KR100806280B1 - 광학 위치 평가장치 및 방법 - Google Patents

광학 위치 평가장치 및 방법 Download PDF

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Publication number
KR100806280B1
KR100806280B1 KR1020050102372A KR20050102372A KR100806280B1 KR 100806280 B1 KR100806280 B1 KR 100806280B1 KR 1020050102372 A KR1020050102372 A KR 1020050102372A KR 20050102372 A KR20050102372 A KR 20050102372A KR 100806280 B1 KR100806280 B1 KR 100806280B1
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South Korea
Prior art keywords
substrate
alignment mark
frame
alignment
detector
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Expired - Fee Related
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KR1020050102372A
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English (en)
Korean (ko)
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KR20060052321A (ko
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쳉-쿤 귀
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에이에스엠엘 네델란즈 비.브이.
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
KR1020050102372A 2004-10-28 2005-10-28 광학 위치 평가장치 및 방법 Expired - Fee Related KR100806280B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/975,183 US7388663B2 (en) 2004-10-28 2004-10-28 Optical position assessment apparatus and method
US10/975,183 2004-10-28

Publications (2)

Publication Number Publication Date
KR20060052321A KR20060052321A (ko) 2006-05-19
KR100806280B1 true KR100806280B1 (ko) 2008-02-22

Family

ID=35636881

Family Applications (1)

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KR1020050102372A Expired - Fee Related KR100806280B1 (ko) 2004-10-28 2005-10-28 광학 위치 평가장치 및 방법

Country Status (7)

Country Link
US (1) US7388663B2 (enExample)
EP (1) EP1653288B1 (enExample)
JP (4) JP4310302B2 (enExample)
KR (1) KR100806280B1 (enExample)
CN (2) CN101852992B (enExample)
SG (3) SG147421A1 (enExample)
TW (2) TW200921304A (enExample)

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KR101585370B1 (ko) * 2006-08-31 2016-01-14 가부시키가이샤 니콘 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 그리고 디바이스 제조 방법
CN101405837B (zh) 2006-09-01 2012-08-29 株式会社尼康 移动体驱动方法、图案形成方法、曝光方法以及组件制造方法
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JP5793236B2 (ja) * 2011-03-29 2015-10-14 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィにおける放射ビームスポットの位置の測定
KR101326107B1 (ko) * 2011-12-20 2013-11-06 삼성디스플레이 주식회사 레이저 가공장치 및 그 제어방법
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JP5605770B2 (ja) * 2013-05-20 2014-10-15 株式会社ニコン 表示素子の製造方法、及び表示素子の製造装置
JP6228420B2 (ja) * 2013-10-08 2017-11-08 キヤノン株式会社 検出装置、リソグラフィ装置、および物品の製造方法
KR102419494B1 (ko) * 2014-09-29 2022-07-12 삼성디스플레이 주식회사 마스크리스 노광 장치, 마스크리스 노광 방법 및 이에 의해 제조되는 표시 기판
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CN108121162B (zh) * 2016-11-29 2019-09-17 上海微电子装备（集团）股份有限公司 一种投影曝光装置及曝光方法
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Also Published As

Publication number Publication date
CN101852992A (zh) 2010-10-06
CN101852992B (zh) 2013-01-09
SG172672A1 (en) 2011-07-28
JP5238771B2 (ja) 2013-07-17
JP2006128693A (ja) 2006-05-18
TW200627096A (en) 2006-08-01
CN1766740A (zh) 2006-05-03
SG121953A1 (en) 2006-05-26
JP2010268005A (ja) 2010-11-25
JP4310302B2 (ja) 2009-08-05
SG147421A1 (en) 2008-11-28
TWI326015B (en) 2010-06-11
US20060092419A1 (en) 2006-05-04
JP2013047850A (ja) 2013-03-07
JP2009010420A (ja) 2009-01-15
CN1766740B (zh) 2010-05-05
US7388663B2 (en) 2008-06-17
EP1653288A1 (en) 2006-05-03
JP5554819B2 (ja) 2014-07-23
TW200921304A (en) 2009-05-16
JP4648442B2 (ja) 2011-03-09
EP1653288B1 (en) 2019-05-15
KR20060052321A (ko) 2006-05-19

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