KR100845752B1 - 감광성 수지 조성물 및 이를 사용한 감광성 드라이 필름 - Google Patents
감광성 수지 조성물 및 이를 사용한 감광성 드라이 필름 Download PDFInfo
- Publication number
- KR100845752B1 KR100845752B1 KR1020067009107A KR20067009107A KR100845752B1 KR 100845752 B1 KR100845752 B1 KR 100845752B1 KR 1020067009107 A KR1020067009107 A KR 1020067009107A KR 20067009107 A KR20067009107 A KR 20067009107A KR 100845752 B1 KR100845752 B1 KR 100845752B1
- Authority
- KR
- South Korea
- Prior art keywords
- meth
- photosensitive resin
- acrylate
- resin composition
- photosensitive
- Prior art date
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
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- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials For Photolithography (AREA)
- Polymerisation Methods In General (AREA)
- Graft Or Block Polymers (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Abstract
Description
Claims (9)
- (a) 빌딩 블록으로서 벤질 (메트)아크릴레이트를 함유하는 공중합체 기재의 바인더 중합체, (b) 2,2-비스[4-{(메트)아크릴옥시폴리에톡시}페닐]프로판 (에톡시기의 수: 2-14), 트리글리세롤 디(메트)아크릴레이트 및 에톡실화 폴리프로필렌 글리콜 디(메트)아크릴레이트로 이루어진 군으로부터 선택된 하나 이상의 광중합할 수 있는 화합물 및 (c) 헥실비스이미다졸 화합물 기재의 광중합 개시제를 포함하는 감광성 수지 조성물.
- 제 1 항에 있어서, 성분 (a)가 (메트)아크릴산/벤질 (메트)아크릴레이트 공중합체인 감광성 수지 조성물.
- 제 2 항에 있어서, 벤질 (메트)아크릴레이트에 대한 (메트)아크릴산의 중합비가 5:95 내지 50:50의 범위인 감광성 수지 조성물.
- 삭제
- 삭제
- 제 1 항에 있어서, (d) 광-개시 발색제를 추가로 함유하는 감광성 수지 조성물.
- 제 6 항에 있어서, 성분 (d)가 트리페닐메탄 발색제인 감광성 수지 조성물.
- 제 1 항 내지 제 3 항, 제 6 항, 또는 제 7 항 중 어느 한 항에 따른 감광성 수지 조성물을 지지 필름에 적용하고, 적용된 조성물을 건조시켜 감광성 수지층을 형성하고, 보호 필름으로 감광성 수지층을 씌움으로써 제조되는 감광성 드라이 필름.
- 제 8 항에 있어서, 상기 지지 필름이 0 초과 10 nm 이하의 표면 거칠기 (Ra) 및 0 초과 1012 Ω 이하의 표면 저항성을 갖는 감광성 드라이 필름.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003355032A JP4159094B2 (ja) | 2003-10-15 | 2003-10-15 | 感光性樹脂組成物およびこれを用いた感光性ドライフィルム |
JPJP-P-2003-00355032 | 2003-10-15 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20060088126A KR20060088126A (ko) | 2006-08-03 |
KR100845752B1 true KR100845752B1 (ko) | 2008-07-11 |
Family
ID=34431200
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020067009107A KR100845752B1 (ko) | 2003-10-15 | 2004-10-14 | 감광성 수지 조성물 및 이를 사용한 감광성 드라이 필름 |
Country Status (6)
Country | Link |
---|---|
US (1) | US8372577B2 (ko) |
EP (1) | EP1678557A2 (ko) |
JP (1) | JP4159094B2 (ko) |
KR (1) | KR100845752B1 (ko) |
TW (1) | TWI266143B (ko) |
WO (1) | WO2005036267A2 (ko) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006154622A (ja) * | 2004-12-01 | 2006-06-15 | Fuji Photo Film Co Ltd | パターン形成材料及びパターン形成方法 |
CN1892428A (zh) * | 2005-07-08 | 2007-01-10 | 长兴化学工业股份有限公司 | 可光成像组合物 |
JP2007114731A (ja) * | 2005-09-20 | 2007-05-10 | Hitachi Chem Co Ltd | 感光性エレメント |
JP4646759B2 (ja) * | 2005-09-20 | 2011-03-09 | 旭化成イーマテリアルズ株式会社 | パターン形成材料、並びにパターン形成装置及びパターン形成方法 |
KR100791819B1 (ko) | 2005-09-30 | 2008-01-04 | 주식회사 동진쎄미켐 | 감광성 수지 조성물 |
US8039817B2 (en) | 2008-05-05 | 2011-10-18 | Illumina, Inc. | Compensator for multiple surface imaging |
JP5223923B2 (ja) * | 2008-07-31 | 2013-06-26 | 日立化成株式会社 | 感光性エレメント、これを用いたレジストパターンの形成方法及びプリント配線板の製造方法 |
JP5411521B2 (ja) * | 2009-02-09 | 2014-02-12 | 旭化成イーマテリアルズ株式会社 | 感光性樹脂積層体 |
JP6017753B2 (ja) * | 2009-12-25 | 2016-11-02 | 旭化成株式会社 | 感光性樹脂組成物及びその積層体 |
US9352315B2 (en) | 2013-09-27 | 2016-05-31 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method to produce chemical pattern in micro-fluidic structure |
JP6404571B2 (ja) * | 2014-02-04 | 2018-10-10 | 旭化成株式会社 | 感光性樹脂組成物、感光性樹脂積層体及びレジストパターン形成方法 |
JP2015062080A (ja) * | 2014-12-15 | 2015-04-02 | 旭化成イーマテリアルズ株式会社 | 感光性樹脂積層体 |
TWI535563B (zh) * | 2015-03-31 | 2016-06-01 | 長興材料工業股份有限公司 | 疊層結構 |
JP6596375B2 (ja) | 2016-03-31 | 2019-10-23 | 株式会社荏原製作所 | ティーチング装置およびティーチング方法 |
TWM543773U (zh) * | 2017-01-26 | 2017-06-21 | 長興材料工業股份有限公司 | 感光型乾膜 |
TWI634003B (zh) | 2017-01-26 | 2018-09-01 | 長興材料工業股份有限公司 | 感光型乾膜及其應用 |
JP2020106581A (ja) * | 2018-12-26 | 2020-07-09 | 三菱製紙株式会社 | サンドブラスト用感光性樹脂構成体 |
Citations (4)
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US5030548A (en) | 1988-08-11 | 1991-07-09 | Fuji Photo Film Co., Ltd. | Photo-polymerizable composition |
JPH0728236A (ja) * | 1993-05-12 | 1995-01-31 | Fuji Photo Film Co Ltd | 遮光性感光性樹脂組成物および遮光性画像の形成方法 |
US5397678A (en) | 1992-04-09 | 1995-03-14 | Fuji Photo Film Co., Ltd. | Image formation method using a photosensitive transfer material |
JP2699015B2 (ja) * | 1989-09-21 | 1998-01-19 | 富士写真フイルム株式会社 | 光重合性組成物 |
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JP2004163917A (ja) * | 2002-10-25 | 2004-06-10 | Sumitomo Chem Co Ltd | 着色感光性樹脂組成物 |
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2003
- 2003-10-15 JP JP2003355032A patent/JP4159094B2/ja not_active Expired - Fee Related
-
2004
- 2004-10-12 TW TW093130902A patent/TWI266143B/zh active
- 2004-10-14 KR KR1020067009107A patent/KR100845752B1/ko active IP Right Grant
- 2004-10-14 EP EP04773808A patent/EP1678557A2/en not_active Withdrawn
- 2004-10-14 WO PCT/JP2004/015640 patent/WO2005036267A2/en active Application Filing
-
2010
- 2010-06-09 US US12/801,451 patent/US8372577B2/en active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5030548A (en) | 1988-08-11 | 1991-07-09 | Fuji Photo Film Co., Ltd. | Photo-polymerizable composition |
JP2699015B2 (ja) * | 1989-09-21 | 1998-01-19 | 富士写真フイルム株式会社 | 光重合性組成物 |
US5397678A (en) | 1992-04-09 | 1995-03-14 | Fuji Photo Film Co., Ltd. | Image formation method using a photosensitive transfer material |
JPH0728236A (ja) * | 1993-05-12 | 1995-01-31 | Fuji Photo Film Co Ltd | 遮光性感光性樹脂組成物および遮光性画像の形成方法 |
Also Published As
Publication number | Publication date |
---|---|
KR20060088126A (ko) | 2006-08-03 |
TWI266143B (en) | 2006-11-11 |
EP1678557A2 (en) | 2006-07-12 |
US20110065046A1 (en) | 2011-03-17 |
TW200519534A (en) | 2005-06-16 |
JP2005121790A (ja) | 2005-05-12 |
WO2005036267A3 (en) | 2005-07-07 |
JP4159094B2 (ja) | 2008-10-01 |
US8372577B2 (en) | 2013-02-12 |
WO2005036267A2 (en) | 2005-04-21 |
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