DE69230237T2 - Licht empfindliche Zusammensetzung - Google Patents

Licht empfindliche Zusammensetzung

Info

Publication number
DE69230237T2
DE69230237T2 DE69230237T DE69230237T DE69230237T2 DE 69230237 T2 DE69230237 T2 DE 69230237T2 DE 69230237 T DE69230237 T DE 69230237T DE 69230237 T DE69230237 T DE 69230237T DE 69230237 T2 DE69230237 T2 DE 69230237T2
Authority
DE
Germany
Prior art keywords
light sensitive
sensitive composition
composition
light
sensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69230237T
Other languages
English (en)
Other versions
DE69230237D1 (de
Inventor
Shigeki Shimizu
Youichiro Tsuji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chemical Corp filed Critical Mitsubishi Chemical Corp
Publication of DE69230237D1 publication Critical patent/DE69230237D1/de
Application granted granted Critical
Publication of DE69230237T2 publication Critical patent/DE69230237T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/107—Polyamide or polyurethane
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
DE69230237T 1991-07-04 1992-07-03 Licht empfindliche Zusammensetzung Expired - Fee Related DE69230237T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16471191 1991-07-04

Publications (2)

Publication Number Publication Date
DE69230237D1 DE69230237D1 (de) 1999-12-09
DE69230237T2 true DE69230237T2 (de) 2000-02-17

Family

ID=15798437

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69230237T Expired - Fee Related DE69230237T2 (de) 1991-07-04 1992-07-03 Licht empfindliche Zusammensetzung

Country Status (4)

Country Link
US (1) US5459010A (de)
EP (1) EP0522457B1 (de)
CA (1) CA2073147A1 (de)
DE (1) DE69230237T2 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0962005A (ja) * 1995-06-14 1997-03-07 Fuji Photo Film Co Ltd ネガ型感光性組成物
US5786127A (en) * 1996-08-15 1998-07-28 Western Litho Plate & Supply Co. Photosensitive element having an overcoat which increases photo-speed and is substantially impermeable to oxygen
US5872158A (en) * 1997-06-12 1999-02-16 International Business Machines Corporation Cleavable diacrylate for removable acrylate compositions
JP4090103B2 (ja) * 1998-03-02 2008-05-28 太陽インキ製造株式会社 感光性組成物及びそれを用いて得られる焼成物パターン
US6951705B2 (en) * 2000-05-05 2005-10-04 E. I. Du Pont De Nemours And Company Polymers for photoresist compositions for microlithography
KR100771367B1 (ko) 2005-07-25 2007-10-30 주식회사 엘지화학 기계적 물성이 우수한 수지, 및 이를 포함하는 감광성조성물
CN102608867B (zh) * 2012-03-27 2014-04-02 惠州联大电子材料有限公司 感光水显影抗蚀组合物及感光水显影抗蚀干膜
KR20170050078A (ko) 2015-10-29 2017-05-11 주식회사 엘지화학 리튬-황 이차전지 양극용 아크릴 바인더

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS527364B2 (de) * 1973-07-23 1977-03-02
US4123276A (en) * 1974-02-28 1978-10-31 Fuji Photo Film Co., Ltd. Photosensitive composition
US4192684A (en) * 1976-01-24 1980-03-11 Asahi Kasei Kogyo Kabushiki Kaisha Photosensitive compositions containing hydrogenated 1,2-polybutadiene
JPS533216A (en) * 1976-06-28 1978-01-12 Fuji Photo Film Co Ltd Diazo photosensitive composition
JPS55527A (en) * 1978-06-16 1980-01-05 Fuji Photo Film Co Ltd Photosensitive planographic plate
US4293635A (en) * 1980-05-27 1981-10-06 E. I. Du Pont De Nemours And Company Photopolymerizable composition with polymeric binder
US4555473A (en) * 1984-12-06 1985-11-26 E. I. Dupont De Nemours And Company Alkali developable photopolymer crystalline composition
DE3504254A1 (de) * 1985-02-08 1986-08-14 Basf Ag, 6700 Ludwigshafen Lichtempfindliches aufzeichnungselement
US4717643A (en) * 1985-08-06 1988-01-05 Hercules Incorporated No thermal cure dry film solder mask
JPS6259948A (ja) * 1985-09-10 1987-03-16 Mitsubishi Chem Ind Ltd 感光性組成物
JP2733672B2 (ja) * 1988-10-24 1998-03-30 東京応化工業株式会社 光重合性樹脂組成物

Also Published As

Publication number Publication date
CA2073147A1 (en) 1993-01-05
EP0522457B1 (de) 1999-11-03
DE69230237D1 (de) 1999-12-09
EP0522457A1 (de) 1993-01-13
US5459010A (en) 1995-10-17

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee