JPS62181440A - ウェーハ処理方法 - Google Patents

ウェーハ処理方法

Info

Publication number
JPS62181440A
JPS62181440A JP61253518A JP25351886A JPS62181440A JP S62181440 A JPS62181440 A JP S62181440A JP 61253518 A JP61253518 A JP 61253518A JP 25351886 A JP25351886 A JP 25351886A JP S62181440 A JPS62181440 A JP S62181440A
Authority
JP
Japan
Prior art keywords
wafer
support
load lock
transfer arm
wafer support
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61253518A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0556859B2 (enExample
Inventor
セシル　ジエイ．デービス
テイモシイ　エイ．ウールドリツジ
ドユアン　イー．カーター
ジヨン　イー．スペンサー
ロバート　マチユーズ
ランドール　シー．ヒルデンブランド
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Texas Instruments Inc
Original Assignee
Texas Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US06/790,924 external-priority patent/US4687542A/en
Application filed by Texas Instruments Inc filed Critical Texas Instruments Inc
Publication of JPS62181440A publication Critical patent/JPS62181440A/ja
Publication of JPH0556859B2 publication Critical patent/JPH0556859B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67748—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber horizontal transfer of a single workpiece
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67201—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the load-lock chamber
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67772—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving removal of lid, door, cover
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68707—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68785—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the mechanical construction of the susceptor, stage or support

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Robotics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Warehouses Or Storage Devices (AREA)
  • Physical Vapour Deposition (AREA)
  • Manipulator (AREA)
  • ing And Chemical Polishing (AREA)
  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
  • Specific Conveyance Elements (AREA)
JP61253518A 1985-10-24 1986-10-24 ウェーハ処理方法 Granted JPS62181440A (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US79070885A 1985-10-24 1985-10-24
US06/790,924 US4687542A (en) 1985-10-24 1985-10-24 Vacuum processing system
US790924 1985-10-24
US790708 1985-10-24

Related Child Applications (3)

Application Number Title Priority Date Filing Date
JP10134791A Division JPH04226049A (ja) 1985-10-24 1991-05-07 ウェーハ処理モジュールとウェーハ処理方法
JP5-46734A Division JPH0658931B2 (ja) 1985-10-24 1993-03-08 ウェーハ移送方法及びウェーハ処理モジュール
JP5046733A Division JP2693352B2 (ja) 1985-10-24 1993-03-08 ウェーハ移送方法

Publications (2)

Publication Number Publication Date
JPS62181440A true JPS62181440A (ja) 1987-08-08
JPH0556859B2 JPH0556859B2 (enExample) 1993-08-20

Family

ID=27121066

Family Applications (5)

Application Number Title Priority Date Filing Date
JP61253518A Granted JPS62181440A (ja) 1985-10-24 1986-10-24 ウェーハ処理方法
JP5-99635A Expired - Lifetime JPH0658932B2 (ja) 1985-10-24 1986-10-24 ウェーハ処理ステーション
JP10134791A Pending JPH04226049A (ja) 1985-10-24 1991-05-07 ウェーハ処理モジュールとウェーハ処理方法
JP5046733A Expired - Fee Related JP2693352B2 (ja) 1985-10-24 1993-03-08 ウェーハ移送方法
JP5-46734A Expired - Lifetime JPH0658931B2 (ja) 1985-10-24 1993-03-08 ウェーハ移送方法及びウェーハ処理モジュール

Family Applications After (4)

Application Number Title Priority Date Filing Date
JP5-99635A Expired - Lifetime JPH0658932B2 (ja) 1985-10-24 1986-10-24 ウェーハ処理ステーション
JP10134791A Pending JPH04226049A (ja) 1985-10-24 1991-05-07 ウェーハ処理モジュールとウェーハ処理方法
JP5046733A Expired - Fee Related JP2693352B2 (ja) 1985-10-24 1993-03-08 ウェーハ移送方法
JP5-46734A Expired - Lifetime JPH0658931B2 (ja) 1985-10-24 1993-03-08 ウェーハ移送方法及びウェーハ処理モジュール

Country Status (3)

Country Link
EP (3) EP0555890B1 (enExample)
JP (5) JPS62181440A (enExample)
DE (3) DE3650057T2 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03134176A (ja) * 1989-10-18 1991-06-07 Tokyo Electron Ltd 真空処理装置用ユニット
JPH08227929A (ja) * 1988-02-12 1996-09-03 Tokyo Electron Ltd 処理装置

Families Citing this family (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4917556A (en) * 1986-04-28 1990-04-17 Varian Associates, Inc. Modular wafer transport and processing system
GB2194500B (en) * 1986-07-04 1991-01-23 Canon Kk A wafer handling apparatus
EP0303030A1 (en) * 1987-07-16 1989-02-15 Texas Instruments Incorporated Processing apparatus and method
JPS6428912A (en) * 1987-07-24 1989-01-31 Hitachi Electr Eng Wafer handling device
DE3735449A1 (de) * 1987-10-20 1989-05-03 Convac Gmbh Fertigungssystem fuer halbleitersubstrate
US4949783A (en) * 1988-05-18 1990-08-21 Veeco Instruments, Inc. Substrate transport and cooling apparatus and method for same
IL86514A0 (enExample) * 1988-05-26 1988-11-15
DE3822598C2 (de) * 1988-07-04 1997-09-04 Siemens Ag Justieranordnung und Verfahren zum Justieren einer Greifvorrichtung eines Roboterarms zum Handhaben einer Halbleiterscheibe
EP0367423A3 (en) * 1988-10-31 1991-01-09 Eaton Corporation Vacuum deposition system
JP2528962B2 (ja) * 1989-02-27 1996-08-28 株式会社日立製作所 試料処理方法及び装置
US6989228B2 (en) 1989-02-27 2006-01-24 Hitachi, Ltd Method and apparatus for processing samples
US5868854A (en) * 1989-02-27 1999-02-09 Hitachi, Ltd. Method and apparatus for processing samples
US6077788A (en) * 1989-02-27 2000-06-20 Hitachi, Ltd. Method and apparatus for processing samples
NL8901630A (nl) * 1989-06-28 1991-01-16 Philips Nv Vacuuem systeem.
JP2525284B2 (ja) * 1990-10-22 1996-08-14 ティーディーケイ株式会社 クリ―ン搬送方法及び装置
JPH05251408A (ja) * 1992-03-06 1993-09-28 Ebara Corp 半導体ウェーハのエッチング装置
US5398481A (en) * 1992-05-19 1995-03-21 Ebara Corporation Vacuum processing system
EP0596536A1 (en) * 1992-11-06 1994-05-11 Applied Materials, Inc. Transport system and method of using same
KR100303075B1 (ko) * 1992-11-06 2001-11-30 조셉 제이. 스위니 집적회로 웨이퍼 이송 방법 및 장치
US5643366A (en) * 1994-01-31 1997-07-01 Applied Materials, Inc. Wafer handling within a vacuum chamber using vacuum
GB2320135A (en) * 1996-12-04 1998-06-10 Smiths Industries Plc Semiconductor wafer processing apparatus
JP3850951B2 (ja) * 1997-05-15 2006-11-29 東京エレクトロン株式会社 基板搬送装置及び基板搬送方法
CN100423179C (zh) 2002-06-21 2008-10-01 应用材料股份有限公司 用于真空处理系统的传送处理室
US7258520B2 (en) 2002-08-31 2007-08-21 Applied Materials, Inc. Methods and apparatus for using substrate carrier movement to actuate substrate carrier door opening/closing
US6955197B2 (en) 2002-08-31 2005-10-18 Applied Materials, Inc. Substrate carrier having door latching and substrate clamping mechanisms
US20050167554A1 (en) 2003-11-13 2005-08-04 Rice Michael R. Kinematic pin with shear member and substrate carrier for use therewith
DE10359464A1 (de) * 2003-12-17 2005-07-28 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Vorrichtung zum Erzeugen von insbesondere EUV-Strahlung und/oder weicher Röntgenstrahlung
US7720558B2 (en) 2004-09-04 2010-05-18 Applied Materials, Inc. Methods and apparatus for mapping carrier contents
CN101370616B (zh) 2006-01-11 2011-04-27 应用材料股份有限公司 一种基材载件、一种装载端口以及一种清洗基材载件的方法
US7849889B2 (en) * 2006-05-31 2010-12-14 Philip Morris Usa Inc. Applicator wheel for filling cavities with metered amounts of particulate material
JP5329854B2 (ja) 2008-06-25 2013-10-30 ティアック株式会社 光ディスク装置及びこれを備える光ディスク処理システム
JP5329853B2 (ja) 2008-06-25 2013-10-30 ティアック株式会社 光ディスク装置及びこれを備える光ディスク処理システム
WO2011142000A1 (ja) 2010-05-11 2011-11-17 トヨタ自動車株式会社 車両用シフト制御装置
KR102139673B1 (ko) * 2013-07-04 2020-07-31 엘지디스플레이 주식회사 평판표시장치 제조용 장비 및 그의 동작방법
JP2017204608A (ja) * 2016-05-13 2017-11-16 信越ポリマー株式会社 基板収納容器
WO2021014675A1 (ja) * 2019-07-22 2021-01-28 株式会社アルバック 真空処理装置
CN113728422B (zh) * 2020-03-24 2024-01-09 株式会社日立高新技术 真空处理装置
JP7617745B2 (ja) * 2021-01-05 2025-01-20 東京エレクトロン株式会社 プロセスモジュール、基板処理システムおよび処理方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5480086A (en) * 1977-12-09 1979-06-26 Hitachi Ltd Mask aligner
JPS57113245A (en) * 1980-12-29 1982-07-14 Fujitsu Ltd Sample conveying method into vacuum device
JPS58170028A (ja) * 1982-03-31 1983-10-06 Fujitsu Ltd 真空処理装置
JPS59208837A (ja) * 1983-05-13 1984-11-27 Nec Kyushu Ltd プラズマエツチング装置
JPS6054449A (ja) * 1983-09-05 1985-03-28 Toshiba Corp 半導体ウエハ搬送治具
JPS60102744A (ja) * 1983-11-09 1985-06-06 Hitachi Ltd 真空処理装置

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5337546U (enExample) * 1976-09-06 1978-04-01
JPS5337456U (enExample) * 1976-09-07 1978-04-01
US4181161A (en) * 1977-02-02 1980-01-01 Balzers Aktiengesellschaft Fur Hochvakuumtechnik Und Dunne Schichten Method of producing a high vacuum in a container
US4293249A (en) * 1980-03-03 1981-10-06 Texas Instruments Incorporated Material handling system and method for manufacturing line
JPS5730341A (en) * 1980-07-30 1982-02-18 Anelva Corp Substrate processing device
JPS5739914A (en) * 1980-08-25 1982-03-05 Shimizu Construction Co Ltd Method of controlling moisture of high slump concrete
US4433951A (en) * 1981-02-13 1984-02-28 Lam Research Corporation Modular loadlock
JPS57145321A (en) * 1981-03-03 1982-09-08 Nec Corp Dry etching device
JPS57149748A (en) * 1981-03-12 1982-09-16 Anelva Corp Treating device for substrate
US4466766A (en) * 1981-05-20 1984-08-21 Ruska Instrument Corporation Transfer apparatus
JPS57194531A (en) * 1981-05-26 1982-11-30 Toshiba Corp Electron beam transfer device
JPS58292U (ja) * 1981-06-26 1983-01-05 同和機器工業株式会社 冷却兼冷凍装置
JPS58127341A (ja) * 1982-01-25 1983-07-29 Hitachi Ltd 自動ウエハハンドリング装置
DE3214256A1 (de) * 1982-04-17 1983-10-20 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Vorrichtung zur handhabung eines substrates
JPS58204347A (ja) * 1982-05-24 1983-11-29 Nippon Jido Seigyo Kk パタ−ンの欠陥検査装置に用いる被検体の自動装填装置
DE3219502C2 (de) * 1982-05-25 1990-04-19 Ernst Leitz Wetzlar Gmbh, 6330 Wetzlar Vorrichtung zum automatischen Transport scheibenförmiger Objekte
JPS5956739A (ja) * 1982-09-27 1984-04-02 Ulvac Corp ウエハ装填装置
JPS5994435A (ja) * 1982-11-20 1984-05-31 Tokuda Seisakusho Ltd 真空処理装置
JPS59186326A (ja) * 1983-04-06 1984-10-23 Hitachi Ltd プラズマ処理装置
US4534695A (en) * 1983-05-23 1985-08-13 Eaton Corporation Wafer transport system
JPS6020515A (ja) * 1983-07-14 1985-02-01 Ulvac Corp 真空処理装置
DE3483828D1 (de) * 1983-09-28 1991-02-07 Hewlett Packard Co Verarbeitungssystem fuer integrierte schaltkreise.
US4584045A (en) * 1984-02-21 1986-04-22 Plasma-Therm, Inc. Apparatus for conveying a semiconductor wafer
JPS60175411A (ja) * 1984-02-22 1985-09-09 Hitachi Ltd 半導体薄膜の製造方法及びその製造装置

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5480086A (en) * 1977-12-09 1979-06-26 Hitachi Ltd Mask aligner
JPS57113245A (en) * 1980-12-29 1982-07-14 Fujitsu Ltd Sample conveying method into vacuum device
JPS58170028A (ja) * 1982-03-31 1983-10-06 Fujitsu Ltd 真空処理装置
JPS59208837A (ja) * 1983-05-13 1984-11-27 Nec Kyushu Ltd プラズマエツチング装置
JPS6054449A (ja) * 1983-09-05 1985-03-28 Toshiba Corp 半導体ウエハ搬送治具
JPS60102744A (ja) * 1983-11-09 1985-06-06 Hitachi Ltd 真空処理装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08227929A (ja) * 1988-02-12 1996-09-03 Tokyo Electron Ltd 処理装置
JPH03134176A (ja) * 1989-10-18 1991-06-07 Tokyo Electron Ltd 真空処理装置用ユニット

Also Published As

Publication number Publication date
EP0555891B1 (en) 1999-01-20
EP0219826A2 (en) 1987-04-29
JPH0658931B1 (enExample) 1994-08-03
DE3650057T2 (de) 1995-02-16
JPH04226049A (ja) 1992-08-14
EP0555891A3 (en) 1993-09-15
DE3650697T2 (de) 1999-04-15
DE3650697D1 (de) 1998-10-08
DE3650710T2 (de) 1999-08-19
JP2693352B2 (ja) 1997-12-24
EP0555890A3 (en) 1993-09-15
EP0555890B1 (en) 1998-09-02
EP0219826B1 (en) 1994-09-07
JPH0629369A (ja) 1994-02-04
DE3650057D1 (de) 1994-10-13
EP0219826A3 (en) 1989-07-26
JPH0658932B2 (ja) 1994-08-03
JPH0645425A (ja) 1994-02-18
JPH0658931B2 (ja) 1994-08-03
EP0555890A2 (en) 1993-08-18
JPH0658932B1 (enExample) 1994-08-03
JPH0556859B2 (enExample) 1993-08-20
EP0555891A2 (en) 1993-08-18
JPH0640517A (ja) 1994-02-15
DE3650710D1 (de) 1999-03-04

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