TWI266143B - Photosensitive resin compositions and photosensitive dry film using the same - Google Patents

Photosensitive resin compositions and photosensitive dry film using the same

Info

Publication number
TWI266143B
TWI266143B TW093130902A TW93130902A TWI266143B TW I266143 B TWI266143 B TW I266143B TW 093130902 A TW093130902 A TW 093130902A TW 93130902 A TW93130902 A TW 93130902A TW I266143 B TWI266143 B TW I266143B
Authority
TW
Taiwan
Prior art keywords
photosensitive
dry film
photosensitive resin
same
resin compositions
Prior art date
Application number
TW093130902A
Other languages
English (en)
Other versions
TW200519534A (en
Inventor
Yukihiko Tanaka
Shinkichi Asahi
Naoya Katsumata
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of TW200519534A publication Critical patent/TW200519534A/zh
Application granted granted Critical
Publication of TWI266143B publication Critical patent/TWI266143B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
TW093130902A 2003-10-15 2004-10-12 Photosensitive resin compositions and photosensitive dry film using the same TWI266143B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003355032A JP4159094B2 (ja) 2003-10-15 2003-10-15 感光性樹脂組成物およびこれを用いた感光性ドライフィルム

Publications (2)

Publication Number Publication Date
TW200519534A TW200519534A (en) 2005-06-16
TWI266143B true TWI266143B (en) 2006-11-11

Family

ID=34431200

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093130902A TWI266143B (en) 2003-10-15 2004-10-12 Photosensitive resin compositions and photosensitive dry film using the same

Country Status (6)

Country Link
US (1) US8372577B2 (zh)
EP (1) EP1678557A2 (zh)
JP (1) JP4159094B2 (zh)
KR (1) KR100845752B1 (zh)
TW (1) TWI266143B (zh)
WO (1) WO2005036267A2 (zh)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006154622A (ja) * 2004-12-01 2006-06-15 Fuji Photo Film Co Ltd パターン形成材料及びパターン形成方法
CN1892428A (zh) * 2005-07-08 2007-01-10 长兴化学工业股份有限公司 可光成像组合物
JP2007114731A (ja) * 2005-09-20 2007-05-10 Hitachi Chem Co Ltd 感光性エレメント
JP4646759B2 (ja) * 2005-09-20 2011-03-09 旭化成イーマテリアルズ株式会社 パターン形成材料、並びにパターン形成装置及びパターン形成方法
KR100791819B1 (ko) 2005-09-30 2008-01-04 주식회사 동진쎄미켐 감광성 수지 조성물
US8039817B2 (en) 2008-05-05 2011-10-18 Illumina, Inc. Compensator for multiple surface imaging
JP5223923B2 (ja) * 2008-07-31 2013-06-26 日立化成株式会社 感光性エレメント、これを用いたレジストパターンの形成方法及びプリント配線板の製造方法
JP5411521B2 (ja) * 2009-02-09 2014-02-12 旭化成イーマテリアルズ株式会社 感光性樹脂積層体
JP6017753B2 (ja) * 2009-12-25 2016-11-02 旭化成株式会社 感光性樹脂組成物及びその積層体
US9352315B2 (en) 2013-09-27 2016-05-31 Taiwan Semiconductor Manufacturing Company, Ltd. Method to produce chemical pattern in micro-fluidic structure
JP6404571B2 (ja) * 2014-02-04 2018-10-10 旭化成株式会社 感光性樹脂組成物、感光性樹脂積層体及びレジストパターン形成方法
JP2015062080A (ja) * 2014-12-15 2015-04-02 旭化成イーマテリアルズ株式会社 感光性樹脂積層体
TWI535563B (zh) * 2015-03-31 2016-06-01 長興材料工業股份有限公司 疊層結構
JP6596375B2 (ja) 2016-03-31 2019-10-23 株式会社荏原製作所 ティーチング装置およびティーチング方法
TWM543773U (zh) * 2017-01-26 2017-06-21 長興材料工業股份有限公司 感光型乾膜
TWI634003B (zh) 2017-01-26 2018-09-01 長興材料工業股份有限公司 感光型乾膜及其應用
JP2020106581A (ja) * 2018-12-26 2020-07-09 三菱製紙株式会社 サンドブラスト用感光性樹脂構成体

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US3843384A (en) * 1971-06-14 1974-10-22 Matsushita Electric Ind Co Ltd Heat-sensitive two color recording paper
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US4629680A (en) * 1984-01-30 1986-12-16 Fuji Photo Film Co., Ltd. Photopolymerizable materials capable of being developed by a weak alkaline aqueous solution
JPH02153353A (ja) * 1988-07-25 1990-06-13 Matsushita Electric Ind Co Ltd 着色光重合組成物およびカラーフィルタ
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JP2744643B2 (ja) * 1989-06-02 1998-04-28 旭化成工業株式会社 光重合性組成物
JP2699015B2 (ja) * 1989-09-21 1998-01-19 富士写真フイルム株式会社 光重合性組成物
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JPH05173330A (ja) * 1991-12-24 1993-07-13 Hitachi Chem Co Ltd 感光性樹脂組成物及びこれを用いた感光性エレメント
DE4243912A1 (de) 1992-04-09 1993-10-14 Fuji Photo Film Co Ltd Lichtempfindliches Übertragungsmaterial und Bilderzeugungs-Verfahren unter Verwendung desselben
JP3205404B2 (ja) 1992-09-28 2001-09-04 ティーディーケイ株式会社 耐摩耗性保護膜とそれを有するサーマルヘッド
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US5489621A (en) * 1993-05-12 1996-02-06 Fuji Photo Film Co., Ltd. Process for forming colored partial picture element and light-shielding light-sensitive resin composition used therefor
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JP3252081B2 (ja) * 1995-09-22 2002-01-28 旭化成株式会社 光重合性組成物
JP3644731B2 (ja) * 1995-10-04 2005-05-11 旭化成エレクトロニクス株式会社 新規な光硬化性樹脂組成物
JP4378579B2 (ja) * 1999-10-19 2009-12-09 東洋紡績株式会社 極細線フォトレジスト用積層ポリエステルフィルム
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JP2002322380A (ja) * 2001-04-25 2002-11-08 Fuji Photo Film Co Ltd ビス型アントラキノン化合物、これを含む着色樹脂組成物及び着色感光性組成物、並びにカラーフィルタ
JP2003043692A (ja) * 2001-08-02 2003-02-13 Fuji Photo Film Co Ltd 光重合性平版印刷版
JP3943385B2 (ja) * 2001-12-18 2007-07-11 富士フイルム株式会社 反射板形成用転写材料の製造方法及び液晶表示装置の製造方法
JP2004163917A (ja) * 2002-10-25 2004-06-10 Sumitomo Chem Co Ltd 着色感光性樹脂組成物

Also Published As

Publication number Publication date
KR20060088126A (ko) 2006-08-03
EP1678557A2 (en) 2006-07-12
US20110065046A1 (en) 2011-03-17
KR100845752B1 (ko) 2008-07-11
TW200519534A (en) 2005-06-16
JP2005121790A (ja) 2005-05-12
WO2005036267A3 (en) 2005-07-07
JP4159094B2 (ja) 2008-10-01
US8372577B2 (en) 2013-02-12
WO2005036267A2 (en) 2005-04-21

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