JPS638735A - Photosensitive resin plate for pattern formation - Google Patents
Photosensitive resin plate for pattern formationInfo
- Publication number
- JPS638735A JPS638735A JP15177186A JP15177186A JPS638735A JP S638735 A JPS638735 A JP S638735A JP 15177186 A JP15177186 A JP 15177186A JP 15177186 A JP15177186 A JP 15177186A JP S638735 A JPS638735 A JP S638735A
- Authority
- JP
- Japan
- Prior art keywords
- weight
- component
- photosensitive resin
- parts
- monomer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229920005989 resin Polymers 0.000 title claims abstract description 28
- 239000011347 resin Substances 0.000 title claims abstract description 28
- 230000007261 regionalization Effects 0.000 title claims description 6
- 239000000178 monomer Substances 0.000 claims abstract description 24
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims abstract description 7
- 239000003999 initiator Substances 0.000 claims abstract description 7
- 239000000463 material Substances 0.000 claims abstract description 3
- -1 unsaturated vinyl compound Chemical class 0.000 claims description 8
- 125000005397 methacrylic acid ester group Chemical group 0.000 claims description 5
- 239000000203 mixture Substances 0.000 claims description 5
- 229920006243 acrylic copolymer Polymers 0.000 claims description 2
- 229920001577 copolymer Polymers 0.000 abstract description 13
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 abstract description 8
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 abstract description 6
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 abstract description 4
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 abstract description 4
- 229920002554 vinyl polymer Polymers 0.000 abstract description 4
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 abstract description 3
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 abstract description 3
- 239000012965 benzophenone Substances 0.000 abstract description 3
- RZVHIXYEVGDQDX-UHFFFAOYSA-N 9,10-anthraquinone Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3C(=O)C2=C1 RZVHIXYEVGDQDX-UHFFFAOYSA-N 0.000 abstract 1
- 229940076442 9,10-anthraquinone Drugs 0.000 abstract 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 abstract 1
- 239000000976 ink Substances 0.000 description 27
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N Methyl ethyl ketone Natural products CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 20
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 15
- HCLJOFJIQIJXHS-UHFFFAOYSA-N 2-[2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOCCOC(=O)C=C HCLJOFJIQIJXHS-UHFFFAOYSA-N 0.000 description 14
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 12
- 239000003504 photosensitizing agent Substances 0.000 description 12
- 239000000243 solution Substances 0.000 description 12
- 238000012546 transfer Methods 0.000 description 12
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 11
- LEJBBGNFPAFPKQ-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethoxy)ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOC(=O)C=C LEJBBGNFPAFPKQ-UHFFFAOYSA-N 0.000 description 10
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 9
- OQHMGFSAURFQAF-UHFFFAOYSA-N [2-hydroxy-3-(2-methylprop-2-enoyloxy)propyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(O)COC(=O)C(C)=C OQHMGFSAURFQAF-UHFFFAOYSA-N 0.000 description 9
- 238000013461 design Methods 0.000 description 9
- BTJPUDCSZVCXFQ-UHFFFAOYSA-N 2,4-diethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC(CC)=C3SC2=C1 BTJPUDCSZVCXFQ-UHFFFAOYSA-N 0.000 description 8
- 239000003795 chemical substances by application Substances 0.000 description 8
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 8
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical group CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 7
- 239000000853 adhesive Substances 0.000 description 7
- 230000001070 adhesive effect Effects 0.000 description 7
- 239000002904 solvent Substances 0.000 description 7
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- 238000001035 drying Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 4
- UZKWTJUDCOPSNM-UHFFFAOYSA-N 1-ethenoxybutane Chemical compound CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 4
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 4
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 4
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 4
- 238000011161 development Methods 0.000 description 4
- 230000018109 developmental process Effects 0.000 description 4
- SSTAXLJQSRFHMB-UHFFFAOYSA-N ethyl 1,4-dimethylcyclohexa-2,4-diene-1-carboxylate Chemical compound CCOC(=O)C1(C)CC=C(C)C=C1 SSTAXLJQSRFHMB-UHFFFAOYSA-N 0.000 description 4
- 239000002985 plastic film Substances 0.000 description 4
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 239000003086 colorant Substances 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- JLIDVCMBCGBIEY-UHFFFAOYSA-N 1-penten-3-one Chemical compound CCC(=O)C=C JLIDVCMBCGBIEY-UHFFFAOYSA-N 0.000 description 2
- XFCMNSHQOZQILR-UHFFFAOYSA-N 2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOC(=O)C(C)=C XFCMNSHQOZQILR-UHFFFAOYSA-N 0.000 description 2
- INQDDHNZXOAFFD-UHFFFAOYSA-N 2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOC(=O)C=C INQDDHNZXOAFFD-UHFFFAOYSA-N 0.000 description 2
- SZNYYWIUQFZLLT-UHFFFAOYSA-N 2-methyl-1-(2-methylpropoxy)propane Chemical compound CC(C)COCC(C)C SZNYYWIUQFZLLT-UHFFFAOYSA-N 0.000 description 2
- KUDUQBURMYMBIJ-UHFFFAOYSA-N 2-prop-2-enoyloxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC(=O)C=C KUDUQBURMYMBIJ-UHFFFAOYSA-N 0.000 description 2
- ZGHFDIIVVIFNPS-UHFFFAOYSA-N 3-Methyl-3-buten-2-one Chemical compound CC(=C)C(C)=O ZGHFDIIVVIFNPS-UHFFFAOYSA-N 0.000 description 2
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 2
- CNCOEDDPFOAUMB-UHFFFAOYSA-N N-Methylolacrylamide Chemical compound OCNC(=O)C=C CNCOEDDPFOAUMB-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- 244000028419 Styrax benzoin Species 0.000 description 2
- 235000000126 Styrax benzoin Nutrition 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 235000008411 Sumatra benzointree Nutrition 0.000 description 2
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 2
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 2
- 239000005456 alcohol based solvent Substances 0.000 description 2
- 230000001476 alcoholic effect Effects 0.000 description 2
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- FUSUHKVFWTUUBE-UHFFFAOYSA-N buten-2-one Chemical compound CC(=O)C=C FUSUHKVFWTUUBE-UHFFFAOYSA-N 0.000 description 2
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 2
- FJKIXWOMBXYWOQ-UHFFFAOYSA-N ethenoxyethane Chemical compound CCOC=C FJKIXWOMBXYWOQ-UHFFFAOYSA-N 0.000 description 2
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 2
- MTZQAGJQAFMTAQ-UHFFFAOYSA-N ethyl benzoate Chemical compound CCOC(=O)C1=CC=CC=C1 MTZQAGJQAFMTAQ-UHFFFAOYSA-N 0.000 description 2
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Substances CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 2
- 239000001530 fumaric acid Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 235000019382 gum benzoic Nutrition 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 125000005395 methacrylic acid group Chemical group 0.000 description 2
- 239000012046 mixed solvent Substances 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- UCUUFSAXZMGPGH-UHFFFAOYSA-N penta-1,4-dien-3-one Chemical compound C=CC(=O)C=C UCUUFSAXZMGPGH-UHFFFAOYSA-N 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 229920006255 plastic film Polymers 0.000 description 2
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 2
- 229920006267 polyester film Polymers 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 2
- 241000894007 species Species 0.000 description 2
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 2
- RBKHNGHPZZZJCI-UHFFFAOYSA-N (4-aminophenyl)-phenylmethanone Chemical compound C1=CC(N)=CC=C1C(=O)C1=CC=CC=C1 RBKHNGHPZZZJCI-UHFFFAOYSA-N 0.000 description 1
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 1
- GJZFGDYLJLCGHT-UHFFFAOYSA-N 1,2-diethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=C(CC)C(CC)=CC=C3SC2=C1 GJZFGDYLJLCGHT-UHFFFAOYSA-N 0.000 description 1
- SRMCCEAXOINPMD-UHFFFAOYSA-N 1,5-dichloropenta-1,4-dien-3-one Chemical compound ClC=CC(=O)C=CCl SRMCCEAXOINPMD-UHFFFAOYSA-N 0.000 description 1
- BOCJQSFSGAZAPQ-UHFFFAOYSA-N 1-chloroanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2Cl BOCJQSFSGAZAPQ-UHFFFAOYSA-N 0.000 description 1
- GXZPMXGRNUXGHN-UHFFFAOYSA-N 1-ethenoxy-2-methoxyethane Chemical compound COCCOC=C GXZPMXGRNUXGHN-UHFFFAOYSA-N 0.000 description 1
- YAOJJEJGPZRYJF-UHFFFAOYSA-N 1-ethenoxyhexane Chemical compound CCCCCCOC=C YAOJJEJGPZRYJF-UHFFFAOYSA-N 0.000 description 1
- XXCVIFJHBFNFBO-UHFFFAOYSA-N 1-ethenoxyoctane Chemical compound CCCCCCCCOC=C XXCVIFJHBFNFBO-UHFFFAOYSA-N 0.000 description 1
- OVGRCEFMXPHEBL-UHFFFAOYSA-N 1-ethenoxypropane Chemical compound CCCOC=C OVGRCEFMXPHEBL-UHFFFAOYSA-N 0.000 description 1
- KUIZKZHDMPERHR-UHFFFAOYSA-N 1-phenylprop-2-en-1-one Chemical compound C=CC(=O)C1=CC=CC=C1 KUIZKZHDMPERHR-UHFFFAOYSA-N 0.000 description 1
- FDUFQLNPPGRIKX-UHFFFAOYSA-N 2,2-dimethylpropane-1,3-diol prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.CC(C)(CO)CO FDUFQLNPPGRIKX-UHFFFAOYSA-N 0.000 description 1
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical group NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 1
- HWSSEYVMGDIFMH-UHFFFAOYSA-N 2-[2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOCCOC(=O)C(C)=C HWSSEYVMGDIFMH-UHFFFAOYSA-N 0.000 description 1
- LTHJXDSHSVNJKG-UHFFFAOYSA-N 2-[2-[2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethoxy]ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOCCOCCOC(=O)C(C)=C LTHJXDSHSVNJKG-UHFFFAOYSA-N 0.000 description 1
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 1
- FDSUVTROAWLVJA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(CO)(CO)COCC(CO)(CO)CO FDSUVTROAWLVJA-UHFFFAOYSA-N 0.000 description 1
- FPKCTSIVDAWGFA-UHFFFAOYSA-N 2-chloroanthracene-9,10-dione Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3C(=O)C2=C1 FPKCTSIVDAWGFA-UHFFFAOYSA-N 0.000 description 1
- ZCDADJXRUCOCJE-UHFFFAOYSA-N 2-chlorothioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3SC2=C1 ZCDADJXRUCOCJE-UHFFFAOYSA-N 0.000 description 1
- PGYJSURPYAAOMM-UHFFFAOYSA-N 2-ethenoxy-2-methylpropane Chemical compound CC(C)(C)OC=C PGYJSURPYAAOMM-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- DIVXVZXROTWKIH-UHFFFAOYSA-N 2-hydroxy-1,2-diphenylpropan-1-one Chemical compound C=1C=CC=CC=1C(O)(C)C(=O)C1=CC=CC=C1 DIVXVZXROTWKIH-UHFFFAOYSA-N 0.000 description 1
- VHSHLMUCYSAUQU-UHFFFAOYSA-N 2-hydroxypropyl methacrylate Chemical compound CC(O)COC(=O)C(C)=C VHSHLMUCYSAUQU-UHFFFAOYSA-N 0.000 description 1
- GWZMWHWAWHPNHN-UHFFFAOYSA-N 2-hydroxypropyl prop-2-enoate Chemical compound CC(O)COC(=O)C=C GWZMWHWAWHPNHN-UHFFFAOYSA-N 0.000 description 1
- TURITJIWSQEMDB-UHFFFAOYSA-N 2-methyl-n-[(2-methylprop-2-enoylamino)methyl]prop-2-enamide Chemical compound CC(=C)C(=O)NCNC(=O)C(C)=C TURITJIWSQEMDB-UHFFFAOYSA-N 0.000 description 1
- CDIYIEKBGHJSDO-UHFFFAOYSA-N 2-methyl-n-[3-(2-methylprop-2-enoylamino)propyl]prop-2-enamide Chemical compound CC(=C)C(=O)NCCCNC(=O)C(C)=C CDIYIEKBGHJSDO-UHFFFAOYSA-N 0.000 description 1
- YBKWKURHPIBUEM-UHFFFAOYSA-N 2-methyl-n-[6-(2-methylprop-2-enoylamino)hexyl]prop-2-enamide Chemical compound CC(=C)C(=O)NCCCCCCNC(=O)C(C)=C YBKWKURHPIBUEM-UHFFFAOYSA-N 0.000 description 1
- GHHGVSCQWPVENX-UHFFFAOYSA-N 2-methylpent-1-en-3-one Chemical compound CCC(=O)C(C)=C GHHGVSCQWPVENX-UHFFFAOYSA-N 0.000 description 1
- GZNCCNHJQSRXNU-UHFFFAOYSA-N 2-oxobut-3-enyl acetate Chemical compound CC(=O)OCC(=O)C=C GZNCCNHJQSRXNU-UHFFFAOYSA-N 0.000 description 1
- REEBWSYYNPPSKV-UHFFFAOYSA-N 3-[(4-formylphenoxy)methyl]thiophene-2-carbonitrile Chemical compound C1=CC(C=O)=CC=C1OCC1=C(C#N)SC=C1 REEBWSYYNPPSKV-UHFFFAOYSA-N 0.000 description 1
- BJOWTLCTYPKRRU-UHFFFAOYSA-N 3-ethenoxyoctane Chemical compound CCCCCC(CC)OC=C BJOWTLCTYPKRRU-UHFFFAOYSA-N 0.000 description 1
- MBLXROIYHWIVRL-UHFFFAOYSA-N 3-methylideneheptan-4-one Chemical compound CCCC(=O)C(=C)CC MBLXROIYHWIVRL-UHFFFAOYSA-N 0.000 description 1
- GFLJTEHFZZNCTR-UHFFFAOYSA-N 3-prop-2-enoyloxypropyl prop-2-enoate Chemical compound C=CC(=O)OCCCOC(=O)C=C GFLJTEHFZZNCTR-UHFFFAOYSA-N 0.000 description 1
- MUOKXXOKLLKNIE-UHFFFAOYSA-N 4,4-dimethylpent-1-en-3-one Chemical compound CC(C)(C)C(=O)C=C MUOKXXOKLLKNIE-UHFFFAOYSA-N 0.000 description 1
- XOJWAAUYNWGQAU-UHFFFAOYSA-N 4-(2-methylprop-2-enoyloxy)butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCCOC(=O)C(C)=C XOJWAAUYNWGQAU-UHFFFAOYSA-N 0.000 description 1
- LRDIEHDJWYRVPT-UHFFFAOYSA-N 4-amino-5-hydroxynaphthalene-1-sulfonic acid Chemical compound C1=CC(O)=C2C(N)=CC=C(S(O)(=O)=O)C2=C1 LRDIEHDJWYRVPT-UHFFFAOYSA-N 0.000 description 1
- DBCAQXHNJOFNGC-UHFFFAOYSA-N 4-bromo-1,1,1-trifluorobutane Chemical compound FC(F)(F)CCCBr DBCAQXHNJOFNGC-UHFFFAOYSA-N 0.000 description 1
- UGVRJVHOJNYEHR-UHFFFAOYSA-N 4-chlorobenzophenone Chemical compound C1=CC(Cl)=CC=C1C(=O)C1=CC=CC=C1 UGVRJVHOJNYEHR-UHFFFAOYSA-N 0.000 description 1
- FIHBHSQYSYVZQE-UHFFFAOYSA-N 6-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCOC(=O)C=C FIHBHSQYSYVZQE-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- OSDWBNJEKMUWAV-UHFFFAOYSA-N Allyl chloride Chemical compound ClCC=C OSDWBNJEKMUWAV-UHFFFAOYSA-N 0.000 description 1
- ATRRKUHOCOJYRX-UHFFFAOYSA-N Ammonium bicarbonate Chemical compound [NH4+].OC([O-])=O ATRRKUHOCOJYRX-UHFFFAOYSA-N 0.000 description 1
- XELHRAKOFRYMEM-UHFFFAOYSA-N CC(=C)C(O)=O.CC(=C)C(O)=O.CC(=C)C(O)=O.OCC(C)C(CO)(CO)CO Chemical compound CC(=C)C(O)=O.CC(=C)C(O)=O.CC(=C)C(O)=O.OCC(C)C(CO)(CO)CO XELHRAKOFRYMEM-UHFFFAOYSA-N 0.000 description 1
- QCFQUXGEMVWDLK-UHFFFAOYSA-N CCC.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C Chemical compound CCC.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C QCFQUXGEMVWDLK-UHFFFAOYSA-N 0.000 description 1
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 229920000298 Cellophane Polymers 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- IZMILXUBYXMQBP-UHFFFAOYSA-N OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(C)C(CO)(CO)CO Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(C)C(CO)(CO)CO IZMILXUBYXMQBP-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- BGNXCDMCOKJUMV-UHFFFAOYSA-N Tert-Butylhydroquinone Chemical compound CC(C)(C)C1=CC(O)=CC=C1O BGNXCDMCOKJUMV-UHFFFAOYSA-N 0.000 description 1
- OKKRPWIIYQTPQF-UHFFFAOYSA-N Trimethylolpropane trimethacrylate Chemical compound CC(=C)C(=O)OCC(CC)(COC(=O)C(C)=C)COC(=O)C(C)=C OKKRPWIIYQTPQF-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- JUDXBRVLWDGRBC-UHFFFAOYSA-N [2-(hydroxymethyl)-3-(2-methylprop-2-enoyloxy)-2-(2-methylprop-2-enoyloxymethyl)propyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(CO)(COC(=O)C(C)=C)COC(=O)C(C)=C JUDXBRVLWDGRBC-UHFFFAOYSA-N 0.000 description 1
- BEUGBYXJXMVRFO-UHFFFAOYSA-N [4-(dimethylamino)phenyl]-phenylmethanone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=CC=C1 BEUGBYXJXMVRFO-UHFFFAOYSA-N 0.000 description 1
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 1
- 150000001241 acetals Chemical class 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 125000005396 acrylic acid ester group Chemical group 0.000 description 1
- HFBMWMNUJJDEQZ-UHFFFAOYSA-N acryloyl chloride Chemical compound ClC(=O)C=C HFBMWMNUJJDEQZ-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 239000001099 ammonium carbonate Substances 0.000 description 1
- 235000012501 ammonium carbonate Nutrition 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000008280 chlorinated hydrocarbons Chemical class 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 125000004386 diacrylate group Chemical group 0.000 description 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- JBTWLSYIZRCDFO-UHFFFAOYSA-N ethyl methyl carbonate Chemical compound CCOC(=O)OC JBTWLSYIZRCDFO-UHFFFAOYSA-N 0.000 description 1
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- CDOSHBSSFJOMGT-UHFFFAOYSA-N linalool Chemical compound CC(C)=CCCC(C)(O)C=C CDOSHBSSFJOMGT-UHFFFAOYSA-N 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- XJRBAMWJDBPFIM-UHFFFAOYSA-N methyl vinyl ether Chemical compound COC=C XJRBAMWJDBPFIM-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- ZIUHHBKFKCYYJD-UHFFFAOYSA-N n,n'-methylenebisacrylamide Chemical compound C=CC(=O)NCNC(=O)C=C ZIUHHBKFKCYYJD-UHFFFAOYSA-N 0.000 description 1
- IZMLACJTYRPMBG-UHFFFAOYSA-N n-[phenyl-(prop-2-enoylamino)methyl]prop-2-enamide Chemical compound C=CC(=O)NC(NC(=O)C=C)C1=CC=CC=C1 IZMLACJTYRPMBG-UHFFFAOYSA-N 0.000 description 1
- FZUGPQWGEGAKET-UHFFFAOYSA-N parbenate Chemical compound CCOC(=O)C1=CC=C(N(C)C)C=C1 FZUGPQWGEGAKET-UHFFFAOYSA-N 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920002432 poly(vinyl methyl ether) polymer Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229920001289 polyvinyl ether Polymers 0.000 description 1
- 239000011736 potassium bicarbonate Substances 0.000 description 1
- 229910000028 potassium bicarbonate Inorganic materials 0.000 description 1
- 235000015497 potassium bicarbonate Nutrition 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 235000011181 potassium carbonates Nutrition 0.000 description 1
- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical compound [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 description 1
- 229940086066 potassium hydrogencarbonate Drugs 0.000 description 1
- 235000011118 potassium hydroxide Nutrition 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- YPFDHNVEDLHUCE-UHFFFAOYSA-N propane-1,3-diol Chemical compound OCCCO YPFDHNVEDLHUCE-UHFFFAOYSA-N 0.000 description 1
- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 235000017550 sodium carbonate Nutrition 0.000 description 1
- 235000011121 sodium hydroxide Nutrition 0.000 description 1
- KJCLYACXIWMFCC-UHFFFAOYSA-M sodium;5-benzoyl-4-hydroxy-2-methoxybenzenesulfonate Chemical compound [Na+].C1=C(S([O-])(=O)=O)C(OC)=CC(O)=C1C(=O)C1=CC=CC=C1 KJCLYACXIWMFCC-UHFFFAOYSA-M 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- 239000004250 tert-Butylhydroquinone Substances 0.000 description 1
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 1
- 235000019281 tert-butylhydroquinone Nutrition 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical class C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は支持体上にデザインパターンを形成するための
感光性樹脂板に関する。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a photosensitive resin plate for forming a design pattern on a support.
ガラス、金属、プラスチックフィルム上に、デザインパ
ターンを形成する場合に、感光剤を用いた方法が提案さ
れている。A method using a photosensitizer has been proposed when forming a design pattern on glass, metal, or plastic film.
このようなパターンはカラーイメージと呼ばれ、ロゴや
図案のサンプルとして利用される外。Such patterns are called color images and are used as samples for logos and designs.
パターン上に接着剤を塗布して転写シートとして利用さ
れる。このときのデザインパターンはアルコール可溶性
インキにて形成されている。該インキは色彩の種類が豊
富であるため色を自由に選択し、一枚の原図フィルムか
ら所望の色彩のデザインパターンを何枚も作成すること
ができるという利点がある。また、転写シートとして利
用する場合は、紙、金属プラスチックなどに転写するこ
とができる。Adhesive is applied onto the pattern and used as a transfer sheet. The design pattern at this time is formed using alcohol-soluble ink. Since the ink has a wide variety of colors, it has the advantage that the color can be freely selected and a number of design patterns of desired colors can be created from a single original film. Further, when used as a transfer sheet, it can be transferred to paper, metal plastic, etc.
さらに、この外の分野にも利用される可能性の大きいパ
ターン形成用感光性樹脂板である。Furthermore, this photosensitive resin plate for pattern formation has a high possibility of being used in other fields as well.
従来の技術
従来、このようなデザインパターンの形成には以下のよ
うな感光性樹脂板とパターン形成方法が用いられている
。すなわち。Prior Art Conventionally, the following photosensitive resin plates and pattern forming methods have been used to form such design patterns. Namely.
■ プラスチックシート?の支持体の一方の面にアルコ
ール可溶性インキを全面に均一に塗布し、乾燥させる。■ Plastic sheet? An alcohol-soluble ink is evenly applied to one side of the support and allowed to dry.
■ アルコール可溶性インキが塗布された面に水現像型
の感光剤を塗布し、乾燥して感光層を形成する。■ A water-developable photosensitive agent is applied to the surface coated with the alcohol-soluble ink and dried to form a photosensitive layer.
■ ネガフィルムを介して露光する。■ Expose through negative film.
■ 感光層の未露光部を水で現像する。■ Develop the unexposed areas of the photosensitive layer with water.
(つ アルコール可溶性インキ層の表面が露出した部分
を、アルコールで溶解除去する。(1) Dissolve and remove the exposed surface of the alcohol-soluble ink layer with alcohol.
■ 剥離液で残った感光層を除去する。■ Remove the remaining photosensitive layer with a stripping solution.
といった工程が用いられる。この後、インキ表面に接着
剤を塗布すれば転写シートとして使用でさる。この場合
、デザインパターンはあらがじめ鏡像となるように形成
させる。The following process is used. After this, if an adhesive is applied to the ink surface, it can be used as a transfer sheet. In this case, the design pattern is first formed to be a mirror image.
ここでは通常、パターン形成用インキとしてアルコール
可溶性インキが用いられる。その理由は、アルコール可
溶性インキは水溶性インキに比べ、乾燥が速く、しかも
耐候性に優れているためである。Here, alcohol-soluble ink is usually used as the pattern-forming ink. The reason for this is that alcohol-soluble ink dries faster and has better weather resistance than water-soluble ink.
また感光剤としてはジアゾ樹脂あるいはアクリルアミド
類とポリビニルアルコールまたはポリ酢酸ビニルとの混
合組成物が一般に用いられてきた。As a photosensitizer, a mixed composition of a diazo resin or acrylamide and polyvinyl alcohol or polyvinyl acetate has generally been used.
発明が解決しようとする問題点
しかしながら前記のような感光剤は、水現像型であるた
めに現像後の乾燥性が悪く、またインキ層への濡れ性が
悪いため、十分な密若性が得られなかったり、あるいは
インキ層表面に付いた手の脂分などに感光剤がはじかれ
たりして均一な感光層が得られないという問題があった
。Problems to be Solved by the Invention However, since the above-mentioned photosensitizers are water-developable, they have poor drying properties after development and poor wettability to the ink layer, making it difficult to obtain sufficient density. There was a problem that a uniform photosensitive layer could not be obtained because the photosensitive agent was not coated or the photosensitive agent was repelled by oil from hands and the like on the surface of the ink layer.
また、インキ層は水に対して不溶性のため、感光層を現
像する工程と、露出したインキを除去して画像を形成す
る工程が別工程となって手間がかかるという問題があっ
た。Furthermore, since the ink layer is insoluble in water, there is a problem in that the step of developing the photosensitive layer and the step of removing the exposed ink to form an image are separate and time-consuming steps.
問題点を解決するだめの手段
このような問題点を解決するべく本願発明者等は鋭意研
究を重ねた結果、アルコール可溶性インキによるデザイ
ンパターンの形成において、好適に用いることができる
アルコール現像型感光剤を見いだし、本発明を完成する
に至った。Means to Solve the Problems In order to solve these problems, the inventors of the present application have conducted intensive research and have developed an alcohol-developable photosensitive agent that can be suitably used in the formation of design patterns using alcohol-soluble inks. They discovered this and completed the present invention.
すなわち本発明は、支持体上にアルコール可溶性インキ
層を設け、その上に感光性樹脂層を設けてなるパターン
形成用感光性樹脂板において、感光性樹脂層を形成する
感光性樹脂材料が、(a)メタクリル酸エステルとカル
ボキシル基含有不飽和単量体とを必須の単届体成分とし
て含み、必要に応じてこれらの”lj 1体と共重合可
能な少なくとも1種の不飽和ビニル化合物を少量成分と
して含む単量体混合物を共重合して得られるアクリル系
共重合体を主成分とする樹脂と、
(b)分子中に少なくとも1個のエチレン性不飽和基を
有する架橋性単量体と。That is, the present invention provides a pattern-forming photosensitive resin plate in which an alcohol-soluble ink layer is provided on a support and a photosensitive resin layer is provided thereon, in which the photosensitive resin material forming the photosensitive resin layer is ( a) Contains a methacrylic acid ester and a carboxyl group-containing unsaturated monomer as essential single receptor components, and optionally contains a small amount of at least one unsaturated vinyl compound copolymerizable with these lj monomers. (b) a resin whose main component is an acrylic copolymer obtained by copolymerizing a monomer mixture contained as a component; (b) a crosslinkable monomer having at least one ethylenically unsaturated group in the molecule; .
(C)光重合開始剤
を必須成分として成ることを特徴とするパターン形成用
感光性樹脂板である。(C) A photosensitive resin plate for pattern formation characterized by comprising a photopolymerization initiator as an essential component.
(樹脂成分)
本発明における(a)成分である樹脂は、メタクリル酸
エチル、メタクリル酸エチル、メタクリル酸n−プロピ
ル、メタクリル酸1so−プロピル、メタクリル酸n−
ブチル、メタクリルm:Sミーブチル、メタクリルII
5ec−ブチル、メタクリル酸tart−ブチル、メ
タクリル酸2−ヒドロキシエチル、メタクリル酸2−ヒ
ドロキシプロピルなどのメタクリル酸エステル1種また
は2種以上とアクリル酸、メタクリル酸、マレイン酸、
クロトン酸、フマル酸などのカルボキシル基含有不飽和
単量体1種または2種以上との共重合体が好適に用いら
れる。また(a)成分は前記メタクリル酸エステルおよ
びカルボキシル基含有不飽和単量体に、これらの111
M体と共重合可能な不飽和ビニル化合物、例えば、アク
リル酸メチル、アクリル酸エチル、アクリル酸n−プロ
ピル、アクリル酸1SO−プロピル、アクリル酸n−ブ
チル、アクリル酸l5O−ブチル、アクリルm 5ea
−ブチル、アクリル@tert−ブチル、アクリル酸2
−ヒドロキシエチル、アクリル酸2−ヒドロキシプロピ
ルなどのアクリル酸エステル、塩化ビニル、アリルクロ
リド、アクリル酸クロリドなどの塩素含有不飽和単量体
、メチルビニルエーテル、エチルビニルエーテル、n−
プロピルビニルエーテル、1so−プロピルビニルエー
テル、n−ブチルビニルエーテル、1so−ブチルビニ
ルエーテル、38C−ブチルビニルエーテル、tert
−ブチルビニルエーテル、n−アミルビニルエーテル、
1so−アミルビニルエーテル、2−メトキシエチル
ビニルエーテル、2−クロロエチルビニルエーテル、2
−エチルヘキシルビニルエーテル、n−ヘキシルビニル
エーテル、n−オクチルビニルエーテル等のビニルエー
テル類、メチルビニルケトン、エチルビニルケトン、β
−メチレン−γ−ケトブタール、2−メチル−1−ペン
テン−3−オン、4.4−ジメチル−1−ペンテン−3
−オン、2−エチル−1−ヘキセン−3−オン、ジビニ
ルケトン、フェニルビニルケトン、アセトキシメチルビ
ニルケトン、α−アセトキシビニルメチルエチルケトン
、α−クロロビニルメチルケトン、β−クロロビニルメ
チルケトン、クロロビニルケトン、メチルイソプロペニ
ルケトン等のビニルケトン類、スチレン、ビニルトルエ
ン等のビニルベンゼン類、アクリルアミド、N−メチロ
ールアクリルアミド等のアクリルアミド類などから選ば
れた1種または2種以−Lを組み合わ、せた共重合体と
してもよい。(Resin component) The resin as component (a) in the present invention includes ethyl methacrylate, ethyl methacrylate, n-propyl methacrylate, 1so-propyl methacrylate, n-methacrylate
Butyl, methacrylic m:S mebutyl, methacrylic II
One or more methacrylic acid esters such as 5ec-butyl, tart-butyl methacrylate, 2-hydroxyethyl methacrylate, and 2-hydroxypropyl methacrylate, and acrylic acid, methacrylic acid, maleic acid,
A copolymer with one or more carboxyl group-containing unsaturated monomers such as crotonic acid and fumaric acid is preferably used. In addition, component (a) is the methacrylic acid ester and the carboxyl group-containing unsaturated monomer, and these 111
Unsaturated vinyl compounds copolymerizable with M-form, such as methyl acrylate, ethyl acrylate, n-propyl acrylate, 1SO-propyl acrylate, n-butyl acrylate, 15O-butyl acrylate, acrylic m5ea
-Butyl, acrylic@tert-butyl, acrylic acid 2
- Acrylic acid esters such as hydroxyethyl and 2-hydroxypropyl acrylate, chlorine-containing unsaturated monomers such as vinyl chloride, allyl chloride, and acrylic acid chloride, methyl vinyl ether, ethyl vinyl ether, n-
Propyl vinyl ether, 1so-propyl vinyl ether, n-butyl vinyl ether, 1so-butyl vinyl ether, 38C-butyl vinyl ether, tert
-butyl vinyl ether, n-amyl vinyl ether,
1so-amyl vinyl ether, 2-methoxyethyl vinyl ether, 2-chloroethyl vinyl ether, 2
- Vinyl ethers such as ethylhexyl vinyl ether, n-hexyl vinyl ether, n-octyl vinyl ether, methyl vinyl ketone, ethyl vinyl ketone, β
-Methylene-γ-ketobutal, 2-methyl-1-penten-3-one, 4,4-dimethyl-1-penten-3
-one, 2-ethyl-1-hexen-3-one, divinyl ketone, phenyl vinyl ketone, acetoxymethyl vinyl ketone, α-acetoxy vinyl methyl ethyl ketone, α-chlorovinyl methyl ketone, β-chlorovinyl methyl ketone, chlorovinyl ketone , vinyl ketones such as methyl isopropenyl ketone, styrene, vinylbenzenes such as vinyltoluene, acrylamide, acrylamide such as N-methylol acrylamide, etc., or a combination of one or more L. May be combined.
本発明の(a)成分である樹脂の共重合割合は、メタク
リル酸エステル40〜90fifi%、カルボキシル基
含有不飽和単量体10〜40重量%、その他の不飽和ビ
ニル化合物O〜30重量%の範囲が好ましい。The copolymerization ratio of the resin that is component (a) of the present invention is 40 to 90 fifi% of methacrylic acid ester, 10 to 40% by weight of carboxyl group-containing unsaturated monomer, and O to 30% by weight of other unsaturated vinyl compounds. A range is preferred.
さらに(a)成分は、前記共重合体にポリビニルエーテ
ル類、ポリビニルアセタール、ボリヒニルアルコール、
ポリビニルブチラール、ポリアミド類から選らばれた1
種または2種以上を混合した樹脂としてもよい。Furthermore, component (a) includes polyvinyl ethers, polyvinyl acetal, polyhinyl alcohol,
1 selected from polyvinyl butyral and polyamides
The resin may be a species or a mixture of two or more species.
本発明においては(a)成分の共重合体の重量平均分子
量が20,000〜150.000程度のものが好適で
あり、さらに好ましくは30,000〜80,000の
範囲であることが望ましい。In the present invention, the weight average molecular weight of the copolymer of component (a) is preferably about 20,000 to 150,000, more preferably 30,000 to 80,000.
(架橋性単量体)
本発明における(b) a分として用いられる、分子中
に少なくとも1個のエチレン性不飽和基を有する架橋性
単量体としては、アクリル酸メチル。(Crosslinkable monomer) The crosslinkable monomer having at least one ethylenically unsaturated group in the molecule, which is used as the component (b) a in the present invention, is methyl acrylate.
アクリル酸エチル、アクリル酸n−プロピル、アクリル
酸1so−プロピル、アクリル酸n−ブチル、アクリル
酸1so−ブチル、アクリル酸see −ブチル、アク
リル酸tert−ブチル等のアクリル酸エステル、メタ
クリル酸メチル、メタクリル酸エチル、メタクリル酸n
−プロピル、メタクリル酸1so−プロピル、メタクリ
ル酩n−ブチル、メタクリル酸1so−ブチル、メタク
リルm s e c−ブチル、メタクリル酸tert−
ブチル等のメタクリル酸エステル、アクリル酸、メタク
リル酸、マレモノ醇、クロトン酸、フマル酸等のカルボ
キシル基含有不飽和単量体、エチレングリコールジアク
リレート、エチレングリコールジメタクリレート、ジエ
チレングリコールジアクリレート、ジエチレングリコー
ルジメタクリレート、トリエチレングリニールジアクリ
レート、トリエチレングリコールジメタクリレート、テ
トラエチレングリコールジアクリレート、テトラエチレ
ングリコールジメタクリレート、1.3−プロパンジオ
ールジアクリレート、1.3−プロパンジオールジメタ
クリレート、1.3−ブタンジオールジアクリレート、
1.3−ブタンジオールジメタクリレート、1.4−ブ
タンジオールジアクリレート、1,4−ブタンジオール
ジメタクリレート、ネオベンタンジオールジアクリレー
ト、ネオベンタンジオールジメタクリレート、1.6−
ヘキサンジオールジアクリレート、1.6−ヘキサンジ
オールジアクリレート、トリメチロールプロパントリア
クリレート、トリメチロールプロパントリメタクリレー
ト、テトラメチロールプロパントリアクリレート、テト
ラメチロールプロパントリメタクリレート、ペンタエリ
スリトールトリアクリレート、ペンタエリスリトールト
リメタクリレート、ペンタエリスリトールテトラアクリ
レート、ペンタエリスリトールテトラメタクリレート、
ジペンタエリスリトールペンタメタクリレート、ジペン
タエリスリトールへキサアクリレート、ジペンタエリス
リトールペンタアクリレート、ジペンタエリスリトール
へキサアクリレートなどを好適に用いることができる。Acrylic acid esters such as ethyl acrylate, n-propyl acrylate, 1so-propyl acrylate, n-butyl acrylate, 1so-butyl acrylate, see-butyl acrylate, tert-butyl acrylate, methyl methacrylate, methacrylate Ethyl acid, methacrylic acid n
-propyl, 1so-propyl methacrylate, n-butyl methacrylate, 1so-butyl methacrylate, msec-butyl methacrylate, tert- methacrylate
Methacrylic acid esters such as butyl, carboxyl group-containing unsaturated monomers such as acrylic acid, methacrylic acid, male monomer, crotonic acid, fumaric acid, ethylene glycol diacrylate, ethylene glycol dimethacrylate, diethylene glycol diacrylate, diethylene glycol dimethacrylate, Triethylene glycol diacrylate, triethylene glycol dimethacrylate, tetraethylene glycol diacrylate, tetraethylene glycol dimethacrylate, 1,3-propanediol diacrylate, 1.3-propanediol dimethacrylate, 1.3-butanediol diacrylate acrylate,
1.3-butanediol dimethacrylate, 1.4-butanediol diacrylate, 1,4-butanediol dimethacrylate, neobentanediol diacrylate, neobentanediol dimethacrylate, 1.6-
Hexanediol diacrylate, 1,6-hexanediol diacrylate, trimethylolpropane triacrylate, trimethylolpropane trimethacrylate, tetramethylolpropane triacrylate, tetramethylolpropane trimethacrylate, pentaerythritol triacrylate, pentaerythritol trimethacrylate, pentaerythritol Tetraacrylate, pentaerythritol tetramethacrylate,
Dipentaerythritol pentamethacrylate, dipentaerythritol hexaacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, and the like can be suitably used.
また他に、アクリルアミド、N−メチロールアクリルア
ミド、N、N’−メチレンビスアクリルアミド、N、N
’−メチレンビスメタクリルアミド、N、N′−トリメ
チレンビスアクリルアミド、N、N′−)リメチレンビ
スメタクリルアミド、N、N’−へキサメチレンビスア
クリルアミド、N、N′−へキサメチレンビスメタクリ
ルアミド、N、N′−ベンジリデンビスアクリルアミド
、N、N’−ベンジリデンビスメタクリルアミド等のア
クリルアミド類も使用することができる。In addition, acrylamide, N-methylolacrylamide, N,N'-methylenebisacrylamide, N,N
'-methylenebismethacrylamide, N,N'-trimethylenebismethacrylamide, N,N'-)rimethylenebismethacrylamide, N,N'-hexamethylenebismethacrylamide, N,N'-hexamethylenebismethacrylamide Acrylamides such as amide, N,N'-benzylidene bisacrylamide, N,N'-benzylidene bismethacrylamide, etc. can also be used.
これらの(b)成分である架橋性単量体の配合割合は、
(a)成分である樹脂100重量部に対し、25〜20
0重量部、好ましくは40〜150重量部の範囲で用い
られる。(b)成分がこの範囲より少ない場合は充分な
感度が得られない。また、多い場合は乾燥して得られる
感光層にクランクが発生しやすくなり、さらにまた保存
安定性が低下する。The blending ratio of these crosslinkable monomers as component (b) is as follows:
25 to 20 parts by weight of resin as component (a)
It is used in an amount of 0 parts by weight, preferably in a range of 40 to 150 parts by weight. If the amount of component (b) is less than this range, sufficient sensitivity cannot be obtained. In addition, if the amount is too high, cranks are likely to occur in the photosensitive layer obtained by drying, and storage stability is further reduced.
(光重合開始剤)
本発明における(c)成分である光重合開始剤としては
、9.10−アントラキノン、1−クロロアントラキノ
ン、2−クロロアントラキノンなどの7ントラキノン類
、ペンツフェノン、p−アミノベンゾフェノン、p−ク
ロロベンゾフェノン、P−ジメチルアミノベノゾフェノ
ンなどのベンゾフェノン類、ベンゾイン、ペンツインメ
チルエーテル、ペンツインエチルエーテル、α−メチル
ベンゾインなどのベンゾイン類、2−クロロチオキサン
トン、2.4−ジエチルチオキサントンなどのチオキサ
ントン類など従来公知のものを使用することができる。(Photopolymerization initiator) Examples of the photopolymerization initiator as component (c) in the present invention include 7-anthraquinones such as 9.10-anthraquinone, 1-chloroanthraquinone, and 2-chloroanthraquinone, pentuphenone, p-aminobenzophenone, Benzophenones such as p-chlorobenzophenone and P-dimethylaminobenozophenone, benzoins such as benzoin, pentuin methyl ether, pentuin ethyl ether, and α-methylbenzoin, 2-chlorothioxanthone, 2,4-diethylthioxanthone, etc. Conventionally known thioxanthone compounds can be used.
これらの光重合開始剤は、前記成分(b)である架橋性
単量体に対し0.1〜10重量%の範囲で用いられる。These photopolymerization initiators are used in an amount of 0.1 to 10% by weight based on the crosslinkable monomer as component (b).
この範囲より少ないと活性光線照射後の照射部と光照射
部との間の現像液に対する溶解性に差が生ぜず、画像が
形成されない、また、多いと溶解性に差を生ぜしめるに
要する照射時間が不当に長くなり実用的でない。If it is less than this range, there will be no difference in solubility in the developer between the irradiated area and the light irradiated area after irradiation with actinic rays, and no image will be formed; if it is more than this, the irradiation required to cause a difference in solubility This takes an unreasonably long time and is not practical.
(その他の成分)
本発明においては、前記(a) 、 (b)および(C
)成分の他に、必要に応じて、ミヒラーケトン、p−ジ
メチル安息香酸エチルなどの光重合促進剤、ヒ1” l
:l キ/ン、tert−ブチルヒドロキノン、ベンゾ
キノン、カテコール、などの熱重合禁止剤、あるいは染
料、顔料などの着色剤、可塑剤等の、公知の添加剤を加
えてもよい。(Other components) In the present invention, the above (a), (b) and (C
) In addition to the ingredients, if necessary, photopolymerization accelerators such as Michler's ketone and ethyl p-dimethylbenzoate, and
:l Known additives such as thermal polymerization inhibitors such as quinone, tert-butylhydroquinone, benzoquinone, and catechol, colorants such as dyes and pigments, and plasticizers may be added.
本発明の感光剤は溶媒に溶解して下層のインク層上に塗
布して感光層となすが、そのための溶媒としては、アル
コール系溶媒、あるいはこれに脂肪族炭化水素系、芳香
族炭化水素系、塩素化炭化水素系、エーテル系、ケトン
系、S−酸エステル系の溶媒を加えた混合溶媒を用いる
ことができる。The photosensitive agent of the present invention is dissolved in a solvent and applied onto the lower ink layer to form a photosensitive layer.The solvent for this purpose is an alcohol-based solvent, or an aliphatic hydrocarbon-based or aromatic hydrocarbon-based solvent. A mixed solvent containing a chlorinated hydrocarbon, ether, ketone, or S-acid ester solvent can be used.
このようにして得られた感光剤により形成した感光層は
原図フィルムを密着して重ね合わせ、そのL方から活性
光線を照射すると、露光部のみが硬化する。このような
活性光線を発する光源としては、各種水銀燈、炭素アー
ク燈、キセノンランプ、紫外線蛍光燈などが使用できる
。When the photosensitive layer formed from the photosensitive agent thus obtained is closely stacked with the original film and irradiated with actinic light from the L side, only the exposed areas are cured. As a light source that emits such actinic rays, various mercury lamps, carbon arc lamps, xenon lamps, ultraviolet fluorescent lamps, etc. can be used.
(使用例)
次に本発明におけるパターン形成用感光性樹脂板に好適
な使用例を示す。(Example of use) Next, an example of use suitable for the photosensitive resin plate for pattern formation in the present invention will be shown.
支持体となるベースフィルムを作業台上に固定する。支
持体としてはポリエステル、ポリスチロールなどの透明
なプラスチックフィルムの外、プラスチックフィルムの
片面がマット化された転写用フィルムなどが用いられる
0次いでアルコール可溶性インキをパーコーター等を用
いて均一に一面に塗布する。アルコール可溶性インキは
専用インキが、レトラセットジャパン社、ホルベイン画
材社などから市販されている。このときの膜厚は5〜1
5gm程度である。ドライヤーなどで充分に乾燥した後
本発明における感光剤をバーコーター等を用いて一面に
塗布し、ドライヤーなどで乾燥させる。感光層の膜厚は
5〜20gm程度であることが好ましい。Fix the base film that will serve as a support on a workbench. The support may be a transparent plastic film such as polyester or polystyrene, or a transfer film with one side of the plastic film matted.Next, alcohol-soluble ink is applied uniformly over one surface using a percoater or the like. . Special alcohol-soluble inks are commercially available from Letraset Japan Co., Ltd., Holbein Art Materials Co., Ltd., and others. The film thickness at this time is 5 to 1
It is about 5gm. After sufficiently drying with a hair dryer or the like, the photosensitive agent of the present invention is applied over one surface using a bar coater or the like, and then dried with a hair dryer or the like. The thickness of the photosensitive layer is preferably about 5 to 20 gm.
次いで原図フィルムをT:着し、露光する。転写シート
とする場合は鏡像となるように原図フィルムを密着する
。Next, the original film is attached to T: and exposed. When making a transfer sheet, attach the original film closely so that it becomes a mirror image.
露光後、スポンジ、布、ティッシュ等に、現像液を浸み
込ませ、軽く感光層が形成された面をこすることにより
感光層の未露光部とその下のインキ層は容易に除去され
、原図フィルムに忠実なパターンが形成される。現像液
としてはアルコール系溶媒、あるいはこれに脂肪族炭化
水素系、芳香族炭化水素系、kM素化炭化水素系、ケト
ン系、エーテル系、酢酸エステル系の溶媒等を加えた混
合溶媒を用いることができる。下層のインキ層へ溶媒が
浸透してパターンがくずれることを避けるため、揮発性
の溶媒を用いることが望ましい。After exposure, the unexposed areas of the photosensitive layer and the underlying ink layer can be easily removed by soaking a sponge, cloth, tissue, etc. in the developer and lightly rubbing the surface on which the photosensitive layer is formed. A pattern faithful to the original film is formed. As the developer, use an alcohol-based solvent, or a mixed solvent in which an aliphatic hydrocarbon-based, aromatic hydrocarbon-based, kM hydrogenated hydrocarbon-based, ketone-based, ether-based, acetate-based solvent, etc. are added to this solvent. Can be done. It is desirable to use a volatile solvent in order to prevent the solvent from penetrating into the underlying ink layer and destroying the pattern.
現像後、乾燥することにより所望のパターンが得られる
が、このまま長時間放置すると、硬化した感光層が紫外
線などで劣化し、クラック等が発生する場合もあるので
、必要に応じて現像後に硬化した感光層を剥離すること
もできる。この場合、感光層はモノエタノールアミン、
ジェタノールアミン、トリエタノールアミン、4級アン
モニウム塩、炭酸ナトリウム、炭酸カリウム、炭酸アン
モニウム、炭酸水素ナトリウム、炭酸水素カリウム、水
酸化ナトリウム、水酸化カリウム等のアルカリ性水溶液
で溶解除去することができる。The desired pattern can be obtained by drying after development, but if left as is for a long time, the cured photosensitive layer may deteriorate due to ultraviolet rays and cracks may occur, so if necessary, dry it after development. The photosensitive layer can also be peeled off. In this case, the photosensitive layer is monoethanolamine,
It can be dissolved and removed with an alkaline aqueous solution of jetanolamine, triethanolamine, quaternary ammonium salt, sodium carbonate, potassium carbonate, ammonium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, sodium hydroxide, potassium hydroxide, and the like.
また、転写シートとする場合には、パターン形成後ある
いは感光層を剥離した後、/ヘーコーター等を用いて接
着剤を塗布する。接着剤はポリビニルメチルエーテルの
水溶液、同じくアルコール溶液あるいは水−アルコール
溶液、ポリビニルイソブチルエーテルのアルコール溶液
さらに転写シート用として市Jl[されているものを用
いることができる。 実施例
以下に本発明の実施例を示し、本発明をざらに詳しく説
明するが、これにより本発明は何ら制限を受けるもので
はない。In addition, in the case of making a transfer sheet, after forming the pattern or peeling off the photosensitive layer, an adhesive is applied using a coater or the like. As the adhesive, an aqueous solution of polyvinyl methyl ether, an alcoholic solution or a water-alcoholic solution, an alcoholic solution of polyvinyl isobutyl ether, and, for transfer sheets, those listed by Ichi Jl can be used. EXAMPLES The present invention will be explained in detail by referring to examples below, but the present invention is not limited thereby.
実施例1
(1)メタクリル酸メチル/メタクリル酸/メタクリル
酸2−ヒドロキシプロピル共重合体(重量比=70/2
0/10、重量平均分子量35,000)の40重量%
エタノール溶液250重量部
(2)ペンタエリスリトールトリアクリレート60重量
部
(3)テトラエチレングリコールジアクリレート20重
量部
(4)ベンゾフェノン 4重量部(5)
p−ジメチルアミノベンゾフェノン1重量部
をプロペラ型ミキサーで充分混合し、感光剤とした。Example 1 (1) Methyl methacrylate/methacrylic acid/2-hydroxypropyl methacrylate copolymer (weight ratio = 70/2
0/10, weight average molecular weight 35,000) 40% by weight
250 parts by weight of ethanol solution (2) 60 parts by weight of pentaerythritol triacrylate (3) 20 parts by weight of tetraethylene glycol diacrylate (4) 4 parts by weight of benzophenone (5)
1 part by weight of p-dimethylaminobenzophenone was thoroughly mixed with a propeller mixer to prepare a photosensitizer.
ガラス板上にポリエステルフィルムをセロテープで密着
固定し、該ポリエステルフィルム上に白色アルコール可
溶性インキをバーコーターで塗布し、ドライヤーで乾燥
した。この時の膜厚は5〜10ルmの範囲内であった。A polyester film was tightly fixed on a glass plate with cellophane tape, and a white alcohol-soluble ink was applied onto the polyester film using a bar coater and dried using a dryer. The film thickness at this time was within the range of 5 to 10 lm.
該アルコール可溶性インキ層上に先に調製した感光剤を
バーコーターで塗布し、ドライヤーで乾燥し、5〜15
gm厚の感光層を得た。The previously prepared photosensitizer was applied onto the alcohol-soluble ink layer using a bar coater, and dried using a dryer.
A photosensitive layer having a thickness of gm was obtained.
次に原図フィルムを密着させ、3 kWa高圧水銀燈(
才一り製作所社製、ジェットライト3000)で露光し
た。この時の感光層の平均膜厚は10gmであり、露光
量は45 mJ/crrr′であった。Next, the original film was placed in close contact with the original film, and a 3 kW high-pressure mercury lamp (
Exposure was carried out using Jet Light 3000 (manufactured by Saiichi Seisakusho Co., Ltd.). The average thickness of the photosensitive layer at this time was 10 gm, and the exposure amount was 45 mJ/crrr'.
露光後1組成が、イソプロピルアルコール80容量%、
n−ヘキサン20容量%からなる現像液をスポンジに浸
み込ませ、露光面を軽くこするようにして現像するとと
もに、現像処理によって露出したアルコール可溶性イン
ク層も除去し、ドライヤーで乾燥したところ、原図フィ
ルムに忠実なパターンを得た。1 composition after exposure is isopropyl alcohol 80% by volume,
A sponge was soaked in a developer consisting of 20% by volume of n-hexane, and the exposed surface was developed by rubbing lightly.The alcohol-soluble ink layer exposed by the development process was also removed and dried with a hair dryer. A pattern faithful to the original film was obtained.
実施例2
(1)メタクリル酩メチル/メタクリル酸/アクリル酸
エチル共重合物(重量比= 60/20/20、重量平
均分子量38,000)の50重量%エタノール溶液
200屯量部
〔2〕トリメチロ一ルプロパントリアクリレート40重
量部
(3)2−ヒドロキシ−1,3−ジメタクリロキシプロ
パン 40重量部(4) 2 、4−
ジエチルチオキサントン4重量部
(5)P−ジメチルアミノ安、0香酸エチル4重量部
(6)メチルエチルケトン 60重量部より感
光剤を調製し、実施例1と同様にしてパターンを形成し
、実施例1と同様の結果が得られた。ただし、このとき
の感光層の平均膜厚は10gmであり、露光量は45
mJ/crrfであった。Example 2 (1) 200 parts by volume of a 50% by weight ethanol solution of methyl methacrylate/methacrylic acid/ethyl acrylate copolymer (weight ratio = 60/20/20, weight average molecular weight 38,000) [2] Trimethyl 40 parts by weight of monopropane triacrylate (3) 40 parts by weight of 2-hydroxy-1,3-dimethacryloxypropane (4) 2,4-
A photosensitizer was prepared from 4 parts by weight of diethylthioxanthone (5) P-dimethylaminoben, 4 parts by weight of ethyl oxyfluoroate (6) 60 parts by weight of methyl ethyl ketone, and a pattern was formed in the same manner as in Example 1. Similar results were obtained. However, the average thickness of the photosensitive layer at this time was 10 gm, and the exposure amount was 45 gm.
It was mJ/crrf.
実施例3
(1)メタクリル酸メチル/メタクリル酸/アクリル酸
エチル共重合物(1f(iB比=40/4.0/20、
重量平均分子量
%エタノール溶液 200重量部(2)トリ
メチロールプロパントリアクリレート40重量部
(3)テトラエチレングリコールジアクリレート50重
量部
(4) 2 、4−ジエチルチオキサントン6重量部
(5)p−ジメチルアミノ安息香酸エチル4重量部
(8)メチルエチルケトン 80重量部より感
光剤を調製し、実施例1と同様にしてパターンを形成し
、実施例1と同様の結果が得られた。ただし、このとき
の感光層の平均膜厚は10ルmであり、露光量は50
mJ/crn’であった。Example 3 (1) Methyl methacrylate/methacrylic acid/ethyl acrylate copolymer (1f (iB ratio = 40/4.0/20,
Weight average molecular weight% ethanol solution 200 parts by weight (2) 40 parts by weight of trimethylolpropane triacrylate (3) 50 parts by weight of tetraethylene glycol diacrylate (4) 6 parts by weight of 2,4-diethylthioxanthone (5) p-dimethylamino A photosensitizer was prepared from 4 parts by weight of ethyl benzoate (8) and 80 parts by weight of methyl ethyl ketone, and a pattern was formed in the same manner as in Example 1. The same results as in Example 1 were obtained. However, the average thickness of the photosensitive layer at this time was 10 lm, and the exposure amount was 50 lm.
mJ/crn'.
実施例4
(1)メタクリル酸メチル/メタクリル酸/アクリル酸
エチル共重合物(重量比= 60/20/201重量平
均分子量40,000)の50重量%イソプロパツール
溶液 180 @ 置部(2)ポリビニルブチラー
ル樹脂 10重量部(3)トリメチロールプロパント
リアクリレート20重量部
(4)ジエチレングリコールジアクリレート20重量部
(5) 2 、4−ジエチルチオキサントン4重量部
(8)p−ジメチル安息香酸エチル 4重量部(7)
メチルエチルケトン 50重量部より感光剤を
調製し、実施例1と同様にしてパターンを形成し、実施
例1と同様の結果が得られた。ただし、このときの感光
層の平均膜厚は15鉢1であり、露光量は60 mJ/
cゴであった。Example 4 (1) 50% by weight isopropanol solution of methyl methacrylate/methacrylic acid/ethyl acrylate copolymer (weight ratio = 60/20/201 weight average molecular weight 40,000) 180 @Okibe (2) Polyvinyl butyral resin 10 parts by weight (3) 20 parts by weight of trimethylolpropane triacrylate (4) 20 parts by weight of diethylene glycol diacrylate (5) 4 parts by weight of 2,4-diethylthioxanthone (8) 4 parts by weight of ethyl p-dimethylbenzoate (7)
A photosensitizer was prepared from 50 parts by weight of methyl ethyl ketone, and a pattern was formed in the same manner as in Example 1, and the same results as in Example 1 were obtained. However, the average film thickness of the photosensitive layer at this time was 15 cm, and the exposure amount was 60 mJ/
It was C.
実施例5
(1)メタクリル酸メチル/メタクリル酸/メタクリル
酸n−ブチル/アクリル酸エチル共重合体(重量比=4
0/20/10/30.重量平均分子量50,000)
の50重量%エタノール溶液 2
00重量部(2)テトラニチレ7グリコールジアクリレ
ート70爪楢部
(3) 2− tart−ブチルアントラキノン7重量
部
(4)エチレングリコールモノヱチルエーテル50重量
部
より感光剤を調製し、′3¥施例1と同様にしてパター
ンを形成し、実施例1と同様の結果が得られた。ただし
、このときの感光層の1・均膜厚は10pmであり、露
光量は70 mJ/am″であった。Example 5 (1) Methyl methacrylate/methacrylic acid/n-butyl methacrylate/ethyl acrylate copolymer (weight ratio = 4
0/20/10/30. Weight average molecular weight 50,000)
50% ethanol solution of 2
00 parts by weight (2) Tetranityle 7 glycol diacrylate 70 parts by weight (3) 7 parts by weight of 2-tart-butylanthraquinone (4) A photosensitizer was prepared from 50 parts by weight of ethylene glycol monoethyl ether, and A pattern was formed in the same manner as in Example 1, and the same results as in Example 1 were obtained. However, the uniform film thickness of the photosensitive layer at this time was 10 pm, and the exposure amount was 70 mJ/am''.
実施例6 (1)メタクリル酸メチル/メタクリル酸/is。Example 6 (1) Methyl methacrylate/methacrylic acid/is.
−ブチルビニルエーテル共重合体(正紙比=70/20
/10.重量平均分子i40,000)の50重量%エ
タノール溶液
200重N部
(2)ポリエチレングリコールジメタクリレート30重
量部
(3)テトラエチレングリコールジアクリレート60重
量部
(4)ベンゾフェノン 4.5重量部(
5)p−ジメチルアミノ安息香酸エチル2ffi縫部
(6)メチルエチルケトン 80重r?L部よ
り感光剤を調製し、実施例1と同様にしてパターンを形
成し、実施例1と同様の結果が得られた。ただし、この
ときの感光層の平均膜厚は1゜用mであり、露光量は6
0 mJ/am″であったφ実施例7
(1)メタクリル酸メチル/メタクリル酸/アクリル酸
エチル共重合体(重量比= 50/30/201重量平
均分子量39,000)の50重量%エタノール溶液
200重量部(2)トリメチロールプロパ
ントリアクリレート30重量部
(3)テトラエチレングリコールジアクリレート20重
量部
(4)メタクリル酸 10重量部(5)
2 、4−ジエチルチオキサントン4重量部
([i) p−ジメチル安息香酸エチル 4重量部げ
)メチルエチルケトン 40重量部より感光剤
を調製し、実施例1と同様にしてパターンを形成し、実
施例1と同様の結果が得られた。ただし、このときの感
光層の平均膜厚は10用mであり、露光量は60 mJ
/crn’であった。-Butyl vinyl ether copolymer (original paper ratio = 70/20
/10. (2) 30 parts by weight of polyethylene glycol dimethacrylate (3) 60 parts by weight of tetraethylene glycol diacrylate (4) 4.5 parts by weight of benzophenone
5) Ethyl p-dimethylaminobenzoate 2ffi seam (6) Methyl ethyl ketone 80 weight r? A photosensitizer was prepared from part L and a pattern was formed in the same manner as in Example 1, and the same results as in Example 1 were obtained. However, the average thickness of the photosensitive layer at this time was 1°m, and the exposure amount was 6.
0 mJ/am'' Example 7 (1) 50% by weight ethanol solution of methyl methacrylate/methacrylic acid/ethyl acrylate copolymer (weight ratio = 50/30/201 weight average molecular weight 39,000)
200 parts by weight (2) 30 parts by weight of trimethylolpropane triacrylate (3) 20 parts by weight of tetraethylene glycol diacrylate (4) 10 parts by weight of methacrylic acid (5)
A photosensitizer was prepared from 4 parts by weight of 2,4-diethylthioxanthone ([i) 4 parts by weight of ethyl p-dimethylbenzoate] and 40 parts by weight of methyl ethyl ketone, and a pattern was formed in the same manner as in Example 1. Similar results were obtained. However, the average thickness of the photosensitive layer at this time was 10 m, and the exposure amount was 60 mJ.
/crn'.
次に、トリエタノールアミン20重量%水溶液を調製し
、これをスポンジに浸み込ませ、パターンが形成された
面に塗布し、60〜90秒間放置した後水洗すると感光
層のみが除去され、アルコール町溶性インキのみになる
パターンが残った。Next, prepare a 20% by weight aqueous solution of triethanolamine, soak it into a sponge, apply it to the patterned surface, leave it for 60 to 90 seconds, and then wash with water to remove only the photosensitive layer and remove the alcohol. A pattern remained where only the town-soluble ink was used.
実施例8
(1)メタクリル酸ノチル/メタクリル酸/メタクリル
酸2−ヒドロキシプロピル共重合体(重量比=80/1
0/10、重量平均分子量42.000)の40重量%
イソプロパツール溶液250重量部
(2)ペンタエリスリトールトリアクリレート80重量
部
(3)テトラエチレングリコールジアクリレート10重
量部
(4〕ベンツフエノン 4.5重量部(5
) p−ジメチルアミノヘンンフェノン0.5重尾部
より感光剤を調製し、実施例1と同様にして転写用フィ
ルム上にパターンを形成し、実施例1と同様の結果が得
られた。ただし、このときの感光層の平均膜厚は12用
mであり、露光量は40m J / c m’であった
。Example 8 (1) Notyl methacrylate/methacrylic acid/2-hydroxypropyl methacrylate copolymer (weight ratio = 80/1
0/10, weight average molecular weight 42.000) 40% by weight
250 parts by weight of isopropanol solution (2) 80 parts by weight of pentaerythritol triacrylate (3) 10 parts by weight of tetraethylene glycol diacrylate (4) Benzphenone 4.5 parts by weight (5
) A photosensitizer was prepared from p-dimethylaminphenone 0.5 heavy tail, and a pattern was formed on a transfer film in the same manner as in Example 1, and the same results as in Example 1 were obtained. However, the average thickness of the photosensitive layer at this time was 12 m, and the exposure amount was 40 mJ/cm'.
パターン形成後転写シート用接着剤(レトラセット社製
)をバーコーターでパターンが形成された面に塗!口し
、ドライヤーで乾燥した。次に接着剤が塗布された面を
白紙に密若させ、転写フィルム裏面より、圧着させた後
、転写フィルムをはがすと、パターンは白紙上に転写さ
れたいた。After pattern formation, apply transfer sheet adhesive (manufactured by Letraset) to the patterned surface using a bar coater! I washed it and dried it with a hair dryer. Next, the surface coated with the adhesive was placed on a white paper, and the transfer film was pressed from the back side. When the transfer film was peeled off, the pattern was transferred onto the white paper.
実施例9
(1)メタクリル酸メチル/メタクリル酸/アクリル酸
エチル共重合体(重量比= 40/40/204重量平
均分子蚤45,000)の50重量%エタノール溶液
200重M部(2) )ジメチロールプロ
パントリアクリレ−840重量部
(3)テトラエチレングリコールジアクリレート40f
fi量部
(4) 2 、4−ジエチルチオキサントン4重量部
(5)p−ジメチル安月、香酸エチル 4重量部(8
)メチルエチルケトン 60重量部より感光剤
を謂製し、″J!:施例1と同様にして転写用フィルム
上にパターンを形成し、実施例1と同様の結果が得られ
た。ただし、このときの感光層の平均膜厚は5gmであ
り、露光量は30 zJ/crn’であった。Example 9 (1) 50% by weight ethanol solution of methyl methacrylate/methacrylic acid/ethyl acrylate copolymer (weight ratio = 40/40/204 weight average molecular weight 45,000)
200 parts by weight (2)) Dimethylolpropane triacrylate - 840 parts by weight (3) Tetraethylene glycol diacrylate 40f
fi parts (4) 2,4-diethylthioxanthone 4 parts by weight (5) p-dimethyl Anzuki, ethyl fragrant 4 parts by weight (8
) A photosensitive agent was prepared from 60 parts by weight of methyl ethyl ketone, and a pattern was formed on a transfer film in the same manner as in Example 1, and the same results as in Example 1 were obtained. The average film thickness of the photosensitive layer was 5 gm, and the exposure amount was 30 zJ/crn'.
次に実施例5と仝〈回じ方法で感光層を除去した後、実
施例6と同様にして接着剤を塗70し、乾燥した後、白
紙に圧着したところ、パターンは白紙上に転写されたい
た。Next, after removing the photosensitive layer using the circular method as in Example 5, adhesive was applied 70 in the same manner as in Example 6, and after drying, it was pressed onto white paper, and the pattern was transferred onto the white paper. I wanted it.
発明の効果
本発明によれば、支持体上にアルコール可、容性インキ
によるデザインバクーンを形成する工程において、感光
層を現像する工程と3露出したアルコール可溶性・イン
キを除去する工程を同時に行なうことができるため、従
来よりも容易に 短時間でパターンを形成することがで
きる。Effects of the Invention According to the present invention, in the step of forming a design bag using an alcohol-soluble ink on a support, the step of developing the photosensitive layer and the step of removing the exposed alcohol-soluble ink are performed simultaneously. As a result, patterns can be formed more easily and in a shorter time than before.
Claims (1)
感光性樹脂層を設けてなるパターン形成用感光性樹脂板
において、感光性樹脂層を形成する感光性樹脂材料が、 (a)メタクリル酸エステルとカルボキシル基含有不飽
和単量体とを必須の単量体成分として含み、必要に応じ
てこれらの単量体と共重合可能な少なくとも1種の不飽
和ビニル化合物を少量成分として含む単量体混合物を共
重合して得られるアクリル系共重合体を主成分とする樹
脂と、 (b)分子中に少なくとも1個のエチレン性不飽和基を
有する架橋性単量体と、 (c)光重合開始剤 を必須成分として成ることを特徴とするパターン形成用
感光性樹脂板。[Scope of Claims] In a pattern-forming photosensitive resin plate in which an alcohol-soluble ink layer is provided on a support and a photosensitive resin layer is provided thereon, the photosensitive resin material forming the photosensitive resin layer is (a) Contains a methacrylic acid ester and a carboxyl group-containing unsaturated monomer as essential monomer components, and optionally contains a small amount of at least one unsaturated vinyl compound copolymerizable with these monomers. (b) a resin whose main component is an acrylic copolymer obtained by copolymerizing a monomer mixture contained as a component; (b) a crosslinkable monomer having at least one ethylenically unsaturated group in the molecule; (c) A photosensitive resin plate for pattern formation, comprising a photopolymerization initiator as an essential component.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15177186A JPS638735A (en) | 1986-06-30 | 1986-06-30 | Photosensitive resin plate for pattern formation |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15177186A JPS638735A (en) | 1986-06-30 | 1986-06-30 | Photosensitive resin plate for pattern formation |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS638735A true JPS638735A (en) | 1988-01-14 |
Family
ID=15525934
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15177186A Pending JPS638735A (en) | 1986-06-30 | 1986-06-30 | Photosensitive resin plate for pattern formation |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS638735A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20110262675A1 (en) * | 2006-08-31 | 2011-10-27 | Bridgestone Corporation | Photo-curable transfer sheet, process for the preparation of optical information recording medium using the sheet, and optical information recording medium |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5114042A (en) * | 1974-07-25 | 1976-02-04 | Mitsui Shipbuilding Eng | TAMOKUTE KISHIKEN SUISO |
JPS55127552A (en) * | 1979-03-26 | 1980-10-02 | Daicel Chem Ind Ltd | Photosensitive laminate |
JPS581142A (en) * | 1981-06-25 | 1983-01-06 | Hitachi Chem Co Ltd | Photosensitive resin composition and photosensitive resin composition laminate |
JPS60159743A (en) * | 1984-01-30 | 1985-08-21 | Fuji Photo Film Co Ltd | Photopolymerizable composition |
JPS60208748A (en) * | 1984-04-02 | 1985-10-21 | Hitachi Chem Co Ltd | Photosensitive resin composition and laminate using it |
JPS61134756A (en) * | 1974-10-04 | 1986-06-21 | ダイナケム コ−ポレ−シヨン | Making of photoresist |
-
1986
- 1986-06-30 JP JP15177186A patent/JPS638735A/en active Pending
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5114042A (en) * | 1974-07-25 | 1976-02-04 | Mitsui Shipbuilding Eng | TAMOKUTE KISHIKEN SUISO |
JPS61134756A (en) * | 1974-10-04 | 1986-06-21 | ダイナケム コ−ポレ−シヨン | Making of photoresist |
JPS55127552A (en) * | 1979-03-26 | 1980-10-02 | Daicel Chem Ind Ltd | Photosensitive laminate |
JPS581142A (en) * | 1981-06-25 | 1983-01-06 | Hitachi Chem Co Ltd | Photosensitive resin composition and photosensitive resin composition laminate |
JPS60159743A (en) * | 1984-01-30 | 1985-08-21 | Fuji Photo Film Co Ltd | Photopolymerizable composition |
JPS60208748A (en) * | 1984-04-02 | 1985-10-21 | Hitachi Chem Co Ltd | Photosensitive resin composition and laminate using it |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20110262675A1 (en) * | 2006-08-31 | 2011-10-27 | Bridgestone Corporation | Photo-curable transfer sheet, process for the preparation of optical information recording medium using the sheet, and optical information recording medium |
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