KR920015428A - 마스크 제조방법 - Google Patents

마스크 제조방법 Download PDF

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Publication number
KR920015428A
KR920015428A KR1019910000461A KR910000461A KR920015428A KR 920015428 A KR920015428 A KR 920015428A KR 1019910000461 A KR1019910000461 A KR 1019910000461A KR 910000461 A KR910000461 A KR 910000461A KR 920015428 A KR920015428 A KR 920015428A
Authority
KR
South Korea
Prior art keywords
silicon
electron beam
mask manufacturing
beam resist
oxide
Prior art date
Application number
KR1019910000461A
Other languages
English (en)
Other versions
KR0172816B1 (ko
Inventor
김홍석
Original Assignee
문정환
금성일렉트론 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 문정환, 금성일렉트론 주식회사 filed Critical 문정환
Priority to KR1019910000461A priority Critical patent/KR0172816B1/ko
Priority to TW080110098A priority patent/TW276352B/zh
Priority to DE4200647A priority patent/DE4200647C2/de
Priority to JP2333292A priority patent/JP2824817B2/ja
Priority to US07/821,938 priority patent/US5597666A/en
Publication of KR920015428A publication Critical patent/KR920015428A/ko
Application granted granted Critical
Publication of KR0172816B1 publication Critical patent/KR0172816B1/ko

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/29—Rim PSM or outrigger PSM; Preparation thereof

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

내용 없음

Description

마스크 제조방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
재2도는 본 고안의 실리콘 산화물을 증착한 마스크 공정도.

Claims (2)

  1. 수정판위에 실리콘과 크롬을 증착시킨 후 일정한 전자빔 레지스트(E-beam resist)를 형성하여 전자빔이 실리콘과 크롬을 에칭하는 공정과, 전자빔 레지스트를 제거한 후 산화물 계통의 물질인 실리콘을 산화시켜 부피를 팽창시킴에 따라 실리콘 산호막의 크기를 조절할 수 있도록 하는 공정을 포함하여 구성된 것을 특징으로 하는 마스크 제조방법.
  2. 제1항에 있어서, 산화물 계통의 물질인 반도체 실리콘은 금속으로도 증착하여 산화시킬 수 있는 공정을 포함하며 구성된 것을 특징으로 하는 마스크 제조방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019910000461A 1991-01-14 1991-01-14 마스크 제조방법 KR0172816B1 (ko)

Priority Applications (5)

Application Number Priority Date Filing Date Title
KR1019910000461A KR0172816B1 (ko) 1991-01-14 1991-01-14 마스크 제조방법
TW080110098A TW276352B (ko) 1991-01-14 1991-12-24
DE4200647A DE4200647C2 (de) 1991-01-14 1992-01-13 Verfahren zur Herstellung einer Maske
JP2333292A JP2824817B2 (ja) 1991-01-14 1992-01-14 マスクの製造方法
US07/821,938 US5597666A (en) 1991-01-14 1992-01-14 Method for fabrication of a mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019910000461A KR0172816B1 (ko) 1991-01-14 1991-01-14 마스크 제조방법

Publications (2)

Publication Number Publication Date
KR920015428A true KR920015428A (ko) 1992-08-26
KR0172816B1 KR0172816B1 (ko) 1999-03-30

Family

ID=19309740

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019910000461A KR0172816B1 (ko) 1991-01-14 1991-01-14 마스크 제조방법

Country Status (5)

Country Link
US (1) US5597666A (ko)
JP (1) JP2824817B2 (ko)
KR (1) KR0172816B1 (ko)
DE (1) DE4200647C2 (ko)
TW (1) TW276352B (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100790751B1 (ko) * 2006-12-06 2008-01-02 삼성전기주식회사 수정판 제조방법

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR0152952B1 (ko) * 1995-05-13 1998-10-01 문정환 위상반전 마스크 및 그 제조방법
KR0166825B1 (ko) * 1996-06-26 1999-01-15 문정환 위상반전 마스크의 제조 방법
KR100328448B1 (ko) * 1999-12-29 2002-03-16 박종섭 반도체 소자의 위상반전 마스크 제조방법
KR102323615B1 (ko) * 2020-01-23 2021-11-05 김용석 원 스텝 습식 에칭 기술을 이용한 oled 패널 제조용 파인 메탈 마스크 제조 방법
TWI707195B (zh) * 2020-02-14 2020-10-11 力晶積成電子製造股份有限公司 相位轉移光罩的製造方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4360586A (en) * 1979-05-29 1982-11-23 Massachusetts Institute Of Technology Spatial period division exposing
EP0051488B1 (en) * 1980-11-06 1985-01-30 Kabushiki Kaisha Toshiba Method for manufacturing a semiconductor device
JPS6195356A (ja) * 1984-10-16 1986-05-14 Mitsubishi Electric Corp フオトマスクブランク
US4890309A (en) * 1987-02-25 1989-12-26 Massachusetts Institute Of Technology Lithography mask with a π-phase shifting attenuator
JP2710967B2 (ja) * 1988-11-22 1998-02-10 株式会社日立製作所 集積回路装置の製造方法
JPH03211554A (ja) * 1990-01-17 1991-09-17 Fujitsu Ltd 位相シフトマスクの製造方法
JPH04127149A (ja) * 1990-09-19 1992-04-28 Hitachi Ltd ホトマスク及びその製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100790751B1 (ko) * 2006-12-06 2008-01-02 삼성전기주식회사 수정판 제조방법

Also Published As

Publication number Publication date
US5597666A (en) 1997-01-28
JPH06138637A (ja) 1994-05-20
DE4200647C2 (de) 1994-03-10
JP2824817B2 (ja) 1998-11-18
TW276352B (ko) 1996-05-21
KR0172816B1 (ko) 1999-03-30
DE4200647A1 (de) 1992-07-23

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