DE69012441D1 - Herstellung von Belichtungsmasken. - Google Patents
Herstellung von Belichtungsmasken.Info
- Publication number
- DE69012441D1 DE69012441D1 DE69012441T DE69012441T DE69012441D1 DE 69012441 D1 DE69012441 D1 DE 69012441D1 DE 69012441 T DE69012441 T DE 69012441T DE 69012441 T DE69012441 T DE 69012441T DE 69012441 D1 DE69012441 D1 DE 69012441D1
- Authority
- DE
- Germany
- Prior art keywords
- manufacture
- exposure masks
- masks
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70783—Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/143—Electron beam
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Electron Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15028989A JP2794793B2 (ja) | 1989-06-13 | 1989-06-13 | 露光用マスクの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69012441D1 true DE69012441D1 (de) | 1994-10-20 |
DE69012441T2 DE69012441T2 (de) | 1995-01-26 |
Family
ID=15493730
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69012441T Expired - Fee Related DE69012441T2 (de) | 1989-06-13 | 1990-06-12 | Herstellung von Belichtungsmasken. |
Country Status (5)
Country | Link |
---|---|
US (1) | US5202204A (de) |
EP (1) | EP0403220B1 (de) |
JP (1) | JP2794793B2 (de) |
KR (1) | KR0160963B1 (de) |
DE (1) | DE69012441T2 (de) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5556724A (en) * | 1992-11-10 | 1996-09-17 | Dai Nippon Printing Co., Ltd. | Phase shift photomask and method of producing same |
JP3068398B2 (ja) * | 1993-11-15 | 2000-07-24 | 日本電気株式会社 | レチクルの製造方法およびその製造装置 |
JPH0915833A (ja) * | 1995-06-30 | 1997-01-17 | Sony Corp | 露光用マスク作製装置における走査用データ作成装置及び走査用データの作成方法 |
JP4853685B2 (ja) * | 2009-03-31 | 2012-01-11 | 信越化学工業株式会社 | フォトマスクブランク又はその製造中間体の検査方法及び良否判定方法 |
CN106997146B (zh) * | 2017-04-17 | 2021-01-26 | 京东方科技集团股份有限公司 | 一种掩膜板的制作方法、制作系统及掩膜板 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2066487B (en) * | 1979-12-18 | 1983-11-23 | Philips Electronic Associated | Alignment of exposure masks |
DE3485291D1 (de) * | 1983-03-29 | 1992-01-09 | Toshiba Kawasaki Kk | Verfahren fuer die herstellung mittels projektion einer integrierten schaltungsabbildung auf einer halbleiterplatte. |
US4887283A (en) * | 1988-09-27 | 1989-12-12 | Mitsubishi Denki Kabushiki Kaisha | X-ray mask and exposure method employing the same |
JPH0779075B2 (ja) * | 1990-02-21 | 1995-08-23 | 株式会社東芝 | 電子ビーム露光装置 |
-
1989
- 1989-06-13 JP JP15028989A patent/JP2794793B2/ja not_active Expired - Lifetime
-
1990
- 1990-06-11 US US07/536,303 patent/US5202204A/en not_active Expired - Lifetime
- 1990-06-12 EP EP90306376A patent/EP0403220B1/de not_active Expired - Lifetime
- 1990-06-12 DE DE69012441T patent/DE69012441T2/de not_active Expired - Fee Related
- 1990-06-13 KR KR1019900008645A patent/KR0160963B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR910001875A (ko) | 1991-01-31 |
JPH0315065A (ja) | 1991-01-23 |
EP0403220B1 (de) | 1994-09-14 |
KR0160963B1 (ko) | 1999-02-01 |
US5202204A (en) | 1993-04-13 |
DE69012441T2 (de) | 1995-01-26 |
EP0403220A1 (de) | 1990-12-19 |
JP2794793B2 (ja) | 1998-09-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |