KR102587691B1 - 포름알데히드 프리 무전해 구리 도금액 - Google Patents
포름알데히드 프리 무전해 구리 도금액 Download PDFInfo
- Publication number
- KR102587691B1 KR102587691B1 KR1020227045941A KR20227045941A KR102587691B1 KR 102587691 B1 KR102587691 B1 KR 102587691B1 KR 1020227045941 A KR1020227045941 A KR 1020227045941A KR 20227045941 A KR20227045941 A KR 20227045941A KR 102587691 B1 KR102587691 B1 KR 102587691B1
- Authority
- KR
- South Korea
- Prior art keywords
- copper plating
- electroless copper
- plating solution
- solution
- tellurium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/38—Coating with copper
- C23C18/40—Coating with copper using reducing agents
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemically Coating (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPJP-P-2020-187294 | 2020-11-10 | ||
| JP2020187294 | 2020-11-10 | ||
| PCT/JP2021/032487 WO2022102226A1 (ja) | 2020-11-10 | 2021-09-03 | 無電解銅めっき液 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20230011434A KR20230011434A (ko) | 2023-01-20 |
| KR102587691B1 true KR102587691B1 (ko) | 2023-10-10 |
Family
ID=81601091
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020227045941A Active KR102587691B1 (ko) | 2020-11-10 | 2021-09-03 | 포름알데히드 프리 무전해 구리 도금액 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US20230323541A1 (https=) |
| JP (1) | JP7111410B1 (https=) |
| KR (1) | KR102587691B1 (https=) |
| CN (1) | CN116194618A (https=) |
| DE (1) | DE112021005992T5 (https=) |
| MY (1) | MY199940A (https=) |
| TW (1) | TW202219320A (https=) |
| WO (1) | WO2022102226A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117448800B (zh) * | 2023-09-11 | 2025-12-26 | 广东利尔化学有限公司 | 一种镀铜液以及稳定剂 |
| TW202518607A (zh) * | 2023-10-30 | 2025-05-01 | 強茂股份有限公司 | 預成型封裝導線架的製造方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013234343A (ja) * | 2012-05-07 | 2013-11-21 | C Uyemura & Co Ltd | 無電解銅めっき浴及び無電解銅めっき方法 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2721567A1 (de) * | 1977-05-13 | 1978-11-16 | Cannings Ltd W | Loesung fuer die stromlose kupferplatierung |
| JPS53142328A (en) * | 1977-05-17 | 1978-12-12 | Canning & Co Ltd W | Solution for nonnelectrolytic copper plating |
| JP3227504B2 (ja) * | 1993-04-19 | 2001-11-12 | 奥野製薬工業株式会社 | 無電解銅めっき液 |
| JP2007092111A (ja) * | 2005-09-28 | 2007-04-12 | Okuno Chem Ind Co Ltd | めっき析出阻害用組成物 |
| EP2034049A1 (en) * | 2007-09-05 | 2009-03-11 | Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO | An electroless process for depositing a metal on a non-catalytic substrate |
| JP5337276B1 (ja) * | 2012-05-07 | 2013-11-06 | 鹿島建設株式会社 | 逆打ち工法用免震装置支持ユニット及びそれを使用した免震構造物の施工方法 |
| EP2784181B1 (en) * | 2013-03-27 | 2015-12-09 | ATOTECH Deutschland GmbH | Electroless copper plating solution |
| TWI690619B (zh) * | 2014-12-17 | 2020-04-11 | 德商德國艾托特克公司 | 鈀之電鍍浴組合物及無電電鍍方法 |
| KR101660520B1 (ko) * | 2015-04-08 | 2016-09-29 | 한국생산기술연구원 | 구리 및 니켈의 연속 무전해 도금방법 및 이를 이용하여 제조된 도금층 |
| US20170051411A1 (en) * | 2015-08-20 | 2017-02-23 | Macdermid Acumen, Inc. | Electroless Silver Plating Bath and Method of Using the Same |
-
2021
- 2021-09-03 WO PCT/JP2021/032487 patent/WO2022102226A1/ja not_active Ceased
- 2021-09-03 CN CN202180060016.XA patent/CN116194618A/zh active Pending
- 2021-09-03 DE DE112021005992.0T patent/DE112021005992T5/de active Pending
- 2021-09-03 KR KR1020227045941A patent/KR102587691B1/ko active Active
- 2021-09-03 JP JP2021572906A patent/JP7111410B1/ja active Active
- 2021-09-03 US US18/035,806 patent/US20230323541A1/en not_active Abandoned
- 2021-09-03 MY MYPI2023001353A patent/MY199940A/en unknown
- 2021-09-07 TW TW110133195A patent/TW202219320A/zh unknown
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013234343A (ja) * | 2012-05-07 | 2013-11-21 | C Uyemura & Co Ltd | 無電解銅めっき浴及び無電解銅めっき方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN116194618A (zh) | 2023-05-30 |
| JP7111410B1 (ja) | 2022-08-02 |
| WO2022102226A1 (ja) | 2022-05-19 |
| KR20230011434A (ko) | 2023-01-20 |
| US20230323541A1 (en) | 2023-10-12 |
| TW202219320A (zh) | 2022-05-16 |
| JPWO2022102226A1 (https=) | 2022-05-19 |
| MY199940A (en) | 2023-11-30 |
| DE112021005992T5 (de) | 2023-08-24 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0105 | International application |
Patent event date: 20221227 Patent event code: PA01051R01D Comment text: International Patent Application |
|
| A201 | Request for examination | ||
| A302 | Request for accelerated examination | ||
| PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 20230103 Comment text: Request for Examination of Application |
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| PA0302 | Request for accelerated examination |
Patent event date: 20230103 Patent event code: PA03022R01D Comment text: Request for Accelerated Examination |
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| PG1501 | Laying open of application | ||
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20230511 Patent event code: PE09021S01D |
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| E701 | Decision to grant or registration of patent right | ||
| PE0701 | Decision of registration |
Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 20230925 |
|
| GRNT | Written decision to grant | ||
| PR0701 | Registration of establishment |
Comment text: Registration of Establishment Patent event date: 20231005 Patent event code: PR07011E01D |
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| PR1002 | Payment of registration fee |
Payment date: 20231005 End annual number: 3 Start annual number: 1 |
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| PG1601 | Publication of registration |