ATE175280T1 - Lichtempfindliche, elektroabscheidbare photoresistzusammensetzung - Google Patents

Lichtempfindliche, elektroabscheidbare photoresistzusammensetzung

Info

Publication number
ATE175280T1
ATE175280T1 AT91112767T AT91112767T ATE175280T1 AT E175280 T1 ATE175280 T1 AT E175280T1 AT 91112767 T AT91112767 T AT 91112767T AT 91112767 T AT91112767 T AT 91112767T AT E175280 T1 ATE175280 T1 AT E175280T1
Authority
AT
Austria
Prior art keywords
electrodepositorable
light sensitive
photoresist composition
photoresist
sensitive
Prior art date
Application number
AT91112767T
Other languages
English (en)
Inventor
Kurt G Olson
Michael G Sandale
Steven R Zawacky
Ii Charles F Kahle
Masayuki Nakajima
Original Assignee
Ppg Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ppg Industries Inc filed Critical Ppg Industries Inc
Application granted granted Critical
Publication of ATE175280T1 publication Critical patent/ATE175280T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/164—Coating processes; Apparatus therefor using electric, electrostatic or magnetic means; powder coating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/107—Polyamide or polyurethane
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/136—Coating process making radiation sensitive element

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Materials For Photolithography (AREA)
  • Paints Or Removers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
AT91112767T 1990-08-02 1991-07-30 Lichtempfindliche, elektroabscheidbare photoresistzusammensetzung ATE175280T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US56205790A 1990-08-02 1990-08-02
US69735591A 1991-01-14 1991-01-14

Publications (1)

Publication Number Publication Date
ATE175280T1 true ATE175280T1 (de) 1999-01-15

Family

ID=27072823

Family Applications (1)

Application Number Title Priority Date Filing Date
AT91112767T ATE175280T1 (de) 1990-08-02 1991-07-30 Lichtempfindliche, elektroabscheidbare photoresistzusammensetzung

Country Status (12)

Country Link
US (2) US5674660A (de)
EP (1) EP0469537B1 (de)
JP (1) JP2547904B2 (de)
KR (1) KR950001005B1 (de)
AR (1) AR248459A1 (de)
AT (1) ATE175280T1 (de)
AU (1) AU649695B2 (de)
BR (1) BR9103260A (de)
CA (1) CA2048164C (de)
DE (1) DE69130691T2 (de)
ES (1) ES2126558T3 (de)
MX (1) MX9100508A (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05343837A (ja) * 1992-06-05 1993-12-24 Taiyo Ink Mfg Ltd ソルダーレジストインキ組成物及びソルダーレジストパターン形成方法
JPH06164102A (ja) * 1992-11-25 1994-06-10 Nippon Paint Co Ltd 電着型感光性樹脂被膜の表面処理方法
US5721088A (en) * 1995-12-20 1998-02-24 Ppg Industries, Inc. Electrodepositable photoimageable compositions with improved edge coverage
AU4252997A (en) * 1996-09-19 1998-04-14 Ericsson Inc. Battery charging methods and apparatuses
US6559222B1 (en) 1997-10-16 2003-05-06 Sun Chemical Corporation Photoneutralization of pH sensitive aqueous polymeric dispersions and methods for using same
US6268109B1 (en) 1999-10-12 2001-07-31 E. I. Du Pont De Nemours And Company Composite photosensitive element
JP4440590B2 (ja) * 2003-09-29 2010-03-24 関西ペイント株式会社 カチオン性塗料組成物及び塗膜形成方法
JP2005305689A (ja) * 2004-04-19 2005-11-04 Konica Minolta Medical & Graphic Inc 印刷版材料および印刷方法
US7537884B2 (en) * 2004-10-20 2009-05-26 National Taiwan University Method for forming self-synthesizing conductive or conjugated polymer film and application
EP2868681A1 (de) * 2013-10-31 2015-05-06 ALLNEX AUSTRIA GmbH Wässrige Härtungszusammensetzungen für Galvanisierung und Strahlungshärtung und Verfahren zur Gewinnung solcher Zusammensetzungen

Family Cites Families (57)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3501391A (en) * 1966-10-03 1970-03-17 Ford Motor Co Electrocoatacure process and paint binders therefor
US3501390A (en) * 1966-10-03 1970-03-17 Ford Motor Co Process for electrocoating and polymerizing by radiation
US3937679A (en) * 1968-10-31 1976-02-10 Ppg Industries, Inc. Electrodepositable compositions
JPS4836163B1 (de) * 1969-12-03 1973-11-01
US3738835A (en) * 1971-10-21 1973-06-12 Ibm Electrophoretic photoresist composition and a method of forming etch resistant masks
JPS5221526B2 (de) * 1972-01-10 1977-06-11
US3894922A (en) * 1972-01-12 1975-07-15 Ppg Industries Inc Electrodeposition method utilizing quaternary phosphonium group-containing resins
US3936405A (en) * 1972-08-16 1976-02-03 Ppg Industries, Inc. Novel pigment grinding vehicles
US4038232A (en) * 1972-12-19 1977-07-26 Ppg Industries, Inc. Electrodepositable compositions containing sulfonium resins and capped polyisocyanates
US3935087A (en) * 1972-12-22 1976-01-27 Ppg Industries, Inc. Method for electrodeposition of self-crosslinking cationic compositions
US3959106A (en) * 1974-03-27 1976-05-25 Ppg Industries, Inc. Method of electrodepositing quaternary sulfonium group-containing resins
US4039414A (en) * 1974-06-19 1977-08-02 Scm Corporation Ultraviolet curing of electrocoating compositions
US4066523A (en) * 1976-02-17 1978-01-03 Scm Corporation Dual cure cathodic electrocoating composition
US4166017A (en) * 1976-05-24 1979-08-28 Scm Corporation Process for cathodic electrocoating and photocuring
US4338232A (en) * 1977-12-27 1982-07-06 The Dow Chemical Company Radiation-curable resins
US4260720A (en) * 1979-10-31 1981-04-07 Ppg Industries, Inc. Novel mercapto chain extended products and their use in cationic electrodeposition
US4321304A (en) * 1980-10-02 1982-03-23 Ppg Industries, Inc. Beta-diketone-epoxy resin reaction products blended with monomeric or polymeric phosphonium salts useful for providing corrosion resistance
CA1255952A (en) * 1983-03-04 1989-06-20 Akihiro Furuta Positive type photoresist composition
DE3586263D1 (de) * 1984-03-07 1992-08-06 Ciba Geigy Ag Verfahren zur herstellung von abbildungen.
US4601916A (en) * 1984-07-18 1986-07-22 Kollmorgen Technologies Corporation Process for bonding metals to electrophoretically deposited resin coatings
US4592816A (en) * 1984-09-26 1986-06-03 Rohm And Haas Company Electrophoretic deposition process
US4877818A (en) * 1984-09-26 1989-10-31 Rohm And Haas Company Electrophoretically depositable photosensitive polymer composition
US4632891A (en) * 1984-10-04 1986-12-30 Ciba-Geigy Corporation Process for the production of images
GB8430377D0 (en) * 1984-12-01 1985-01-09 Ciba Geigy Ag Modified phenolic resins
JPS61206293A (ja) * 1985-03-08 1986-09-12 日本ペイント株式会社 回路板の製造方法
JPS61247090A (ja) * 1985-04-24 1986-11-04 日本ペイント株式会社 半田スル−ホ−ルを有する回路板の製造方法
FI82866C (fi) * 1985-06-24 1991-04-25 Siemens Ag Foerfarande foer framstaellning av strukturerade vaermebestaendiga skikt och deras anvaendning.
DE3588111T2 (de) * 1985-06-29 1996-10-31 Asahi Chem Res Lab Kunststoffzusammensetzung für Lötschutztinte
JPH0644150B2 (ja) * 1986-05-09 1994-06-08 関西ペイント株式会社 プリント配線フオトレジスト用電着塗料組成物
GB8614868D0 (en) * 1986-06-18 1986-07-23 Ciba Geigy Ag Metallic patterns
JPS6317592A (ja) * 1986-07-09 1988-01-25 三菱電機株式会社 プリント配線板の製造方法
US4751172A (en) * 1986-08-01 1988-06-14 Shipley Company Inc. Process for forming metal images
JPH0770812B2 (ja) * 1986-08-08 1995-07-31 関西ペイント株式会社 プリント回路板の形成方法
GB8620001D0 (en) * 1986-08-16 1986-09-24 Ciba Geigy Ag Production of images
EP0259723B1 (de) * 1986-09-11 1993-04-07 Siemens Aktiengesellschaft Verfahren zur Herstellung wärmebeständiger strukturierter Schichten
US4863827A (en) * 1986-10-20 1989-09-05 American Hoechst Corporation Postive working multi-level photoresist
JPS63178228A (ja) * 1987-01-20 1988-07-22 Fuji Photo Film Co Ltd ポジ型フオトレジスト組成物
JPS63182888A (ja) * 1987-01-26 1988-07-28 関西ペイント株式会社 プリント配線板の製造方法
US4863757A (en) * 1987-02-06 1989-09-05 Key-Tech, Inc. Printed circuit board
US4760013A (en) * 1987-02-17 1988-07-26 International Business Machines Corporation Sulfonium salt photoinitiators
GB8708747D0 (en) * 1987-04-11 1987-05-20 Ciba Geigy Ag Formation of image
EP0302827B1 (de) * 1987-08-05 1994-07-06 Ciba-Geigy Ag Bilderzeugungsverfahren
JPH07119374B2 (ja) * 1987-11-06 1995-12-20 関西ペイント株式会社 ポジ型感光性カチオン電着塗料組成物
US5196098A (en) * 1988-01-04 1993-03-23 Shipley Company Inc. Apparatus and process for electrophoretic deposition
GB8801736D0 (en) * 1988-01-27 1988-02-24 Ciba Geigy Ag Method of making patterns
US4898656A (en) * 1988-03-28 1990-02-06 Kansai Paint Co., Ltd. Electrodeposition coating process of photoresist for printed circuit board
JPH0769613B2 (ja) * 1988-05-02 1995-07-31 三菱電機株式会社 プリント配線フオトレジスト用カチオン型電着塗装方法
US5102775A (en) * 1988-09-30 1992-04-07 Kansai Paint Co., Ltd. Visible light sensitive electrodeposition coating composition and image-forming method using the same
JP2758039B2 (ja) * 1988-09-30 1998-05-25 関西ペイント株式会社 可視光感光性電着塗料用組成物及びそれを用いた画像形成方法
GB8827847D0 (en) * 1988-11-29 1988-12-29 Ciba Geigy Ag Method
JP2696419B2 (ja) * 1990-07-04 1998-01-14 日本石油株式会社 カチオン電着型ネガ型エッチングレジスト組成物
JPH0486666A (ja) * 1990-07-27 1992-03-19 Toagosei Chem Ind Co Ltd フォトレジスト膜形成用電着塗料組成物
JPH04116181A (ja) * 1990-09-03 1992-04-16 Nippon Oil Co Ltd カチオン電着型ネガ型エッチングレジスト組成物
US5246816A (en) * 1990-09-03 1993-09-21 Nippon Oil Co., Ltd. Cationic electrodeposition negative type resist composition
JP2681546B2 (ja) * 1991-01-11 1997-11-26 日本石油株式会社 カチオン電着型ネガ型レジスト組成物
JPH0616978A (ja) * 1990-10-16 1994-01-25 Hitachi Chem Co Ltd ネガ型感光性電着塗料樹脂組成物、これを用いた電着塗装浴及びレジストパターンの製造法
US5403698A (en) * 1990-10-16 1995-04-04 Hitachi Chemical Company, Ltd. Negative type photosensitive electrodepositing resin composition

Also Published As

Publication number Publication date
KR920004903A (ko) 1992-03-28
CA2048164C (en) 1998-11-10
AU649695B2 (en) 1994-06-02
BR9103260A (pt) 1992-02-18
MX9100508A (es) 1992-04-01
CA2048164A1 (en) 1992-02-03
JP2547904B2 (ja) 1996-10-30
DE69130691D1 (de) 1999-02-11
AU8147191A (en) 1992-02-13
ES2126558T3 (es) 1999-04-01
AR248459A1 (es) 1995-08-18
EP0469537A2 (de) 1992-02-05
US5674660A (en) 1997-10-07
KR950001005B1 (ko) 1995-02-06
JPH04251847A (ja) 1992-09-08
EP0469537A3 (en) 1992-04-29
EP0469537B1 (de) 1998-12-30
US5595859A (en) 1997-01-21
DE69130691T2 (de) 1999-07-22

Similar Documents

Publication Publication Date Title
DE69129955D1 (de) Photolackzusammensetzung
DE69014913D1 (de) Lichtempfindliche Zusammensetzung.
DE68921146D1 (de) Lichtempfindliche Zusammensetzung.
DE3771737D1 (de) Lichtempfindliche zusammensetzung.
DE68921019D1 (de) Lichtempfindliche Zusammensetzungen.
DE68915148D1 (de) Fotoresist-zusammensetzung.
DE69226920D1 (de) Lichtempfindliche Zusammensetzung
DE59108086D1 (de) Photoresist
DE69216079D1 (de) Infrarotsensitive, photopolymerisierbare zusammensetzungen
DE59101652D1 (de) Operationsleuchte.
DE69123873D1 (de) Photoresistzusammensetzung
DE69012475D1 (de) Lichtempfindliche Zusammensetzungen.
DE69016486D1 (de) Fotografisches Kopiergerät.
DE69229419D1 (de) Photoempfindliche Polymerzusammensetzung
ATE110176T1 (de) Lichtempfindliche vorrichtungen.
ATE175280T1 (de) Lichtempfindliche, elektroabscheidbare photoresistzusammensetzung
DE69219747D1 (de) Lichtempfindliche Zusammensetzung
DE68903911D1 (de) Lichtempfindliche zusammensetzung.
FI920710A0 (fi) Optisk kopplare.
FI914579A0 (fi) Optisk stroemtransformator.
FI912087A0 (fi) Optisk foerstaerkare.
DE68922901D1 (de) Photoresistzusammensetzung.
DE69230237D1 (de) Licht empfindliche Zusammensetzung
DE69119606D1 (de) Leichte Zuschlastoffe
FI911991A (fi) Optisk anordning.

Legal Events

Date Code Title Description
REN Ceased due to non-payment of the annual fee