EP0391996A4 - Temperature controlled distributor beam for chemical vapor deposition - Google Patents

Temperature controlled distributor beam for chemical vapor deposition

Info

Publication number
EP0391996A4
EP0391996A4 EP19890910701 EP89910701A EP0391996A4 EP 0391996 A4 EP0391996 A4 EP 0391996A4 EP 19890910701 EP19890910701 EP 19890910701 EP 89910701 A EP89910701 A EP 89910701A EP 0391996 A4 EP0391996 A4 EP 0391996A4
Authority
EP
European Patent Office
Prior art keywords
vapor deposition
chemical vapor
temperature controlled
controlled distributor
distributor beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
EP19890910701
Other versions
EP0391996A1 (en
Inventor
William M. Greenberg
Randall L. Bauman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Pilkington North America Inc
Original Assignee
Libbey Owens Ford Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Libbey Owens Ford Co filed Critical Libbey Owens Ford Co
Publication of EP0391996A1 publication Critical patent/EP0391996A1/en
Publication of EP0391996A4 publication Critical patent/EP0391996A4/en
Ceased legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/453Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating passing the reaction gases through burners or torches, e.g. atmospheric pressure CVD
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001General methods for coating; Devices therefor
    • C03C17/002General methods for coating; Devices therefor for flat glass, e.g. float glass

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Surface Treatment Of Glass (AREA)
  • Chemical Vapour Deposition (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
EP19890910701 1988-09-16 1989-09-12 Temperature controlled distributor beam for chemical vapor deposition Ceased EP0391996A4 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US245444 1981-03-19
US24544488A 1988-09-16 1988-09-16

Publications (2)

Publication Number Publication Date
EP0391996A1 EP0391996A1 (en) 1990-10-17
EP0391996A4 true EP0391996A4 (en) 1991-07-31

Family

ID=22926680

Family Applications (1)

Application Number Title Priority Date Filing Date
EP19890910701 Ceased EP0391996A4 (en) 1988-09-16 1989-09-12 Temperature controlled distributor beam for chemical vapor deposition

Country Status (11)

Country Link
EP (1) EP0391996A4 (en)
JP (1) JPH03501474A (en)
KR (1) KR900702073A (en)
AU (1) AU618412B2 (en)
BR (1) BR8907091A (en)
CA (1) CA1332281C (en)
ES (1) ES2015459A6 (en)
FI (1) FI902414A0 (en)
MX (1) MX171806B (en)
TW (1) TW239165B (en)
WO (1) WO1990002826A1 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2672519B1 (en) * 1991-02-13 1995-04-28 Saint Gobain Vitrage Int NOZZLE WITH HEAVY DOWNSTREAM HEEL, FOR DEPOSITING A COATING LAYER ON A TAPE OF GLASS, BY PYROLYSIS OF A GASEOUS MIXTURE.
US5356718A (en) * 1993-02-16 1994-10-18 Ppg Industries, Inc. Coating apparatus, method of coating glass, compounds and compositions for coating glasss and coated glass substrates
US5599387A (en) * 1993-02-16 1997-02-04 Ppg Industries, Inc. Compounds and compositions for coating glass with silicon oxide
US5863337A (en) * 1993-02-16 1999-01-26 Ppg Industries, Inc. Apparatus for coating a moving glass substrate
US6164557A (en) * 1998-04-30 2000-12-26 Sioux Steam Cleaner Corporation Fluid temperature control for a heated fluid cleaner with multiple outlets
JP4800845B2 (en) * 2006-05-30 2011-10-26 積水化学工業株式会社 Plasma processing equipment

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4100962A (en) * 1977-02-28 1978-07-18 James H. Housman Casting die
US4793282A (en) * 1987-05-18 1988-12-27 Libbey-Owens-Ford Co. Distributor beam for chemical vapor deposition on glass

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See references of WO9002826A1 *

Also Published As

Publication number Publication date
AU618412B2 (en) 1991-12-19
BR8907091A (en) 1991-01-08
MX171806B (en) 1993-11-15
JPH03501474A (en) 1991-04-04
FI902414A0 (en) 1990-05-15
KR900702073A (en) 1990-12-05
TW239165B (en) 1995-01-21
AU4308489A (en) 1990-04-02
ES2015459A6 (en) 1990-08-16
EP0391996A1 (en) 1990-10-17
CA1332281C (en) 1994-10-11
WO1990002826A1 (en) 1990-03-22

Similar Documents

Publication Publication Date Title
GB2229454B (en) Vapor deposition system
EP0311401A3 (en) Process for chemical vapor deposition
IL96401A0 (en) Selective area chemical vapor deposition
IL109131A0 (en) Triangular deposition chamber for a vapor deposition system
AU5097490A (en) Modular continuous vapor deposition system
EP0430079A3 (en) Chemical vapor deposition apparatus of in-line type
DE3564290D1 (en) Chemical vapour deposition process
GB2206608B (en) Vapor deposition apparatus
EP0326998A3 (en) Microwave chemical vapor deposition apparatus
EP0367289A3 (en) Plasma chemical vapor deposition apparatus
ZA883485B (en) Distributor beam for chemical vapor deposition on glass
AR243144A1 (en) Coating flat glass by chemical vapor deposition
EP0418554A3 (en) Chemical vapor deposition system
GB2169003B (en) Chemical vapour deposition
GB2214047B (en) Control system for uniform spraying of plants
JPS57198690A (en) Vapor phase growing nonplanar substrate injection type laser
GB8827836D0 (en) Laser chemical vapour deposition
EP0391996A4 (en) Temperature controlled distributor beam for chemical vapor deposition
EP0382932A3 (en) Process for the vapor deposition of polysilanes
KR960015377B1 (en) Chemical vapor deposition reactor
AU8745282A (en) Vapor deposition
GB2210387B (en) Chemical vapour deposition
GB2185494B (en) Vapour phase deposition process
ZA908296B (en) Method for preparing vaporized reactants for chemical vapor deposition
EG19922A (en) Method for preparing vaporized reactants for chemical vapor deposition

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 19900606

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AT BE CH DE FR GB IT LI LU NL SE

A4 Supplementary search report drawn up and despatched

Effective date: 19910610

AK Designated contracting states

Kind code of ref document: A4

Designated state(s): AT BE CH DE FR GB IT LI LU NL SE

17Q First examination report despatched

Effective date: 19930407

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE APPLICATION HAS BEEN REFUSED

18R Application refused

Effective date: 19941128