TW276352B - - Google Patents

Info

Publication number
TW276352B
TW276352B TW080110098A TW80110098A TW276352B TW 276352 B TW276352 B TW 276352B TW 080110098 A TW080110098 A TW 080110098A TW 80110098 A TW80110098 A TW 80110098A TW 276352 B TW276352 B TW 276352B
Authority
TW
Taiwan
Application number
TW080110098A
Original Assignee
Gold Star Electronics
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gold Star Electronics filed Critical Gold Star Electronics
Application granted granted Critical
Publication of TW276352B publication Critical patent/TW276352B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/29—Rim PSM or outrigger PSM; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW080110098A 1991-01-14 1991-12-24 TW276352B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019910000461A KR0172816B1 (ko) 1991-01-14 1991-01-14 마스크 제조방법

Publications (1)

Publication Number Publication Date
TW276352B true TW276352B (zh) 1996-05-21

Family

ID=19309740

Family Applications (1)

Application Number Title Priority Date Filing Date
TW080110098A TW276352B (zh) 1991-01-14 1991-12-24

Country Status (5)

Country Link
US (1) US5597666A (zh)
JP (1) JP2824817B2 (zh)
KR (1) KR0172816B1 (zh)
DE (1) DE4200647C2 (zh)
TW (1) TW276352B (zh)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR0152952B1 (ko) * 1995-05-13 1998-10-01 문정환 위상반전 마스크 및 그 제조방법
KR0166825B1 (ko) * 1996-06-26 1999-01-15 문정환 위상반전 마스크의 제조 방법
KR100328448B1 (ko) * 1999-12-29 2002-03-16 박종섭 반도체 소자의 위상반전 마스크 제조방법
KR100790751B1 (ko) * 2006-12-06 2008-01-02 삼성전기주식회사 수정판 제조방법
KR102323615B1 (ko) * 2020-01-23 2021-11-05 김용석 원 스텝 습식 에칭 기술을 이용한 oled 패널 제조용 파인 메탈 마스크 제조 방법
TWI707195B (zh) * 2020-02-14 2020-10-11 力晶積成電子製造股份有限公司 相位轉移光罩的製造方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4360586A (en) * 1979-05-29 1982-11-23 Massachusetts Institute Of Technology Spatial period division exposing
EP0051488B1 (en) * 1980-11-06 1985-01-30 Kabushiki Kaisha Toshiba Method for manufacturing a semiconductor device
JPS6195356A (ja) * 1984-10-16 1986-05-14 Mitsubishi Electric Corp フオトマスクブランク
US4890309A (en) * 1987-02-25 1989-12-26 Massachusetts Institute Of Technology Lithography mask with a π-phase shifting attenuator
JP2710967B2 (ja) * 1988-11-22 1998-02-10 株式会社日立製作所 集積回路装置の製造方法
JPH03211554A (ja) * 1990-01-17 1991-09-17 Fujitsu Ltd 位相シフトマスクの製造方法
JPH04127149A (ja) * 1990-09-19 1992-04-28 Hitachi Ltd ホトマスク及びその製造方法

Also Published As

Publication number Publication date
KR0172816B1 (ko) 1999-03-30
JPH06138637A (ja) 1994-05-20
JP2824817B2 (ja) 1998-11-18
KR920015428A (ko) 1992-08-26
DE4200647C2 (de) 1994-03-10
DE4200647A1 (de) 1992-07-23
US5597666A (en) 1997-01-28

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