KR100953577B1 - 권취식 프라즈마 cvd 장치 - Google Patents
권취식 프라즈마 cvd 장치 Download PDFInfo
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- H—ELECTRICITY
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- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32733—Means for moving the material to be treated
- H01J37/32752—Means for moving the material to be treated for moving the material across the discharge
- H01J37/32761—Continuous moving
- H01J37/3277—Continuous moving of continuous material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4405—Cleaning of reactor or parts inside the reactor by using reactive gases
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
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- C—CHEMISTRY; METALLURGY
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
- C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
- C23C16/5096—Flat-bed apparatus
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- C—CHEMISTRY; METALLURGY
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
- C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
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- H01J37/32—Gas-filled discharge tubes
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Abstract
Description
Claims (21)
- 진공실 내에서 필름을 주행시키면서 당해 필름에 프라즈마 CVD에 의해 성막을 행하는 권취식 프라즈마 CVD 장치에 있어서,상기 필름의 주행방향에 관하여 성막위치의 상류측 및 하류측에 각각 배치되고, 상기 성막위치에서 상기 필름을 직선적으로 주행시키는 상류 롤러 및 하류 롤러와,상기 필름 성막면에 대향하고 고주파 전원에 접속된 고주파 전극과,상기 필름 성막면 이면측에 배치된 대향 전극과,상기 필름 성막면에 원료 가스를 공급하는 가스공급수단과,상기 필름의 성막면을 한정하는 개구부를 가지는 마스크와,상기 마스크 개구부를 개폐자재한 셔터를 가지고,성막부의 크리닝처리가 실행될 때에는, 이 셔터에서 상기 마스크 개구부가 상기 셔터로 막혀지고, 클리닝용 가스가 상기 고주파 전극과 상기 셔터 사이에 공급되는 것을 특징으로 하는 권취식 프라즈마 CVD 장치.
- 제1항에 있어서,상기 가스공급수단은,상기 고주파 전극에 취부된 샤워 플레이트와,상기 고주파 전극과 상기 샤워 플레이트 사이에 형성된 공간부와,상기 공간부와 연통하고 상기 샤워 플레이트를 통해 상기 필름 성막면에 가스를 공급하는 가스공급배관을 가지는 것을 특징으로 하는 권취식 프라즈마 CVD 장치.
- 제2항에 있어서,상기 샤워 플레이트와 상기 필름 성막면 사이의 대향거리는 10㎜ 이상 50㎜ 이하인 것을 특징으로 하는 권취식 프라즈마 CVD 장치.
- 제1항에 있어서,상기 고주파전원의 주파수는, 100㎑ 이상 100㎒ 이하인 것을 특징으로 하는 권취식 프라즈마 CVD 장치.
- 제1항에 있어서,상기 대향전극은 접지전위인 것을 특징으로 하는 권취식 프라즈마 CVD 장치.
- 제1항에 있어서,상기 성막위치 상류측에는 상기 필름을 가열하는 히터가 설치되어 있는 것을 특징으로 하는 권취식 프라즈마 CVD 장치.
- 제1항에 있어서,상기 성막위치 하류측에는 상기 필름을 제전(除電)하는 제전기구가 설치되어 있는 것을 특징으로 하는 권취식 프라즈마 CVD 장치.
- 제1항에 있어서,상기 필름은 수지필름 또는 유리 필름인 것을 특징으로 하는 권취식 프라즈마 CVD 장치.
- 제1항에 있어서,상기 필름 성막면에 성막되는 재료는 실리콘, 질화 실리콘, 산화 실리콘 혹은 산질화 실리콘, 또는, 이들에 붕소, 인중 어느 것인가 한쪽 혹은 양쪽을 첨가한 것을 특징으로 하는 권취식 프라즈마 CVD 장치.
- 제1항에 있어서,상기 진공실에는 상기 성막위치에서 상기 필름 성막면의 이면측을 지지하는 금속 벨트와, 이 금속 벨트를 순환 주행시키는 벨트 주행계가 배치되어 있는 것을 특징으로 하는 권취식 프라즈마 CVD 장치.
- 제10항에 있어서,상기 금속 벨트는 상기 성막위치에 배치된 대향전극과 동전위인 것을 특징으로 하는 권취식 프라즈마 CVD 장치.
- 제10항에 있어서,상기 금속 벨트는 상기 성막위치에 배치된 대향전극인 것을 특징으로 하는 권취식 프라즈마 CVD 장치.
- 제10항에 있어서,상기 금속 벨트 및 상기 필름은 각각 상기 성막위치 상류측에 배치된 상류 롤러에 접촉하여 주행하고, 이 상류 롤러에는 상기 금속 벨트를 통해 상기 필름을 가열하는 히터가 내장되어 있는 것을 특징으로 하는 권취식 프라즈마 CVD 장치.
- 삭제
- 삭제
- 제1항에 있어서,상기 필름 성막면과 상기 마스크 사이의 간격을 조정하는 조정기구를 더 구비하고, 상기 조정기구는 상기 상류 롤러 및 하류 롤러를 승강 이동시키는것을 특징으로 하는 권취식 프라즈마 CVD 장치.
- 제16항에 있어서,상기 필름 성막면의 이면측에서 당해 필름과 동시에 주행하는 금속 벨트를 가지고,상기 조정기구는 상기 필름과 상기 금속 벨트의 주행을 가이드하는 상류 롤러 및 하류 롤러를 상승 이동시키는 롤러이동기구부와, 상기 금속 벨트의 장력을 조정하는 벨트장력조정부를 가지는 것을 특징으로 하는 권취식 프라즈마 CVD 장치.
- 제17항에 있어서,상기 롤러이동기구부는 상기 상류 롤러 및 하류 롤러를 승강 이동시키면서 동시에, 상기 성막위치에 배치된 대향전극도 승강 이동시키는 것을 특징으로 하는 권취식 프라즈마 CVD 장치.
- 제18항에 있어서,상기 롤러이동기구부는 상기 상류 롤러 및 하류 롤러 회전축의 양단을 지지하는 지지브라켓과 이 지지브라켓에 취부되고, 상기 대향전극의 주연 하단부에 계합가능한 계합조(係合爪)를 가지는 것을 특징으로 하는 권취식 프라즈마 CVD 장치.
- 제16항에 있어서,상기 셔터는 접지전위인 것을 특징으로 하는 권취식 프라즈마 CVD 장치.
- 제1항에 있어서,상기 마스크와 상기 고주파 전극 사이에는 가스배기유로가 형성되어 있는 것을 특징으로 하는 권취식 프라즈마 CVD 장치.
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JP4817313B2 (ja) * | 2006-09-01 | 2011-11-16 | 株式会社アルバック | 巻取式プラズマcvd装置 |
JP5292696B2 (ja) * | 2007-01-11 | 2013-09-18 | Tdk株式会社 | プラズマcvd装置、薄膜製造方法、及び、積層基板 |
JP5338034B2 (ja) * | 2007-04-09 | 2013-11-13 | 住友金属鉱山株式会社 | 耐熱遮光フィルムとその製造方法、及びそれを用いた絞り又は光量調整装置 |
KR101204089B1 (ko) * | 2007-12-24 | 2012-11-22 | 삼성테크윈 주식회사 | 롤투롤 기판 이송 장치, 이를 포함하는 습식 식각 장치 및회로 기판 제조 장치 |
EP2096190A1 (en) * | 2008-02-28 | 2009-09-02 | Applied Materials, Inc. | Coating apparatus for coating a web |
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EP1881087B1 (en) | 2013-07-24 |
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CN101098981B (zh) | 2010-10-20 |
TWI328050B (en) | 2010-08-01 |
KR20070089848A (ko) | 2007-09-03 |
EP1881087A1 (en) | 2008-01-23 |
US7896968B2 (en) | 2011-03-01 |
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