JPH11214293A - 投影光学系及び該光学系を備えた露光装置並びにデバイス製造方法 - Google Patents

投影光学系及び該光学系を備えた露光装置並びにデバイス製造方法

Info

Publication number
JPH11214293A
JPH11214293A JP10024043A JP2404398A JPH11214293A JP H11214293 A JPH11214293 A JP H11214293A JP 10024043 A JP10024043 A JP 10024043A JP 2404398 A JP2404398 A JP 2404398A JP H11214293 A JPH11214293 A JP H11214293A
Authority
JP
Japan
Prior art keywords
lens group
optical system
refractive power
aspherical surface
projection optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP10024043A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11214293A5 (enExample
Inventor
Koji Shigematsu
幸二 重松
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP10024043A priority Critical patent/JPH11214293A/ja
Priority to DE19902336A priority patent/DE19902336A1/de
Priority to US09/234,969 priority patent/US6259508B1/en
Publication of JPH11214293A publication Critical patent/JPH11214293A/ja
Priority to US09/722,506 priority patent/US6700645B1/en
Publication of JPH11214293A5 publication Critical patent/JPH11214293A5/ja
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/7025—Size or form of projection system aperture, e.g. aperture stops, diaphragms or pupil obscuration; Control thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP10024043A 1998-01-22 1998-01-22 投影光学系及び該光学系を備えた露光装置並びにデバイス製造方法 Withdrawn JPH11214293A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP10024043A JPH11214293A (ja) 1998-01-22 1998-01-22 投影光学系及び該光学系を備えた露光装置並びにデバイス製造方法
DE19902336A DE19902336A1 (de) 1998-01-22 1999-01-21 Optisches Projektionssystem und dieses verwendende Belichtungsvorrichtung und Belichtungsverfahren
US09/234,969 US6259508B1 (en) 1998-01-22 1999-01-21 Projection optical system and exposure apparatus and method
US09/722,506 US6700645B1 (en) 1998-01-22 2000-11-28 Projection optical system and exposure apparatus and method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10024043A JPH11214293A (ja) 1998-01-22 1998-01-22 投影光学系及び該光学系を備えた露光装置並びにデバイス製造方法

Publications (2)

Publication Number Publication Date
JPH11214293A true JPH11214293A (ja) 1999-08-06
JPH11214293A5 JPH11214293A5 (enExample) 2005-09-15

Family

ID=12127467

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10024043A Withdrawn JPH11214293A (ja) 1998-01-22 1998-01-22 投影光学系及び該光学系を備えた露光装置並びにデバイス製造方法

Country Status (3)

Country Link
US (1) US6259508B1 (enExample)
JP (1) JPH11214293A (enExample)
DE (1) DE19902336A1 (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000171706A (ja) * 1998-11-30 2000-06-23 Carl Zeiss:Fa マイクロリソグラフィ用縮小対物レンズ，投影露光装置及び投影露光方法
JP2001201682A (ja) * 1999-12-21 2001-07-27 Carl Zeiss:Fa 光学投影システム
US6791761B2 (en) 1999-10-21 2004-09-14 Zeiss Smt Ag Optical projection lens system
US7339743B2 (en) 2002-03-01 2008-03-04 Carl Zeiss Smt Ag Very-high aperture projection objective

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USRE42570E1 (en) * 1996-09-26 2011-07-26 Carl Zeiss Smt Gmbh Catadioptric objective
JPH1195095A (ja) 1997-09-22 1999-04-09 Nikon Corp 投影光学系
DE19942281A1 (de) * 1999-05-14 2000-11-16 Zeiss Carl Fa Projektionsobjektiv
US6600550B1 (en) * 1999-06-03 2003-07-29 Nikon Corporation Exposure apparatus, a photolithography method, and a device manufactured by the same
JP3359302B2 (ja) * 1999-06-14 2002-12-24 キヤノン株式会社 投影露光装置
WO2001023933A1 (en) * 1999-09-29 2001-04-05 Nikon Corporation Projection optical system
KR100866818B1 (ko) * 2000-12-11 2008-11-04 가부시키가이샤 니콘 투영광학계 및 이 투영광학계를 구비한 노광장치
DE10064685A1 (de) * 2000-12-22 2002-07-04 Zeiss Carl Lithographieobjektiv mit einer ersten Linsengruppe, bestehend ausschließlich aus Linsen positiver Brechkraft
JP2002244034A (ja) 2001-02-21 2002-08-28 Nikon Corp 投影光学系および該投影光学系を備えた露光装置
JP2002323652A (ja) * 2001-02-23 2002-11-08 Nikon Corp 投影光学系，該投影光学系を備えた投影露光装置および投影露光方法
US6683710B2 (en) * 2001-06-01 2004-01-27 Optical Research Associates Correction of birefringence in cubic crystalline optical systems
JP3708845B2 (ja) * 2001-06-19 2005-10-19 株式会社ミツトヨ 両テレセントリック対物レンズ
US6844972B2 (en) * 2001-10-30 2005-01-18 Mcguire, Jr. James P. Reducing aberration in optical systems comprising cubic crystalline optical elements
US6970232B2 (en) * 2001-10-30 2005-11-29 Asml Netherlands B.V. Structures and methods for reducing aberration in integrated circuit fabrication systems
US6995908B2 (en) * 2001-10-30 2006-02-07 Asml Netherlands B.V. Methods for reducing aberration in optical systems
US7453641B2 (en) * 2001-10-30 2008-11-18 Asml Netherlands B.V. Structures and methods for reducing aberration in optical systems
US7813634B2 (en) 2005-02-28 2010-10-12 Tessera MEMS Technologies, Inc. Autofocus camera
JP4157305B2 (ja) * 2002-02-13 2008-10-01 株式会社ミツトヨ テレセントリックレンズ系および画像測定装置
DE10212343A1 (de) * 2002-03-15 2003-10-09 Traub Drehmaschinen Gmbh Schlittensystem
DE10221386A1 (de) * 2002-05-14 2003-11-27 Zeiss Carl Smt Ag Projektionsbelichtungssystem
US6958864B2 (en) * 2002-08-22 2005-10-25 Asml Netherlands B.V. Structures and methods for reducing polarization aberration in integrated circuit fabrication systems
US7301712B2 (en) * 2003-01-09 2007-11-27 Olympus Corporation Image-formation optical system, and imaging system incorporating the same
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US7068446B2 (en) * 2003-05-05 2006-06-27 Illumitech Inc. Compact non-imaging light collector
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US6906866B2 (en) 2003-10-15 2005-06-14 Carl Zeiss Smt Ag Compact 1½-waist system for sub 100 nm ArF lithography
US20080151365A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
IL159977A0 (en) * 2004-01-21 2004-09-27 Odf Optronics Ltd Ommi directional lens
KR101391470B1 (ko) 2004-05-17 2014-05-07 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
JP4700953B2 (ja) * 2004-11-17 2011-06-15 日東光学株式会社 投写用ズームレンズおよびプロジェクタ装置
US7403344B2 (en) * 2005-02-28 2008-07-22 Siimpel Corporation Lens Assembly
JP4687194B2 (ja) * 2005-03-30 2011-05-25 株式会社ニコン ズームレンズ
JP4747645B2 (ja) * 2005-04-11 2011-08-17 コニカミノルタオプト株式会社 広角レンズ、及び、撮像装置
TWI269061B (en) * 2005-11-24 2006-12-21 Young Optics Inc Zoom lens
TWM296983U (en) * 2005-12-28 2006-09-01 Genius Electronic Optical Co Ltd Imaging lens set
JP2007219316A (ja) * 2006-02-17 2007-08-30 Nikon Corp ズームレンズとこれを具備する光学装置
US7515352B2 (en) * 2006-02-17 2009-04-07 Nikon Corporation Zoom lens system and optical device using thereof
JP4908887B2 (ja) * 2006-03-23 2012-04-04 キヤノン株式会社 フィッシュアイアタッチメント
JP2008122900A (ja) * 2006-03-30 2008-05-29 Fujinon Corp 撮像レンズ
TWI299408B (en) * 2006-08-31 2008-08-01 Asia Optical Co Inc Zoom lens system
JP2008129238A (ja) * 2006-11-20 2008-06-05 Olympus Imaging Corp ズームレンズ及びそれを用いた撮像装置
KR100882621B1 (ko) * 2006-11-22 2009-02-06 엘지이노텍 주식회사 줌 렌즈
JP2008145967A (ja) * 2006-12-13 2008-06-26 Sony Corp ズームレンズ及び撮像装置
JP5037963B2 (ja) * 2007-02-09 2012-10-03 富士フイルム株式会社 撮像レンズ
JP4931136B2 (ja) * 2007-05-22 2012-05-16 オリンパスイメージング株式会社 ズームレンズ
TWI351530B (en) * 2007-07-05 2011-11-01 Largan Precision Co Ltd Inverse telephoto with correction lenses
KR20090033754A (ko) * 2007-10-01 2009-04-06 삼성테크윈 주식회사 광각 줌 광학계
CN101430417B (zh) * 2007-11-05 2010-04-07 鸿富锦精密工业（深圳）有限公司 广角镜头及成像装置
US7917671B2 (en) * 2007-12-18 2011-03-29 Nvidia Corporation Scalable port controller architecture supporting data streams of different speeds
TWI395992B (zh) * 2008-07-25 2013-05-11 Largan Precision Co 四片式攝影光學鏡組
CN101819316B (zh) * 2009-02-27 2011-11-09 富士迈半导体精密工业（上海）有限公司 变焦镜头
KR101586025B1 (ko) 2009-08-11 2016-01-15 엘지이노텍 주식회사 촬상 렌즈
JP2011237588A (ja) * 2010-05-10 2011-11-24 Sony Corp ズームレンズ及び撮像装置
JP2011252962A (ja) * 2010-05-31 2011-12-15 Olympus Imaging Corp 結像光学系及びそれを備えた撮像装置
TWI497146B (zh) * 2013-12-27 2015-08-21 Ability Opto Electronics Technology Co Ltd 七片式光學影像擷取鏡頭與七片式光學影像擷取模組

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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000171706A (ja) * 1998-11-30 2000-06-23 Carl Zeiss:Fa マイクロリソグラフィ用縮小対物レンズ，投影露光装置及び投影露光方法
US6791761B2 (en) 1999-10-21 2004-09-14 Zeiss Smt Ag Optical projection lens system
US6930837B2 (en) 1999-10-21 2005-08-16 Carl Zeiss Smt Ag Optical projection lens system
US7450312B2 (en) 1999-10-21 2008-11-11 Carl Zeiss Smt Ag Optical projection lens system
JP2001201682A (ja) * 1999-12-21 2001-07-27 Carl Zeiss:Fa 光学投影システム
US7339743B2 (en) 2002-03-01 2008-03-04 Carl Zeiss Smt Ag Very-high aperture projection objective

Also Published As

Publication number Publication date
DE19902336A1 (de) 1999-07-29
US6259508B1 (en) 2001-07-10

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