JPH06216034A - 化学蒸着装置用蒸気発生器 - Google Patents

化学蒸着装置用蒸気発生器

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Publication number
JPH06216034A
JPH06216034A JP5329619A JP32961993A JPH06216034A JP H06216034 A JPH06216034 A JP H06216034A JP 5329619 A JP5329619 A JP 5329619A JP 32961993 A JP32961993 A JP 32961993A JP H06216034 A JPH06216034 A JP H06216034A
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Japan
Prior art keywords
generator
vapor
temperature
wall
hole
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JP5329619A
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JPH0789544B2 (ja
Inventor
Daniele Bertone
ダニエレ・ベルトーネ
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Telecom Italia SpA
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CSELT Centro Studi e Laboratori Telecomunicazioni SpA
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Publication of JPH06216034A publication Critical patent/JPH06216034A/ja
Publication of JPH0789544B2 publication Critical patent/JPH0789544B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • C23C16/4482—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material by bubbling of carrier gas through liquid source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material

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  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Chemical Vapour Deposition (AREA)
  • Investigating Or Analyzing Non-Biological Materials By The Use Of Chemical Means (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

(57)【要約】 【目的】 液体又は固体の給源から金属有機化合物蒸気
の引き出しを可能にする化学蒸着装置用蒸気発生器を提
供する。 【構成】 本蒸気発生器は主として容器から成り、しか
してガスが該容器中に流入しそして試薬近くを通るとき
生成蒸気で飽和されそして該蒸気を反応室に移送する。
発生器のみが、多量の試薬で飽和された蒸気が得られる
ように室温より高い温度にもたらされる。蒸気を発生器
から反応室に移送するパイプ系中での蒸気の凝縮を避け
るため、加熱された発生器の本体中で直接に蒸気がキャ
リヤガスで希釈され、かくして不飽和になる該蒸気の凝
縮温度が下げられる。これを達成するために、該発生器
は、キャリヤガスが流入するようにした希釈用バイパス
管路が該容器の上方基部に設けられている。 【効果】 発生器から反応室に至るパイプ系は、凝縮の
危険を何ら伴うことなく室温に保持され得る。

Description

【発明の詳細な説明】
【０００１】
【産業上の利用分野】本発明は半導体デバイスの実現用
装置に関するものであり、特に化学蒸着系用の蒸気発生
器に関する。
【０００２】
【従来の技術】多くの電子デバイス、特に光ファイバー
伝送システムにおいて用いられる多くの光電デバイス例
えばレーザー、光検出器等は、種々の組成及び数分の１
ミクロンないし数ミクロン範囲の厚さを有する異なった
単結晶層からなる半導体材料の構造体から作られてい
る、ということは公知である。上記の個々の層は、出発
基板上に適当な化合物を付着させることにより得られ
る。この操作のために種々の方法が用いられ得、とりわ
けＭＯＣＶＤ（Metal-Organic Chemical Vapour Deposi
tion, 金属−有機化合物化学蒸着）と称される蒸気相試
薬からの付着法がやや広く用いられている。この方法に
よれば、金属及び非金属の可能な給源は、いくつかの金
属有機化合物及び純粋な元素例えば水銀である。
【０００３】これらの試薬の蒸気は付着中Ｈ2 、Ａｒの
ようなキャリヤガスの助成でもって反応器中に移送さ
れ、しかして該反応器は出発基板が収容されておりかつ
適当な温度に保たれている。ここで、それらの試薬は互
いに反応して所要の半導体材料を生じ、そして該半導体
材料は該基板上に付着する。異なる層を得るために或る
組成の試薬の流れが異なる組成の試薬の流れと置き換え
られ、同時に他の物理的条件のすべてが変化しないよう
に保たれるよう試みて制御されない組成の層の形成を避
ける。個々の層の組成は、反応器内で反応する蒸気の量
及びそれ故当該給源から引き出されそして反応器に導か
れる蒸気の量に依存する。蒸気の引き出しは、給源が液
体である場合はバブラーあるいは給源が固体である場合
は昇華装置と称される特別な発生器にて遂行される。引
き出し効率は種々の因子に左右され、しかして主な因子
は、給源が収容されている蒸気発生器に流れるキャリヤ
ガスの流量、給源それ自体が保たれている温度及び圧力
である。
【０００４】発生器から反応器に蒸気を移送する際に生
じる問題点の一つは、導管の内面上での蒸気の凝縮（特
に、導管が室温に保たれている場合）である。蒸気の所
要量が非常に多く、それ故発生器中の給源温度が室温よ
り低い温度値に保たれ得る場合は問題ない。実際、給源
蒸気で飽和されたキャリヤガスの混合物は発生器から出
て行きそしてより高い温度の導管中に導かれ、しかして
そこで加熱されそして不飽和になって凝縮の危険なしに
反応器中に導かれ得るようになる。
【０００５】より多量の蒸気が必要とされるかあるいは
試薬の蒸気圧が非常に低い場合、充分な量の蒸気を生じ
させるために必要な温度は室温より高くなければならな
い。この場合、蒸気発生器の出口において導管を加熱し
て少なくとも最初の希釈点まで容器の温度より高い温度
にすることにより、凝縮は避けられ得る。
【０００６】
【発明が解決しようとする課題】試薬の飽和混合物を不
活性ガスで希釈することにより、該混合物は不飽和にさ
れ、それ故その凝縮温度は低くなる。モートン・インタ
ーナショナル・カンパニーにより製造されているもの
（米国特許第４，５０６，８１５号）のような市販の発
生器を用いる場合、該混合物は通常、弁、パイプ、取付
部品等のような或る部品を含むシステムラインの区域を
流れた後容器の出口にて希釈される。該ラインのこの区
域には、凝縮並びにあまりにも高い温度における蒸気の
分解の両方を避けるために一定の制御された温度を確保
する加熱装置（加熱システム）が設けられねばならな
い。明らかに、このような装置はこの装置の建設段階中
著しい複雑性を伴う。
【０００７】
【作用・効果】本発明により提供される蒸気発生器はこ
れらの欠点を除去し、何故なら該蒸気発生器は、凝縮問
題を何ら伴うことなく直接その中でキャリヤガスと試薬
蒸気との混合物の希釈を可能にすることにより更なる加
熱装置（加熱システム）の使用が必要とされず、また液
体試薬用のバブラーとして及び固体試薬用の昇華装置と
して働き得る故である。
【０００８】
【課題を解決するための手段】本発明の対象は、請求項
１のいわゆる特徴部に記載されているような化学蒸着系
用の蒸気発生器である。
【０００９】
【実施例】本発明の上記及び他の特徴は、非制限的な例
としてかつ添付図面を参照して与えられている本発明の
好ましい具体例についての下記の記載により一層明らか
にされよう。
【００１０】図１に示された蒸気発生器は主に気密な円
筒状容器ＣＣから成り、その中に試薬の液体又は固体の
蒸気給源ＳＯが入れられる。該容器の上方基部には２つ
の穴ＩＮ及びＯＵが設けられており、これらの穴は一方
の側で該蒸気発生器の内部と連通しており、穴ＯＵはパ
イプ部材ＴＵとともにほとんど該容器の下方基部まで延
びており、該２つの穴は他方の側で２個の空気駆動弁Ｖ
２及びＶ１とそれぞれ連通している。弁Ｖ２は該上方基
部の基部体内に設けられたパイプ部材ＴＧと連結されて
おり、一方Ｖ１はこれも該上方基部内に設けられている
バイパス管路ＬＰに連結されている。これらの弁が働い
ていないとき該容器は密封され、そしてそれらが作動し
ているとき蒸気及びガスは穴ＩＮ及びＯＵを通じて入り
及び出て行く。図２においてバイパス管路ＬＰが一層良
好に見られ得、しかしてバイパス管路ＬＰにはそれぞれ
入口及び出口のユニオン継手ＲＩ及びＲＵが設けられて
いる。図３においてユニオン継手ＧＩが見られ得、しか
してユニオン継手ＧＩはパイプ部材ＴＧに連結されてい
る。
【００１１】該蒸気発生器の全体がサーモスタット制御
浴（図示せず）中に浸漬され、しかして該浴は該蒸気発
生器をその内部で所要蒸気圧を得るのに必要な温度に保
つ。操作中、弁Ｖ１及びＶ２は開いており、そのため乾
性キャリヤガスがユニオン継手ＧＩ、パイプ部材ＴＧ、
弁Ｖ２及び穴ＩＮを通って蒸気発生器中に入り、給源Ｓ
Ｏによって発せられた蒸気で飽和され、そしてパイプ部
材ＴＵ、穴ＯＵ、弁Ｖ１及びバイパス管路ＬＰを通って
出て行く。バイパス管路には、弁Ｖ１の状態とは無関係
にキャリヤガスが連続的に流される。この流れはユニオ
ン継手ＲＩを通じて入り、弁Ｖ１に達し、発生器の内部
から穴ＯＵを通って来る飽和ガスと混ざり合って不飽和
混合物を生じ、ユニオン継手ＲＵを通じて出て行って反
応器へ導かれる。バイパス管路ＬＰと穴ＯＵとの接合点
は、Ｖ１が開いているとき、試薬で飽和された混合物の
希釈点をなす。穴ＯＵ及び管路ＬＰから成る導管部材が
金属製の発生器壁それ自体中において作られているの
で、その温度はサーモスタット制御浴によって調節され
ている発生器の温度と同じであり、そのため試薬の凝縮
は起こり得ない。バイパス管路の後で当該混合物は顕著
に希釈され、それ故その凝縮温度はそれに応じて下がり
そして凝縮は起こり得ない。
【００１２】この凝縮温度を室温より低くするために
は、バイパス管路中のキャリヤガスの流量を、発生器と
（一般に室温に保たれる）管路との間の温度差に関連し
て適当な希釈率を達成し得る値に設定することで充分で
ある。蒸気給源は、例えば８８℃で溶融するトリメチル
インジウムであり得る。元素周期表の第III 族及び第Ｖ
族に属する半導体の付着に用いられ得るトリメチルイン
ジウムの所与量を引き出すために、該給源は通常蒸気発
生器内で３０〜４０℃の温度に保たれねばならない。２
０℃の室温に保たれているパイプ系中でのその凝縮は、
バイパス管路ＬＰ中の流量を、ユニオン継手ＧＩを通じ
て発生器中に導かれる乾燥ガスの流量の少なくとも４又
は５倍にすることにより避けられ得る。上記に述べられ
ていることは非制限的な例によって与えられていること
は明らかである。種々の変更態様が、特許請求の範囲か
ら逸脱することなく可能である。例えば、発生器は円筒
状形態とは異なる形態を有し得る。
【図面の簡単な説明】
【図１】蒸気発生器の第１の縦断面図である。
【図２】図１の縦断面に垂直な面で切断した、蒸気発生
器の第２の縦断面図である。
【図３】蒸気発生器の上面図である。
【符号の説明】
ＣＣ 円筒状容器 ＳＯ 給源 ＯＵ 穴 ＩＮ 穴 Ｖ１ 弁 Ｖ２ 弁 ＴＧ パイプ部材 ＬＰ バイパス管路 ＴＵ パイプ部材 ＲＩ ユニオン継手 ＲＵ ユニオン継手 ＧＩ ユニオン継手

Claims (3)

    【特許請求の範囲】
  1. 【請求項１】 液体又は固体の状態の試薬の給源から引
    き出された蒸気でキャリヤガスが飽和されそして反応室
    にもたらされる化学蒸着装置用蒸気発生器において、該
    蒸気発生器は主として気密容器（ＣＣ）から成り、該容
    器中に試薬の給源（ＳＯ）が入れられ得、該容器は第１
    及び第２の穴（ＯＵ，ＩＮ）を有する第１の壁を備え、
    第１及び第２の穴（ＯＵ，ＩＮ）は一方の側で該蒸気発
    生器の内部と連通しておりかつ他方の側でそれぞれ第１
    及び第２の空気作動弁（Ｖ１，Ｖ２）と連通しており、
    第２の弁（Ｖ２）は、該第１の壁の壁体内に設けられか
    つ外部の第１のユニオン継手（ＧＩ）にて終端している
    パイプ部材（ＴＧ）に連結されており、第１の弁（Ｖ
    １）は、該第１の壁の壁体内に設けられかつ第２の入口
    ユニオン継手及び第３の出口ユニオン継手（ＲＩ，Ｒ
    Ｕ）を備えたバイパス管路（ＬＰ）に連結されているこ
    とを特徴とする上記蒸気発生器。
  2. 【請求項２】 第１の穴（ＯＵ）がパイプ部材（ＴＵ）
    とともにほとんど該第１の壁の対向壁まで延びているこ
    とを特徴とする、請求項１記載の化学蒸着装置用蒸気発
    生器。
  3. 【請求項３】 蒸気発生器が円筒状形態を有し、かつ該
    第１の壁が上方基部と一致していることを特徴とする、
    請求項１記載の化学蒸着装置用蒸気発生器。
JP5329619A 1992-12-04 1993-12-02 化学蒸着装置用蒸気発生器 Expired - Fee Related JPH0789544B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
IT92A000981 1992-12-04
ITTO920981A IT1257434B (it) 1992-12-04 1992-12-04 Generatore di vapori per impianti di deposizione chimica da fase vapore

Publications (2)

Publication Number Publication Date
JPH06216034A true JPH06216034A (ja) 1994-08-05
JPH0789544B2 JPH0789544B2 (ja) 1995-09-27

Family

ID=11410901

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5329619A Expired - Fee Related JPH0789544B2 (ja) 1992-12-04 1993-12-02 化学蒸着装置用蒸気発生器

Country Status (6)

Country Link
US (1) US5380367A (ja)
EP (1) EP0600503B1 (ja)
JP (1) JPH0789544B2 (ja)
CA (1) CA2110647C (ja)
DE (2) DE600503T1 (ja)
IT (1) IT1257434B (ja)

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CA2110647C (en) 1997-09-30
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