BR7601434A - PHOTOPOLIMERIZABLE COMPOSITION, LAMINATE, PROCESS TO PREPARE A PHOTOPROTECTOR AND PRODUCT OBTAINED BY EXPOSURE OF PHOTOPOLIMERIZABLE COMPOSITION TO ACTINIC LIGHT - Google Patents

PHOTOPOLIMERIZABLE COMPOSITION, LAMINATE, PROCESS TO PREPARE A PHOTOPROTECTOR AND PRODUCT OBTAINED BY EXPOSURE OF PHOTOPOLIMERIZABLE COMPOSITION TO ACTINIC LIGHT

Info

Publication number
BR7601434A
BR7601434A BR7601434A BR7601434A BR7601434A BR 7601434 A BR7601434 A BR 7601434A BR 7601434 A BR7601434 A BR 7601434A BR 7601434 A BR7601434 A BR 7601434A BR 7601434 A BR7601434 A BR 7601434A
Authority
BR
Brazil
Prior art keywords
photopolimerizable
composition
photoprotector
laminate
exposure
Prior art date
Application number
BR7601434A
Other languages
Portuguese (pt)
Inventor
M Lipson
E Zador
Original Assignee
Dynachem Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to ZA00757984A priority Critical patent/ZA757984B/en
Priority to SE7600431A priority patent/SE7600431L/en
Priority to DE2602410A priority patent/DE2602410C2/en
Priority to FR7602048A priority patent/FR2339185B1/en
Priority to NL7600794.A priority patent/NL160004C/en
Priority to GB3624/76A priority patent/GB1521372A/en
Priority to BE163988A priority patent/BE838135A/en
Priority to JP994776A priority patent/JPS5294388A/en
Priority to DD191055A priority patent/DD125491A5/xx
Application filed by Dynachem Corp filed Critical Dynachem Corp
Priority to BR7601434A priority patent/BR7601434A/en
Publication of BR7601434A publication Critical patent/BR7601434A/en
Priority to JP59257283A priority patent/JPS61134756A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F257/00—Macromolecular compounds obtained by polymerising monomers on to polymers of aromatic monomers as defined in group C08F12/00
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F265/00—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
    • C08F265/04—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00 on to polymers of esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
    • C08F291/18—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
BR7601434A 1974-10-04 1976-03-10 PHOTOPOLIMERIZABLE COMPOSITION, LAMINATE, PROCESS TO PREPARE A PHOTOPROTECTOR AND PRODUCT OBTAINED BY EXPOSURE OF PHOTOPOLIMERIZABLE COMPOSITION TO ACTINIC LIGHT BR7601434A (en)

Priority Applications (11)

Application Number Priority Date Filing Date Title
ZA00757984A ZA757984B (en) 1974-10-04 1975-12-23 Polymers for aqueous processed photoresists
SE7600431A SE7600431L (en) 1974-10-04 1976-01-16 PHOTORESIST POLYMER FOR TREATMENT IN WATER SOLUTIONS
DE2602410A DE2602410C2 (en) 1974-10-04 1976-01-23 Photopolymerizable material
FR7602048A FR2339185B1 (en) 1974-10-04 1976-01-26 PHOTORESISTANT COMPOSITION
NL7600794.A NL160004C (en) 1974-10-04 1976-01-27 DRY FILM PHOTORESIST.
GB3624/76A GB1521372A (en) 1974-10-04 1976-01-29 Photopolymerisable compositions for aqueous processed photoresists
BE163988A BE838135A (en) 1974-10-04 1976-01-30 POLYMERS FOR PHOTOGRAPHIC MASKS DEVELOPED IN AQUEOUS MEDIUM
JP994776A JPS5294388A (en) 1974-10-04 1976-01-31 Photopolymerizable composition and preparation thereof
DD191055A DD125491A5 (en) 1974-10-04 1976-02-02
BR7601434A BR7601434A (en) 1974-10-04 1976-03-10 PHOTOPOLIMERIZABLE COMPOSITION, LAMINATE, PROCESS TO PREPARE A PHOTOPROTECTOR AND PRODUCT OBTAINED BY EXPOSURE OF PHOTOPOLIMERIZABLE COMPOSITION TO ACTINIC LIGHT
JP59257283A JPS61134756A (en) 1974-10-04 1984-12-05 Making of photoresist

Applications Claiming Priority (12)

Application Number Priority Date Filing Date Title
US51192974A 1974-10-04 1974-10-04
ZA00757984A ZA757984B (en) 1974-10-04 1975-12-23 Polymers for aqueous processed photoresists
SE7600431A SE7600431L (en) 1974-10-04 1976-01-16 PHOTORESIST POLYMER FOR TREATMENT IN WATER SOLUTIONS
DE2602410A DE2602410C2 (en) 1974-10-04 1976-01-23 Photopolymerizable material
FR7602048A FR2339185B1 (en) 1974-10-04 1976-01-26 PHOTORESISTANT COMPOSITION
NL7600794.A NL160004C (en) 1974-10-04 1976-01-27 DRY FILM PHOTORESIST.
GB3624/76A GB1521372A (en) 1974-10-04 1976-01-29 Photopolymerisable compositions for aqueous processed photoresists
BE163988A BE838135A (en) 1974-10-04 1976-01-30 POLYMERS FOR PHOTOGRAPHIC MASKS DEVELOPED IN AQUEOUS MEDIUM
JP994776A JPS5294388A (en) 1974-10-04 1976-01-31 Photopolymerizable composition and preparation thereof
DD191055A DD125491A5 (en) 1974-10-04 1976-02-02
BR7601434A BR7601434A (en) 1974-10-04 1976-03-10 PHOTOPOLIMERIZABLE COMPOSITION, LAMINATE, PROCESS TO PREPARE A PHOTOPROTECTOR AND PRODUCT OBTAINED BY EXPOSURE OF PHOTOPOLIMERIZABLE COMPOSITION TO ACTINIC LIGHT
JP59257283A JPS61134756A (en) 1974-10-04 1984-12-05 Making of photoresist

Publications (1)

Publication Number Publication Date
BR7601434A true BR7601434A (en) 1977-09-06

Family

ID=27582848

Family Applications (1)

Application Number Title Priority Date Filing Date
BR7601434A BR7601434A (en) 1974-10-04 1976-03-10 PHOTOPOLIMERIZABLE COMPOSITION, LAMINATE, PROCESS TO PREPARE A PHOTOPROTECTOR AND PRODUCT OBTAINED BY EXPOSURE OF PHOTOPOLIMERIZABLE COMPOSITION TO ACTINIC LIGHT

Country Status (10)

Country Link
JP (2) JPS5294388A (en)
BE (1) BE838135A (en)
BR (1) BR7601434A (en)
DD (1) DD125491A5 (en)
DE (1) DE2602410C2 (en)
FR (1) FR2339185B1 (en)
GB (1) GB1521372A (en)
NL (1) NL160004C (en)
SE (1) SE7600431L (en)
ZA (1) ZA757984B (en)

Families Citing this family (142)

* Cited by examiner, † Cited by third party
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DE3367683D1 (en) * 1982-06-21 1987-01-02 Hoechst Ag Photopolymerizable mixture and photopolymerizable copying material produced therewith
DE3223104A1 (en) * 1982-06-21 1983-12-22 Hoechst Ag, 6230 Frankfurt PHOTOPOLYMERIZABLE MIXTURE AND PHOTOPOLYMERIZABLE COPY MATERIAL MADE THEREOF
US4539286A (en) * 1983-06-06 1985-09-03 Dynachem Corporation Flexible, fast processing, photopolymerizable composition
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FR2339185A1 (en) 1977-08-19
NL160004C (en) 1979-09-17
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JPS5425957B2 (en) 1979-08-31
SE7600431L (en) 1977-07-17
NL7600794A (en) 1977-07-29
NL160004B (en) 1979-04-17
GB1521372A (en) 1978-08-16
DE2602410C2 (en) 1985-11-21
DE2602410A1 (en) 1977-07-28
DD125491A5 (en) 1977-04-20
JPS61134756A (en) 1986-06-21
JPH0359416B2 (en) 1991-09-10
FR2339185B1 (en) 1980-03-14
BE838135A (en) 1976-05-14
ZA757984B (en) 1976-12-29

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