ITTO920981A0 - Generatore di vapori per impienti di deposizione chimica da fase vapo re. - Google Patents

Generatore di vapori per impienti di deposizione chimica da fase vapo re.

Info

Publication number
ITTO920981A0
ITTO920981A0 IT92TO981A ITTO920981A ITTO920981A0 IT TO920981 A0 ITTO920981 A0 IT TO920981A0 IT 92TO981 A IT92TO981 A IT 92TO981A IT TO920981 A ITTO920981 A IT TO920981A IT TO920981 A0 ITTO920981 A0 IT TO920981A0
Authority
IT
Italy
Prior art keywords
steam generator
vapor phase
chemical deposition
deposition systems
systems
Prior art date
Application number
IT92TO981A
Other languages
English (en)
Inventor
Daniele Bertone
Original Assignee
Cselt Centro Studi Lab Telecom
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cselt Centro Studi Lab Telecom filed Critical Cselt Centro Studi Lab Telecom
Priority to ITTO920981A priority Critical patent/IT1257434B/it
Publication of ITTO920981A0 publication Critical patent/ITTO920981A0/it
Priority to US08/139,395 priority patent/US5380367A/en
Priority to JP5329619A priority patent/JPH0789544B2/ja
Priority to DE0600503T priority patent/DE600503T1/de
Priority to EP93119521A priority patent/EP0600503B1/en
Priority to DE69301903T priority patent/DE69301903T2/de
Priority to CA002110647A priority patent/CA2110647C/en
Publication of ITTO920981A1 publication Critical patent/ITTO920981A1/it
Application granted granted Critical
Publication of IT1257434B publication Critical patent/IT1257434B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • C23C16/4482—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material by bubbling of carrier gas through liquid source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Chemical Vapour Deposition (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Investigating Or Analyzing Non-Biological Materials By The Use Of Chemical Means (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
ITTO920981A 1992-12-04 1992-12-04 Generatore di vapori per impianti di deposizione chimica da fase vapore IT1257434B (it)

Priority Applications (7)

Application Number Priority Date Filing Date Title
ITTO920981A IT1257434B (it) 1992-12-04 1992-12-04 Generatore di vapori per impianti di deposizione chimica da fase vapore
US08/139,395 US5380367A (en) 1992-12-04 1993-10-18 Vapour generator for chemical vapour deposition systems
JP5329619A JPH0789544B2 (ja) 1992-12-04 1993-12-02 化学蒸着装置用蒸気発生器
DE0600503T DE600503T1 (de) 1992-12-04 1993-12-03 Dampferzeuger für Systeme zur chemischen Beschichtung aus der Dampfphase.
EP93119521A EP0600503B1 (en) 1992-12-04 1993-12-03 Vapour generator for chemical vapour deposition systems
DE69301903T DE69301903T2 (de) 1992-12-04 1993-12-03 Dampferzeuger für Systeme zur chemischen Beschichtung aus der Dampfphase
CA002110647A CA2110647C (en) 1992-12-04 1993-12-03 Vapour generator for chemical vapour deposition systems

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
ITTO920981A IT1257434B (it) 1992-12-04 1992-12-04 Generatore di vapori per impianti di deposizione chimica da fase vapore

Publications (3)

Publication Number Publication Date
ITTO920981A0 true ITTO920981A0 (it) 1992-12-04
ITTO920981A1 ITTO920981A1 (it) 1994-06-04
IT1257434B IT1257434B (it) 1996-01-17

Family

ID=11410901

Family Applications (1)

Application Number Title Priority Date Filing Date
ITTO920981A IT1257434B (it) 1992-12-04 1992-12-04 Generatore di vapori per impianti di deposizione chimica da fase vapore

Country Status (6)

Country Link
US (1) US5380367A (it)
EP (1) EP0600503B1 (it)
JP (1) JPH0789544B2 (it)
CA (1) CA2110647C (it)
DE (2) DE600503T1 (it)
IT (1) IT1257434B (it)

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DE102005024210B3 (de) * 2005-05-23 2007-02-08 Dockweiler Ag Sicherheitsbehälter
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JPH0789544B2 (ja) 1995-09-27
US5380367A (en) 1995-01-10
EP0600503A1 (en) 1994-06-08
JPH06216034A (ja) 1994-08-05
CA2110647C (en) 1997-09-30
DE69301903D1 (de) 1996-04-25
DE600503T1 (de) 1994-12-22
CA2110647A1 (en) 1994-06-05
DE69301903T2 (de) 1996-09-05
ITTO920981A1 (it) 1994-06-04
IT1257434B (it) 1996-01-17
EP0600503B1 (en) 1996-03-20

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