JPWO2006121068A1 - 巻取式プラズマcvd装置 - Google Patents
巻取式プラズマcvd装置 Download PDFInfo
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- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 2
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- 239000011521 glass Substances 0.000 claims description 2
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- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 2
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 2
- 210000000078 claw Anatomy 0.000 claims 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32733—Means for moving the material to be treated
- H01J37/32752—Means for moving the material to be treated for moving the material across the discharge
- H01J37/32761—Continuous moving
- H01J37/3277—Continuous moving of continuous material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4405—Cleaning of reactor or parts inside the reactor by using reactive gases
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
- C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
- C23C16/5096—Flat-bed apparatus
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
- C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Plasma Technology (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
21 真空チャンバ
22 フィルム
23 巻出しローラ
24 巻取りローラ
25 成膜部
27 反応室
29 真空排気ポート
32 加熱ローラ
33 上流側可動ローラ
34 下流側可動ローラ
36 高周波電極
37 シャワープレート
38 アノード電極(対向電極)
40 金属ベルト
41 ベルト走行系
43 移動ローラ
46 リフター
47 高周波電源
49 空間部
50 ガス導入配管
51 マスク
52 開口部
53 除電機構
56 回転軸
57 支持ブラケット
60 上段側フック
61 下段側フック
65 シャッタ
さて、フィルム22の成膜処理を長時間連続して行うと、成膜部25の特にシャワープレート37やマスク51の開口部52周辺に、原料ガスの分解生成物の付着量が増大する。これを放置すると、ダストの発生により膜質を劣化させたり、マスク開口部52の開口面積が変動する。そこで、本実施の形態では、以下のようにして、成膜部25のセルフクリーニング処理が実行される。
Claims (21)
- 真空室内でフィルムを走行させながら当該フィルムにプラズマCVDにより成膜を行う巻取式プラズマCVD装置であって、
前記フィルムの走行方向に関して成膜位置の上流側および下流側に各々配置され、前記成膜位置で前記フィルムをほぼ直線的に走行させる上流ローラおよび下流ローラを有し、
前記成膜位置には、
前記フィルムの成膜面に対向し高周波電源に接続された高周波電極と、
前記フィルムの成膜面の裏面側に配置された対向電極と、
前記フィルムの成膜面に原料ガスを供給するガス供給手段とが配置されていることを特徴とする巻取式プラズマCVD装置。 - 前記ガス供給手段は、
前記高周波電極に取り付けられたシャワープレートと、
前記高周波電極と前記シャワープレートとの間に形成された空間部と、
前記空間部と連通し前記シャワープレートを介して前記フィルムの成膜面にガスを供給するガス供給配管とを有する請求の範囲第1項に記載の巻取式プラズマCVD装置。 - 前記シャワープレートと前記フィルムの成膜面との間の対向距離は、10mm以上50mm以下である請求の範囲第2項に記載の巻取式プラズマCVD装置。
- 前記高周波電源の周波数は、100KHz以上100MHz以下である請求の範囲第1項に記載の巻取式プラズマCVD装置。
- 前記対向電極は、接地電位である請求の範囲第1項に記載の巻取式プラズマCVD装置。
- 前記成膜位置の上流側には、前記フィルムを加熱するヒータが設置されている請求の範囲第1項に記載の巻取式プラズマCVD装置。
- 前記成膜位置の下流側には、前記フィルムを除電する除電機構が設置されている請求の範囲第1項に記載の巻取式プラズマCVD装置。
- 前記フィルムは、樹脂フィルム又はガラスフィルムである請求の範囲第1項に記載の巻取式プラズマCVD装置。
- 前記フィルムの成膜面に成膜される材料は、シリコン、窒化シリコン、酸化シリコンもしくは酸窒化シリコン、又は、これらにホウ素、リンの何れか一方もしくは両方を添加したものである請求の範囲第1項に記載の巻取式プラズマCVD装置。
- 前記真空室には、前記成膜位置で前記フィルムの成膜面の裏面側を支持する金属ベルトと、この金属ベルトを循環走行させるベルト走行系が配置されている請求の範囲第1項に記載の巻取式プラズマCVD装置。
- 前記金属ベルトは、前記成膜位置に配置された対向電極と同電位である請求の範囲第10項に記載の巻取式プラズマCVD装置。
- 前記金属ベルトは、前記成膜位置に配置された対向電極である請求の範囲第10項に記載の巻取式プラズマCVD装置。
- 前記金属ベルト及び前記フィルムはそれぞれ、前記成膜位置の上流側に配置された上流ローラに接触して走行し、この上流ローラには前記金属ベルトを介して前記フィルムを加熱するヒータが内蔵されている請求の範囲第10項に記載の巻取式プラズマCVD装置。
- 前記成膜位置には、前記フィルムの成膜面を限定する開口部を有するマスクが配置されている請求の範囲第1項に記載の巻取式プラズマCVD装置。
- 前記マスクの開口部を開閉自在なシャッタを有し、このシャッタで前記マスクの開口部を塞ぎ、ガス供給手段からクリーニング用ガスを供給して、成膜部のクリーニングを行う請求の範囲第14項に記載の巻取式プラズマCVD装置。
- 前記フィルムの成膜面を限定する開口部を有するマスクと、
前記フィルムの成膜面と前記マスク間の間隔を調整する調整機構と、
前記フィルムの成膜面と前記マスクの開口部との間に挿入されることにより当該開口部を閉塞可能なシャッタと、
クリーニング用ガスの供給手段とを備えた請求の範囲第1項に記載の巻取式プラズマCVD装置。 - 前記フィルムの成膜面の裏面側で当該フィルムと同時に走行する金属ベルトを有し、
前記調整機構は、前記フィルムと前記金属ベルトの走行をガイドする上流ローラ及び下流ローラを昇降移動させるローラ移動機構部と、前記金属ベルトの張力を調整するベルト張力調整部とを有する請求の範囲第16項に記載の巻取式プラズマCVD装置。 - 前記ローラ移動機構部は、前記上流ローラ及び下流ローラを昇降移動させると同時に、前記成膜位置に配置された対向電極をも昇降移動させる請求の範囲第17項に記載の巻取式プラズマCVD装置。
- 前記ローラ移動機構部は、前記上流ローラ及び下流ローラの回転軸の両端を支持する支持ブラケットと、この支持ブラケットに取り付けられ、前記対向電極の周縁下端部に係合可能な係合爪とを有する請求の範囲第18項に記載の巻取式プラズマCVD装置。
- 前記シャッタは、接地電位である請求の範囲第16項に記載の巻取式プラズマCVD装置。
- 前記成膜位置には、前記フィルムの成膜面を限定する開口部を有するマスクが配置されており、このマスクと前記高周波電極との間には、ガスの排気流路が形成されている請求の範囲第1項に記載の巻取式プラズマCVD装置。
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JP2007528300A JP5234911B2 (ja) | 2005-05-10 | 2006-05-10 | 巻取式プラズマcvd装置 |
PCT/JP2006/309387 WO2006121068A1 (ja) | 2005-05-10 | 2006-05-10 | 巻取式プラズマcvd装置 |
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EP (1) | EP1881087B1 (ja) |
JP (1) | JP5234911B2 (ja) |
KR (1) | KR100953577B1 (ja) |
CN (1) | CN101098981B (ja) |
RU (1) | RU2371515C2 (ja) |
TW (1) | TWI328050B (ja) |
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JP2013044015A (ja) * | 2011-08-24 | 2013-03-04 | Fujifilm Corp | 成膜装置 |
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EP1881087A1 (en) | 2008-01-23 |
CN101098981B (zh) | 2010-10-20 |
US20080006206A1 (en) | 2008-01-10 |
EP1881087A4 (en) | 2009-07-08 |
US7896968B2 (en) | 2011-03-01 |
RU2371515C2 (ru) | 2009-10-27 |
RU2007141737A (ru) | 2009-05-20 |
EP1881087B1 (en) | 2013-07-24 |
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TWI328050B (en) | 2010-08-01 |
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