JPWO2019098168A1 - 蒸着マスクを製造するための金属板、金属板の検査方法、金属板の製造方法、蒸着マスク、蒸着マスク装置及び蒸着マスクの製造方法 - Google Patents

蒸着マスクを製造するための金属板、金属板の検査方法、金属板の製造方法、蒸着マスク、蒸着マスク装置及び蒸着マスクの製造方法 Download PDF

Info

Publication number
JPWO2019098168A1
JPWO2019098168A1 JP2018563643A JP2018563643A JPWO2019098168A1 JP WO2019098168 A1 JPWO2019098168 A1 JP WO2019098168A1 JP 2018563643 A JP2018563643 A JP 2018563643A JP 2018563643 A JP2018563643 A JP 2018563643A JP WO2019098168 A1 JPWO2019098168 A1 JP WO2019098168A1
Authority
JP
Japan
Prior art keywords
metal plate
reflectance
vapor deposition
deposition mask
less
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2018563643A
Other languages
English (en)
Japanese (ja)
Inventor
知加雄 池永
英介 岡本
昌人 牛草
千秋 初田
宏樹 岡
幸代 松浦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=66496400&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=JPWO2019098168(A1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP2019122142A priority Critical patent/JP6896801B2/ja
Publication of JPWO2019098168A1 publication Critical patent/JPWO2019098168A1/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/20008—Constructional details of analysers, e.g. characterised by X-ray source, detector or optical system; Accessories therefor; Preparing specimens therefor
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21B—ROLLING OF METAL
    • B21B1/00—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations
    • B21B1/22—Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations for rolling plates, strips, bands or sheets of indefinite length
    • C—CHEMISTRY; METALLURGY
    • C21—METALLURGY OF IRON
    • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D1/00—General methods or devices for heat treatment, e.g. annealing, hardening, quenching or tempering
    • C21D1/26—Methods of annealing
    • C21D1/30—Stress-relieving
    • C—CHEMISTRY; METALLURGY
    • C21—METALLURGY OF IRON
    • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D1/00—General methods or devices for heat treatment, e.g. annealing, hardening, quenching or tempering
    • C21D1/74—Methods of treatment in inert gas, controlled atmosphere, vacuum or pulverulent material
    • C21D1/76—Adjusting the composition of the atmosphere
    • C—CHEMISTRY; METALLURGY
    • C21—METALLURGY OF IRON
    • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D6/00—Heat treatment of ferrous alloys
    • C21D6/001—Heat treatment of ferrous alloys containing Ni
    • C—CHEMISTRY; METALLURGY
    • C21—METALLURGY OF IRON
    • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D6/00—Heat treatment of ferrous alloys
    • C21D6/007—Heat treatment of ferrous alloys containing Co
    • C—CHEMISTRY; METALLURGY
    • C21—METALLURGY OF IRON
    • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D8/00—Modifying the physical properties of ferrous metals or ferrous alloys by deformation combined with, or followed by, heat treatment
    • C21D8/02—Modifying the physical properties of ferrous metals or ferrous alloys by deformation combined with, or followed by, heat treatment during manufacturing of plates or strips
    • C21D8/0221—Modifying the physical properties of ferrous metals or ferrous alloys by deformation combined with, or followed by, heat treatment during manufacturing of plates or strips characterised by the working steps
    • C21D8/0236—Cold rolling
    • C—CHEMISTRY; METALLURGY
    • C21—METALLURGY OF IRON
    • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D8/00—Modifying the physical properties of ferrous metals or ferrous alloys by deformation combined with, or followed by, heat treatment
    • C21D8/02—Modifying the physical properties of ferrous metals or ferrous alloys by deformation combined with, or followed by, heat treatment during manufacturing of plates or strips
    • C21D8/0247—Modifying the physical properties of ferrous metals or ferrous alloys by deformation combined with, or followed by, heat treatment during manufacturing of plates or strips characterised by the heat treatment
    • C—CHEMISTRY; METALLURGY
    • C21—METALLURGY OF IRON
    • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D8/00—Modifying the physical properties of ferrous metals or ferrous alloys by deformation combined with, or followed by, heat treatment
    • C21D8/02—Modifying the physical properties of ferrous metals or ferrous alloys by deformation combined with, or followed by, heat treatment during manufacturing of plates or strips
    • C21D8/0278—Modifying the physical properties of ferrous metals or ferrous alloys by deformation combined with, or followed by, heat treatment during manufacturing of plates or strips involving a particular surface treatment 
    • C—CHEMISTRY; METALLURGY
    • C21—METALLURGY OF IRON
    • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D9/00—Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor
    • C21D9/46—Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor for sheet metals
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C22C38/08—Ferrous alloys, e.g. steel alloys containing nickel
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/16—Acidic compositions
    • C23F1/28—Acidic compositions for etching iron group metals
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/04—Wires; Strips; Foils
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00—Sampling; Preparing specimens for investigation
    • G01N1/28—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/20058—Measuring diffraction of electrons, e.g. low energy electron diffraction [LEED] method or reflection high energy electron diffraction [RHEED] method
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/203—Measuring back scattering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3005—Observing the objects or the point of impact on the object
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • C—CHEMISTRY; METALLURGY
    • C21—METALLURGY OF IRON
    • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D2261/00—Machining or cutting being involved
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C22C38/10—Ferrous alloys, e.g. steel alloys containing cobalt
    • C22C38/105—Ferrous alloys, e.g. steel alloys containing cobalt containing Co and Ni
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/562—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/05—Investigating materials by wave or particle radiation by diffraction, scatter or reflection
    • G01N2223/053—Investigating materials by wave or particle radiation by diffraction, scatter or reflection back scatter
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/05—Investigating materials by wave or particle radiation by diffraction, scatter or reflection
    • G01N2223/056—Investigating materials by wave or particle radiation by diffraction, scatter or reflection diffraction
    • G01N2223/0565—Investigating materials by wave or particle radiation by diffraction, scatter or reflection diffraction diffraction of electrons, e.g. LEED
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Thermal Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Child & Adolescent Psychology (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
  • Metal Rolling (AREA)
  • ing And Chemical Polishing (AREA)
  • Heat Treatment Of Sheet Steel (AREA)
JP2018563643A 2017-11-14 2018-11-13 蒸着マスクを製造するための金属板、金属板の検査方法、金属板の製造方法、蒸着マスク、蒸着マスク装置及び蒸着マスクの製造方法 Pending JPWO2019098168A1 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2019122142A JP6896801B2 (ja) 2017-11-14 2019-06-28 蒸着マスクを製造するための金属板、金属板の検査方法、金属板の製造方法、蒸着マスク、蒸着マスク装置及び蒸着マスクの製造方法

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
JP2017219369 2017-11-14
JP2017219369 2017-11-14
JP2017249744 2017-12-26
JP2017249744 2017-12-26
JP2018002932 2018-01-11
JP2018002932 2018-01-11
PCT/JP2018/041919 WO2019098168A1 (ja) 2017-11-14 2018-11-13 蒸着マスクを製造するための金属板、金属板の検査方法、金属板の製造方法、蒸着マスク、蒸着マスク装置及び蒸着マスクの製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2019122142A Division JP6896801B2 (ja) 2017-11-14 2019-06-28 蒸着マスクを製造するための金属板、金属板の検査方法、金属板の製造方法、蒸着マスク、蒸着マスク装置及び蒸着マスクの製造方法

Publications (1)

Publication Number Publication Date
JPWO2019098168A1 true JPWO2019098168A1 (ja) 2019-11-14

Family

ID=66496400

Family Applications (14)

Application Number Title Priority Date Filing Date
JP2019554211A Active JP6787503B2 (ja) 2017-11-14 2018-11-13 蒸着マスクを製造するための金属板の製造方法
JP2019554213A Active JP7167936B2 (ja) 2017-11-14 2018-11-13 蒸着マスクを製造するための金属板及び金属板の製造方法並びに蒸着マスク、蒸着マスクの製造方法及び蒸着マスクを備える蒸着マスク装置
JP2018563643A Pending JPWO2019098168A1 (ja) 2017-11-14 2018-11-13 蒸着マスクを製造するための金属板、金属板の検査方法、金属板の製造方法、蒸着マスク、蒸着マスク装置及び蒸着マスクの製造方法
JP2019090946A Active JP6792829B2 (ja) 2017-11-14 2019-05-13 蒸着マスクを製造するための金属板及び金属板の製造方法並びに蒸着マスク、蒸着マスクの製造方法及び蒸着マスクを備える蒸着マスク装置
JP2019122142A Active JP6896801B2 (ja) 2017-11-14 2019-06-28 蒸着マスクを製造するための金属板、金属板の検査方法、金属板の製造方法、蒸着マスク、蒸着マスク装置及び蒸着マスクの製造方法
JP2020134174A Active JP6814420B2 (ja) 2017-11-14 2020-08-06 蒸着マスクを製造するための金属板、金属板の検査方法、金属板の製造方法、蒸着マスク、蒸着マスク装置及び蒸着マスクの製造方法
JP2020180577A Active JP7116929B2 (ja) 2017-11-14 2020-10-28 蒸着マスクを製造するための金属板及び金属板の製造方法並びに蒸着マスク及び蒸着マスクの製造方法
JP2020202968A Pending JP2021059783A (ja) 2017-11-14 2020-12-07 蒸着マスクを製造するための金属板、金属板の検査方法、金属板の製造方法、蒸着マスク、蒸着マスク装置及び蒸着マスクの製造方法
JP2021133631A Active JP7125683B2 (ja) 2017-11-14 2021-08-18 蒸着マスクを製造するための金属板並びに蒸着マスク及び蒸着マスクの製造方法
JP2022123637A Active JP7334833B2 (ja) 2017-11-14 2022-08-02 蒸着マスクを製造するための金属板の製造方法
JP2022169266A Active JP7478364B2 (ja) 2017-11-14 2022-10-21 蒸着マスクを製造するための金属板の評価方法
JP2023128116A Active JP7720035B2 (ja) 2017-11-14 2023-08-04 蒸着マスクを製造するための金属板の製造方法
JP2023181313A Pending JP2024010051A (ja) 2017-11-14 2023-10-20 蒸着マスクを製造するための金属板、金属板の検査方法、金属板の製造方法、蒸着マスク、蒸着マスク装置及び蒸着マスクの製造方法
JP2025033920A Pending JP2025090646A (ja) 2017-11-14 2025-03-04 蒸着マスクを製造するための金属板

Family Applications Before (2)

Application Number Title Priority Date Filing Date
JP2019554211A Active JP6787503B2 (ja) 2017-11-14 2018-11-13 蒸着マスクを製造するための金属板の製造方法
JP2019554213A Active JP7167936B2 (ja) 2017-11-14 2018-11-13 蒸着マスクを製造するための金属板及び金属板の製造方法並びに蒸着マスク、蒸着マスクの製造方法及び蒸着マスクを備える蒸着マスク装置

Family Applications After (11)

Application Number Title Priority Date Filing Date
JP2019090946A Active JP6792829B2 (ja) 2017-11-14 2019-05-13 蒸着マスクを製造するための金属板及び金属板の製造方法並びに蒸着マスク、蒸着マスクの製造方法及び蒸着マスクを備える蒸着マスク装置
JP2019122142A Active JP6896801B2 (ja) 2017-11-14 2019-06-28 蒸着マスクを製造するための金属板、金属板の検査方法、金属板の製造方法、蒸着マスク、蒸着マスク装置及び蒸着マスクの製造方法
JP2020134174A Active JP6814420B2 (ja) 2017-11-14 2020-08-06 蒸着マスクを製造するための金属板、金属板の検査方法、金属板の製造方法、蒸着マスク、蒸着マスク装置及び蒸着マスクの製造方法
JP2020180577A Active JP7116929B2 (ja) 2017-11-14 2020-10-28 蒸着マスクを製造するための金属板及び金属板の製造方法並びに蒸着マスク及び蒸着マスクの製造方法
JP2020202968A Pending JP2021059783A (ja) 2017-11-14 2020-12-07 蒸着マスクを製造するための金属板、金属板の検査方法、金属板の製造方法、蒸着マスク、蒸着マスク装置及び蒸着マスクの製造方法
JP2021133631A Active JP7125683B2 (ja) 2017-11-14 2021-08-18 蒸着マスクを製造するための金属板並びに蒸着マスク及び蒸着マスクの製造方法
JP2022123637A Active JP7334833B2 (ja) 2017-11-14 2022-08-02 蒸着マスクを製造するための金属板の製造方法
JP2022169266A Active JP7478364B2 (ja) 2017-11-14 2022-10-21 蒸着マスクを製造するための金属板の評価方法
JP2023128116A Active JP7720035B2 (ja) 2017-11-14 2023-08-04 蒸着マスクを製造するための金属板の製造方法
JP2023181313A Pending JP2024010051A (ja) 2017-11-14 2023-10-20 蒸着マスクを製造するための金属板、金属板の検査方法、金属板の製造方法、蒸着マスク、蒸着マスク装置及び蒸着マスクの製造方法
JP2025033920A Pending JP2025090646A (ja) 2017-11-14 2025-03-04 蒸着マスクを製造するための金属板

Country Status (8)

Country Link
US (5) US11237481B2 (https=)
EP (3) EP3712295A4 (https=)
JP (14) JP6787503B2 (https=)
KR (5) KR20230150402A (https=)
CN (7) CN109778115A (https=)
DE (2) DE202018006884U1 (https=)
TW (5) TWI765121B (https=)
WO (3) WO2019098168A1 (https=)

Families Citing this family (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108977762B (zh) * 2017-06-05 2019-12-27 京东方科技集团股份有限公司 掩膜板、套装掩膜板和蒸镀系统
EP3712295A4 (en) * 2017-11-14 2021-12-15 Dai Nippon Printing Co., Ltd. METAL PLATE FOR PRODUCING STEAM DEPOSIT MASKS, METAL PLATE INSPECTION PROCESS, METAL PLATE PRODUCTION PROCESS, STEAM DEPOSIT MASK, STEAM PHASE DEPOSIT MASK DEVICE AND PRODUCTION PROCESS IN STEAM PHASE
DE202019006014U1 (de) * 2018-11-13 2024-01-25 Dai Nippon Printing Co., Ltd. Metallplatte zur Herstellung von Dampfphasenabscheidungsmasken
KR102109037B1 (ko) * 2018-11-13 2020-05-11 (주)애니캐스팅 다중배열전극을 이용한 유기 증착 마스크 제조 방법
JP7481330B2 (ja) 2018-11-19 2024-05-10 エルジー イノテック カンパニー リミテッド 合金金属板及びこれを含む蒸着用マスク
JP7487481B2 (ja) 2019-02-06 2024-05-21 大日本印刷株式会社 蒸着マスク装置、マスク支持機構及び蒸着マスク装置の製造方法
CN109778116B (zh) * 2019-03-28 2021-03-02 京东方科技集团股份有限公司 一种掩膜版及其制作方法、掩膜版组件
CN114096694B (zh) 2019-10-04 2025-01-21 凸版印刷株式会社 蒸镀掩模、蒸镀掩模的制造方法及显示装置的制造方法
KR20210042026A (ko) * 2019-10-08 2021-04-16 다이니폰 인사츠 가부시키가이샤 증착 마스크를 제조하기 위한 금속판, 금속판의 제조 방법, 증착 마스크 및 증착 마스크의 제조 방법
JP7749925B2 (ja) * 2020-03-13 2025-10-07 大日本印刷株式会社 有機デバイスの製造装置の蒸着室の評価方法
US11613802B2 (en) * 2020-04-17 2023-03-28 Rockwell Collins, Inc. Additively manufactured shadow masks for material deposition control
KR102485407B1 (ko) * 2020-10-23 2023-01-06 주식회사 오럼머티리얼 마스크의 제조 방법
CN114481018B (zh) * 2020-10-23 2024-08-09 悟劳茂材料公司 掩模制造方法
CN112376015A (zh) * 2020-11-09 2021-02-19 京东方科技集团股份有限公司 一种掩膜版及其制作方法、显示基板及其制作方法
CN112323019B (zh) * 2020-11-18 2025-03-14 匠博先进材料科技(广州)有限公司 一种蒸镀掩模、组件、装置及有机显示装置
JP7151912B1 (ja) * 2020-12-03 2022-10-12 Ｊｆｅスチール株式会社 溶接鋼管のシーム部および加熱部の位置検出装置、溶接鋼管の製造設備、溶接鋼管のシーム部および加熱部の位置検出方法、溶接鋼管の製造方法および溶接鋼管の品質管理方法
JP7743186B2 (ja) * 2021-01-08 2025-09-24 株式会社Magnolia White 蒸着マスクの製造装置、及び蒸着マスクの製造方法
JP2022120464A (ja) * 2021-02-05 2022-08-18 昭和電工マテリアルズ株式会社 メタルマスクの製造方法
CN113410151B (zh) * 2021-06-01 2022-10-14 云谷（固安）科技有限公司 一种确定掩膜版的位置偏移量的方法、装置及设备
CN113373406A (zh) * 2021-06-17 2021-09-10 浙江众凌科技有限公司 一种精密金属遮罩及其蚀刻激光复合制作方法
JP7681442B2 (ja) * 2021-06-22 2025-05-22 前田建設工業株式会社 シールドマシンにおけるチャンバー内試料回収装置及び試料回収方法
JP2023035028A (ja) * 2021-08-31 2023-03-13 富士フイルム株式会社 蒸着マスク形成用転写フィルム及び蒸着マスクの製造方法
JP7327693B2 (ja) * 2021-08-31 2023-08-16 凸版印刷株式会社 蒸着マスク基材、蒸着マスク基材の検査方法、蒸着マスクの製造方法、および、表示装置の製造方法
TWI828015B (zh) * 2021-12-01 2024-01-01 達運精密工業股份有限公司 精密金屬遮罩的製造方法
CN115558928B (zh) * 2022-08-31 2024-10-22 浙江众凌科技有限公司 一种基于表面平坦度的蒸镀基材蚀刻装置及蚀刻方法
KR102764176B1 (ko) * 2022-09-29 2025-02-07 엘지이노텍 주식회사 금속판 및 이를 포함하는 증착용 마스크
WO2024102693A2 (en) 2022-11-07 2024-05-16 Xencor, Inc. Il-18-fc fusion proteins
KR102581740B1 (ko) * 2022-12-27 2023-09-22 풍원정밀(주) 변형 불량 방지 및 돌출부 잔여물을 제거한 파인 메탈 마스크 및 그 제조 방법
CN116314527B (zh) * 2023-03-31 2025-09-05 江西兆驰半导体有限公司 一种led芯片及其制备方法
CN118773543A (zh) * 2023-04-07 2024-10-15 京东方科技集团股份有限公司 一种掩模版及制备方法
TW202444140A (zh) 2023-04-18 2024-11-01 日商大日本印刷股份有限公司 金屬板、金屬板之製造方法、遮罩、遮罩裝置及遮罩之製造方法
CN121443768A (zh) * 2023-07-06 2026-01-30 凸版控股株式会社 金属掩模用基材、金属掩模、金属掩模用基材的制造方法、金属掩模的制造方法及显示装置的制造方法
JP2026003573A (ja) * 2024-06-24 2026-01-13 Ｔｏｐｐａｎホールディングス株式会社 メタルマスクおよび製造方法
CN120268813B (zh) * 2025-06-09 2025-10-24 浙江众凌科技有限公司 一种金属掩膜板用金属带材的板形控制方法

Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6139344A (ja) * 1984-07-31 1986-02-25 Toshiba Corp シャドウマスク
JPH08269742A (ja) * 1995-03-30 1996-10-15 Nikko Kinzoku Kk 精密エッチング加工用冷間圧延金属材料及びその製造方法
JPH11219986A (ja) * 1998-02-03 1999-08-10 Hitachi Cable Ltd Ｔａｂ用テープキャリアの製造方法
JP2002012998A (ja) * 2000-04-28 2002-01-15 Fukuda Metal Foil & Powder Co Ltd プリント配線板用銅箔及びその表面処理方法
JP2002194573A (ja) * 2000-12-27 2002-07-10 Mitsubishi Gas Chem Co Inc 銅および銅合金の表面処理剤
JP2008293841A (ja) * 2007-05-25 2008-12-04 Shinko Electric Co Ltd マスクアライメント装置
JP2010247500A (ja) * 2009-04-20 2010-11-04 Sonocom Co Ltd マスク及びマスクの製造方法
JP2016121376A (ja) * 2014-12-24 2016-07-07 大日本印刷株式会社 蒸着マスクの製造方法、蒸着マスクを作製するために用いられる金属板および蒸着マスク
WO2016129533A1 (ja) * 2015-02-10 2016-08-18 大日本印刷株式会社 蒸着マスクの製造方法、蒸着マスクを作製するために用いられる金属板およびその製造方法
WO2017014016A1 (ja) * 2015-07-17 2017-01-26 凸版印刷株式会社 メタルマスク用基材の製造方法、蒸着用メタルマスクの製造方法、メタルマスク用基材、および、蒸着用メタルマスク
WO2017013904A1 (ja) * 2015-07-17 2017-01-26 凸版印刷株式会社 メタルマスク基材、メタルマスク基材の管理方法、メタルマスク、および、メタルマスクの製造方法
JP2017088914A (ja) * 2015-11-04 2017-05-25 Ｊｘ金属株式会社 メタルマスク材料及びメタルマスク
JP2017088915A (ja) * 2015-11-04 2017-05-25 Ｊｘ金属株式会社 メタルマスク材料及びメタルマスク

Family Cites Families (67)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5612503Y2 (https=) 1976-12-08 1981-03-23
JPS57104141A (en) * 1980-12-22 1982-06-29 Dainippon Printing Co Ltd Photomask and photomask substrate
JPS5968146A (ja) * 1982-10-08 1984-04-18 Toshiba Corp フラツトマスクの表裏判別方法
JPH0687398B2 (ja) * 1986-07-08 1994-11-02 株式会社東芝 シヤドウマスクの製造方法
US5130203A (en) * 1988-07-28 1992-07-14 Nippon Leakless Industry Co., Ltd. Metal gasket and method of producing the same
JPH04282439A (ja) * 1991-03-12 1992-10-07 Fujitsu Ltd 貫通孔検査装置
JPH0528913A (ja) * 1991-07-23 1993-02-05 Toshiba Corp カラーブラウン管用シヤドウマスク検査装置
JPH05144384A (ja) * 1991-09-25 1993-06-11 Toshiba Corp シヤドウマスク用素材
JPH0634623A (ja) * 1992-07-17 1994-02-10 Nkk Corp 鋼板の表面のカーボン汚れ分析方法
JPH08220778A (ja) 1995-02-17 1996-08-30 Dainippon Screen Mfg Co Ltd エッチング方法及び装置
DE60040004D1 (de) * 1999-06-10 2008-10-02 Nippon Yakin Kogyo Co Ltd Material auf fe-ni-basis für lochmaske
JP4595143B2 (ja) 1999-09-06 2010-12-08 双葉電子工業株式会社 有機ｅｌデバイスとその製造方法
JP2001131707A (ja) 1999-10-29 2001-05-15 Dainippon Printing Co Ltd カラーブラウン管用シャドウマスク
JP2001234385A (ja) 2000-02-24 2001-08-31 Tohoku Pioneer Corp メタルマスク及びその製造方法
EP1134300A3 (en) 2000-03-17 2002-05-22 Hitachi Metals, Ltd. Fe-Ni alloy
US6524723B2 (en) 2000-04-28 2003-02-25 Fukuda Metal Foil & Powder Co., Ltd. Copper foil for printed circuit boards and its surface treatment method
JP3545684B2 (ja) * 2000-07-17 2004-07-21 日鉱金属加工株式会社 エッチング穿孔性に優れたＦｅ−Ｎｉ系合金シャドウマスク用素材
JP2002035804A (ja) * 2000-07-31 2002-02-05 Hitachi Metals Ltd 高強度シャドウマスク用あるいはアパーチャグリル用薄板の製造方法
JP3740105B2 (ja) 2001-11-20 2006-02-01 日鉱金属加工株式会社 シャドウマスク用Ｆｅ−Ｎｉ系およびＦｅ−Ｎｉ−Ｃｏ系合金条
JP2004061121A (ja) 2002-07-24 2004-02-26 Nippon Light Metal Co Ltd 表面分析用標準試料及びその製造方法
JP2004185890A (ja) * 2002-12-02 2004-07-02 Hitachi Metals Ltd メタルマスク
JP3975439B2 (ja) * 2002-12-02 2007-09-12 日立金属株式会社 メタルマスク
JP4170179B2 (ja) * 2003-01-09 2008-10-22 株式会社 日立ディスプレイズ 有機ｅｌパネルの製造方法および有機ｅｌパネル
JP2006010576A (ja) * 2004-06-28 2006-01-12 Chugoku Electric Power Co Inc:The 物体表面における測定対象凹部或いは凸部の幅測定方法および体積測定方法
US20060068132A1 (en) * 2004-09-30 2006-03-30 Asahi Glass Company, Limited Ink jet recording sheet for plate-making mask film, and process for producing flexographic printing plate
DE602006003856D1 (de) * 2006-02-28 2009-01-08 Agfa Graphics Nv Verfahren zur Herstellung eines lithographischen Druckplattenträgers
DE102008064781B3 (de) * 2007-04-23 2016-01-07 Hitachi High-Technologies Corporation lonenstrahlbearbeitungs-/Betrachtungsvorrichtung
JP2009054512A (ja) * 2007-08-29 2009-03-12 Seiko Epson Corp マスク
JP2010106358A (ja) * 2008-09-30 2010-05-13 Canon Inc 成膜用マスク及びそれを用いた成膜方法
JP5294072B2 (ja) * 2009-03-18 2013-09-18 日立金属株式会社 エッチング加工用素材の製造方法及びエッチング加工用素材
CN103403938B (zh) * 2011-02-15 2016-09-28 攀时股份有限公司 层结构和其在高温燃料电池的连接体与阴极之间形成陶瓷层结构的用途
CN103930588B (zh) * 2011-06-22 2016-08-17 艾克斯特朗欧洲公司 用于气相沉积的方法和装置
MX2014003968A (es) * 2011-10-14 2014-08-27 Ingrain Inc Metodo de imagen doble y sistema para generar una imagen multidimensional de una muestra.
CN102692184B (zh) * 2012-02-29 2014-07-23 首钢总公司 一种同时测量腐蚀坑体积、面积、深度的方法
JP5382259B1 (ja) * 2013-01-10 2014-01-08 大日本印刷株式会社 金属板、金属板の製造方法、および金属板を用いて蒸着マスクを製造する方法
JP6432722B2 (ja) * 2013-07-30 2018-12-05 俊 保坂 半導体センサー・デバイスおよびその製造方法
JP5455099B1 (ja) * 2013-09-13 2014-03-26 大日本印刷株式会社 金属板、金属板の製造方法、および金属板を用いてマスクを製造する方法
JP2015129334A (ja) * 2014-01-08 2015-07-16 大日本印刷株式会社 積層マスクの製造方法、積層マスクおよび保護フィルム付き積層マスク
JP2015140464A (ja) * 2014-01-29 2015-08-03 大日本印刷株式会社 蒸着マスク装置及び熱バリア材
JP5626491B1 (ja) 2014-03-06 2014-11-19 大日本印刷株式会社 金属板、金属板の製造方法、および金属板を用いて蒸着マスクを製造する方法
JP5641462B1 (ja) * 2014-05-13 2014-12-17 大日本印刷株式会社 金属板、金属板の製造方法、および金属板を用いてマスクを製造する方法
US10119174B2 (en) * 2014-05-28 2018-11-06 Hitachi Metals, Ltd. Hot work tool material and method for manufacturing hot work tool
JP6341039B2 (ja) 2014-09-29 2018-06-13 大日本印刷株式会社 金属板、金属板の製造方法、および金属板を用いて蒸着マスクを製造する方法
JP6459040B2 (ja) 2014-12-10 2019-01-30 大日本印刷株式会社 金属板、金属板の製造方法、および金属板を用いて蒸着マスクを製造する方法
JP6515520B2 (ja) * 2014-12-15 2019-05-22 大日本印刷株式会社 蒸着マスクの製造方法、蒸着マスクを作製するために用いられる金属板および蒸着マスク
JP6628082B2 (ja) * 2015-01-20 2020-01-08 日立金属株式会社 Ｆｅ−Ｎｉ系合金薄板の製造方法
JP2015098650A (ja) * 2015-02-05 2015-05-28 Jx日鉱日石金属株式会社 メタルマスク材料及びメタルマスク
TWI651588B (zh) 2015-02-10 2019-02-21 日商大日本印刷股份有限公司 蒸鍍遮罩之製造方法及蒸鍍遮罩
JP6666656B2 (ja) * 2015-04-02 2020-03-18 東洋鋼鈑株式会社 Ｒｆマグネトロンスパッタリング装置
CN106304689A (zh) * 2015-06-05 2017-01-04 Jx日矿日石金属株式会社 压延铜箔、覆铜层叠板、以及柔性印刷基板和电子设备
KR102071840B1 (ko) * 2015-07-17 2020-01-31 도판 인사츠 가부시키가이샤 메탈 마스크 기재, 메탈 마스크, 및 메탈 마스크의 제조 방법
CN107406963B (zh) * 2015-07-17 2018-11-20 凸版印刷株式会社 蒸镀用金属掩模基材及其制造方法、蒸镀用金属掩模及其制造方法
CN105004786B (zh) * 2015-08-17 2017-10-31 苏州热工研究院有限公司 一种基于涡流检测的换热管管壁凹陷程度评估方法
KR102121674B1 (ko) 2015-08-17 2020-06-10 닛테츠 케미컬 앤드 머티리얼 가부시키가이샤 오스테나이트계 스테인리스 강박
JP6598007B2 (ja) 2015-09-30 2019-10-30 日立金属株式会社 Ｆｅ−Ｎｉ系合金薄板の製造方法
JP6624504B2 (ja) * 2015-12-03 2019-12-25 大日本印刷株式会社 蒸着マスク及び蒸着マスクの製造方法
KR102586048B1 (ko) * 2016-01-12 2023-10-10 삼성디스플레이 주식회사 마스크 조립체, 이의 제조방법 및 이를 포함한 표시 장치의 제조장치
JP6720564B2 (ja) * 2016-02-12 2020-07-08 大日本印刷株式会社 蒸着マスクおよび蒸着マスクの製造方法
JP6460131B2 (ja) * 2016-02-16 2019-01-30 Ｊｆｅスチール株式会社 溶融亜鉛めっき鋼板の表面性状評価方法、溶融亜鉛めっき鋼板の表面性状評価装置、及び溶融亜鉛めっき鋼板の製造方法
JP6670469B2 (ja) * 2016-03-16 2020-03-25 大日本印刷株式会社 蒸着マスクおよび蒸着マスク中間体
EP3231588A1 (de) * 2016-04-12 2017-10-18 Evonik Röhm GmbH Sprühgetrocknetes weichphasenemulsionspolymerisat für das auffüllen der zwickel in perlpolymerisatschichten im binder jetting verfahren
KR102200854B1 (ko) 2016-08-31 2021-01-11 히다찌긴조꾸가부시끼가이사 메탈 마스크용 소재 및 그 제조 방법
EP3508285B1 (en) 2016-08-31 2021-09-29 Hitachi Metals, Ltd. Metal mask material and production method therefor
KR101819367B1 (ko) * 2016-09-08 2018-01-17 주식회사 포스코 철-니켈 합금 박 및 이의 제조방법
WO2018235862A1 (ja) 2017-06-20 2018-12-27 日立金属株式会社 メタルマスク用薄板の製造方法及びメタルマスク用薄板
EP3712295A4 (en) * 2017-11-14 2021-12-15 Dai Nippon Printing Co., Ltd. METAL PLATE FOR PRODUCING STEAM DEPOSIT MASKS, METAL PLATE INSPECTION PROCESS, METAL PLATE PRODUCTION PROCESS, STEAM DEPOSIT MASK, STEAM PHASE DEPOSIT MASK DEVICE AND PRODUCTION PROCESS IN STEAM PHASE
KR20200058819A (ko) * 2018-11-20 2020-05-28 엘지이노텍 주식회사 합금 금속판 및 이를 포함하는 증착용 마스크

Patent Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6139344A (ja) * 1984-07-31 1986-02-25 Toshiba Corp シャドウマスク
JPH08269742A (ja) * 1995-03-30 1996-10-15 Nikko Kinzoku Kk 精密エッチング加工用冷間圧延金属材料及びその製造方法
JPH11219986A (ja) * 1998-02-03 1999-08-10 Hitachi Cable Ltd Ｔａｂ用テープキャリアの製造方法
JP2002012998A (ja) * 2000-04-28 2002-01-15 Fukuda Metal Foil & Powder Co Ltd プリント配線板用銅箔及びその表面処理方法
JP2002194573A (ja) * 2000-12-27 2002-07-10 Mitsubishi Gas Chem Co Inc 銅および銅合金の表面処理剤
JP2008293841A (ja) * 2007-05-25 2008-12-04 Shinko Electric Co Ltd マスクアライメント装置
JP2010247500A (ja) * 2009-04-20 2010-11-04 Sonocom Co Ltd マスク及びマスクの製造方法
JP2016121376A (ja) * 2014-12-24 2016-07-07 大日本印刷株式会社 蒸着マスクの製造方法、蒸着マスクを作製するために用いられる金属板および蒸着マスク
WO2016129533A1 (ja) * 2015-02-10 2016-08-18 大日本印刷株式会社 蒸着マスクの製造方法、蒸着マスクを作製するために用いられる金属板およびその製造方法
WO2017014016A1 (ja) * 2015-07-17 2017-01-26 凸版印刷株式会社 メタルマスク用基材の製造方法、蒸着用メタルマスクの製造方法、メタルマスク用基材、および、蒸着用メタルマスク
WO2017013904A1 (ja) * 2015-07-17 2017-01-26 凸版印刷株式会社 メタルマスク基材、メタルマスク基材の管理方法、メタルマスク、および、メタルマスクの製造方法
JP2017088914A (ja) * 2015-11-04 2017-05-25 Ｊｘ金属株式会社 メタルマスク材料及びメタルマスク
JP2017088915A (ja) * 2015-11-04 2017-05-25 Ｊｘ金属株式会社 メタルマスク材料及びメタルマスク

Also Published As

Publication number Publication date
EP3712294A1 (en) 2020-09-23
TW201923115A (zh) 2019-06-16
US20200019056A1 (en) 2020-01-16
JP7720035B2 (ja) 2025-08-07
JP2022174040A (ja) 2022-11-22
JPWO2019098165A1 (ja) 2020-11-26
JP2020079441A (ja) 2020-05-28
JP6787503B2 (ja) 2020-11-18
JP2024010051A (ja) 2024-01-23
CN117187746A (zh) 2023-12-08
US20200017951A1 (en) 2020-01-16
JP2020190033A (ja) 2020-11-26
KR20200087184A (ko) 2020-07-20
CN113061843B (zh) 2023-07-11
JP7167936B2 (ja) 2022-11-09
TW201932621A (zh) 2019-08-16
CN111455312A (zh) 2020-07-28
CN109778113A (zh) 2019-05-21
JP2023171717A (ja) 2023-12-05
US20200017950A1 (en) 2020-01-16
KR20200087185A (ko) 2020-07-20
US12117727B2 (en) 2024-10-15
TWI827235B (zh) 2023-12-21
JP7478364B2 (ja) 2024-05-07
JP6792829B2 (ja) 2020-12-02
CN113774323B (zh) 2023-12-12
WO2019098167A1 (ja) 2019-05-23
US11733607B2 (en) 2023-08-22
TWI765121B (zh) 2022-05-21
TW201923121A (zh) 2019-06-16
EP3712294A4 (en) 2022-02-16
WO2019098168A1 (ja) 2019-05-23
JP2023012491A (ja) 2023-01-25
KR20230150402A (ko) 2023-10-30
JP6896801B2 (ja) 2021-06-30
KR20230154477A (ko) 2023-11-08
TWI757562B (zh) 2022-03-11
US20210157232A1 (en) 2021-05-27
JPWO2019098167A1 (ja) 2020-12-17
CN109778113B (zh) 2021-02-12
CN113061843A (zh) 2021-07-02
CN109778114A (zh) 2019-05-21
KR102650066B1 (ko) 2024-03-22
CN111455312B (zh) 2022-12-20
JP7116929B2 (ja) 2022-08-12
JP2021038461A (ja) 2021-03-11
JP2019214788A (ja) 2019-12-19
JP7125683B2 (ja) 2022-08-25
JP2025090646A (ja) 2025-06-17
US12540385B2 (en) 2026-02-03
KR102591494B1 (ko) 2023-10-20
EP3712295A4 (en) 2021-12-15
EP3712296A1 (en) 2020-09-23
JP2021193211A (ja) 2021-12-23
CN109778115A (zh) 2019-05-21
DE202018006884U1 (de) 2024-01-24
JP7334833B2 (ja) 2023-08-29
KR20200055679A (ko) 2020-05-21
EP3712296A4 (en) 2021-08-11
DE202018006883U1 (de) 2024-02-19
JP6814420B2 (ja) 2021-01-20
JP2021059783A (ja) 2021-04-15
TWI832926B (zh) 2024-02-21
TW202305155A (zh) 2023-02-01
US20220121115A1 (en) 2022-04-21
KR20200086691A (ko) 2020-07-17
EP3712295A1 (en) 2020-09-23
TWI776990B (zh) 2022-09-11
US11237481B2 (en) 2022-02-01
CN113774323A (zh) 2021-12-10
CN109778114B (zh) 2021-10-15
TW202026439A (zh) 2020-07-16
KR102596249B1 (ko) 2023-11-01
WO2019098165A1 (ja) 2019-05-23

Similar Documents

Publication Publication Date Title
JPWO2019098168A1 (ja) 蒸着マスクを製造するための金属板、金属板の検査方法、金属板の製造方法、蒸着マスク、蒸着マスク装置及び蒸着マスクの製造方法
US10731261B2 (en) Metal plate, method of manufacturing metal plate, and method of manufacturing mask by use of metal plate
JP7828564B2 (ja) 蒸着マスクを製造するための金属板及び金属板の製造方法並びに蒸着マスク、蒸着マスクの製造方法及び蒸着マスクを備える蒸着マスク装置
KR20260061476A (ko) 증착 마스크를 제조하기 위한 금속판 및 금속판의 제조 방법, 그리고 증착 마스크 및 증착 마스크의 제조 방법

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20181205

A871 Explanation of circumstances concerning accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A871

Effective date: 20181205

A975 Report on accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A971005

Effective date: 20190124

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20190201

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20190301

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20190329