JPS61264341A - 感光性樹脂組成物 - Google Patents

感光性樹脂組成物

Info

Publication number
JPS61264341A
JPS61264341A JP10778585A JP10778585A JPS61264341A JP S61264341 A JPS61264341 A JP S61264341A JP 10778585 A JP10778585 A JP 10778585A JP 10778585 A JP10778585 A JP 10778585A JP S61264341 A JPS61264341 A JP S61264341A
Authority
JP
Japan
Prior art keywords
equivalent
parts
photosensitive resin
type epoxy
epoxy resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10778585A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0562731B2 (enrdf_load_stackoverflow
Inventor
Katsushige Tsukada
塚田 勝重
Noboru Sugasawa
菅沢 昇
Nobuyuki Hayashi
信行 林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP10778585A priority Critical patent/JPS61264341A/ja
Publication of JPS61264341A publication Critical patent/JPS61264341A/ja
Publication of JPH0562731B2 publication Critical patent/JPH0562731B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0381Macromolecular compounds which are rendered insoluble or differentially wettable using a combination of a phenolic resin and a polyoxyethylene resin
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings
    • H05K3/285Permanent coating compositions
    • H05K3/287Photosensitive compositions
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4644Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
    • H05K3/4673Application methods or materials of intermediate insulating layers not specially adapted to any one of the previous methods of adding a circuit layer
    • H05K3/4676Single layer compositions

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
JP10778585A 1985-05-20 1985-05-20 感光性樹脂組成物 Granted JPS61264341A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10778585A JPS61264341A (ja) 1985-05-20 1985-05-20 感光性樹脂組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10778585A JPS61264341A (ja) 1985-05-20 1985-05-20 感光性樹脂組成物

Publications (2)

Publication Number Publication Date
JPS61264341A true JPS61264341A (ja) 1986-11-22
JPH0562731B2 JPH0562731B2 (enrdf_load_stackoverflow) 1993-09-09

Family

ID=14467959

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10778585A Granted JPS61264341A (ja) 1985-05-20 1985-05-20 感光性樹脂組成物

Country Status (1)

Country Link
JP (1) JPS61264341A (enrdf_load_stackoverflow)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61264340A (ja) * 1985-05-20 1986-11-22 Hitachi Chem Co Ltd 感光性樹脂組成物
JPS62247353A (ja) * 1986-04-21 1987-10-28 Hitachi Chem Co Ltd 感光性エレメント
JPS63280244A (ja) * 1987-05-12 1988-11-17 Hitachi Chem Co Ltd 感光性樹脂組成物
JPH01279241A (ja) * 1988-05-06 1989-11-09 Oki Electric Ind Co Ltd シリコン含有レジスト材料及びその製造方法
JPH0572723A (ja) * 1991-09-12 1993-03-26 Fuji Photo Film Co Ltd 感光性組成物
JPH0588372A (ja) * 1991-09-27 1993-04-09 Fuji Photo Film Co Ltd 感光性組成物
JPH05197147A (ja) * 1990-10-09 1993-08-06 Internatl Business Mach Corp <Ibm> 熱的に安定な光イメージング用組成物
JPH06317905A (ja) * 1993-11-15 1994-11-15 Ibiden Co Ltd 感光性樹脂組成物及びプリント配線板

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5755914A (en) * 1980-09-19 1982-04-03 Hitachi Chem Co Ltd Photopolymer composition and photosensitive element
JPS5936246A (ja) * 1975-12-19 1984-02-28 バイエル・アクチエンゲゼルシヤフト 樹脂組成物
JPS60188413A (ja) * 1984-03-09 1985-09-25 Toyobo Co Ltd 光重合性樹脂組成物
JPS60195171A (ja) * 1984-03-19 1985-10-03 Mitsubishi Rayon Co Ltd 紫外線硬化型インキ組成物
JPS61130946A (ja) * 1984-11-29 1986-06-18 Hitachi Chem Co Ltd 感光性樹脂組成物
JPS61200536A (ja) * 1985-03-01 1986-09-05 Hitachi Chem Co Ltd 感光性組成物

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5936246A (ja) * 1975-12-19 1984-02-28 バイエル・アクチエンゲゼルシヤフト 樹脂組成物
JPS5755914A (en) * 1980-09-19 1982-04-03 Hitachi Chem Co Ltd Photopolymer composition and photosensitive element
JPS60188413A (ja) * 1984-03-09 1985-09-25 Toyobo Co Ltd 光重合性樹脂組成物
JPS60195171A (ja) * 1984-03-19 1985-10-03 Mitsubishi Rayon Co Ltd 紫外線硬化型インキ組成物
JPS61130946A (ja) * 1984-11-29 1986-06-18 Hitachi Chem Co Ltd 感光性樹脂組成物
JPS61200536A (ja) * 1985-03-01 1986-09-05 Hitachi Chem Co Ltd 感光性組成物

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61264340A (ja) * 1985-05-20 1986-11-22 Hitachi Chem Co Ltd 感光性樹脂組成物
JPS62247353A (ja) * 1986-04-21 1987-10-28 Hitachi Chem Co Ltd 感光性エレメント
JPS63280244A (ja) * 1987-05-12 1988-11-17 Hitachi Chem Co Ltd 感光性樹脂組成物
JPH01279241A (ja) * 1988-05-06 1989-11-09 Oki Electric Ind Co Ltd シリコン含有レジスト材料及びその製造方法
JPH05197147A (ja) * 1990-10-09 1993-08-06 Internatl Business Mach Corp <Ibm> 熱的に安定な光イメージング用組成物
JPH0572723A (ja) * 1991-09-12 1993-03-26 Fuji Photo Film Co Ltd 感光性組成物
JPH0588372A (ja) * 1991-09-27 1993-04-09 Fuji Photo Film Co Ltd 感光性組成物
JPH06317905A (ja) * 1993-11-15 1994-11-15 Ibiden Co Ltd 感光性樹脂組成物及びプリント配線板

Also Published As

Publication number Publication date
JPH0562731B2 (enrdf_load_stackoverflow) 1993-09-09

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