JP6016625B2 - 高純度シリカゾルおよびその製造方法 - Google Patents

高純度シリカゾルおよびその製造方法 Download PDF

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Publication number
JP6016625B2
JP6016625B2 JP2012284078A JP2012284078A JP6016625B2 JP 6016625 B2 JP6016625 B2 JP 6016625B2 JP 2012284078 A JP2012284078 A JP 2012284078A JP 2012284078 A JP2012284078 A JP 2012284078A JP 6016625 B2 JP6016625 B2 JP 6016625B2
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solution
concentration
silica sol
purified
silicic acid
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JP2013151409A (ja
JP2013151409A5 (https=
Inventor
中山　和洋
和洋 中山
中島　昭
昭 中島
小松　通郎
通郎 小松
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JGC Catalysts and Chemicals Ltd
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JGC Catalysts and Chemicals Ltd
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Priority to JP2012284078A priority Critical patent/JP6016625B2/ja
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Publication of JP2013151409A5 publication Critical patent/JP2013151409A5/ja
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    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/157—After-treatment of gels
    • C01B33/158—Purification; Drying; Dehydrating
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/141—Preparation of hydrosols or aqueous dispersions
    • C01B33/142—Preparation of hydrosols or aqueous dispersions by acidic treatment of silicates
    • C01B33/143—Preparation of hydrosols or aqueous dispersions by acidic treatment of silicates of aqueous solutions of silicates
    • C01B33/1435—Preparation of hydrosols or aqueous dispersions by acidic treatment of silicates of aqueous solutions of silicates using ion exchangers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1409—Abrasive particles per se

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Silicon Compounds (AREA)
  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
JP2012284078A 2011-12-28 2012-12-27 高純度シリカゾルおよびその製造方法 Active JP6016625B2 (ja)

Priority Applications (1)

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JP2012284078A JP6016625B2 (ja) 2011-12-28 2012-12-27 高純度シリカゾルおよびその製造方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2011287575 2011-12-28
JP2011287575 2011-12-28
JP2012284078A JP6016625B2 (ja) 2011-12-28 2012-12-27 高純度シリカゾルおよびその製造方法

Related Child Applications (1)

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JP2016188793A Division JP2017036209A (ja) 2011-12-28 2016-09-27 高純度シリカゾルおよびその製造方法

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JP2013151409A JP2013151409A (ja) 2013-08-08
JP2013151409A5 JP2013151409A5 (https=) 2015-11-05
JP6016625B2 true JP6016625B2 (ja) 2016-10-26

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JP2016188793A Pending JP2017036209A (ja) 2011-12-28 2016-09-27 高純度シリカゾルおよびその製造方法

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Country Status (4)

Country Link
US (1) US9598611B2 (https=)
JP (2) JP6016625B2 (https=)
KR (1) KR101426250B1 (https=)
TW (2) TWI549911B (https=)

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JP2014511330A (ja) * 2011-02-22 2014-05-15 エボニック デグサ ゲーエムベーハー アルカリ金属ケイ酸塩溶液からの高純度水性コロイダルシリカゾルの製造方法
TWI584867B (zh) 2011-09-05 2017-06-01 日產化學工業股份有限公司 經純化的矽酸鹼水溶液及矽溶膠的製造方法
TWI549911B (zh) * 2011-12-28 2016-09-21 日揮觸媒化成股份有限公司 高純度氧化矽溶膠及其製造方法
JP6450124B2 (ja) * 2014-09-25 2019-01-09 パイオニア株式会社 発光装置
CN104877401A (zh) * 2015-05-25 2015-09-02 天津市职业大学 一种玻璃镀膜液的制备方法及应用
KR102611733B1 (ko) 2015-10-20 2023-12-11 닛산 가가쿠 가부시키가이샤 정제된 규산수용액의 제조방법
CN106395833A (zh) * 2016-08-31 2017-02-15 湖北金伟新材料有限公司 高纯度粒径均匀的催化剂用硅溶胶制备方法
CN108083283B (zh) * 2017-12-07 2021-08-20 临汾博利士纳米材料有限公司 铝改性酸性硅溶胶及其制备方法
KR102686976B1 (ko) 2018-02-26 2024-07-19 닛산 가가쿠 가부시키가이샤 가늘고 긴 입자형상을 갖는 실리카졸의 제조방법
CN110217799B (zh) * 2018-03-02 2020-12-18 中国石油化工股份有限公司 硅溶胶及其制备方法
JP2019036758A (ja) * 2018-12-07 2019-03-07 パイオニア株式会社 発光装置
CN111747419B (zh) * 2020-07-08 2023-08-22 青岛美高集团有限公司 一种降低硅胶中重金属含量的方法
CN111732107B (zh) * 2020-07-10 2021-03-30 阳江市惠尔特新材料科技有限公司 一种水玻璃制备超大粒径高浓度硅溶胶的方法
CN114249330B (zh) * 2020-09-21 2023-01-17 航天特种材料及工艺技术研究所 一种制备大粒径窄分布硅溶胶的方法
CN112299424B (zh) * 2020-09-29 2022-07-26 航天特种材料及工艺技术研究所 一种制备低金属含量高纯硅酸的方法
KR102657883B1 (ko) * 2021-08-02 2024-04-17 (주)에이스나노켐 규산의 금속 불순물 제거 방법, 고순도 규산 및 고순도 콜로이달 실리카
CN114195154A (zh) * 2021-12-27 2022-03-18 于向真 一种以水玻璃生产硅溶胶的制备方法
CN116124560B (zh) * 2022-12-27 2026-04-07 科之杰新材料集团有限公司 硅溶胶溶液作为一价碱金属盐类窗片或二价碱土金属盐类窗片处理剂的应用及应用的方法
US20250243073A1 (en) 2024-01-26 2025-07-31 Pq Llc Manipulation of sodium silicate ratio on metal removal by ultrafiltration and ultrafiltered biogenic silicate purification
CN120157137B (zh) * 2025-03-12 2025-12-05 中国科学院宁波材料技术与工程研究所 一种高纯二氧化硅溶胶的制备方法及其应用

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Also Published As

Publication number Publication date
JP2013151409A (ja) 2013-08-08
KR20130076705A (ko) 2013-07-08
TWI681929B (zh) 2020-01-11
US20140013674A1 (en) 2014-01-16
TW201332895A (zh) 2013-08-16
US9598611B2 (en) 2017-03-21
JP2017036209A (ja) 2017-02-16
KR101426250B1 (ko) 2014-08-05
TW201623146A (zh) 2016-07-01
TWI549911B (zh) 2016-09-21

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