KR101426250B1 - 고순도 실리카졸 및 그의 제조방법 - Google Patents
고순도 실리카졸 및 그의 제조방법 Download PDFInfo
- Publication number
- KR101426250B1 KR101426250B1 KR1020120133507A KR20120133507A KR101426250B1 KR 101426250 B1 KR101426250 B1 KR 101426250B1 KR 1020120133507 A KR1020120133507 A KR 1020120133507A KR 20120133507 A KR20120133507 A KR 20120133507A KR 101426250 B1 KR101426250 B1 KR 101426250B1
- Authority
- KR
- South Korea
- Prior art keywords
- solution
- concentration
- silica sol
- purified
- silicic acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
- C01B33/157—After-treatment of gels
- C01B33/158—Purification; Drying; Dehydrating
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
- C01B33/141—Preparation of hydrosols or aqueous dispersions
- C01B33/142—Preparation of hydrosols or aqueous dispersions by acidic treatment of silicates
- C01B33/143—Preparation of hydrosols or aqueous dispersions by acidic treatment of silicates of aqueous solutions of silicates
- C01B33/1435—Preparation of hydrosols or aqueous dispersions by acidic treatment of silicates of aqueous solutions of silicates using ion exchangers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1409—Abrasive particles per se
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Dispersion Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Silicon Compounds (AREA)
- Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011287575 | 2011-12-28 | ||
| JPJP-P-2011-287575 | 2011-12-28 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20130076705A KR20130076705A (ko) | 2013-07-08 |
| KR101426250B1 true KR101426250B1 (ko) | 2014-08-05 |
Family
ID=48990225
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020120133507A Active KR101426250B1 (ko) | 2011-12-28 | 2012-11-23 | 고순도 실리카졸 및 그의 제조방법 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US9598611B2 (https=) |
| JP (2) | JP6016625B2 (https=) |
| KR (1) | KR101426250B1 (https=) |
| TW (2) | TWI549911B (https=) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014511330A (ja) * | 2011-02-22 | 2014-05-15 | エボニック デグサ ゲーエムベーハー | アルカリ金属ケイ酸塩溶液からの高純度水性コロイダルシリカゾルの製造方法 |
| TWI584867B (zh) | 2011-09-05 | 2017-06-01 | 日產化學工業股份有限公司 | 經純化的矽酸鹼水溶液及矽溶膠的製造方法 |
| TWI549911B (zh) * | 2011-12-28 | 2016-09-21 | 日揮觸媒化成股份有限公司 | 高純度氧化矽溶膠及其製造方法 |
| JP6450124B2 (ja) * | 2014-09-25 | 2019-01-09 | パイオニア株式会社 | 発光装置 |
| CN104877401A (zh) * | 2015-05-25 | 2015-09-02 | 天津市职业大学 | 一种玻璃镀膜液的制备方法及应用 |
| KR102611733B1 (ko) | 2015-10-20 | 2023-12-11 | 닛산 가가쿠 가부시키가이샤 | 정제된 규산수용액의 제조방법 |
| CN106395833A (zh) * | 2016-08-31 | 2017-02-15 | 湖北金伟新材料有限公司 | 高纯度粒径均匀的催化剂用硅溶胶制备方法 |
| CN108083283B (zh) * | 2017-12-07 | 2021-08-20 | 临汾博利士纳米材料有限公司 | 铝改性酸性硅溶胶及其制备方法 |
| KR102686976B1 (ko) | 2018-02-26 | 2024-07-19 | 닛산 가가쿠 가부시키가이샤 | 가늘고 긴 입자형상을 갖는 실리카졸의 제조방법 |
| CN110217799B (zh) * | 2018-03-02 | 2020-12-18 | 中国石油化工股份有限公司 | 硅溶胶及其制备方法 |
| JP2019036758A (ja) * | 2018-12-07 | 2019-03-07 | パイオニア株式会社 | 発光装置 |
| CN111747419B (zh) * | 2020-07-08 | 2023-08-22 | 青岛美高集团有限公司 | 一种降低硅胶中重金属含量的方法 |
| CN111732107B (zh) * | 2020-07-10 | 2021-03-30 | 阳江市惠尔特新材料科技有限公司 | 一种水玻璃制备超大粒径高浓度硅溶胶的方法 |
| CN114249330B (zh) * | 2020-09-21 | 2023-01-17 | 航天特种材料及工艺技术研究所 | 一种制备大粒径窄分布硅溶胶的方法 |
| CN112299424B (zh) * | 2020-09-29 | 2022-07-26 | 航天特种材料及工艺技术研究所 | 一种制备低金属含量高纯硅酸的方法 |
| KR102657883B1 (ko) * | 2021-08-02 | 2024-04-17 | (주)에이스나노켐 | 규산의 금속 불순물 제거 방법, 고순도 규산 및 고순도 콜로이달 실리카 |
| CN114195154A (zh) * | 2021-12-27 | 2022-03-18 | 于向真 | 一种以水玻璃生产硅溶胶的制备方法 |
| CN116124560B (zh) * | 2022-12-27 | 2026-04-07 | 科之杰新材料集团有限公司 | 硅溶胶溶液作为一价碱金属盐类窗片或二价碱土金属盐类窗片处理剂的应用及应用的方法 |
| US20250243073A1 (en) | 2024-01-26 | 2025-07-31 | Pq Llc | Manipulation of sodium silicate ratio on metal removal by ultrafiltration and ultrafiltered biogenic silicate purification |
| CN120157137B (zh) * | 2025-03-12 | 2025-12-05 | 中国科学院宁波材料技术与工程研究所 | 一种高纯二氧化硅溶胶的制备方法及其应用 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003089786A (ja) * | 2001-09-19 | 2003-03-28 | Nippon Chem Ind Co Ltd | 研磨剤用高純度コロイダルシリカ |
| JP2006104354A (ja) * | 2004-10-06 | 2006-04-20 | Nippon Chem Ind Co Ltd | 研磨用組成物、その製造方法及び該研磨用組成物を用いる研磨方法 |
Family Cites Families (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0557740B1 (en) | 1992-02-27 | 1997-05-28 | Nissan Chemical Industries Ltd. | Method of preparing high-purity aqueous silica sol |
| JPH11214338A (ja) * | 1998-01-20 | 1999-08-06 | Memc Kk | シリコンウェハーの研磨方法 |
| JP2001302254A (ja) | 2000-04-26 | 2001-10-31 | Watanabe Shoko:Kk | 含水シリカゲルの脱水方法及び合成石英ガラス粉末の製造方法 |
| KR100720016B1 (ko) * | 1999-12-28 | 2007-05-18 | 가부시키가이샤 와타나베 쇼코 | 실리카 입자, 합성 석영 가루 및 합성 석영 유리의 합성방법 |
| JP2001294420A (ja) * | 2000-04-12 | 2001-10-23 | Nippon Chem Ind Co Ltd | 珪酸アルカリ水溶液の精製方法 |
| JP2001294417A (ja) | 2000-04-12 | 2001-10-23 | Nippon Chem Ind Co Ltd | コロイダルシリカの製造方法 |
| JP2002173314A (ja) | 2000-11-30 | 2002-06-21 | Watanabe Shoko:Kk | 高純度コロイダルシリカ及び高純度合成石英粉の製造方法 |
| KR20040094758A (ko) * | 2002-03-04 | 2004-11-10 | 가부시키가이샤 후지미인코퍼레이티드 | 연마용 조성물 및 이를 사용한 배선구조의 형성방법 |
| DE10211958A1 (de) * | 2002-03-18 | 2003-10-16 | Wacker Chemie Gmbh | Hochreines Silica-Pulver, Verfahren und Vorrichtung zu seiner Herstellung |
| JP4912592B2 (ja) * | 2002-11-08 | 2012-04-11 | 株式会社フジミインコーポレーテッド | 研磨用組成物及びその使用方法 |
| JP4264701B2 (ja) | 2002-12-11 | 2009-05-20 | 日産化学工業株式会社 | 低アルカリ金属含有水性シリカゾルの製造方法 |
| JP2004315300A (ja) * | 2003-04-17 | 2004-11-11 | Nippon Steel Chem Co Ltd | シリカ微粒子、それが分散したシリカコロイド及びその製造方法 |
| JP4566645B2 (ja) * | 2003-07-25 | 2010-10-20 | 扶桑化学工業株式会社 | シリカゾル及びその製造方法 |
| JP4011566B2 (ja) * | 2003-07-25 | 2007-11-21 | 扶桑化学工業株式会社 | シリカゾル及びその製造方法 |
| JP4580674B2 (ja) | 2004-04-13 | 2010-11-17 | 裕子 石栗 | 微細な高純度金属酸化物の製造方法 |
| TW200604097A (en) * | 2004-07-26 | 2006-02-01 | Fuso Chemical Co Ltd | Silica sol and manufacturing method therefor |
| JP2006036605A (ja) * | 2004-07-29 | 2006-02-09 | Catalysts & Chem Ind Co Ltd | 高純度水性シリカゾルの製造方法 |
| JP3659965B1 (ja) | 2004-08-06 | 2005-06-15 | 日本化学工業株式会社 | 高純度コロイダルシリカの製造方法 |
| TW200619368A (en) * | 2004-10-28 | 2006-06-16 | Nissan Chemical Ind Ltd | Polishing composition for silicon wafer |
| JP2006202932A (ja) * | 2005-01-20 | 2006-08-03 | Nippon Chem Ind Co Ltd | 研磨用組成物、その製造方法及び該研磨用組成物を用いる研磨方法 |
| JP5127452B2 (ja) * | 2005-08-10 | 2013-01-23 | 日揮触媒化成株式会社 | 異形シリカゾルの製造方法 |
| WO2007038321A2 (en) * | 2005-09-26 | 2007-04-05 | Planar Solutions, Llc | Ultrapure colloidal silica for use in chemical mechanical polishing applications |
| US9550683B2 (en) * | 2007-03-27 | 2017-01-24 | Fuso Chemical Co., Ltd. | Colloidal silica, and method for production thereof |
| TWI549911B (zh) * | 2011-12-28 | 2016-09-21 | 日揮觸媒化成股份有限公司 | 高純度氧化矽溶膠及其製造方法 |
-
2012
- 2012-11-20 TW TW101143206A patent/TWI549911B/zh active
- 2012-11-20 TW TW105108078A patent/TWI681929B/zh active
- 2012-11-23 KR KR1020120133507A patent/KR101426250B1/ko active Active
- 2012-12-27 US US13/727,791 patent/US9598611B2/en active Active
- 2012-12-27 JP JP2012284078A patent/JP6016625B2/ja active Active
-
2016
- 2016-09-27 JP JP2016188793A patent/JP2017036209A/ja active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003089786A (ja) * | 2001-09-19 | 2003-03-28 | Nippon Chem Ind Co Ltd | 研磨剤用高純度コロイダルシリカ |
| JP2006104354A (ja) * | 2004-10-06 | 2006-04-20 | Nippon Chem Ind Co Ltd | 研磨用組成物、その製造方法及び該研磨用組成物を用いる研磨方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP6016625B2 (ja) | 2016-10-26 |
| JP2013151409A (ja) | 2013-08-08 |
| KR20130076705A (ko) | 2013-07-08 |
| TWI681929B (zh) | 2020-01-11 |
| US20140013674A1 (en) | 2014-01-16 |
| TW201332895A (zh) | 2013-08-16 |
| US9598611B2 (en) | 2017-03-21 |
| JP2017036209A (ja) | 2017-02-16 |
| TW201623146A (zh) | 2016-07-01 |
| TWI549911B (zh) | 2016-09-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR101426250B1 (ko) | 고순도 실리카졸 및 그의 제조방법 | |
| EP2678399B1 (de) | Verfahren zur herstellung wässriger kolloidaler silikasole hoher reinheit aus alkalimetallsilikatlösungen | |
| JP3195569B2 (ja) | 繭型コロイダルシリカの製造方法 | |
| KR101795042B1 (ko) | 고순도 원소 인의 제조 방법 및 고순도 인산의 제조 방법 | |
| JP5221517B2 (ja) | アルミ改質コロイダルシリカ及びその製造方法 | |
| JP6134599B2 (ja) | 高純度シリカゾルおよびその製造方法 | |
| CN1315725C (zh) | 二氧化硅粒子、合成石英粉、合成石英玻璃的合成方法 | |
| JP2001294417A (ja) | コロイダルシリカの製造方法 | |
| CN112299424A (zh) | 一种制备低金属含量高纯硅酸的方法 | |
| JP6047395B2 (ja) | 高純度シリカゾルおよびその製造方法 | |
| US20090253813A1 (en) | Colloidal silica consisting of silica particles fixing nitrogen contained alkaline compound | |
| JP2006045039A (ja) | 高純度コロイダルシリカの製造方法 | |
| JP3362793B2 (ja) | シリカゾルの製造方法 | |
| US20090286154A1 (en) | Process for the Preparation of an Electrolyte | |
| JP3659965B1 (ja) | 高純度コロイダルシリカの製造方法 | |
| JP2006104354A (ja) | 研磨用組成物、その製造方法及び該研磨用組成物を用いる研磨方法 | |
| JP3478394B2 (ja) | シリカゾル及びシリカ粉末 | |
| JP2007176710A (ja) | 酸化アンチモンゾルの製造方法および酸化アンチモンゾル | |
| JP2004189534A (ja) | 低アルカリ金属含有水性シリカゾルの製造方法 | |
| JP3478395B2 (ja) | シリカゾル及びシリカ粉末 | |
| JP4504491B2 (ja) | 高純度合成石英粉の製造方法 | |
| JP3362792B2 (ja) | シリカゾルの製造方法 | |
| JP5377134B2 (ja) | コロイダルシリカの製造方法 | |
| JP2006202932A (ja) | 研磨用組成物、その製造方法及び該研磨用組成物を用いる研磨方法 | |
| JP2002173316A (ja) | 高純度コロイダルシリカ等の製造方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A201 | Request for examination | ||
| PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 20121123 |
|
| PA0201 | Request for examination | ||
| PG1501 | Laying open of application | ||
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20140116 Patent event code: PE09021S01D |
|
| E701 | Decision to grant or registration of patent right | ||
| PE0701 | Decision of registration |
Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 20140724 |
|
| GRNT | Written decision to grant | ||
| PR0701 | Registration of establishment |
Comment text: Registration of Establishment Patent event date: 20140729 Patent event code: PR07011E01D |
|
| PR1002 | Payment of registration fee |
Payment date: 20140729 End annual number: 3 Start annual number: 1 |
|
| PG1601 | Publication of registration | ||
| FPAY | Annual fee payment |
Payment date: 20170508 Year of fee payment: 4 |
|
| PR1001 | Payment of annual fee |
Payment date: 20170508 Start annual number: 4 End annual number: 4 |
|
| FPAY | Annual fee payment |
Payment date: 20180628 Year of fee payment: 5 |
|
| PR1001 | Payment of annual fee |
Payment date: 20180628 Start annual number: 5 End annual number: 5 |
|
| FPAY | Annual fee payment |
Payment date: 20190627 Year of fee payment: 6 |
|
| PR1001 | Payment of annual fee |
Payment date: 20190627 Start annual number: 6 End annual number: 6 |
|
| PR1001 | Payment of annual fee |
Payment date: 20200630 Start annual number: 7 End annual number: 7 |
|
| PR1001 | Payment of annual fee |
Payment date: 20210629 Start annual number: 8 End annual number: 8 |
|
| PR1001 | Payment of annual fee |
Payment date: 20240619 Start annual number: 11 End annual number: 11 |
|
| PR1001 | Payment of annual fee |
Payment date: 20250616 Start annual number: 12 End annual number: 12 |