DE69033938T2 - Positiv arbeitende lichtempfindliche Zusammensetzungen zur Herstellung von Linsen - Google Patents

Positiv arbeitende lichtempfindliche Zusammensetzungen zur Herstellung von Linsen

Info

Publication number
DE69033938T2
DE69033938T2 DE69033938T DE69033938T DE69033938T2 DE 69033938 T2 DE69033938 T2 DE 69033938T2 DE 69033938 T DE69033938 T DE 69033938T DE 69033938 T DE69033938 T DE 69033938T DE 69033938 T2 DE69033938 T2 DE 69033938T2
Authority
DE
Germany
Prior art keywords
lenses
production
photosensitive compositions
positive working
working photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69033938T
Other languages
English (en)
Other versions
DE69033938D1 (de
Inventor
Yoshitaka Tsutsumi
Teruhisa Uemura
Masazumi Hasegawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tosoh Corp
Original Assignee
Tosoh Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tosoh Corp filed Critical Tosoh Corp
Publication of DE69033938D1 publication Critical patent/DE69033938D1/de
Application granted granted Critical
Publication of DE69033938T2 publication Critical patent/DE69033938T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0012—Arrays characterised by the manufacturing method
    • G02B3/0018—Reflow, i.e. characterized by the step of melting microstructures to form curved surfaces, e.g. manufacturing of moulds and surfaces for transfer etching
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
    • B29L2011/00—Optical elements, e.g. lenses, prisms
    • B29L2011/0016—Lenses

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
DE69033938T 1989-12-01 1990-11-30 Positiv arbeitende lichtempfindliche Zusammensetzungen zur Herstellung von Linsen Expired - Fee Related DE69033938T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP31051289 1989-12-01

Publications (2)

Publication Number Publication Date
DE69033938D1 DE69033938D1 (de) 2002-04-25
DE69033938T2 true DE69033938T2 (de) 2002-07-18

Family

ID=18006120

Family Applications (2)

Application Number Title Priority Date Filing Date
DE69028834T Expired - Fee Related DE69028834T2 (de) 1989-12-01 1990-11-30 Positiv arbeitende lichtempfindliche Zusammensetzungen zur Herstellung von Linsen
DE69033938T Expired - Fee Related DE69033938T2 (de) 1989-12-01 1990-11-30 Positiv arbeitende lichtempfindliche Zusammensetzungen zur Herstellung von Linsen

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE69028834T Expired - Fee Related DE69028834T2 (de) 1989-12-01 1990-11-30 Positiv arbeitende lichtempfindliche Zusammensetzungen zur Herstellung von Linsen

Country Status (4)

Country Link
US (1) US5183722A (de)
EP (2) EP0704718B1 (de)
KR (1) KR910012756A (de)
DE (2) DE69028834T2 (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2067042A1 (en) * 1991-04-26 1992-10-27 Yasunori Uetani Positive resist composition
US5332650A (en) * 1991-09-06 1994-07-26 Japan Synthetic Rubber Co., Ltd. Radiation-sensitive composition
JP3114166B2 (ja) * 1992-10-22 2000-12-04 ジェイエスアール株式会社 マイクロレンズ用感放射線性樹脂組成物
EP0599779A1 (de) * 1992-10-29 1994-06-01 OCG Microelectronic Materials AG Hochauflösender negativ arbeitender Photoresist mit grossem Prozessspielraum
US6280910B1 (en) 1992-11-23 2001-08-28 Pioneer Electronic Corporation Photoresist for optical disc and method of preparing optical disc utilizing photoresist
DE19602736A1 (de) * 1996-01-26 1997-07-31 Inst Mikrotechnik Mainz Gmbh Verfahren und Vorrichtung zur Herstellung von optischen Linsen und optischen Linsenarrays
KR19980087477A (ko) * 1997-05-30 1998-12-05 마틴즈 길레모 방사선 민감성 중합체 조성물
US6642963B1 (en) * 1998-06-29 2003-11-04 Intel Corporation Silylation layer for optical devices
JP3743490B2 (ja) 2000-02-16 2006-02-08 信越化学工業株式会社 熱硬化性感光材料
TW594395B (en) * 2000-09-29 2004-06-21 Nippon Zeon Co Photoresist composition for insulating film, insulating film for organic electroluminescent element, and process for producing the same
CN100582939C (zh) * 2005-02-05 2010-01-20 明德国际仓储贸易(上海)有限公司 正型光阻剂组成物及其应用
JP4588551B2 (ja) * 2005-06-16 2010-12-01 富士通株式会社 レジスト組成物、レジストパターンの形成方法、半導体装置及びその製造方法
KR101062673B1 (ko) 2008-04-14 2011-09-06 주식회사 엘지화학 액정표시소자의 유기절연막 형성용 포지티브형포토레지스트 조성물
US9240500B2 (en) * 2010-12-02 2016-01-19 Nissan Chemical Industries, Ltd. Film-forming material

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5114042B2 (de) * 1972-06-12 1976-05-06
DE2617088A1 (de) * 1975-04-29 1976-11-11 Hoechst Co American Lichtempfindliche kopiermasse
DE3325022A1 (de) * 1983-07-11 1985-01-24 Hoechst Ag, 6230 Frankfurt Verfahren zur herstellung negativer kopien mittels eines materials auf basis von 1,2-chinondiaziden
IE57143B1 (en) * 1984-06-01 1992-05-06 Rohm & Haas Photosensitive coating compositions,thermally stable coating prepared from them,and the use of such coatings in forming thermally stable polymer images
DE3445276A1 (de) * 1984-12-12 1986-06-19 Hoechst Ag, 6230 Frankfurt Strahlungsempfindliches gemisch, daraus hergestelltes lichtempfindliches aufzeichnungsmaterial und verfahren zur herstellung einer flachdruckform
DE3711951A1 (de) 1987-04-09 1988-11-10 Thomson Brandt Gmbh Videorecorder mit standard- und langzeitbetrieb
JPH01103604A (ja) 1987-07-17 1989-04-20 Maruzen Petrochem Co Ltd ｐ−ビニルフェノール系重合体の特性を改善する方法
US4873176A (en) * 1987-08-28 1989-10-10 Shipley Company Inc. Reticulation resistant photoresist coating
JPH01132619A (ja) * 1987-11-18 1989-05-25 Hitachi Ltd フエノール樹脂の精製方法
JPH01246505A (ja) 1988-03-29 1989-10-02 Canon Inc 固体撮像素子
JP2777371B2 (ja) 1988-04-08 1998-07-16 大日本印刷株式会社 固体撮像素子におけるマイクロ集光レンズ形成方法
JP2680598B2 (ja) 1988-04-15 1997-11-19 大日本印刷株式会社 マイクロ集光レンズの形成方法
JP2618688B2 (ja) 1988-06-22 1997-06-11 日本ゼオン株式会社 レジスト組成物
JPH0229751A (ja) 1988-07-20 1990-01-31 Nippon Zeon Co Ltd レジスト組成物
JPH0229752A (ja) 1988-07-20 1990-01-31 Nippon Zeon Co Ltd レジスト組成物
US5128232A (en) * 1989-05-22 1992-07-07 Shiply Company Inc. Photoresist composition with copolymer binder having a major proportion of phenolic units and a minor proportion of non-aromatic cyclic alcoholic units

Also Published As

Publication number Publication date
EP0704718B1 (de) 2002-03-20
EP0430302A2 (de) 1991-06-05
EP0430302B1 (de) 1996-10-09
DE69033938D1 (de) 2002-04-25
KR910012756A (ko) 1991-08-08
EP0704718A1 (de) 1996-04-03
EP0430302A3 (en) 1991-12-18
DE69028834T2 (de) 1997-02-13
DE69028834D1 (de) 1996-11-14
US5183722A (en) 1993-02-02

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee