KR910001875A - 노광용 마스크의 제조방법 - Google Patents
노광용 마스크의 제조방법 Download PDFInfo
- Publication number
- KR910001875A KR910001875A KR1019900008645A KR900008645A KR910001875A KR 910001875 A KR910001875 A KR 910001875A KR 1019900008645 A KR1019900008645 A KR 1019900008645A KR 900008645 A KR900008645 A KR 900008645A KR 910001875 A KR910001875 A KR 910001875A
- Authority
- KR
- South Korea
- Prior art keywords
- mask
- manufacturing
- exposure
- exposure mask
- mask film
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70783—Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/143—Electron beam
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명 노광용 마스크의 제조방법에 사용하는 전자 비임 노광장치의 개략적인 구성도,
제2도 (A), (B)는 배경 기술을 도시하는 바의 노광용 마스크(레티클)의 평면도로써, 제2도 (A)는 포지타입이고, 제2도 (B)는 제거타입인 도면,
제3도는 문제점을 도시하는 노광용 마스크의 단면도.
Claims (1)
- 투명 기판에 마스크막을 형성하여, 이 마스크막에 대해서 노광 및 선택적 에칭 처리를 실시하므로서 마스크막으로 형성되는 마스크 패턴을 형성하는 노광용 마스크의 제조방법에 있어서, 마스크 패턴 형성을 위한 노광시에, 엣칭후에 남는 마스크막의 투명 기판에 점유하는 면적의 비율에 따라 다른 보정량으로 마스크 패턴 위치의 보정을 하는 것을 특징으로 하는 노광용 마스크의 제조방법.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP150289 | 1989-06-13 | ||
JP15028989A JP2794793B2 (ja) | 1989-06-13 | 1989-06-13 | 露光用マスクの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR910001875A true KR910001875A (ko) | 1991-01-31 |
KR0160963B1 KR0160963B1 (ko) | 1999-02-01 |
Family
ID=15493730
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019900008645A KR0160963B1 (ko) | 1989-06-13 | 1990-06-13 | 노광용 마스크의 제조방법 |
Country Status (5)
Country | Link |
---|---|
US (1) | US5202204A (ko) |
EP (1) | EP0403220B1 (ko) |
JP (1) | JP2794793B2 (ko) |
KR (1) | KR0160963B1 (ko) |
DE (1) | DE69012441T2 (ko) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR970006927B1 (ko) * | 1992-11-10 | 1997-04-30 | 다이 니뽄 인사쯔 가부시키가이샤 | 위상시프트 포토마스크 및 그 제조방법 |
JP3068398B2 (ja) * | 1993-11-15 | 2000-07-24 | 日本電気株式会社 | レチクルの製造方法およびその製造装置 |
JPH0915833A (ja) * | 1995-06-30 | 1997-01-17 | Sony Corp | 露光用マスク作製装置における走査用データ作成装置及び走査用データの作成方法 |
JP4853685B2 (ja) * | 2009-03-31 | 2012-01-11 | 信越化学工業株式会社 | フォトマスクブランク又はその製造中間体の検査方法及び良否判定方法 |
CN106997146B (zh) * | 2017-04-17 | 2021-01-26 | 京东方科技集团股份有限公司 | 一种掩膜板的制作方法、制作系统及掩膜板 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2066487B (en) * | 1979-12-18 | 1983-11-23 | Philips Electronic Associated | Alignment of exposure masks |
DE3485291D1 (de) * | 1983-03-29 | 1992-01-09 | Toshiba Kawasaki Kk | Verfahren fuer die herstellung mittels projektion einer integrierten schaltungsabbildung auf einer halbleiterplatte. |
US4887283A (en) * | 1988-09-27 | 1989-12-12 | Mitsubishi Denki Kabushiki Kaisha | X-ray mask and exposure method employing the same |
JPH0779075B2 (ja) * | 1990-02-21 | 1995-08-23 | 株式会社東芝 | 電子ビーム露光装置 |
-
1989
- 1989-06-13 JP JP15028989A patent/JP2794793B2/ja not_active Expired - Lifetime
-
1990
- 1990-06-11 US US07/536,303 patent/US5202204A/en not_active Expired - Lifetime
- 1990-06-12 DE DE69012441T patent/DE69012441T2/de not_active Expired - Fee Related
- 1990-06-12 EP EP90306376A patent/EP0403220B1/en not_active Expired - Lifetime
- 1990-06-13 KR KR1019900008645A patent/KR0160963B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
JP2794793B2 (ja) | 1998-09-10 |
EP0403220B1 (en) | 1994-09-14 |
DE69012441T2 (de) | 1995-01-26 |
US5202204A (en) | 1993-04-13 |
EP0403220A1 (en) | 1990-12-19 |
JPH0315065A (ja) | 1991-01-23 |
DE69012441D1 (de) | 1994-10-20 |
KR0160963B1 (ko) | 1999-02-01 |
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