KR20040006546A - 프리컷 다이싱 테이프와 범용 다이싱 테이프를 웨이퍼에마운팅할 수 있는 다이싱 테이프 부착 장비 및 이를포함하는 인라인 시스템 - Google Patents
프리컷 다이싱 테이프와 범용 다이싱 테이프를 웨이퍼에마운팅할 수 있는 다이싱 테이프 부착 장비 및 이를포함하는 인라인 시스템 Download PDFInfo
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- KR20040006546A KR20040006546A KR1020020040846A KR20020040846A KR20040006546A KR 20040006546 A KR20040006546 A KR 20040006546A KR 1020020040846 A KR1020020040846 A KR 1020020040846A KR 20020040846 A KR20020040846 A KR 20020040846A KR 20040006546 A KR20040006546 A KR 20040006546A
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- Prior art keywords
- dicing tape
- wafer
- tape
- general
- cut
- Prior art date
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- 238000000034 method Methods 0.000 claims description 46
- 239000004065 semiconductor Substances 0.000 claims description 38
- 238000003475 lamination Methods 0.000 claims description 33
- 238000005498 polishing Methods 0.000 claims description 27
- 238000004804 winding Methods 0.000 claims description 9
- 238000005520 cutting process Methods 0.000 claims description 8
- 238000003825 pressing Methods 0.000 claims description 7
- 230000001678 irradiating effect Effects 0.000 claims description 6
- 238000011109 contamination Methods 0.000 claims description 5
- 238000011084 recovery Methods 0.000 claims description 5
- 235000012431 wafers Nutrition 0.000 description 135
- 239000012790 adhesive layer Substances 0.000 description 11
- 238000010586 diagram Methods 0.000 description 8
- 239000004593 Epoxy Substances 0.000 description 7
- 238000012986 modification Methods 0.000 description 7
- 230000004048 modification Effects 0.000 description 7
- 238000007517 polishing process Methods 0.000 description 6
- 239000010410 layer Substances 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- 239000000853 adhesive Substances 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 229920000139 polyethylene terephthalate Polymers 0.000 description 4
- 239000005020 polyethylene terephthalate Substances 0.000 description 4
- 238000004148 unit process Methods 0.000 description 3
- -1 PolyEthylene Terephthalate Polymers 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000002390 adhesive tape Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 1
- 239000002313 adhesive film Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 229920002994 synthetic fiber Polymers 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/52—Mounting semiconductor bodies in containers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68381—Details of chemical or physical process used for separating the auxiliary support from a device or wafer
- H01L2221/68386—Separation by peeling
- H01L2221/68395—Separation by peeling using peeling wheel
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49121—Beam lead frame or beam lead device
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/53—Means to assemble or disassemble
- Y10T29/5313—Means to assemble electrical device
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/53—Means to assemble or disassemble
- Y10T29/5313—Means to assemble electrical device
- Y10T29/53187—Multiple station assembly apparatus
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/53—Means to assemble or disassemble
- Y10T29/5313—Means to assemble electrical device
- Y10T29/53261—Means to align and advance work part
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Dicing (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Abstract
Description
Claims (14)
- 밑면이 연마되지 않은 웨이퍼를 장비 내부로 로딩하는 웨이퍼 로딩부;상기 웨이퍼 로딩부에서 이송된 웨이퍼의 밑면을 연마하는 웨이퍼 밑면 연마장비(wafer backside grinder);상기 웨이퍼 밑면 연마장비에서 연마가 완료된 웨이퍼의 밑면에 링 프레임을 사용하여 다이싱(Dicing) 테이프를 부착하는 다이싱 테이프 부착장비(dicing tape mounter); 및상기 다이싱 테이프에 웨이퍼가 부착된 링 프레임을 장비 밖으로 이송하는 언로딩부(unloading portion)로 이루어진 반도체 패키지 조립공정의 인라인 시스템에 있어서,상기 다이싱 테이프 부착장비는,프리컷 다이싱 테이프(pre-cut dicing tape)와 범용 다이싱 테이프(general dicing tape)를 웨이퍼 밑면에 부착하는 기능이 있는 것을 특징으로 하는 반도체 패키지 조립공정의 인라인 시스템.
- 제1항에 있어서,상기 웨이퍼 로딩부로 로딩되는 웨이퍼는, 웨이퍼 밑면 연마장비에서의 오염을 방지하기 위해 웨이퍼 전면(topside)에 라미네이션 테이프(lamination tape)가 부착된 것을 특징으로 하는 반도체 패키지 조립공정의 인라인 시스템.
- 제1항에 있어서,상기 웨이퍼 밑면 연마장비는 연마가 완료된 후 라미네이션 테이프를 효과적으로 제거하기 위해 UV 광선을 조사하는 UV 광선 조사부(UV light irradiation portion)를 내부에 구비하는 것을 특징으로 하는 반도체 패키지 조립공정의 인라인 시스템.
- 제1항에 있어서,상기 웨이퍼 밑면 연마장비에서 연마가 완료된 웨이퍼는 두께가 20 ~ 200㎛ 범위인 것을 특징으로 하는 반도체 패키지 조립공정의 인라인 시스템.
- 제1항에 있어서,상기 다이싱 테이프 부착장비는,상기 프리컷 다이싱 테이프 혹은 범용 다이싱 테이프를 공급하는 테이프 로더(tape loader);상기 프리컷 다이싱 테이프 혹은 범용 다이싱 테이프에서 분리된 라이너 필름(liner film)이 감기는 라이너 필름 회수릴(liner film winding reel);상기 프리컷 다이싱 테이프 혹은 범용 다이싱 테이프를 웨이퍼에 부착하는데 사용되는 링 프레임을 적재하여 마운팅 테이블(mounting table)로 공급하는 링 프레임 적재부;상기 링 프레임 및 웨이퍼에 프리컷 다이싱 테이프 혹은 범용 다이싱 테이프를 부착하는 장소인 마운팅 테이블;상기 테이프 로더에서 나온 프리컷 다이싱 테이프 혹은 범용 다이싱 테이프를 웨이퍼 및 링 프레임에 눌러 부착하는 프레스 롤러부(press roller portion);상기 마운팅 테이블에서 범용 다이싱 테이프를 부착하고 남는 잔량을 수거하는 필링 유닛(peeling unit);상기 프리컷 다이싱 테이프 혹은 범용 다이싱 테이프의 부착이 완료된 링 프레임을 라미네이션 테이프 제거부로 이송하는 마운팅 프레임 트랜스퍼부(mount frame transfer portion); 및상기 범용 다이싱 테이프를 웨이퍼 및 링 프레임 밑면에 부착하고 남는 부분을 절단하는 역할을 수행하는 테이프 컷터부(tape cutter portion)를 구비하는 것을 특징으로 하는 반도체 패키지 조립공정의 인라인 시스템.
- 제5항에 있어서,상기 테이프 로더는,프리컷 다이싱 테이프를 공급할 때와 범용 다이싱 테이프를 공급할 때에 회전방향을 달리하는 것을 특징으로 하는 반도체 패키지 조립공정의 인라인 시스템.
- 제6항에 있어서,상기 테이프 로더는,프리컷 다이싱 테이프를 공급할 때에 시계방향으로 회전하는 것을 특징으로 하는 반도체 패키지 조립공정의 인라인 시스템.
- 제6항에 있어서,상기 테이프 로더는,범용 다이싱 테이프를 공급할 때에 반시계 방향으로 회전하는 것을 특징으로 하는 반도체 패키지 조립공정의 인라인 시스템.
- 제5항에 있어서,상기 라이너 필름 회수릴은 프리컷 다이싱 테이프의 경우에 라이너 필름을 포함하여 프리컷되고 남은 잔량도 함께 회수하는 것을 특징으로 하는 반도체 패키지 조립공정의 인라인 시스템.
- 제1항에 있어서,상기 반도체 패키지 조립공정의 인라인 시스템은,상기 웨이퍼 밑면 연마장비에서 부착된 라미네이션 테이프를 떼어내는(detach) 기능을 수행하는 라미네이션 테이프 제거부를 더 구비하는 것을 특징으로 하는 반도체 패키지 조립공정의 인라인 시스템.
- 회전방향을 달리하면서 프리컷 다이싱 테이프 혹은 범용 다이싱 테이프를 공급하는 테이프 로더(tape loader);상기 프리컷 다이싱 테이프 혹은 범용 다이싱 테이프에서 분리된 라이너 필름(liner film)이 감기는 라이너 필름 회수릴(liner film winding reel);상기 프리컷 다이싱 테이프 혹은 범용 다이싱 테이프를 웨이퍼에 부착하는데 사용되는 링 프레임을 적재하여 마운팅 테이블로 공급하는 역할을 수행하는 링 프레임 적재부;상기 프리컷 다이싱 테이프 혹은 범용 다이싱 테이프가 부착되는 웨이퍼를 적재하여 마운팅 테이블로 공급하는 역할을 수행하는 웨이퍼 적재부;상기 링 프레임 및 웨이퍼에 프리컷 다이싱 테이프 혹은 범용 다이싱 테이프를 부착하는 장소인 마운팅 테이블;상기 테이프 로더에서 공급된 프리컷 다이싱 테이프 혹은 범용 다이싱 테이프를 웨이퍼 및 링 프레임에 눌러 부착하는 프레스 롤러부(press roller portion);상기 마운팅 테이블에서 범용 다이싱 테이프를 부착하고 남는 잔량을 수거하는 필링 유닛(peeling unit);상기 범용 다이싱 테이프를 웨이퍼 및 링 프레임 밑면에 부착하고 남는 부분을 절단하는 역할을 수행하는 테이프 컷터부(tape cutter portion); 및상기 프리컷 다이싱 테이프 혹은 범용 다이싱 테이프의 부착이 완료된 링 프레임을 외부로 이송하는 언로딩부(unloading portion)를 구비하는 것을 특징으로 프리컷 다이싱 테이프 및 범용 다이싱 테이프를 웨이퍼 밑면에 부착할 수 있는 다이싱 테이프 부착장비.
- 제11항에 있어서,상기 테이프 로더는,프리컷 다이싱 테이프를 로딩할 때에 시계방향으로 회전하는 것을 특징으로 하는 프리컷 다이싱 테이프 및 범용 다이싱 테이프를 웨이퍼 밑면에 부착할 수 있는 다이싱 테이프 부착장비.
- 제11항에 있어서,상기 테이프 로더는,범용 다이싱 테이프를 로딩할 때에 반시계방향으로 회전하는 것을 특징으로 하는 프리컷 다이싱 테이프 및 범용 다이싱 테이프를 웨이퍼 밑면에 부착할 수 있는 다이싱 테이프 부착장비.
- 제11항에 있어서,상기 라이너 필름 회수릴은 프리컷 다이싱 테이프의 경우에 라이너 필름을 포함하여 프리컷되고 남은 잔량도 함께 회수하는 것을 특징으로 하는 반도체 패키지 조립공정의 인라인 시스템.
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2002-0040846A KR100468748B1 (ko) | 2002-07-12 | 2002-07-12 | 프리컷 다이싱 테이프와 범용 다이싱 테이프를 웨이퍼에 마운팅할 수 있는 다이싱 테이프 부착 장비 및 이를포함하는 인라인 시스템 |
US10/607,600 US7051428B2 (en) | 2002-07-12 | 2003-06-27 | In line system used in a semiconductor package assembling |
TW092117788A TWI257141B (en) | 2002-07-12 | 2003-06-30 | Dicing tape attaching unit that can attach pre-cut dicing tape and general dicing tape to wafer and in-line system having the dicing tape attaching unit |
DE10332188A DE10332188B4 (de) | 2002-07-12 | 2003-07-10 | Inline-System für einen Halbleiterpackungs-Montageprozess und Chipvereinzelungs-Folienanbringungseinheit |
JP2003273111A JP2004040114A (ja) | 2002-07-12 | 2003-07-10 | プレカットダイシングテープと汎用ダイシングテープとをウェーハにマウンティングできるダイシングテープ付着装置及びそれを含むインラインシステム |
CNB031277888A CN1327500C (zh) | 2002-07-12 | 2003-07-12 | 切割带贴合单元和具有切割带贴合单元的序列式系统 |
US11/397,824 US20060177954A1 (en) | 2002-07-12 | 2006-04-03 | Dicing tape attaching unit that can attach pre-cut dicing tape and general dicing tape to wafer and in-line system having the dicing tape attaching unit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2002-0040846A KR100468748B1 (ko) | 2002-07-12 | 2002-07-12 | 프리컷 다이싱 테이프와 범용 다이싱 테이프를 웨이퍼에 마운팅할 수 있는 다이싱 테이프 부착 장비 및 이를포함하는 인라인 시스템 |
Publications (2)
Publication Number | Publication Date |
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KR20040006546A true KR20040006546A (ko) | 2004-01-24 |
KR100468748B1 KR100468748B1 (ko) | 2005-01-29 |
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KR10-2002-0040846A KR100468748B1 (ko) | 2002-07-12 | 2002-07-12 | 프리컷 다이싱 테이프와 범용 다이싱 테이프를 웨이퍼에 마운팅할 수 있는 다이싱 테이프 부착 장비 및 이를포함하는 인라인 시스템 |
Country Status (6)
Country | Link |
---|---|
US (2) | US7051428B2 (ko) |
JP (1) | JP2004040114A (ko) |
KR (1) | KR100468748B1 (ko) |
CN (1) | CN1327500C (ko) |
DE (1) | DE10332188B4 (ko) |
TW (1) | TWI257141B (ko) |
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-
2002
- 2002-07-12 KR KR10-2002-0040846A patent/KR100468748B1/ko active IP Right Grant
-
2003
- 2003-06-27 US US10/607,600 patent/US7051428B2/en not_active Expired - Lifetime
- 2003-06-30 TW TW092117788A patent/TWI257141B/zh not_active IP Right Cessation
- 2003-07-10 DE DE10332188A patent/DE10332188B4/de not_active Expired - Lifetime
- 2003-07-10 JP JP2003273111A patent/JP2004040114A/ja active Pending
- 2003-07-12 CN CNB031277888A patent/CN1327500C/zh not_active Expired - Lifetime
-
2006
- 2006-04-03 US US11/397,824 patent/US20060177954A1/en not_active Abandoned
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Publication number | Priority date | Publication date | Assignee | Title |
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KR100876155B1 (ko) * | 2006-11-28 | 2008-12-26 | 삼성전자주식회사 | 웨이퍼 보호테이프 커팅장치, 백 래핑설비 및 이를 사용한웨이퍼 보호테이프 커팅방법 |
Also Published As
Publication number | Publication date |
---|---|
US7051428B2 (en) | 2006-05-30 |
TWI257141B (en) | 2006-06-21 |
US20040009650A1 (en) | 2004-01-15 |
DE10332188A1 (de) | 2004-02-26 |
US20060177954A1 (en) | 2006-08-10 |
JP2004040114A (ja) | 2004-02-05 |
CN1327500C (zh) | 2007-07-18 |
DE10332188B4 (de) | 2009-11-26 |
TW200401391A (en) | 2004-01-16 |
CN1484290A (zh) | 2004-03-24 |
KR100468748B1 (ko) | 2005-01-29 |
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