition to the isocyanate or isothiocyanate nitrogen and oxygen or sulfur
- C08G18/78—Nitrogen
- C08G18/79—Nitrogen characterised by the polyisocyanates used, these having groups formed by oligomerisation of isocyanates or isothiocyanates
- C08G18/791—Nitrogen characterised by the polyisocyanates used, these having groups formed by oligomerisation of isocyanates or isothiocyanates containing isocyanurate groups
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
- H05K3/4673—Application methods or materials of intermediate insulating layers not specially adapted to any one of the previous methods of adding a circuit layer
- H05K3/4676—Single layer compositions
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/107—Polyamide or polyurethane
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Polymerisation Methods In General (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19015592A JP3211108B2 (ja) | 1992-06-25 | 1992-06-25 | 感光性樹脂組成物 |
PCT/JP1993/000853 WO1994000800A1 (en) | 1992-06-25 | 1993-06-24 | Photosensitive resin composition |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69326598D1 true DE69326598D1 (de) | 1999-11-04 |
DE69326598T2 DE69326598T2 (de) | 2000-02-03 |
Family
ID=16253341
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69326598T Expired - Fee Related DE69326598T2 (de) | 1992-06-25 | 1993-06-24 | Lichtempfindliche harzzusammensetzung |
Country Status (7)
Country | Link |
---|---|
US (1) | US5589319A (de) |
EP (1) | EP0601203B1 (de) |
JP (1) | JP3211108B2 (de) |
KR (1) | KR100291376B1 (de) |
DE (1) | DE69326598T2 (de) |
SG (1) | SG46999A1 (de) |
WO (1) | WO1994000800A1 (de) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0867754A (ja) * | 1994-06-24 | 1996-03-12 | Toray Ind Inc | 硬化性組成物 |
TW424172B (en) | 1995-04-19 | 2001-03-01 | Hitachi Chemical Co Ltd | Photosensitive resin composition and photosensitive element using the same |
US5925498A (en) * | 1997-06-16 | 1999-07-20 | Kodak Polychrome Graphics Llc | Photosensitive polymer composition and element containing photosensitive polyamide and mixture of acrylates |
JPH1152572A (ja) * | 1997-08-08 | 1999-02-26 | Fujitsu Ltd | 感光性樹脂組成物及びそれを用いたパターン形成方法 |
US6515355B1 (en) * | 1998-09-02 | 2003-02-04 | Micron Technology, Inc. | Passivation layer for packaged integrated circuits |
US6242935B1 (en) | 1999-01-21 | 2001-06-05 | Micron Technology, Inc. | Interconnect for testing semiconductor components and method of fabrication |
US6242932B1 (en) | 1999-02-19 | 2001-06-05 | Micron Technology, Inc. | Interposer for semiconductor components having contact balls |
US6819127B1 (en) | 1999-02-19 | 2004-11-16 | Micron Technology, Inc. | Method for testing semiconductor components using interposer |
JP4770011B2 (ja) * | 1999-09-28 | 2011-09-07 | 住友ベークライト株式会社 | 絶縁材用樹脂組成物及びこれを用いた絶縁材 |
JP4590690B2 (ja) * | 2000-06-22 | 2010-12-01 | 住友ベークライト株式会社 | 絶縁材用樹脂組成物及びこれを用いた絶縁材 |
JP4981215B2 (ja) * | 2001-03-19 | 2012-07-18 | 株式会社カネカ | 感光性樹脂組成物およびそれを用いた感光性ドライフィルムレジスト |
US6784275B2 (en) | 2001-06-28 | 2004-08-31 | Dainippon Ink And Chemicals, Inc. | Active energy ray-curable polyimide resin composition |
CN1324402C (zh) | 2001-10-30 | 2007-07-04 | 钟渊化学工业株式会社 | 感光性树脂组合物、使用该组合物的感光性薄膜及层压体 |
JP4222120B2 (ja) * | 2002-10-07 | 2009-02-12 | Jsr株式会社 | 光導波路形成用感光性樹脂組成物および光導波路 |
JP4372065B2 (ja) * | 2004-09-09 | 2009-11-25 | 信越化学工業株式会社 | 無溶剤型ポリイミドシリコーン樹脂組成物及びその硬化樹脂皮膜 |
US7604836B2 (en) | 2006-12-13 | 2009-10-20 | Hitachi Global Storage Technologies Netherlands B.V. | Release layer and resist material for master tool and stamper tool |
CN105503755B (zh) * | 2016-01-10 | 2018-10-30 | 江苏博砚电子科技有限公司 | 一种彩色光阻用赛克基丙烯酸酯树脂及其制备方法 |
WO2018154688A1 (ja) * | 2017-02-23 | 2018-08-30 | 日立化成デュポンマイクロシステムズ株式会社 | 樹脂組成物、硬化物、パターン硬化物、硬化物の製造方法、層間絶縁膜、表面保護膜及び電子部品 |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5952822B2 (ja) * | 1978-04-14 | 1984-12-21 | 東レ株式会社 | 耐熱性感光材料 |
JPS5541422A (en) * | 1978-09-18 | 1980-03-24 | Fujitsu Ltd | Encipherment treatment system |
JPS5545746A (en) * | 1978-09-29 | 1980-03-31 | Hitachi Ltd | Reactive polymer composition |
JPS58120636A (ja) * | 1982-01-04 | 1983-07-18 | イ−・アイ・デユポン・ド・ネモア−ス・アンド・コンパニ− | 放射感受性ポリイミド前駆体組成物およびその製造方法 |
US4416973A (en) * | 1982-01-04 | 1983-11-22 | E. I. Du Pont De Nemours & Co. | Radiation-sensitive polyimide precursor composition derived from a diaryl fluoro compound |
US4430418A (en) * | 1982-09-30 | 1984-02-07 | E. I. Du Pont De Nemours And Company | Radiation-sensitive polyimide precursor composition derived from a diaryl fluoronated diamine compound |
JPS5915449A (ja) * | 1982-07-16 | 1984-01-26 | Nitto Electric Ind Co Ltd | 感光性樹脂組成物 |
JPS606729A (ja) * | 1983-06-24 | 1985-01-14 | Ube Ind Ltd | 有機溶媒に可溶性の感光性ポリイミド |
US4515887A (en) * | 1983-08-29 | 1985-05-07 | General Electric Company | Photopatternable dielectric compositions, method for making and use |
US4692272A (en) * | 1984-10-15 | 1987-09-08 | Stauffer Chemical Company | Thermally stable adhesive comprising soluble polyimide resin and epoxy resin |
US4604230A (en) * | 1984-10-15 | 1986-08-05 | Stauffer Chemical Company | Thermally stable adhesive |
JPS63226639A (ja) * | 1986-10-08 | 1988-09-21 | Hitachi Chem Co Ltd | 感光性樹脂組成物 |
JPS63183439A (ja) * | 1987-01-26 | 1988-07-28 | Hitachi Chem Co Ltd | 画像の製造方法 |
JPS63206740A (ja) * | 1987-02-24 | 1988-08-26 | Mitsubishi Gas Chem Co Inc | 感光性重合体組成物 |
US4927431A (en) * | 1988-09-08 | 1990-05-22 | Minnesota Mining And Manufacturing Company | Binder for coated abrasives |
JPH02144539A (ja) * | 1988-11-28 | 1990-06-04 | Sumitomo Bakelite Co Ltd | 感光性樹脂組成物 |
JPH02154260A (ja) * | 1988-12-07 | 1990-06-13 | Hitachi Chem Co Ltd | 感光性樹脂組成物およびこれを用いた感光性エレメント |
JPH0391752A (ja) * | 1989-09-04 | 1991-04-17 | Sumitomo Bakelite Co Ltd | 感光性樹脂組成物 |
JPH03160058A (ja) * | 1989-11-17 | 1991-07-10 | Mitsubishi Rayon Co Ltd | 架橋硬化型樹脂組成物 |
JP2980359B2 (ja) * | 1990-04-16 | 1999-11-22 | 富士通株式会社 | 感光性耐熱樹脂組成物とそれを用いたパターン形成方法 |
US5236472A (en) * | 1991-02-22 | 1993-08-17 | Minnesota Mining And Manufacturing Company | Abrasive product having a binder comprising an aminoplast binder |
JP2890213B2 (ja) * | 1991-02-25 | 1999-05-10 | チッソ株式会社 | 感光性重合体組成物及びパターンの形成方法 |
-
1992
- 1992-06-25 JP JP19015592A patent/JP3211108B2/ja not_active Expired - Fee Related
-
1993
- 1993-06-24 US US08/196,125 patent/US5589319A/en not_active Expired - Fee Related
- 1993-06-24 EP EP93913571A patent/EP0601203B1/de not_active Expired - Lifetime
- 1993-06-24 SG SG1996001425A patent/SG46999A1/en unknown
- 1993-06-24 WO PCT/JP1993/000853 patent/WO1994000800A1/ja active IP Right Grant
- 1993-06-24 DE DE69326598T patent/DE69326598T2/de not_active Expired - Fee Related
- 1993-06-24 KR KR1019940700581A patent/KR100291376B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
EP0601203A4 (de) | 1995-06-07 |
EP0601203B1 (de) | 1999-09-29 |
WO1994000800A1 (en) | 1994-01-06 |
US5589319A (en) | 1996-12-31 |
DE69326598T2 (de) | 2000-02-03 |
JPH0611830A (ja) | 1994-01-21 |
JP3211108B2 (ja) | 2001-09-25 |
EP0601203A1 (de) | 1994-06-15 |
KR100291376B1 (ko) | 2001-09-17 |
SG46999A1 (en) | 1998-03-20 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |