KR910003439A - 광중합성 혼합물 및 이로부터 제조된 기록 재료 - Google Patents

광중합성 혼합물 및 이로부터 제조된 기록 재료 Download PDF

Info

Publication number
KR910003439A
KR910003439A KR1019890010418A KR890010418A KR910003439A KR 910003439 A KR910003439 A KR 910003439A KR 1019890010418 A KR1019890010418 A KR 1019890010418A KR 890010418 A KR890010418 A KR 890010418A KR 910003439 A KR910003439 A KR 910003439A
Authority
KR
South Korea
Prior art keywords
group
mixture
mixture according
compound
alkacrylate
Prior art date
Application number
KR1019890010418A
Other languages
English (en)
Other versions
KR0135077B1 (ko
Inventor
제르타니 루돌프
모흐 디터
로데 클라우스
Original Assignee
베틀라우퍼, 오일러
훽스트 아크티엔게젤샤프트
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 베틀라우퍼, 오일러, 훽스트 아크티엔게젤샤프트 filed Critical 베틀라우퍼, 오일러
Publication of KR910003439A publication Critical patent/KR910003439A/ko
Application granted granted Critical
Publication of KR0135077B1 publication Critical patent/KR0135077B1/ko

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67—Unsaturated compounds having active hydrogen
    • C08G18/671—Unsaturated compounds having only one group containing active hydrogen
    • C08G18/672—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/30—Low-molecular-weight compounds
    • C08G18/32—Polyhydroxy compounds; Polyamines; Hydroxyamines
    • C08G18/3271—Hydroxyamines
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/107—Polyamide or polyurethane
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/116—Redox or dye sensitizer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/126—Halogen compound containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Materials For Photolithography (AREA)

Abstract

내용 없음.

Description

광중합성 혼합물 및 이로부터 제조된 기록 재료
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (12)

  1. 필수 성분으로서, a) 중합성 결합제, b) 다가 알코올의 아크릴레이트 또는 알크아크릴레이트, c) 광환원성 염료, d) 방사에 의해 분해될 수 있는 트리할로메틸 화합물, 및 e) 광 개시제로서 작용하는 아크릴딘, 펜아진 또는 퀴녹살린 화합물을 함유하는 광중합성 혼합물에 있어서, 아크릴레이트 또는 알크아크릴레이트가 하기 일반식(Ⅰ)의 화합물임을 특징으로 하는 광중합성 혼합물.
    상기식에서, Q는이고, R은 수소원자, 메틸 그룹 또는 에틸그룹이며, X1은 CmH2m또는이고, X2는 탄소수 2 내지 12의 포화 탄화수소 그룹이며, X3는 1 내지 5개의 에테르 산소원자에 의해 차단될 수 있는 포화 탄화수소 그룹이고, D1및 D2는 각각 탄소수 1 내지 5의 포화 탄화수소 그룹이며, D3는 탄소수 4 내지 8의 포화 탄화수소 그룹이고, 질소원자와 함께는 5- 또는 6-원 환을 형성하며, Z는 수소원자 또는 일반식 의 그룹이며, a는 0 또는 1 내지 4의 정수이고 b는 0 또는 1이며, m 및 k는 1 내지 12의 정수이고, n은 Q의 원자가에 따라 1,2 또는 3이며, 동일한 정의의 모든 래디칼은 서로 동일하거나 상이할 수 있고, a는 그룹 Q의 적어도 한 치환체에서 0이다.
  2. 제1항에 있어서, 적어도 두개의 아크릴레이트 또는 알크아크릴레이트 그룹이 일반식(Ⅰ)의 화합물 중에 포함되는 혼합물.
  3. 제1항에 있어서, 적어도 하나의 우레탄 그룹이 일반식(Ⅰ)의 화합물 중에 포함되는 혼합물.
  4. 제1항에 있어서, R이 CH3인 혼합물.
  5. 제1항에 있어서, a가 0 또는 1인 혼합물.
  6. 제1항에 있어서, m이 2 내지 10의 정수인 혼합물.
  7. 제1항에 있어서, 광환원성 염료가 크산텐, 벤조크산텐, 벤조티오크산텐, 티아진, 피로닌, 포피린 또는 아크리딘 염료인 혼합물.
  8. 제1항에 있어서, 방사에 의해 분해될 수 있는 트리할로메틸 화합물이 적어도 하나의 트리할로메틸 그룹 및 하나의 추가 그룹에 의해 치환되는 S-트리아진이거나 아릴 트리할로메틸 설폰인 혼합물.
  9. 제1항에 있어서, 결합제가 물 중에서 불용성이고 알칼리 수용액 중에서 가용성인 혼합물.
  10. 제1항에 있어서, 혼합물의 비휘발성 성분에 대해 아크릴레이트 또는 알크아크릴레이트 10 내지 80중량% 중합성 결합제 20 내지 90중량%, 및 방사-활성 가능한 중합 개시제(c), (d) 및 (e) 0.05 내지 20중량%을 함유함을 특징으로 하는 혼합물.
  11. 제1항에 있어서, 추가로 디벤잘 아세톤 또는 쿠마린 화합물(f)를 함유함을 특징으로 하는 혼합물.
  12. 층 지지체 및 광중합성 층으로 이루어진 광중합성 기록 재료에 있어서, 광중합성 층이 제1항에서 청구한 혼합물을 포함함을 특징으로 하는 광중합성 기록 재료.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019890010418A 1988-07-22 1989-07-22 광중합성 혼합물 및 이로부터 제조된 기록재료 KR0135077B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DEP3824903.0 1988-07-22
DE3824903A DE3824903A1 (de) 1988-07-22 1988-07-22 Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial

Publications (2)

Publication Number Publication Date
KR910003439A true KR910003439A (ko) 1991-02-27
KR0135077B1 KR0135077B1 (ko) 1998-04-18

Family

ID=6359302

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019890010418A KR0135077B1 (ko) 1988-07-22 1989-07-22 광중합성 혼합물 및 이로부터 제조된 기록재료

Country Status (5)

Country Link
US (1) US5066564A (ko)
EP (1) EP0355387B1 (ko)
JP (1) JP2700168B2 (ko)
KR (1) KR0135077B1 (ko)
DE (2) DE3824903A1 (ko)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4007428A1 (de) * 1990-03-09 1991-09-12 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
DE69225348T2 (de) * 1991-03-05 1998-10-29 Agfa Gevaert Nv Verfahren zur Herstellung von Bildern
US5327373A (en) * 1992-08-21 1994-07-05 Board Of Regents, The University Of Texas System Optoelectronic memories with photoconductive thin films
US6010824A (en) * 1992-11-10 2000-01-04 Tokyo Ohka Kogyo Co., Ltd. Photosensitive resin composition containing a triazine compound and a pre-sensitized plate using the same, and photosensitive resin composition containing acridine and triazine compounds and a color filter and a pre-sensitized plate using the same
US5523152A (en) * 1993-10-27 1996-06-04 Minnesota Mining And Manufacturing Company Organic compounds suitable as reactive diluents, and binder precursor compositions including same
US5436112A (en) * 1994-04-01 1995-07-25 Hoechst Celanese Corporation Method for producing a negative image with color proofing element containing a urethane monomer
US5552256A (en) * 1994-09-29 1996-09-03 International Business Machines Corporation Positive resist composition containing naphthoquinonediazide compound having non-metallic atom directly bonded to the naphthalene ring
US6204302B1 (en) * 1998-11-20 2001-03-20 Bisco, Inc. Photosensitizers for free radical polymerization initiation resins and method of making the same
EP1349006B1 (en) 2002-03-28 2013-09-25 Agfa Graphics N.V. Photopolymerizable composition sensitized for the wavelength range from 300 to 450 nm.
JP4161850B2 (ja) * 2003-05-13 2008-10-08 コニカミノルタエムジー株式会社 感光性組成物、感光性平版印刷版、及びその画像形成方法
JP2007506125A (ja) * 2003-09-22 2007-03-15 アグフア−ゲヴエルト 光重合体印刷版前駆体
WO2005029187A1 (en) 2003-09-22 2005-03-31 Agfa-Gevaert Photopolymerizable composition.
DE10356847B4 (de) * 2003-12-05 2005-10-06 Kodak Polychrome Graphics Gmbh Strahlungsempfindliche Zusammensetzungen und darauf basierende bebilderbare Elemente
US7198834B2 (en) 2005-03-22 2007-04-03 Hewlett-Packard Development Company, L.P. Imaging media including interference layer for generating human-readable marking on optical media
US7270944B2 (en) * 2005-03-29 2007-09-18 Hewlett-Packard Development Company, L.P. Compositions, systems, and methods for imaging
ES2333442T3 (es) 2005-08-26 2010-02-22 Agfa Graphics N.V. Precursor de placa de impresion fotopolimerico.
EP2735903B1 (en) 2012-11-22 2019-02-27 Eastman Kodak Company Negative working lithographic printing plate precursors comprising a hyperbranched binder material
EP2778782B1 (en) 2013-03-13 2015-12-30 Kodak Graphic Communications GmbH Negative working radiation-sensitive elements
US11313048B2 (en) 2019-06-27 2022-04-26 Prc-Desoto International, Inc. Addition polymer for electrodepositable coating compositions
US11485874B2 (en) 2019-06-27 2022-11-01 Prc-Desoto International, Inc. Addition polymer for electrodepositable coating compositions
US11274167B2 (en) * 2019-06-27 2022-03-15 Prc-Desoto International, Inc. Carbamate functional monomers and polymers and use thereof

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3488269A (en) * 1965-09-15 1970-01-06 Technical Operations Inc Labile hydrogen initiators for visible light photopolymerization
GB1165570A (en) * 1966-12-08 1969-10-01 Agfa Gevaert Nv Photopolymerization of Ethylenically Unsaturated Compounds
US3759807A (en) * 1969-01-28 1973-09-18 Union Carbide Corp Photopolymerization process using combination of organic carbonyls and amines
GB1408265A (en) * 1971-10-18 1975-10-01 Ici Ltd Photopolymerisable composition
US4174307A (en) * 1972-12-14 1979-11-13 Polychrome Corporation Room-temperature-radiation-curable polyurethane
DE2602419A1 (de) * 1976-01-23 1977-07-28 Basf Ag Photopolymerisierbare masse
AT369757B (de) * 1981-02-02 1983-01-25 Inna Alexeevna Pronina Gemisch fuer strahlenchemische bzw. fotochemische haertung von anstrichen, klebstoffen, kompound- und dichtungsmassen
DE3540480A1 (de) * 1985-11-15 1987-05-21 Hoechst Ag Durch strahlung polymerisierbares gemisch, daraus hergestelltes aufzeichnungsmaterial und verfahren zur herstellung von reliefaufzeichnungen
DE3710281A1 (de) * 1987-03-28 1988-10-06 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial

Also Published As

Publication number Publication date
EP0355387B1 (de) 1994-03-09
DE3824903A1 (de) 1990-02-01
EP0355387A3 (en) 1990-03-14
JPH0273813A (ja) 1990-03-13
DE58907165D1 (de) 1994-04-14
KR0135077B1 (ko) 1998-04-18
JP2700168B2 (ja) 1998-01-19
US5066564A (en) 1991-11-19
EP0355387A2 (de) 1990-02-28

Similar Documents

Publication Publication Date Title
KR910003439A (ko) 광중합성 혼합물 및 이로부터 제조된 기록 재료
MX166036B (es) Metodo para reducir la formacion de hojas durante la polimerizacion de alfa-olefinas
KR890008075A (ko) 중합가능성 화합물, 및 이를 함유하는 방사선-중합가능성 혼합물
KR930021649A (ko) 플루오르를 함유하지 않는 티타노센 및 그의 용도
JPS54151024A (en) Photopolymerizable composition
KR880011211A (ko) 중합성 화합물 및 이를 함유하는 방사선-중합성 혼합물
KR880011261A (ko) 광중합성 혼합물 및 이로부터 제조된 기록재료
KR880011262A (ko) 광중합성 혼합물 및 이로부터 제조된 기록 재료
KR850003453A (ko) 4,6-비스-트리클로로메틸-s-트리안진의 제조방법 및 이를 함유하는 감광성 혼합물
ZA888961B (en) Titanocenes,the use thereof,and n-substituted pyrroles
KR890010615A (ko) 광중합성 혼합물 및 이로부터 제조된 기록물질
EP0377321A3 (en) Photopolymerizable composition
KR940014470A (ko) 포지티브 포토레지스트로서 유용한 중합체 및 이를 포함하는 조성물
KR970066718A (ko) 감방사선성 수지 조성물
KR910017240A (ko) 광중합성 혼합물 및 이로부터 제조된 기록 물질
ATE179427T1 (de) Verfahren zur herstellung von nukleosiden
MX9302957A (es) Compuestos de xantina, procedimiento para su preparacion y composiciones farmaceuticas que los contienen.
KR910012800A (ko) 염료-벤질트리아릴 보레이트 광개시제
ES2092116T3 (es) Policarbonatos y sus usos para la preparacion de matrices bioerosionables.
AU8754882A (en) Photopolymerisation process
JPS51139842A (en) Stabilizer for synthetic polymeric material
KR880008980A (ko) 안트라퀴논 화합물 및 이를 함유하는 편광 필름
KR970071129A (ko) 디 또는 트리페닐모노테르펜 탄화수소 유도체, 용해 제어제 및 화학 증폭 포지형 레지스트 재료
JPS5575405A (en) Photopolymerizable composition
KR900016429A (ko) 광학적 활성 디에스테르

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20001229

Year of fee payment: 5

LAPS Lapse due to unpaid annual fee