KR910017382A - 광중합성 혼합물 및 이로부터 제조된 기록물질 - Google Patents

광중합성 혼합물 및 이로부터 제조된 기록물질 Download PDF

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KR910017382A
KR910017382A KR1019910003644A KR910003644A KR910017382A KR 910017382 A KR910017382 A KR 910017382A KR 1019910003644 A KR1019910003644 A KR 1019910003644A KR 910003644 A KR910003644 A KR 910003644A KR 910017382 A KR910017382 A KR 910017382A
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South Korea
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mixture
compound
cpd
group
radiation
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KR1019910003644A
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KR100196589B1 (ko
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제르타니 루돌프
모르 디이터
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빈프리트 게르만, 베른하르트 엠. 벡크
홱스트 아크티엔게젤샤프트
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    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S526/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S526/943—Polymerization with metallocene catalysts

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
  • Materials For Photolithography (AREA)
  • Paints Or Removers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Graft Or Block Polymers (AREA)
  • Catalysts (AREA)
  • Developing Agents For Electrophotography (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)

Abstract

내용 없음

Description

광중합성 혼합물 및 이로부터 제조된 기록물질
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (12)

  1. 필수성분으로서, a)중합체 결합제, b)자유 라디칼에 의해 중합가능하며 중합성 그룹을 하나 이상 갖는 화합물 및 c)광환원성 염료를 함유하며, 추가로 d)디사이클로펜타디에닐 비스(2,4,6-트리플루오로페닐)-티탄 또는-지르크늄을 함유하는 광중합성 혼합물.
  2. 제1항에 있어서, 추가로 e)복사에 의해 분해될 수 있는 트리할로게노메틸 화합물을 함유하는 혼합물.
  3. 제1항에 있어서, 사이클로펜타디에닐 라디칼 중 적어도 하나가 치환된 혼합물.
  4. 제1항에 있어서, 자유 라디칼에 의해 중합가능한 화합물이 광환원성 염료 존재하에 노출시 광산화가능한 그룹을 하나 이상 갖는 아크릴성 또는 알크아크릴성 에스테르인 혼합물.
  5. 제4항에 있어서, 광산화성 그룹이 아미노, 우레아, 티오 또는 에놀 그룹인 혼합물.
  6. 제1항에 있어서, 광환원성 염료가 크산텐, 티아진, 피로닌, 프로피닌 또는 아크리딘 염료인 혼합물.
  7. 제1항에 있어서, 복사에 의해 분해될 수 있는 트리할로게노메틸 화합물이 트리할로게노메틸 그룹 하나 이상 및, 경우에 따라, 다른 그룹으로 치환된 s-트리아진이거나, 아릴 트리할로게노메틸 설폰인 혼합물.
  8. 제1항에 있어서, 추가로, 광개시제로서, 활성인 아크리딘, 페나진 또는 퀴녹살린 화합물을 함유하는 혼합물.
  9. 제1항에 있어서, 결합제가 수불용성이고 알칼리 수용액 중에 가요성인 혼합물.
  10. 제1항에 있어서, 혼합물의 비-휘발성 성분에 대해, 중합성 화합물 10 내지 80중량%, 중합체 결합제 20 내지 90중량% 및 복사에 의해 활성화가능한 중합반응 개시제 0.05 내지 20중량%를 함유하는 혼합물.
  11. 지지체 및 광중합성 층을 포함하며 광중합성 층이 제1항에서 청구된 바와 같은 혼합물을 함유함을 특징으로 하는 광중합성 기록물질.
  12. 제11항에 있어서, 광중합성 층상에, 공기 중 산소 투과성이 낮으며 광중합성 층에 대한 현상액 중에 가용성인 투명층을 추가로 함유하는 기록물질.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019910003644A 1990-03-09 1991-03-07 광중합성 혼합물 및 이로부터 제조된 기록물질 KR100196589B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DEP4007428.5 1990-03-09
DE4007428A DE4007428A1 (de) 1990-03-09 1990-03-09 Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial

Publications (2)

Publication Number Publication Date
KR910017382A true KR910017382A (ko) 1991-11-05
KR100196589B1 KR100196589B1 (ko) 1999-06-15

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KR1019910003644A KR100196589B1 (ko) 1990-03-09 1991-03-07 광중합성 혼합물 및 이로부터 제조된 기록물질

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US (1) US5229253A (ko)
EP (1) EP0445624B1 (ko)
JP (1) JP2949125B2 (ko)
KR (1) KR100196589B1 (ko)
AT (1) ATE151540T1 (ko)
AU (1) AU634868B2 (ko)
BR (1) BR9100945A (ko)
CA (1) CA2037751A1 (ko)
DE (2) DE4007428A1 (ko)
FI (1) FI911146A (ko)

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KR100196589B1 (ko) 1999-06-15
AU7281491A (en) 1991-09-12
BR9100945A (pt) 1991-11-05
JP2949125B2 (ja) 1999-09-13
EP0445624A3 (en) 1992-02-26
CA2037751A1 (en) 1991-09-10
FI911146A0 (fi) 1991-03-07
DE59108650D1 (de) 1997-05-15
US5229253A (en) 1993-07-20
EP0445624B1 (de) 1997-04-09
DE4007428A1 (de) 1991-09-12
EP0445624A2 (de) 1991-09-11
JPH04219756A (ja) 1992-08-10
FI911146A (fi) 1991-09-10
ATE151540T1 (de) 1997-04-15
AU634868B2 (en) 1993-03-04

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