KR0137124B1 - Pattern forming method - Google Patents

Pattern forming method

Info

Publication number
KR0137124B1
KR0137124B1 KR93014801A KR930014801A KR0137124B1 KR 0137124 B1 KR0137124 B1 KR 0137124B1 KR 93014801 A KR93014801 A KR 93014801A KR 930014801 A KR930014801 A KR 930014801A KR 0137124 B1 KR0137124 B1 KR 0137124B1
Authority
KR
South Korea
Prior art keywords
forming method
pattern forming
semiconductor substrate
metal film
desired region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR93014801A
Other languages
English (en)
Korean (ko)
Other versions
KR940006196A (ko
Inventor
Yasuhiro Sekine
Genio Momma
Hiroshi Yuzurihara
Original Assignee
Canon Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Kk filed Critical Canon Kk
Publication of KR940006196A publication Critical patent/KR940006196A/ko
Application granted granted Critical
Publication of KR0137124B1 publication Critical patent/KR0137124B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2059—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam
    • G03F7/2065—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam using corpuscular radiation other than electron beams
    • H10P76/00—
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G03F7/2043—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means with the production of a chemical active agent from a fluid, e.g. an etching agent; with meterial deposition from the fluid phase, e.g. contamination resists
    • H10P34/40—
    • H10P50/695—
    • H10P76/405—
    • H10P76/4085—
    • H10P95/00—

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Chemical & Material Sciences (AREA)
  • Drying Of Semiconductors (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Steroid Compounds (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Glass Compositions (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR93014801A 1992-07-31 1993-07-31 Pattern forming method Expired - Fee Related KR0137124B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP20493892A JP3334911B2 (ja) 1992-07-31 1992-07-31 パターン形成方法
JP92-204938 1992-07-31

Publications (2)

Publication Number Publication Date
KR940006196A KR940006196A (ko) 1994-03-23
KR0137124B1 true KR0137124B1 (en) 1998-04-29

Family

ID=16498841

Family Applications (1)

Application Number Title Priority Date Filing Date
KR93014801A Expired - Fee Related KR0137124B1 (en) 1992-07-31 1993-07-31 Pattern forming method

Country Status (7)

Country Link
US (1) US5861233A (cg-RX-API-DMAC10.html)
EP (1) EP0581280B1 (cg-RX-API-DMAC10.html)
JP (1) JP3334911B2 (cg-RX-API-DMAC10.html)
KR (1) KR0137124B1 (cg-RX-API-DMAC10.html)
AT (1) ATE185430T1 (cg-RX-API-DMAC10.html)
DE (1) DE69326651T2 (cg-RX-API-DMAC10.html)
TW (1) TW238363B (cg-RX-API-DMAC10.html)

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EP0581280B1 (en) 1999-10-06
KR940006196A (ko) 1994-03-23
US5861233A (en) 1999-01-19
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EP0581280A3 (en) 1995-12-13
ATE185430T1 (de) 1999-10-15

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St.27 status event code: A-4-4-P10-P22-nap-X000

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000