KR101237198B1 - 발광 다이오드 및 그 제조 방법, 집적형 발광 다이오드 및 그 제조 방법, 질화물계 ⅲ-ⅴ족 화합물 반도체의 성장 방법, 광원 셀 유닛, 발광 다이오드 백라이트, 발광 다이오드 디스플레이, 및 전자 기기 - Google Patents
발광 다이오드 및 그 제조 방법, 집적형 발광 다이오드 및 그 제조 방법, 질화물계 ⅲ-ⅴ족 화합물 반도체의 성장 방법, 광원 셀 유닛, 발광 다이오드 백라이트, 발광 다이오드 디스플레이, 및 전자 기기 Download PDFInfo
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- KR101237198B1 KR101237198B1 KR1020060043374A KR20060043374A KR101237198B1 KR 101237198 B1 KR101237198 B1 KR 101237198B1 KR 1020060043374 A KR1020060043374 A KR 1020060043374A KR 20060043374 A KR20060043374 A KR 20060043374A KR 101237198 B1 KR101237198 B1 KR 101237198B1
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- South Korea
- Prior art keywords
- light emitting
- emitting diode
- semiconductor layer
- compound semiconductor
- gan
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
- H10H20/011—Manufacture or treatment of bodies, e.g. forming semiconductor layers
- H10H20/013—Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials
- H10H20/0133—Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials with a substrate not being Group III-V materials
- H10H20/01335—Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials with a substrate not being Group III-V materials the light-emitting regions comprising nitride materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/815—Bodies having stress relaxation structures, e.g. buffer layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/484—Connecting portions
- H01L2224/48463—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond
- H01L2224/48465—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond the other connecting portion not on the bonding area being a wedge bond, i.e. ball-to-wedge, regular stitch
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1304—Transistor
- H01L2924/1305—Bipolar Junction Transistor [BJT]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/819—Bodies characterised by their shape, e.g. curved or truncated substrates
- H10H20/82—Roughened surfaces, e.g. at the interface between epitaxial layers
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- Led Devices (AREA)
- Led Device Packages (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005142462 | 2005-05-16 | ||
| JPJP-P-2005-00142462 | 2005-05-16 | ||
| JP2006105647A JP5082278B2 (ja) | 2005-05-16 | 2006-04-06 | 発光ダイオードの製造方法、集積型発光ダイオードの製造方法および窒化物系iii−v族化合物半導体の成長方法 |
| JPJP-P-2006-00105647 | 2006-04-06 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20060118349A KR20060118349A (ko) | 2006-11-23 |
| KR101237198B1 true KR101237198B1 (ko) | 2013-02-25 |
Family
ID=36933328
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020060043374A Expired - Fee Related KR101237198B1 (ko) | 2005-05-16 | 2006-05-15 | 발광 다이오드 및 그 제조 방법, 집적형 발광 다이오드 및 그 제조 방법, 질화물계 ⅲ-ⅴ족 화합물 반도체의 성장 방법, 광원 셀 유닛, 발광 다이오드 백라이트, 발광 다이오드 디스플레이, 및 전자 기기 |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US7754504B2 (enExample) |
| EP (1) | EP1724846A3 (enExample) |
| JP (1) | JP5082278B2 (enExample) |
| KR (1) | KR101237198B1 (enExample) |
| TW (1) | TW200707564A (enExample) |
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| KR100755598B1 (ko) * | 2006-06-30 | 2007-09-06 | 삼성전기주식회사 | 질화물 반도체 발광소자 어레이 |
| KR100773555B1 (ko) * | 2006-07-21 | 2007-11-06 | 삼성전자주식회사 | 저결함 반도체 기판 및 그 제조방법 |
| JP4915218B2 (ja) * | 2006-11-17 | 2012-04-11 | ソニー株式会社 | 発光ダイオードの製造方法 |
| KR101321356B1 (ko) * | 2007-01-24 | 2013-10-22 | 엘지이노텍 주식회사 | 질화물 반도체 발광소자 |
| US8080833B2 (en) * | 2007-01-26 | 2011-12-20 | Crystal Is, Inc. | Thick pseudomorphic nitride epitaxial layers |
| KR101316121B1 (ko) * | 2007-03-06 | 2013-10-11 | 서울바이오시스 주식회사 | 수직형 발광 다이오드의 제조방법 |
| KR101316119B1 (ko) * | 2007-03-06 | 2013-10-11 | 서울바이오시스 주식회사 | 발광다이오드 및 그 제조방법 |
| JP2008270431A (ja) * | 2007-04-18 | 2008-11-06 | Sony Corp | 発光ダイオードの製造方法、半導体装置の製造方法、電子装置の製造方法および窒化物系iii−v族化合物半導体基板の製造方法 |
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| JP2005012063A (ja) * | 2003-06-20 | 2005-01-13 | Fujitsu Ltd | 紫外発光素子およびその製造方法 |
| KR100714639B1 (ko) * | 2003-10-21 | 2007-05-07 | 삼성전기주식회사 | 발광 소자 |
| KR100586970B1 (ko) * | 2004-05-28 | 2006-06-08 | 삼성전기주식회사 | 액정 디스플레이 표시장치의 백라이트 유닛 |
| JP4571476B2 (ja) * | 2004-10-18 | 2010-10-27 | ローム株式会社 | 半導体装置の製造方法 |
-
2006
- 2006-04-06 JP JP2006105647A patent/JP5082278B2/ja not_active Expired - Fee Related
- 2006-05-10 TW TW095116571A patent/TW200707564A/zh not_active IP Right Cessation
- 2006-05-15 EP EP06010001.3A patent/EP1724846A3/en not_active Withdrawn
- 2006-05-15 KR KR1020060043374A patent/KR101237198B1/ko not_active Expired - Fee Related
- 2006-05-16 US US11/383,526 patent/US7754504B2/en not_active Expired - Fee Related
-
2010
- 2010-06-09 US US12/797,042 patent/US20100308349A1/en not_active Abandoned
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002164296A (ja) * | 2000-09-18 | 2002-06-07 | Mitsubishi Cable Ind Ltd | 半導体基材及びその作製方法 |
| JP2002252421A (ja) * | 2001-02-27 | 2002-09-06 | Sanyo Electric Co Ltd | 窒化物系半導体素子および窒化物系半導体の形成方法 |
| JP2003318441A (ja) | 2001-07-24 | 2003-11-07 | Nichia Chem Ind Ltd | 半導体発光素子 |
| JP2004297010A (ja) * | 2003-03-28 | 2004-10-21 | Toyoda Gosei Co Ltd | 半導体結晶の製造方法及び半導体発光素子 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP5082278B2 (ja) | 2012-11-28 |
| TWI300245B (enExample) | 2008-08-21 |
| US20100308349A1 (en) | 2010-12-09 |
| EP1724846A2 (en) | 2006-11-22 |
| KR20060118349A (ko) | 2006-11-23 |
| TW200707564A (en) | 2007-02-16 |
| EP1724846A3 (en) | 2013-12-25 |
| JP2006352084A (ja) | 2006-12-28 |
| US7754504B2 (en) | 2010-07-13 |
| US20060258027A1 (en) | 2006-11-16 |
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