JPS5425957B2 - - Google Patents

Info

Publication number
JPS5425957B2
JPS5425957B2 JP994776A JP994776A JPS5425957B2 JP S5425957 B2 JPS5425957 B2 JP S5425957B2 JP 994776 A JP994776 A JP 994776A JP 994776 A JP994776 A JP 994776A JP S5425957 B2 JPS5425957 B2 JP S5425957B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP994776A
Other versions
JPS5294388A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to ZA00757984A priority Critical patent/ZA757984B/xx
Priority to SE7600431A priority patent/SE7600431L/
Priority to DE2602410A priority patent/DE2602410C2/de
Priority to FR7602048A priority patent/FR2339185B1/fr
Priority to NL7600794.A priority patent/NL160004C/xx
Priority to GB3624/76A priority patent/GB1521372A/en
Priority to BE163988A priority patent/BE838135A/xx
Application filed filed Critical
Priority to JP994776A priority patent/JPS5294388A/ja
Priority to DD191055A priority patent/DD125491A5/xx
Priority to BR7601434A priority patent/BR7601434A/pt
Publication of JPS5294388A publication Critical patent/JPS5294388A/ja
Publication of JPS5425957B2 publication Critical patent/JPS5425957B2/ja
Priority to JP59257283A priority patent/JPS61134756A/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F257/00Macromolecular compounds obtained by polymerising monomers on to polymers of aromatic monomers as defined in group C08F12/00
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F265/00Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
    • C08F265/04Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00 on to polymers of esters
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F291/00Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
    • C08F291/18Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
JP994776A 1974-10-04 1976-01-31 Photopolymerizable composition and preparation thereof Granted JPS5294388A (en)

Priority Applications (11)

Application Number Priority Date Filing Date Title
ZA00757984A ZA757984B (en) 1974-10-04 1975-12-23 Polymers for aqueous processed photoresists
SE7600431A SE7600431L (sv) 1974-10-04 1976-01-16 Polymer for fotoresist for behandling i vattenlosningar
DE2602410A DE2602410C2 (de) 1974-10-04 1976-01-23 Photopolymerisierbares Material
FR7602048A FR2339185B1 (fr) 1974-10-04 1976-01-26 Composition photoresistante
NL7600794.A NL160004C (nl) 1974-10-04 1976-01-27 Droge filmfotoresist.
GB3624/76A GB1521372A (en) 1974-10-04 1976-01-29 Photopolymerisable compositions for aqueous processed photoresists
BE163988A BE838135A (fr) 1974-10-04 1976-01-30 Polymeres pour masques photographiques developpes en milieu aqueux
JP994776A JPS5294388A (en) 1974-10-04 1976-01-31 Photopolymerizable composition and preparation thereof
DD191055A DD125491A5 (ja) 1974-10-04 1976-02-02
BR7601434A BR7601434A (pt) 1974-10-04 1976-03-10 Composicao fotopolimerizavel,laminado,processo para preparar um fotoprotetor e produto obtido pela exposicao da composicao fotopolimerizavel a luz actinica
JP59257283A JPS61134756A (ja) 1974-10-04 1984-12-05 フオトレジストの製法

Applications Claiming Priority (12)

Application Number Priority Date Filing Date Title
US51192974A 1974-10-04 1974-10-04
ZA00757984A ZA757984B (en) 1974-10-04 1975-12-23 Polymers for aqueous processed photoresists
SE7600431A SE7600431L (sv) 1974-10-04 1976-01-16 Polymer for fotoresist for behandling i vattenlosningar
DE2602410A DE2602410C2 (de) 1974-10-04 1976-01-23 Photopolymerisierbares Material
FR7602048A FR2339185B1 (fr) 1974-10-04 1976-01-26 Composition photoresistante
NL7600794.A NL160004C (nl) 1974-10-04 1976-01-27 Droge filmfotoresist.
GB3624/76A GB1521372A (en) 1974-10-04 1976-01-29 Photopolymerisable compositions for aqueous processed photoresists
BE163988A BE838135A (fr) 1974-10-04 1976-01-30 Polymeres pour masques photographiques developpes en milieu aqueux
JP994776A JPS5294388A (en) 1974-10-04 1976-01-31 Photopolymerizable composition and preparation thereof
DD191055A DD125491A5 (ja) 1974-10-04 1976-02-02
BR7601434A BR7601434A (pt) 1974-10-04 1976-03-10 Composicao fotopolimerizavel,laminado,processo para preparar um fotoprotetor e produto obtido pela exposicao da composicao fotopolimerizavel a luz actinica
JP59257283A JPS61134756A (ja) 1974-10-04 1984-12-05 フオトレジストの製法

Publications (2)

Publication Number Publication Date
JPS5294388A JPS5294388A (en) 1977-08-08
JPS5425957B2 true JPS5425957B2 (ja) 1979-08-31

Family

ID=27582848

Family Applications (2)

Application Number Title Priority Date Filing Date
JP994776A Granted JPS5294388A (en) 1974-10-04 1976-01-31 Photopolymerizable composition and preparation thereof
JP59257283A Granted JPS61134756A (ja) 1974-10-04 1984-12-05 フオトレジストの製法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP59257283A Granted JPS61134756A (ja) 1974-10-04 1984-12-05 フオトレジストの製法

Country Status (10)

Country Link
JP (2) JPS5294388A (ja)
BE (1) BE838135A (ja)
BR (1) BR7601434A (ja)
DD (1) DD125491A5 (ja)
DE (1) DE2602410C2 (ja)
FR (1) FR2339185B1 (ja)
GB (1) GB1521372A (ja)
NL (1) NL160004C (ja)
SE (1) SE7600431L (ja)
ZA (1) ZA757984B (ja)

Cited By (115)

* Cited by examiner, † Cited by third party
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SE7600431L (sv) 1977-07-17
BR7601434A (pt) 1977-09-06
NL7600794A (nl) 1977-07-29
NL160004B (nl) 1979-04-17
BE838135A (fr) 1976-05-14
DD125491A5 (ja) 1977-04-20
JPS61134756A (ja) 1986-06-21
ZA757984B (en) 1976-12-29
FR2339185A1 (fr) 1977-08-19
FR2339185B1 (fr) 1980-03-14
NL160004C (nl) 1979-09-17
DE2602410C2 (de) 1985-11-21
JPS5294388A (en) 1977-08-08
GB1521372A (en) 1978-08-16
DE2602410A1 (de) 1977-07-28
JPH0359416B2 (ja) 1991-09-10

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