GB1521372A - Photopolymerisable compositions for aqueous processed photoresists - Google Patents

Photopolymerisable compositions for aqueous processed photoresists

Info

Publication number
GB1521372A
GB1521372A GB3624/76A GB362476A GB1521372A GB 1521372 A GB1521372 A GB 1521372A GB 3624/76 A GB3624/76 A GB 3624/76A GB 362476 A GB362476 A GB 362476A GB 1521372 A GB1521372 A GB 1521372A
Authority
GB
United Kingdom
Prior art keywords
parts
copolymer
alkyl
weight
photopolymerizable compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB3624/76A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dynachem Corp
Original Assignee
Dynachem Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to ZA00757984A priority Critical patent/ZA757984B/en
Priority to SE7600431A priority patent/SE7600431L/en
Priority to DE2602410A priority patent/DE2602410C2/en
Priority to FR7602048A priority patent/FR2339185B1/en
Priority to NL7600794.A priority patent/NL160004C/en
Priority to GB3624/76A priority patent/GB1521372A/en
Application filed by Dynachem Corp filed Critical Dynachem Corp
Priority to BE163988A priority patent/BE838135A/en
Priority to JP994776A priority patent/JPS5294388A/en
Priority to DD191055A priority patent/DD125491A5/xx
Priority to BR7601434A priority patent/BR7601434A/en
Publication of GB1521372A publication Critical patent/GB1521372A/en
Priority to JP59257283A priority patent/JPS61134756A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F257/00—Macromolecular compounds obtained by polymerising monomers on to polymers of aromatic monomers as defined in group C08F12/00
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F265/00—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
    • C08F265/04—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00 on to polymers of esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
    • C08F291/18—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Abstract

1521372 Photopolymerizable compositions DYNACHEM CORP 29 Jan 1976 3624/76 Heading C3V Photopolymerizable compositions useful for producing aqueous processed photo resists for making printed circuits, screen stencils or printing plates comprise 10-60 parts by weight of an ethylenically unsaturated monomer, 1-10 parts of a photoinitiator, and 40-90 parts of a binder which is a copolymer of (i) 40-60% by weight of a compound of the formula where R is H, C1-6 alkyl or halogen and the benzene ring may be substituted by one or more nitro, alkoxy, acyl, carboxyl, sulpho, hydroxyl or halogen substituents, (ii) 15-45% of one or more alkyl or hydroxyalkyl (meth)- acrylates having up to 12 C atoms in the alkyl moiety, and (iii) 15-40% of an unsaturated carboxylic acid or anhydride (including partial esters of polycarboxylic acids), the proportions of monomer and copolymer totalling 100 parts and the copolymer being soluble in dilute aqueous alkali.
GB3624/76A 1974-10-04 1976-01-29 Photopolymerisable compositions for aqueous processed photoresists Expired GB1521372A (en)

Priority Applications (11)

Application Number Priority Date Filing Date Title
ZA00757984A ZA757984B (en) 1974-10-04 1975-12-23 Polymers for aqueous processed photoresists
SE7600431A SE7600431L (en) 1974-10-04 1976-01-16 PHOTORESIST POLYMER FOR TREATMENT IN WATER SOLUTIONS
DE2602410A DE2602410C2 (en) 1974-10-04 1976-01-23 Photopolymerizable material
FR7602048A FR2339185B1 (en) 1974-10-04 1976-01-26 PHOTORESISTANT COMPOSITION
NL7600794.A NL160004C (en) 1974-10-04 1976-01-27 DRY FILM PHOTORESIST.
GB3624/76A GB1521372A (en) 1974-10-04 1976-01-29 Photopolymerisable compositions for aqueous processed photoresists
BE163988A BE838135A (en) 1974-10-04 1976-01-30 POLYMERS FOR PHOTOGRAPHIC MASKS DEVELOPED IN AQUEOUS MEDIUM
JP994776A JPS5294388A (en) 1974-10-04 1976-01-31 Photopolymerizable composition and preparation thereof
DD191055A DD125491A5 (en) 1974-10-04 1976-02-02
BR7601434A BR7601434A (en) 1974-10-04 1976-03-10 PHOTOPOLIMERIZABLE COMPOSITION, LAMINATE, PROCESS TO PREPARE A PHOTOPROTECTOR AND PRODUCT OBTAINED BY EXPOSURE OF PHOTOPOLIMERIZABLE COMPOSITION TO ACTINIC LIGHT
JP59257283A JPS61134756A (en) 1974-10-04 1984-12-05 Making of photoresist

Applications Claiming Priority (12)

Application Number Priority Date Filing Date Title
US51192974A 1974-10-04 1974-10-04
ZA00757984A ZA757984B (en) 1974-10-04 1975-12-23 Polymers for aqueous processed photoresists
SE7600431A SE7600431L (en) 1974-10-04 1976-01-16 PHOTORESIST POLYMER FOR TREATMENT IN WATER SOLUTIONS
DE2602410A DE2602410C2 (en) 1974-10-04 1976-01-23 Photopolymerizable material
FR7602048A FR2339185B1 (en) 1974-10-04 1976-01-26 PHOTORESISTANT COMPOSITION
NL7600794.A NL160004C (en) 1974-10-04 1976-01-27 DRY FILM PHOTORESIST.
GB3624/76A GB1521372A (en) 1974-10-04 1976-01-29 Photopolymerisable compositions for aqueous processed photoresists
BE163988A BE838135A (en) 1974-10-04 1976-01-30 POLYMERS FOR PHOTOGRAPHIC MASKS DEVELOPED IN AQUEOUS MEDIUM
JP994776A JPS5294388A (en) 1974-10-04 1976-01-31 Photopolymerizable composition and preparation thereof
DD191055A DD125491A5 (en) 1974-10-04 1976-02-02
BR7601434A BR7601434A (en) 1974-10-04 1976-03-10 PHOTOPOLIMERIZABLE COMPOSITION, LAMINATE, PROCESS TO PREPARE A PHOTOPROTECTOR AND PRODUCT OBTAINED BY EXPOSURE OF PHOTOPOLIMERIZABLE COMPOSITION TO ACTINIC LIGHT
JP59257283A JPS61134756A (en) 1974-10-04 1984-12-05 Making of photoresist

Publications (1)

Publication Number Publication Date
GB1521372A true GB1521372A (en) 1978-08-16

Family

ID=27582848

Family Applications (1)

Application Number Title Priority Date Filing Date
GB3624/76A Expired GB1521372A (en) 1974-10-04 1976-01-29 Photopolymerisable compositions for aqueous processed photoresists

Country Status (10)

Country Link
JP (2) JPS5294388A (en)
BE (1) BE838135A (en)
BR (1) BR7601434A (en)
DD (1) DD125491A5 (en)
DE (1) DE2602410C2 (en)
FR (1) FR2339185B1 (en)
GB (1) GB1521372A (en)
NL (1) NL160004C (en)
SE (1) SE7600431L (en)
ZA (1) ZA757984B (en)

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4458006A (en) * 1982-06-21 1984-07-03 Hoechst Aktiengesellschaft Photopolymerizable mixture and photopolymerizable copying material prepared therewith
US4530747A (en) * 1982-06-21 1985-07-23 Hoechst Aktiengesellschaft Photopolymerizable mixture and photopolymerizable copying material prepared therewith
US4692396A (en) * 1984-04-10 1987-09-08 Hiroyuki Uchida Photopolymerizable resin composition for producing aqueous-development type dry film resists
GB2198741A (en) * 1984-04-03 1988-06-22 Wolfen Filmfab Veb Photopolymerisable materials
US7052822B2 (en) 2002-09-30 2006-05-30 Fuji Photo Film Co., Ltd. Photosensitive composition
US7081329B2 (en) 2002-09-30 2006-07-25 Fuji Photo Film Co., Ltd. Planographic printing plate precursor
US7291443B2 (en) 2003-07-29 2007-11-06 Fujifilm Corporation Polymerizable composition and image-recording material using the same
US7303857B2 (en) 2003-09-24 2007-12-04 Fujifilm Corporation Photosensitive composition and planographic printing plate precursor
US7338748B2 (en) 2002-09-30 2008-03-04 Fujifilm Corporation Polymerizable composition and planographic printing plate precursor
US7425400B2 (en) 2003-02-20 2008-09-16 Fujifilm Corporation Planographic printing plate precursor
EP2030677A2 (en) 2007-08-29 2009-03-04 FUJIFILM Corporation Biosensor chip, process for producting the same, and sensor for surface plasmon resonance analysis
US7604923B2 (en) 2003-01-14 2009-10-20 Fujifilm Corporation Image forming method
US8110337B2 (en) 2002-12-18 2012-02-07 Fujifilm Corporation Polymerizable composition and lithographic printing plate precursor
US11848249B2 (en) 2019-09-26 2023-12-19 Fujifilm Corporation Manufacturing method for thermal conductive layer, manufacturing method for laminate, and manufacturing method for semiconductor device

Families Citing this family (128)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4208211A (en) * 1978-05-23 1980-06-17 Bell Telephone Laboratories, Incorporated Fabrication based on radiation sensitive resists and related products
DE3120052A1 (en) * 1981-05-20 1982-12-09 Hoechst Ag, 6000 Frankfurt POLYMERIZABLE MIXTURE BY RADIATION AND COPYING MATERIAL MADE THEREOF
US4539286A (en) * 1983-06-06 1985-09-03 Dynachem Corporation Flexible, fast processing, photopolymerizable composition
JPS638735A (en) * 1986-06-30 1988-01-14 Tokyo Ohka Kogyo Co Ltd Photosensitive resin plate for pattern formation
JPH0820735B2 (en) * 1987-08-26 1996-03-04 日立化成工業株式会社 Photosensitive resin composition
JPS6456442A (en) * 1987-08-27 1989-03-03 Okamoto Kagaku Kogyo Kk Production of printing plate
DE3805706A1 (en) * 1988-02-24 1989-09-07 Hoechst Ag RADIATION POLYMERIZABLE MIXTURE AND RECORDING MATERIAL MANUFACTURED THEREFROM
JP2697738B2 (en) * 1988-02-26 1998-01-14 マックダーミッド イメージング テクノロジー，インコーポレイテッド Photopolymerizable composition
JP2826329B2 (en) * 1988-12-15 1998-11-18 ダイセル化学工業株式会社 Photopolymerizable composition
JP2856746B2 (en) * 1988-12-15 1999-02-10 ダイセル化学工業株式会社 Photopolymerizable composition
JP2826330B2 (en) * 1988-12-15 1998-11-18 ダイセル化学工業株式会社 Photopolymerizable composition
JP2776522B2 (en) * 1988-12-15 1998-07-16 ダイセル化学工業株式会社 Photopolymerizable composition
DE3931467A1 (en) * 1989-09-21 1991-04-04 Hoechst Ag POLYMERIZABLE MIXTURE BY RADIATION AND METHOD FOR PRODUCING A SOLDER STOP MASK
JP2756623B2 (en) * 1992-02-26 1998-05-25 富士写真フイルム株式会社 Photopolymerizable composition
JPH07311462A (en) 1994-05-16 1995-11-28 Fuji Photo Film Co Ltd Photopolymerizable composition and image forming method
JPH08101498A (en) 1994-08-03 1996-04-16 Fuji Photo Film Co Ltd Photosensitive planographic printing plate
JP3442176B2 (en) 1995-02-10 2003-09-02 富士写真フイルム株式会社 Photopolymerizable composition
JP4130030B2 (en) 1999-03-09 2008-08-06 富士フイルム株式会社 Photosensitive composition and 1,3-dihydro-1-oxo-2H-indene derivative compound
JP2004252285A (en) 2003-02-21 2004-09-09 Fuji Photo Film Co Ltd Photosensitive composition and lithographic printing original plate using the same
JP4291638B2 (en) 2003-07-29 2009-07-08 富士フイルム株式会社 Alkali-soluble polymer and planographic printing plate precursor using the same
JP2005227554A (en) 2004-02-13 2005-08-25 Fuji Photo Film Co Ltd Photosensitive planographic printing plate
JP4452572B2 (en) 2004-07-06 2010-04-21 富士フイルム株式会社 Photosensitive composition and image recording method using the same
KR101234712B1 (en) 2004-08-02 2013-02-19 후지필름 가부시키가이샤 Colored curable compositions, color filters and process for production thereof
JP2006065074A (en) 2004-08-27 2006-03-09 Fuji Photo Film Co Ltd Photosensitive lithographic printing plate
EP1701213A3 (en) 2005-03-08 2006-11-22 Fuji Photo Film Co., Ltd. Photosensitive composition
JP4538350B2 (en) 2005-03-18 2010-09-08 富士フイルム株式会社 Photosensitive composition, image recording material, and image recording method
JP4406617B2 (en) 2005-03-18 2010-02-03 富士フイルム株式会社 Photosensitive composition and planographic printing plate precursor
US20060216646A1 (en) 2005-03-22 2006-09-28 Fuji Photo Film Co., Ltd. Plate-making method of lithographic printing plate precursor
EP1790984B1 (en) 2005-11-25 2013-08-28 FUJIFILM Corporation A method for producing a biosensor having a covalently bound thin polymeric coat
JP5171005B2 (en) 2006-03-17 2013-03-27 富士フイルム株式会社 Polymer compound, method for producing the same, and pigment dispersant
JP4911455B2 (en) 2006-09-27 2012-04-04 富士フイルム株式会社 Photopolymerization type photosensitive lithographic printing plate precursor
JP4777226B2 (en) 2006-12-07 2011-09-21 富士フイルム株式会社 Image recording materials and novel compounds
US20080281058A1 (en) 2006-12-19 2008-11-13 Fujifilm Corporation Process for producing acrylonitrile-containing polymer latex
US8158307B2 (en) 2007-02-14 2012-04-17 Fujifilm Corporation Color filter and method of manufacturing the same, and solid-state image pickup element
JP4855299B2 (en) 2007-02-27 2012-01-18 富士フイルム株式会社 Colored photosensitive composition, color filter and method for producing the same
JP4860525B2 (en) 2007-03-27 2012-01-25 富士フイルム株式会社 Curable composition and planographic printing plate precursor
EP1975702B1 (en) 2007-03-29 2013-07-24 FUJIFILM Corporation Colored photocurable composition for solid state image pick-up device, color filter and method for production thereof, and solid state image pick-up device
JP5030638B2 (en) 2007-03-29 2012-09-19 富士フイルム株式会社 Color filter and manufacturing method thereof
JP5075450B2 (en) 2007-03-30 2012-11-21 富士フイルム株式会社 Planographic printing plate precursor
JP4992534B2 (en) * 2007-04-27 2012-08-08 三菱化学株式会社 Photopolymerizable composition
CN102702073B (en) 2007-05-11 2015-06-10 巴斯夫欧洲公司 Oxime ester photoinitiators
EP2144900B1 (en) 2007-05-11 2015-03-18 Basf Se Oxime ester photoinitiators
JP5213375B2 (en) 2007-07-13 2013-06-19 富士フイルム株式会社 Pigment dispersion, curable composition, color filter using the same, and solid-state imaging device
CN102617445B (en) 2007-07-17 2015-02-18 富士胶片株式会社 Photosensitive compositions, curable compositions, novel compounds, photopolymerizable compositions, color filters, and planographic printing plate precursors
EP2048539A1 (en) 2007-09-06 2009-04-15 FUJIFILM Corporation Processed pigment, pigment-dispersed composition, colored photosensitive composition, color filter, liquid crystal display element, and solid image pickup element
JP5247093B2 (en) 2007-09-14 2013-07-24 富士フイルム株式会社 Azo compound, curable composition, color filter and production method thereof
JP2009091555A (en) 2007-09-18 2009-04-30 Fujifilm Corp Curable composition, image forming material and planographic printing plate precursor
US9442372B2 (en) 2007-09-26 2016-09-13 Fujifilm Corporation Pigment dispersion composition, photocurable composition and color filter
US7955781B2 (en) 2007-09-28 2011-06-07 Fujifilm Corporation Negative-working photosensitive material and negative-working planographic printing plate precursor
JP5448416B2 (en) 2007-10-31 2014-03-19 富士フイルム株式会社 Colored curable composition, color filter, method for producing the same, and solid-state imaging device
EP2218756B1 (en) 2007-11-01 2013-07-31 FUJIFILM Corporation Pigment dispersion composition, curable color composition, color filter and method for producing the same
WO2009063824A1 (en) 2007-11-14 2009-05-22 Fujifilm Corporation Method of drying coating film and process for producing lithographic printing plate precursor
JP2009145189A (en) 2007-12-13 2009-07-02 Fujifilm Corp Biosensor
JP5068640B2 (en) 2007-12-28 2012-11-07 富士フイルム株式会社 Dye-containing negative curable composition, color filter, method for producing the same, and solid-state imaging device
JP5052360B2 (en) 2008-01-31 2012-10-17 富士フイルム株式会社 Dye-containing negative curable composition, color filter and method for producing the same
JP5147499B2 (en) 2008-02-13 2013-02-20 富士フイルム株式会社 Photosensitive coloring composition, color filter and method for producing the same
JP2009198664A (en) 2008-02-20 2009-09-03 Fujifilm Corp Color filter, method for producing the same, and solid imaging element
JP5448352B2 (en) 2008-03-10 2014-03-19 富士フイルム株式会社 Colored curable composition, color filter, and solid-state imaging device
KR101654666B1 (en) 2008-03-17 2016-09-06 후지필름 가부시키가이샤 Pigment-dispersed composition, colored photosensitive composition, photocurable composition, color filter, liquid crystal display element, and solid image pickup element
JP5334624B2 (en) 2008-03-17 2013-11-06 富士フイルム株式会社 Colored curable composition, color filter, and method for producing color filter
KR20090100262A (en) 2008-03-18 2009-09-23 후지필름 가부시키가이샤 Photosensitive resin composition, light-shielding color filter, method of producing the same and solid-state image sensor
JP5305704B2 (en) 2008-03-24 2013-10-02 富士フイルム株式会社 Novel compound, photopolymerizable composition, photopolymerizable composition for color filter, color filter and method for producing the same, solid-state imaging device, and lithographic printing plate precursor
JP5020871B2 (en) 2008-03-25 2012-09-05 富士フイルム株式会社 Planographic printing plate manufacturing method
JP5473239B2 (en) 2008-03-25 2014-04-16 富士フイルム株式会社 Metal phthalocyanine dye mixture, curable composition, color filter, and method for producing color filter
JP5422134B2 (en) 2008-03-25 2014-02-19 富士フイルム株式会社 Automatic development method for immersion lithographic printing plates
JP2009236355A (en) 2008-03-26 2009-10-15 Fujifilm Corp Drying method and device
JP5535444B2 (en) 2008-03-28 2014-07-02 富士フイルム株式会社 Green curable composition for solid-state image sensor, color filter for solid-state image sensor, and method for producing the same
JP5173528B2 (en) 2008-03-28 2013-04-03 富士フイルム株式会社 Photosensitive resin composition, light-shielding color filter, method for producing the same, and solid-state imaging device
JP5155920B2 (en) 2008-03-31 2013-03-06 富士フイルム株式会社 Photosensitive transparent resin composition, method for producing color filter, and color filter
JP5137662B2 (en) 2008-03-31 2013-02-06 富士フイルム株式会社 Curable composition, color filter and method for producing the same, and solid-state imaging device
JP5528677B2 (en) 2008-03-31 2014-06-25 富士フイルム株式会社 Polymerizable composition, light-shielding color filter for solid-state image sensor, solid-state image sensor, and method for producing light-shielding color filter for solid-state image sensor
KR101441998B1 (en) 2008-04-25 2014-09-18 후지필름 가부시키가이샤 Polymerizable composition, light shielding color filter, black curable composition, light shielding color filter for solid-state imaging device, method of manufacturing the same, and solid-state imaging device
JP5222624B2 (en) 2008-05-12 2013-06-26 富士フイルム株式会社 Black photosensitive resin composition, color filter, and method for producing the same
JP5248203B2 (en) 2008-05-29 2013-07-31 富士フイルム株式会社 Lithographic printing plate developing treatment solution and method for preparing a lithographic printing plate
JP5228631B2 (en) 2008-05-29 2013-07-03 富士フイルム株式会社 Lithographic printing plate developing treatment solution and method for preparing a lithographic printing plate
JP5171506B2 (en) 2008-06-30 2013-03-27 富士フイルム株式会社 NOVEL COMPOUND, POLYMERIZABLE COMPOSITION, COLOR FILTER, PROCESS FOR PRODUCING THE SAME, SOLID-STATE IMAGING ELEMENT, AND lithographic printing plate
JP2010044273A (en) 2008-08-14 2010-02-25 Fujifilm Corp Color filter and production method thereof, and solid-state image sensor using the same
BRPI0917509A2 (en) 2008-08-22 2015-11-17 Fujifilm Corp lithographic printing plate preparation method
JP5171483B2 (en) 2008-08-29 2013-03-27 富士フイルム株式会社 Preparation method of lithographic printing plate
JP2010097175A (en) 2008-09-22 2010-04-30 Fujifilm Corp Method of preparing lithographic printing plate and lithographic printing plate precursor
JP2010102330A (en) 2008-09-24 2010-05-06 Fujifilm Corp Method of preparing lithographic printing plate
JP5079653B2 (en) 2008-09-29 2012-11-21 富士フイルム株式会社 Colored curable composition, color filter, method for producing the same, and solid-state imaging device
JP5393092B2 (en) 2008-09-30 2014-01-22 富士フイルム株式会社 Dye-containing negative curable composition, color filter using the same, method for producing the same, and solid-state imaging device
JP5340102B2 (en) 2008-10-03 2013-11-13 富士フイルム株式会社 Dispersion composition, polymerizable composition, light-shielding color filter, solid-state imaging device, liquid crystal display device, wafer level lens, and imaging unit
EP2204698B1 (en) 2009-01-06 2018-08-08 FUJIFILM Corporation Plate surface treatment agent for lithographic printing plate and method for treating lithographic printing plate
JP5669386B2 (en) 2009-01-15 2015-02-12 富士フイルム株式会社 NOVEL COMPOUND, POLYMERIZABLE COMPOSITION, COLOR FILTER, PROCESS FOR PRODUCING THE SAME, SOLID-STATE IMAGING ELEMENT, AND lithographic printing plate precursor
KR101793114B1 (en) 2009-02-19 2017-11-02 후지필름 가부시키가이샤 Dispersion composition, photosensitive resin composition for light-shielding color filter, light-shielding color filter, method of producing the same, and solid-state image sensor having the color filter
JP2010198735A (en) 2009-02-20 2010-09-09 Fujifilm Corp Optical member and organic electroluminescent display device equipped with the same
JP2010197620A (en) 2009-02-24 2010-09-09 Fujifilm Corp Automatic developing apparatus and processing method for lithographic printing plate precursor
JP5315267B2 (en) 2009-03-26 2013-10-16 富士フイルム株式会社 Colored curable composition, color filter, production method thereof, and quinophthalone dye
JP5554106B2 (en) 2009-03-31 2014-07-23 富士フイルム株式会社 Colored curable composition, method for producing color filter, color filter, solid-state imaging device, and liquid crystal display device
JP5479163B2 (en) 2009-03-31 2014-04-23 富士フイルム株式会社 Colored curable composition for color filter, color filter, method for producing the same, and solid-state imaging device
JP5451235B2 (en) 2009-07-31 2014-03-26 富士フイルム株式会社 Method for producing article having birefringence pattern and birefringence pattern builder
CN102597126B (en) 2009-08-27 2014-12-24 富士胶片株式会社 Dichlorodiketopyrrolopyrrole pigment, coloring material dispersion containing the pigment, and process for production of the coloring material dispersion
JP5535814B2 (en) 2009-09-14 2014-07-02 富士フイルム株式会社 Photopolymerizable composition, color filter, and method for producing the same, solid-state imaging device, liquid crystal display device, planographic printing plate precursor, and novel compound
JP5657243B2 (en) 2009-09-14 2015-01-21 ユー・ディー・シー アイルランド リミテッド Color filter and light emitting display element
JP2011068837A (en) 2009-09-28 2011-04-07 Fujifilm Corp Green pigment dispersion containing phthalocyanine compound
JP5501175B2 (en) 2009-09-28 2014-05-21 富士フイルム株式会社 Dispersion composition and method for producing the same, photosensitive resin composition for light-shielding color filter and method for producing the same, light-shielding color filter and method for producing the same, and solid-state imaging device
JP5535842B2 (en) 2009-09-30 2014-07-02 富士フイルム株式会社 Black curable composition for wafer level lens and wafer level lens
JP5701576B2 (en) 2009-11-20 2015-04-15 富士フイルム株式会社 Dispersion composition, photosensitive resin composition, and solid-state imaging device
JP2012003225A (en) 2010-01-27 2012-01-05 Fujifilm Corp Polymerizable composition for solder resist and method for forming solder resist pattern
KR20110098638A (en) 2010-02-26 2011-09-01 후지필름 가부시키가이샤 Colored curable composition, color filter and method of producing color filter, solid-state image sensor and liquid crystal display device
EP2392621A3 (en) 2010-06-01 2013-01-09 FUJIFILM Corporation Pigment dispersion composition, red colored composition, colored curable composition, color filter for a solid state imaging device and method for producing the same, and solid state imaging device
JP6038033B2 (en) 2010-10-05 2016-12-07 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ Oxime ester derivatives of benzocarbazole compounds and their use as photoinitiators in photopolymerizable compositions
JP5417364B2 (en) 2011-03-08 2014-02-12 富士フイルム株式会社 Curable composition for solid-state imaging device, photosensitive layer, permanent pattern, wafer level lens, solid-state imaging device, and pattern forming method using the same
JP5514781B2 (en) 2011-08-31 2014-06-04 富士フイルム株式会社 Planographic printing plate precursor and method for producing a lithographic printing plate using the same
JP5714544B2 (en) 2011-09-15 2015-05-07 富士フイルム株式会社 Recycling process waste liquid
CN103907062B (en) 2011-11-04 2017-11-28 富士胶片株式会社 The method for recycling that plate-making disposes waste liquid
JP6113181B2 (en) 2011-12-07 2017-04-12 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ Oxime ester photoinitiator
CN104159976B (en) 2012-02-23 2016-10-12 富士胶片株式会社 Color emissivity compositions, color emissivity solidification compositions, original edition of lithographic printing plate and method for platemaking and color emissivity compound
EP2963015B1 (en) 2012-05-09 2018-07-11 Basf Se Oxime ester photoinitiators
JP5909468B2 (en) 2012-08-31 2016-04-26 富士フイルム株式会社 Dispersion composition, curable composition using the same, transparent film, microlens, and solid-state imaging device
JP5934682B2 (en) 2012-08-31 2016-06-15 富士フイルム株式会社 Curable composition for forming microlenses or undercoat film for color filter, transparent film, microlens, solid-state imaging device, and method for producing curable composition
JP5894943B2 (en) 2012-08-31 2016-03-30 富士フイルム株式会社 Dispersion composition, curable composition using the same, transparent film, microlens, method for producing microlens, and solid-state imaging device
JP5786098B2 (en) 2012-09-20 2015-09-30 富士フイルム株式会社 Planographic printing plate precursor and plate making method
BR112015006578A2 (en) 2012-09-26 2019-12-17 Fujifilm Corp A planographic printing original plate and a platemaking method
CN104854699B (en) 2012-12-03 2017-09-01 富士胶片株式会社 Solid photographic element holding substrate and its manufacture method, solid-state image sensor
WO2014087901A1 (en) 2012-12-03 2014-06-12 富士フイルム株式会社 Ir-cut filter and manufacturing method thereof, solid state image pickup device, and light blocking film formation method
JP5899371B2 (en) 2013-02-27 2016-04-06 富士フイルム株式会社 Infrared photosensitive coloring composition, infrared curable coloring composition, lithographic printing plate precursor and plate making method
JP6097128B2 (en) 2013-04-12 2017-03-15 富士フイルム株式会社 Far infrared light shielding layer forming composition
KR20160030233A (en) 2013-07-08 2016-03-16 바스프 에스이 Oxime ester photoinitiators
JP6271594B2 (en) 2014-01-31 2018-01-31 富士フイルム株式会社 Infrared photosensitive coloring composition, lithographic printing plate precursor, lithographic printing plate making method, and infrared photosensitive coloring agent
EP3431513B1 (en) 2016-03-14 2020-12-23 FUJIFILM Corporation Composition, film, cured film, optical sensor and method for producing film
EP3767393A4 (en) 2018-03-13 2021-05-05 FUJIFILM Corporation Method for manufacturing cured film, and method for manufacturing solid-state imaging element
WO2020049930A1 (en) 2018-09-07 2020-03-12 富士フイルム株式会社 Vehicular headlight unit, light-shielding film for headlight, and method for producing light-shielding film for headlight
JP7229337B2 (en) 2019-03-29 2023-02-27 富士フイルム株式会社 Photosensitive resin composition, cured film, inductor, antenna
EP4216242A1 (en) 2020-09-18 2023-07-26 FUJIFILM Corporation Composition, magnetic-particle-containing film, and electronic component
WO2022065183A1 (en) 2020-09-24 2022-03-31 富士フイルム株式会社 Composition, magnetic particle-containing cured product, magnetic particle introduced substrate, and electronic material

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3440047A (en) * 1964-08-10 1969-04-22 Gen Aniline & Film Corp Photopolymer offset printing plates of the etch type
US3796578A (en) * 1970-12-26 1974-03-12 Asahi Chemical Ind Photopolymerizable compositions and elements containing addition polymerizable polymeric compounds
ZA72345B (en) * 1971-02-04 1973-03-28 Dynachem Corp Polymerization compositions and processes
US3887450A (en) * 1971-02-04 1975-06-03 Dynachem Corp Photopolymerizable compositions containing polymeric binding agents
DE2363806B2 (en) * 1973-12-21 1979-05-17 Hoechst Ag, 6000 Frankfurt Photosensitive mixture
JPS5425957A (en) * 1977-07-29 1979-02-27 Nippon Zeon Co Ltd Curable rubber composition having excellent resistance to rancid gasoline

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4530747A (en) * 1982-06-21 1985-07-23 Hoechst Aktiengesellschaft Photopolymerizable mixture and photopolymerizable copying material prepared therewith
US4458006A (en) * 1982-06-21 1984-07-03 Hoechst Aktiengesellschaft Photopolymerizable mixture and photopolymerizable copying material prepared therewith
GB2198741A (en) * 1984-04-03 1988-06-22 Wolfen Filmfab Veb Photopolymerisable materials
US4692396A (en) * 1984-04-10 1987-09-08 Hiroyuki Uchida Photopolymerizable resin composition for producing aqueous-development type dry film resists
US7052822B2 (en) 2002-09-30 2006-05-30 Fuji Photo Film Co., Ltd. Photosensitive composition
US7081329B2 (en) 2002-09-30 2006-07-25 Fuji Photo Film Co., Ltd. Planographic printing plate precursor
US7883827B2 (en) 2002-09-30 2011-02-08 Fujifilm Corporation Polymerizable composition and planographic printing plate precursor
US7338748B2 (en) 2002-09-30 2008-03-04 Fujifilm Corporation Polymerizable composition and planographic printing plate precursor
US8110337B2 (en) 2002-12-18 2012-02-07 Fujifilm Corporation Polymerizable composition and lithographic printing plate precursor
US7604923B2 (en) 2003-01-14 2009-10-20 Fujifilm Corporation Image forming method
US7425400B2 (en) 2003-02-20 2008-09-16 Fujifilm Corporation Planographic printing plate precursor
US7291443B2 (en) 2003-07-29 2007-11-06 Fujifilm Corporation Polymerizable composition and image-recording material using the same
US7303857B2 (en) 2003-09-24 2007-12-04 Fujifilm Corporation Photosensitive composition and planographic printing plate precursor
EP2030677A2 (en) 2007-08-29 2009-03-04 FUJIFILM Corporation Biosensor chip, process for producting the same, and sensor for surface plasmon resonance analysis
US11848249B2 (en) 2019-09-26 2023-12-19 Fujifilm Corporation Manufacturing method for thermal conductive layer, manufacturing method for laminate, and manufacturing method for semiconductor device

Also Published As

Publication number Publication date
JPS5294388A (en) 1977-08-08
BE838135A (en) 1976-05-14
BR7601434A (en) 1977-09-06
DE2602410C2 (en) 1985-11-21
SE7600431L (en) 1977-07-17
NL160004C (en) 1979-09-17
NL160004B (en) 1979-04-17
FR2339185A1 (en) 1977-08-19
ZA757984B (en) 1976-12-29
NL7600794A (en) 1977-07-29
FR2339185B1 (en) 1980-03-14
JPH0359416B2 (en) 1991-09-10
JPS61134756A (en) 1986-06-21
DD125491A5 (en) 1977-04-20
DE2602410A1 (en) 1977-07-28
JPS5425957B2 (en) 1979-08-31

Similar Documents

Publication Publication Date Title
GB1521372A (en) Photopolymerisable compositions for aqueous processed photoresists
GB1329886A (en) Positive photoresists
ATE40757T1 (en) WATER-BASED PHOTOPOLYMERIZABLE COMPOSITIONS AND USE.
GB1010203A (en) Presensitized positive acting lithographic plates
DE2361041B2 (en) Photopolymerizable mixture
GB1507841A (en) Screen printing inks and the use thereof
JPS5278848A (en) Preparation of novel propionic acid ester derivatives
JPS5562446A (en) Photosensitive resin composition for screen printing plate
JPS5710605A (en) Photopolymerizable composition
US3595656A (en) Reprographic materials containing a water-insoluble azidochalcone
DE3568296D1 (en) Composition polymerisable by irradiation
CA1128803A (en) Photopolymerizable mixture containing a phenazine derivative as photoinitiator
US3882168A (en) Photopolymerizable compounds
US4447512A (en) Method for making a negative working lithographic printing plate
ES454521A1 (en) Aqueous alkaline soluble photopolymerizable material
JPS55133030A (en) Photopolymerizable composition
US4483758A (en) Method for making a negative working lithographic printing plate
JPS57104135A (en) Photopolymerizable composition
GB1404687A (en) Benzoin ethers
JPH01278585A (en) Ultraviolet ray curable resist ink
GB725148A (en) Improvements in the preparation of photomechanical printing plates
GB1500607A (en) Photopolymerizable resin composition
GB1436357A (en) Tri-iodo benzene derivatives and their use as x-ray contrast
JPS5397047A (en) Photosensitive resin composition
SU724540A1 (en) Photopolymerizing composition for manufacturing polymeric printing forms

Legal Events

Date Code Title Description
PS Patent sealed
PE20 Patent expired after termination of 20 years

Effective date: 19960128