TW200627061A - Photosensitive composition, image-forming base material, image-forming material, and image-forming method - Google Patents

Photosensitive composition, image-forming base material, image-forming material, and image-forming method

Info

Publication number
TW200627061A
TW200627061A TW094136696A TW94136696A TW200627061A TW 200627061 A TW200627061 A TW 200627061A TW 094136696 A TW094136696 A TW 094136696A TW 94136696 A TW94136696 A TW 94136696A TW 200627061 A TW200627061 A TW 200627061A
Authority
TW
Taiwan
Prior art keywords
image
forming
photosensitive composition
laser light
photopolymerization initiator
Prior art date
Application number
TW094136696A
Other languages
Chinese (zh)
Inventor
Toshiyuki Urano
Yasuhiro Kameyama
Junji Mizukami
Original Assignee
Mitsubishi Chem Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chem Corp filed Critical Mitsubishi Chem Corp
Publication of TW200627061A publication Critical patent/TW200627061A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices

Abstract

Disclosed is a photosensitive composition which is highly sensitive to laser light, particularly to laser light from ultraviolet to blue-violet, and is excellent in long-term storage stability and adhesion to a substrate. The photosensitive composition is suitably used as a solder resist or a dry film, and in particular it is suitable for direct drawing wherein laser light from ultraviolet to blue-violet is used. Also disclosed are an image-forming base material using such a photosensitive composition, an image-forming material and an image-forming method. Specifically disclosed is a photosensitive composition containing an ethylenically unsaturated group-containing compound (A), a photopolymerization initiator (B) and an alkali-soluble resin (C) which is characterized in that the photopolymerization initiator (B) contains a photopolymerization initiator having a specific structure and an average particle diameter of not less than 0.001 m and not more than 150 m.
TW094136696A 2004-10-20 2005-10-20 Photosensitive composition, image-forming base material, image-forming material, and image-forming method TW200627061A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004305938 2004-10-20
JP2005197677 2005-07-06

Publications (1)

Publication Number Publication Date
TW200627061A true TW200627061A (en) 2006-08-01

Family

ID=36203054

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094136696A TW200627061A (en) 2004-10-20 2005-10-20 Photosensitive composition, image-forming base material, image-forming material, and image-forming method

Country Status (3)

Country Link
KR (1) KR20070065889A (en)
TW (1) TW200627061A (en)
WO (1) WO2006043638A1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI509017B (en) * 2010-04-14 2015-11-21 Nippon Kayaku Kk Liquid crystal sealant and liquid crystal display cell using same
TWI734756B (en) * 2016-03-25 2021-08-01 盧森堡商Ａｚ電子材料盧森堡有限公司 Positive tone photosensitive resin composition, curable film and display device

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008096981A (en) * 2006-09-11 2008-04-24 Mitsubishi Chemicals Corp Negative photosensitive composition for projection for liquid crystal alignment control and liquid crystal display
JP4976931B2 (en) * 2006-09-22 2012-07-18 富士フイルム株式会社 Photosensitive composition, photosensitive film, permanent pattern forming method, and printed circuit board
JP4913556B2 (en) * 2006-11-09 2012-04-11 富士フイルム株式会社 Photosensitive composition, photosensitive film, permanent pattern forming method, and printed circuit board
WO2008059670A1 (en) 2006-11-15 2008-05-22 Taiyo Ink Mfg. Co., Ltd. Photocurable/thermosetting resin composition, cured object, and printed wiring board
US7838197B2 (en) * 2006-11-15 2010-11-23 Taiyo Ink Mfg. Co., Ltd. Photosensitive composition
WO2008059935A1 (en) * 2006-11-15 2008-05-22 Taiyo Ink Mfg. Co., Ltd. Photocurable/thermosetting resin composition, cured product and printed wiring board
JP4893299B2 (en) * 2006-12-27 2012-03-07 三菱化学株式会社 Hologram recording layer forming composition, hologram recording material and hologram optical recording medium using the same
KR101007440B1 (en) 2007-07-18 2011-01-12 주식회사 엘지화학 Dendritic photoactive compound comprising oxime ester and method for preparing the same
JP2009086376A (en) * 2007-09-28 2009-04-23 Fujifilm Corp Photosensitive composition, photosensitive film, photosensitive layered product, permanent pattern forming method, printed circuit board
KR101430533B1 (en) * 2008-01-04 2014-08-22 솔브레인 주식회사 Negative photoresist composition and method of manufacturing array substrate using the same
JP6078242B2 (en) * 2012-07-03 2017-02-08 サカタインクス株式会社 Red coloring composition for color filter

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0222305A (en) * 1988-07-12 1990-01-25 Nippon Kayaku Co Ltd Paste of photopolymerization initiator
CN1191614A (en) * 1995-07-19 1998-08-26 希巴特殊化学控股公司 Heterogeneous photo-initiators, photopolymerisable compositions and their use
NL1016815C2 (en) * 1999-12-15 2002-05-14 Ciba Sc Holding Ag Oximester photo initiators.
JP4008273B2 (en) * 2002-03-26 2007-11-14 太陽インキ製造株式会社 Alkali development type photosensitive resin composition and printed wiring board using the same
JP4096682B2 (en) * 2002-10-04 2008-06-04 三菱化学株式会社 Blue-violet laser photosensitive composition, and image forming material, image forming material, and image forming method using the same
TW200417294A (en) * 2002-11-28 2004-09-01 Taiyo Ink Mfg Co Ltd Photo- and thermo-setting resin composition and printed wiring boards made by using the same
JP4489566B2 (en) * 2003-11-27 2010-06-23 太陽インキ製造株式会社 Curable resin composition, cured product thereof, and printed wiring board

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI509017B (en) * 2010-04-14 2015-11-21 Nippon Kayaku Kk Liquid crystal sealant and liquid crystal display cell using same
TWI734756B (en) * 2016-03-25 2021-08-01 盧森堡商Ａｚ電子材料盧森堡有限公司 Positive tone photosensitive resin composition, curable film and display device
TWI771907B (en) * 2016-03-25 2022-07-21 盧森堡商Ａｚ電子材料盧森堡有限公司 Photosensitive siloxane composition and method for forming cured film

Also Published As

Publication number Publication date
KR20070065889A (en) 2007-06-25
WO2006043638A1 (en) 2006-04-27

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