SE7600431L - PHOTORESIST POLYMER FOR TREATMENT IN WATER SOLUTIONS - Google Patents

PHOTORESIST POLYMER FOR TREATMENT IN WATER SOLUTIONS

Info

Publication number
SE7600431L
SE7600431L SE7600431A SE7600431A SE7600431L SE 7600431 L SE7600431 L SE 7600431L SE 7600431 A SE7600431 A SE 7600431A SE 7600431 A SE7600431 A SE 7600431A SE 7600431 L SE7600431 L SE 7600431L
Authority
SE
Sweden
Prior art keywords
parts
copolymer
alkyl
weight
photopolymerizable compositions
Prior art date
Application number
SE7600431A
Other languages
Unknown language ( )
Swedish (sv)
Inventor
M A Lipson
E Zador
Original Assignee
Dynachem Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to ZA00757984A priority Critical patent/ZA757984B/en
Application filed by Dynachem Corp filed Critical Dynachem Corp
Priority to SE7600431A priority patent/SE7600431L/en
Priority to DE2602410A priority patent/DE2602410C2/en
Priority to FR7602048A priority patent/FR2339185B1/en
Priority to NL7600794.A priority patent/NL160004C/en
Priority to GB3624/76A priority patent/GB1521372A/en
Priority to BE163988A priority patent/BE838135A/en
Priority to JP994776A priority patent/JPS5294388A/en
Priority to DD191055A priority patent/DD125491A5/xx
Priority to BR7601434A priority patent/BR7601434A/en
Publication of SE7600431L publication Critical patent/SE7600431L/en
Priority to JP59257283A priority patent/JPS61134756A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F257/00—Macromolecular compounds obtained by polymerising monomers on to polymers of aromatic monomers as defined in group C08F12/00
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F265/00—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
    • C08F265/04—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00 on to polymers of esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
    • C08F291/18—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

1521372 Photopolymerizable compositions DYNACHEM CORP 29 Jan 1976 3624/76 Heading C3V Photopolymerizable compositions useful for producing aqueous processed photo resists for making printed circuits, screen stencils or printing plates comprise 10-60 parts by weight of an ethylenically unsaturated monomer, 1-10 parts of a photoinitiator, and 40-90 parts of a binder which is a copolymer of (i) 40-60% by weight of a compound of the formula where R is H, C1-6 alkyl or halogen and the benzene ring may be substituted by one or more nitro, alkoxy, acyl, carboxyl, sulpho, hydroxyl or halogen substituents, (ii) 15-45% of one or more alkyl or hydroxyalkyl (meth)- acrylates having up to 12 C atoms in the alkyl moiety, and (iii) 15-40% of an unsaturated carboxylic acid or anhydride (including partial esters of polycarboxylic acids), the proportions of monomer and copolymer totalling 100 parts and the copolymer being soluble in dilute aqueous alkali.
SE7600431A 1974-10-04 1976-01-16 PHOTORESIST POLYMER FOR TREATMENT IN WATER SOLUTIONS SE7600431L (en)

Priority Applications (11)

Application Number Priority Date Filing Date Title
ZA00757984A ZA757984B (en) 1974-10-04 1975-12-23 Polymers for aqueous processed photoresists
SE7600431A SE7600431L (en) 1974-10-04 1976-01-16 PHOTORESIST POLYMER FOR TREATMENT IN WATER SOLUTIONS
DE2602410A DE2602410C2 (en) 1974-10-04 1976-01-23 Photopolymerizable material
FR7602048A FR2339185B1 (en) 1974-10-04 1976-01-26 PHOTORESISTANT COMPOSITION
NL7600794.A NL160004C (en) 1974-10-04 1976-01-27 DRY FILM PHOTORESIST.
GB3624/76A GB1521372A (en) 1974-10-04 1976-01-29 Photopolymerisable compositions for aqueous processed photoresists
BE163988A BE838135A (en) 1974-10-04 1976-01-30 POLYMERS FOR PHOTOGRAPHIC MASKS DEVELOPED IN AQUEOUS MEDIUM
JP994776A JPS5294388A (en) 1974-10-04 1976-01-31 Photopolymerizable composition and preparation thereof
DD191055A DD125491A5 (en) 1974-10-04 1976-02-02
BR7601434A BR7601434A (en) 1974-10-04 1976-03-10 PHOTOPOLIMERIZABLE COMPOSITION, LAMINATE, PROCESS TO PREPARE A PHOTOPROTECTOR AND PRODUCT OBTAINED BY EXPOSURE OF PHOTOPOLIMERIZABLE COMPOSITION TO ACTINIC LIGHT
JP59257283A JPS61134756A (en) 1974-10-04 1984-12-05 Making of photoresist

Applications Claiming Priority (12)

Application Number Priority Date Filing Date Title
US51192974A 1974-10-04 1974-10-04
ZA00757984A ZA757984B (en) 1974-10-04 1975-12-23 Polymers for aqueous processed photoresists
SE7600431A SE7600431L (en) 1974-10-04 1976-01-16 PHOTORESIST POLYMER FOR TREATMENT IN WATER SOLUTIONS
DE2602410A DE2602410C2 (en) 1974-10-04 1976-01-23 Photopolymerizable material
FR7602048A FR2339185B1 (en) 1974-10-04 1976-01-26 PHOTORESISTANT COMPOSITION
NL7600794.A NL160004C (en) 1974-10-04 1976-01-27 DRY FILM PHOTORESIST.
GB3624/76A GB1521372A (en) 1974-10-04 1976-01-29 Photopolymerisable compositions for aqueous processed photoresists
BE163988A BE838135A (en) 1974-10-04 1976-01-30 POLYMERS FOR PHOTOGRAPHIC MASKS DEVELOPED IN AQUEOUS MEDIUM
JP994776A JPS5294388A (en) 1974-10-04 1976-01-31 Photopolymerizable composition and preparation thereof
DD191055A DD125491A5 (en) 1974-10-04 1976-02-02
BR7601434A BR7601434A (en) 1974-10-04 1976-03-10 PHOTOPOLIMERIZABLE COMPOSITION, LAMINATE, PROCESS TO PREPARE A PHOTOPROTECTOR AND PRODUCT OBTAINED BY EXPOSURE OF PHOTOPOLIMERIZABLE COMPOSITION TO ACTINIC LIGHT
JP59257283A JPS61134756A (en) 1974-10-04 1984-12-05 Making of photoresist

Publications (1)

Publication Number Publication Date
SE7600431L true SE7600431L (en) 1977-07-17

Family

ID=27582848

Family Applications (1)

Application Number Title Priority Date Filing Date
SE7600431A SE7600431L (en) 1974-10-04 1976-01-16 PHOTORESIST POLYMER FOR TREATMENT IN WATER SOLUTIONS

Country Status (10)

Country Link
JP (2) JPS5294388A (en)
BE (1) BE838135A (en)
BR (1) BR7601434A (en)
DD (1) DD125491A5 (en)
DE (1) DE2602410C2 (en)
FR (1) FR2339185B1 (en)
GB (1) GB1521372A (en)
NL (1) NL160004C (en)
SE (1) SE7600431L (en)
ZA (1) ZA757984B (en)

Families Citing this family (142)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4208211A (en) * 1978-05-23 1980-06-17 Bell Telephone Laboratories, Incorporated Fabrication based on radiation sensitive resists and related products
DE3120052A1 (en) * 1981-05-20 1982-12-09 Hoechst Ag, 6000 Frankfurt POLYMERIZABLE MIXTURE BY RADIATION AND COPYING MATERIAL MADE THEREOF
DE3367683D1 (en) * 1982-06-21 1987-01-02 Hoechst Ag Photopolymerizable mixture and photopolymerizable copying material produced therewith
DE3223104A1 (en) * 1982-06-21 1983-12-22 Hoechst Ag, 6230 Frankfurt PHOTOPOLYMERIZABLE MIXTURE AND PHOTOPOLYMERIZABLE COPY MATERIAL MADE THEREOF
US4539286A (en) * 1983-06-06 1985-09-03 Dynachem Corporation Flexible, fast processing, photopolymerizable composition
DD250593A1 (en) * 1984-04-03 1987-10-14 Wolfen Filmfab Veb PHOTOPOLYMERIZABLE MATERIAL
JPH0642073B2 (en) * 1984-04-10 1994-06-01 三菱レイヨン株式会社 Photopolymerizable resin composition
JPS638735A (en) * 1986-06-30 1988-01-14 Tokyo Ohka Kogyo Co Ltd Photosensitive resin plate for pattern formation
JPH0820735B2 (en) * 1987-08-26 1996-03-04 日立化成工業株式会社 Photosensitive resin composition
JPS6456442A (en) * 1987-08-27 1989-03-03 Okamoto Kagaku Kogyo Kk Production of printing plate
DE3805706A1 (en) * 1988-02-24 1989-09-07 Hoechst Ag RADIATION POLYMERIZABLE MIXTURE AND RECORDING MATERIAL MANUFACTURED THEREFROM
JP2697738B2 (en) * 1988-02-26 1998-01-14 マックダーミッド イメージング テクノロジー，インコーポレイテッド Photopolymerizable composition
JP2826330B2 (en) * 1988-12-15 1998-11-18 ダイセル化学工業株式会社 Photopolymerizable composition
JP2856746B2 (en) * 1988-12-15 1999-02-10 ダイセル化学工業株式会社 Photopolymerizable composition
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DE3931467A1 (en) * 1989-09-21 1991-04-04 Hoechst Ag POLYMERIZABLE MIXTURE BY RADIATION AND METHOD FOR PRODUCING A SOLDER STOP MASK
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JPWO2022065183A1 (en) 2020-09-24 2022-03-31

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3440047A (en) * 1964-08-10 1969-04-22 Gen Aniline & Film Corp Photopolymer offset printing plates of the etch type
US3796578A (en) * 1970-12-26 1974-03-12 Asahi Chemical Ind Photopolymerizable compositions and elements containing addition polymerizable polymeric compounds
US3887450A (en) * 1971-02-04 1975-06-03 Dynachem Corp Photopolymerizable compositions containing polymeric binding agents
ZA72345B (en) * 1971-02-04 1973-03-28 Dynachem Corp Polymerization compositions and processes
DE2363806B2 (en) * 1973-12-21 1979-05-17 Hoechst Ag, 6000 Frankfurt Photosensitive mixture
JPS5425957A (en) * 1977-07-29 1979-02-27 Nippon Zeon Co Ltd Curable rubber composition having excellent resistance to rancid gasoline

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FR2339185A1 (en) 1977-08-19
NL160004C (en) 1979-09-17
JPS5294388A (en) 1977-08-08
JPS5425957B2 (en) 1979-08-31
NL7600794A (en) 1977-07-29
NL160004B (en) 1979-04-17
GB1521372A (en) 1978-08-16
DE2602410C2 (en) 1985-11-21
DE2602410A1 (en) 1977-07-28
DD125491A5 (en) 1977-04-20
JPS61134756A (en) 1986-06-21
JPH0359416B2 (en) 1991-09-10
BR7601434A (en) 1977-09-06
FR2339185B1 (en) 1980-03-14
BE838135A (en) 1976-05-14
ZA757984B (en) 1976-12-29

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