SG147421A1 - Optical position assessment apparatus and method - Google Patents

Optical position assessment apparatus and method

Info

Publication number
SG147421A1
SG147421A1 SG200807524-4A SG2008075244A SG147421A1 SG 147421 A1 SG147421 A1 SG 147421A1 SG 2008075244 A SG2008075244 A SG 2008075244A SG 147421 A1 SG147421 A1 SG 147421A1
Authority
SG
Singapore
Prior art keywords
frame
substrate
alignment mark
alignment
optical position
Prior art date
Application number
SG200807524-4A
Other languages
English (en)
Inventor
Cheng-Qun Gui
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG147421A1 publication Critical patent/SG147421A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
SG200807524-4A 2004-10-28 2005-09-28 Optical position assessment apparatus and method SG147421A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/975,183 US7388663B2 (en) 2004-10-28 2004-10-28 Optical position assessment apparatus and method

Publications (1)

Publication Number Publication Date
SG147421A1 true SG147421A1 (en) 2008-11-28

Family

ID=35636881

Family Applications (3)

Application Number Title Priority Date Filing Date
SG200506271A SG121953A1 (en) 2004-10-28 2005-09-28 Optical position assessment apparatus and method
SG2011040466A SG172672A1 (en) 2004-10-28 2005-09-28 Optical position assessment apparatus and method
SG200807524-4A SG147421A1 (en) 2004-10-28 2005-09-28 Optical position assessment apparatus and method

Family Applications Before (2)

Application Number Title Priority Date Filing Date
SG200506271A SG121953A1 (en) 2004-10-28 2005-09-28 Optical position assessment apparatus and method
SG2011040466A SG172672A1 (en) 2004-10-28 2005-09-28 Optical position assessment apparatus and method

Country Status (7)

Country Link
US (1) US7388663B2 (enExample)
EP (1) EP1653288B1 (enExample)
JP (4) JP4310302B2 (enExample)
KR (1) KR100806280B1 (enExample)
CN (2) CN1766740B (enExample)
SG (3) SG121953A1 (enExample)
TW (2) TW200921304A (enExample)

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Also Published As

Publication number Publication date
TWI326015B (en) 2010-06-11
EP1653288B1 (en) 2019-05-15
EP1653288A1 (en) 2006-05-03
JP5238771B2 (ja) 2013-07-17
JP2013047850A (ja) 2013-03-07
CN101852992B (zh) 2013-01-09
US20060092419A1 (en) 2006-05-04
JP2010268005A (ja) 2010-11-25
CN1766740B (zh) 2010-05-05
JP5554819B2 (ja) 2014-07-23
KR100806280B1 (ko) 2008-02-22
TW200627096A (en) 2006-08-01
TW200921304A (en) 2009-05-16
CN101852992A (zh) 2010-10-06
JP2009010420A (ja) 2009-01-15
JP4310302B2 (ja) 2009-08-05
SG172672A1 (en) 2011-07-28
JP2006128693A (ja) 2006-05-18
JP4648442B2 (ja) 2011-03-09
KR20060052321A (ko) 2006-05-19
SG121953A1 (en) 2006-05-26
US7388663B2 (en) 2008-06-17
CN1766740A (zh) 2006-05-03

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