JP4800845B2 - Plasma processing equipment - Google Patents

Description

  The present invention relates to a so-called direct-type plasma processing apparatus that introduces a processing gas into a plasma discharge space and applies it to an object to be processed disposed in the discharge space to perform plasma surface treatment of the object to be processed.

For example, Patent Document 1 discloses a so-called direct-type plasma treatment in which a discharge space is formed between an electrode unit and a roll electrode facing each other vertically, and an object to be treated is disposed in the discharge space to perform plasma treatment. An apparatus is described. The electrode unit is configured by arranging an electrode in the center and sandwiching both sides thereof with a pair of resin nozzle members. Each nozzle member is in contact with a side portion of the electrode and is connected by a bolt. A processing gas supply path is provided inside the nozzle member on one side, and an exhaust path is provided on the other nozzle member. A solid dielectric plate is provided on the lower surface of the electrode. The solid dielectric plate extends from both sides of the electrode. The pair of nozzle members is provided with a holding portion for holding the extending portion of the solid dielectric plate.
Japanese Patent Laying-Open No. 2005-085547

  In the device described in the above-mentioned Patent Document 1, since the nozzle member is in contact with the side portion of the electrode, the nozzle member is heated and deformed by heat generation of the electrode accompanying plasma discharge or creeping discharge generated at the side portion of the electrode. Easy to come. If it does so, there exists a possibility that a gas flow may become non-uniform | heterogenous, a solid dielectric plate may not be hold | maintained normally, and a solid dielectric plate may be damaged or dropped.

In order to solve the above-described problems, the present invention provides a plasma processing apparatus for introducing a processing gas into a discharge space and applying the processing gas to the object to be processed disposed in the discharge space to perform surface treatment of the object to be processed.
(A) an electrode having a discharge surface for forming the discharge space;
(B) A plate-shaped solid dielectric having a main dielectric portion covering the discharge surface of the electrode, and the main dielectric portion and the discharge surface and thus extending from the electrode along the extending direction along the discharge surface. A dielectric member comprising a body;
(C) A gas path that supplies the processing gas to the discharge space or sucks a processed gas from the discharge space, and a holding portion that holds an end of the extending portion in the extending direction are integrated. a and an insulating material made of a nozzle member apart to the extending direction of the electrode,
(D) a support portion that supports the electrode from the side opposite to the discharge surface;
The side surfaces of the electrode and the nozzle member that are spaced apart from each other in the extending direction directly face each other, and the side surface and the portion of the extending portion on the side of the main dielectric portion from the end portion An electrode side space is defined by.
According to the above configuration, by supporting the side opposite to the discharge surface of the electrode, a space can be formed in the side portion of the electrode, and it becomes easy to dispose the nozzle member thermally away from the electrode. Heat transfer with the nozzle member can be suppressed. As a result, even if the electrode generates heat due to plasma discharge or a creeping discharge is formed on the side, even the nozzle member can be prevented from being heated and causing thermal deformation, and the gas flow becomes non-uniform, It can be prevented that the dielectric member cannot be normally held and the dielectric member is damaged or dropped from the holding portion.

Further, the present invention provides a plasma processing apparatus for introducing a processing gas into a discharge space and applying it to a workpiece disposed in the discharge space to perform a surface treatment of the workpiece.
(E) an electrode having a discharge surface for forming the discharge space;
(F) a main dielectric portion covering the discharge surface of the electrode, and a first extension extending from the main dielectric portion and the discharge surface and thus the electrode to one side of the extension direction along the extending direction along the discharge surface. A dielectric composed of a plate-like solid dielectric having an extending portion and a second extending portion extending from the main dielectric portion and the discharge surface, and thus the other side of the extending direction along the extending direction, along the extending direction. A member,
(G) having a first gas path for supplying the processing gas to the discharge space, and a first holding part for holding the one end of the first extending part in the extending direction; A first nozzle member made of an insulating material separated from the electrode on the one side in the extending direction;
(H) having a second gas path for sucking the treated gas from the discharge space, and a second holding part for holding the other end of the second extending part in the extending direction. A second nozzle member made of an insulating material separated from the electrode to the other side in the extending direction,
(I) a support portion that supports the electrode from the side opposite to the discharge surface;
The first side surfaces of the electrode and the first nozzle member facing each other in the extending direction are directly facing each other, the first side surface of the electrode and the first nozzle member A first electrode side space is defined by the first side surface and a portion on the main dielectric portion side from the one end portion of the first extension portion, and the electrode and the second nozzle member The second side surfaces facing away from each other in the extending direction directly face each other, the second side surface of the electrode, the second side surface of the second nozzle member, and the second extension. A second electrode side space is defined by a portion of the main dielectric portion side of the other end portion of the portion.
According to the above configuration, by supporting the side opposite to the discharge surface of the electrode, a space can be formed on both sides of the electrode, and the first and second nozzle members can be easily disposed away from the electrode. Thus, heat transfer between the electrode and the first and second nozzle members can be suppressed. As a result, even if the electrode generates heat due to plasma discharge or creeping discharge is formed on the side, it is possible to prevent the first and second nozzle members from being heated and causing thermal deformation, and the gas flow is reduced. It is possible to prevent the dielectric member from becoming uniform or being unable to normally hold the dielectric member and from being damaged or falling off the holding portion.

The said electrodes, suction holes to vacuum adsorb the dielectric member opens in the vicinity of the edge of the side of the extending portion of the discharge surface (the first extending portion or the second extending portion) is provided The dielectric member is preferably covered with the suction hole .
Thereby, a dielectric member can be stuck to the discharge surface of an electrode, and it can prevent that a crevice is formed between an electrode and a dielectric member. As a result, the occurrence of abnormal discharge between the electrode and the dielectric member can be avoided, and the generation of particles can be suppressed.

The present invention is suitable for generating plasma and performing surface treatment near atmospheric pressure. Near atmospheric pressure (substantially normal pressure) refers to a range of 1.013 × 10 ^{4 to} 50.663 × 10 ⁴ Pa, and considering the ease of pressure adjustment and the simplification of the apparatus configuration, 1.333 × 10 6. ^{4 to} 10.664 × 10 ⁴ Pa (100 to 800 Torr) is preferable, and 9.331 × 10 ^{4 to} 10.9797 × 10 ⁴ Pa (700 to 780 Torr) is more preferable.

  According to the present invention, it is possible to prevent the nozzle member from undergoing thermal deformation, and it is possible to prevent the gas flow from becoming non-uniform, the dielectric member from being damaged, or falling off the holding portion.

Hereinafter, a first embodiment of the present invention will be described.
FIG. 1 shows an atmospheric pressure plasma processing apparatus M. The apparatus M includes a processing head 1 and a roll 2 disposed below the processing head 1. The roll 2 is made of a cylindrical metal whose axis is oriented in the front-rear direction perpendicular to the plane of FIG. The roll 2 is electrically grounded and constitutes a ground electrode. A surface of the roll 2 is provided with a solid dielectric layer (not shown) made of, for example, an alumina sprayed film.

  A film-like or sheet-like workpiece W is partially wound on the upper side of the roll 2. The roll 2 rotates, for example, clockwise, and the workpiece W is fed, for example, in the right direction.

  As shown in FIGS. 1 and 2, the processing head 1 includes a head frame 10, a power supply electrode 30, and a pair of first and second nozzle members 50 and 60. It extends in the orthogonal direction (vertical direction in FIG. 2). As shown in FIG. 2, resin end blocks 15 are provided at both ends in the longitudinal direction of the processing head 1.

  As shown in FIG. 1, the head frame 10 is composed of a metal plate extending in the front-rear direction, and is supported by a gantry (not shown). A resin insulating frame 11 is attached to the center of the lower surface of the head frame 10 in the left-right direction with metal bolts 12. The insulating frame 11 has a rectangular cross section and extends in the front-rear direction. A power supply electrode 30 is provided below the insulating frame 11.

  As shown in FIGS. 1 and 2, the power electrode 30 is made of a metal such as stainless steel or aluminum and has a substantially rectangular cross section in the front-rear direction (the direction orthogonal to the plane of FIG. 1, the vertical direction in FIG. 2). It extends. The electrode 30 is connected to the power source 3 through the power supply line 3a. When a voltage is supplied from the power source 3 to the electrode 30, an atmospheric pressure glow discharge is formed between the electrode 30 and the roll 2 as a ground electrode below the electrode 30. The lower surface of the electrode 30 constitutes a discharge surface for forming the discharge. As shown in FIGS. 1 and 3, the corners of the lower surface and the left and right side surfaces of the electrode 30 are chamfered obliquely to form a chamfered portion 32.

A support structure of the electrode 30 will be described.
As shown in FIG. 1, bolt insertion holes 13 are vertically formed through the head frame 10 and the insulating frame 11. A step 13 a is formed at an intermediate portion of the insertion hole 13 in the insulating frame 11. The insertion holes 13 form two rows on the left and right sides of the insulating frame 11, and a plurality of the insertion holes 13 are arranged apart in the front-rear direction (the direction orthogonal to the plane of FIG. 1). A metal bolt 14 (support portion) is passed through each of the insertion holes 13. The heads of these bolts 14 are hooked on the step 13 a of the insertion hole 13, and the legs are screwed into the upper part of the electrode 30. Thereby, the electrode 30 is supported from the upper side (the side opposite to the discharge surface) so as to be suspended by the bolt 14. The upper surface of the electrode 30 is pressed against the lower surface of the insulating frame 11. The electrode 30 and the base frame 10 are insulated by the insulating frame 11. The bolt 14 and the base frame 10 are insulated by the space in the insulating frame 11 and the insertion hole 13.

  As shown in FIGS. 1 and 2, a dielectric member 40 is provided on the lower surface (discharge surface) of the electrode 30. The dielectric member 40 is made of a solid dielectric such as ceramic made of alumina, for example, and the longitudinal direction is directed in the front-rear direction (the direction orthogonal to the plane of FIG. 1, the vertical direction in FIG. 2), and the width direction is directed to the left and right. It has a flat plate shape. The thickness of the dielectric member 40 is, for example, about 1 mm. The dielectric member 40 has a length and width larger than those of the electrode 30, and a central portion (main dielectric portion 40 </ b> X) covers the entire lower surface (discharge surface) of the electrode 30. A discharge space 91 is defined between the central portion 40X of the dielectric member and the roll electrode 2. Both side portions in the width direction of the dielectric member 40 extend to the left and right outside from the electrode 30, the left extended portion constitutes a first extension portion 41, and the right extended portion is a second extension. Part 42 is configured.

  As shown in FIGS. 1 and 2, a pair of suction paths 35 are formed inside the electrode 30. These adsorption paths 35 are disposed near the left and right corners of the lower side of the electrode 30 and extend in the longitudinal direction of the electrode 30. Each suction path 35 is connected to the suction means 4 including a vacuum pump or the like via a suction line 4 a penetrating the electrode 30, the insulating frame 11, and the head frame 10.

As shown in FIGS. 2 and 3, a large number of fine adsorption holes 34 branch from each adsorption path 35 and extend downward. These suction holes 34 are arranged at intervals in the longitudinal direction of the suction path 35. The lower end of the suction hole 34 reaches the lower surface of the electrode 30 and is opened. The lower end opening of the suction hole 34 is disposed in the vicinity of the chamfered portion 32 at the lower left and right corners of the electrode 30.
The suction member 4 is driven to suck the suction hole 34 through the suction line 4a and the suction path 35, so that the dielectric member 40 can be sucked to the lower surface (discharge surface) of the electrode 30.

  As shown in FIG. 1, a cooling path 36 (temperature control path) is further formed inside the electrode 30. The cooling path 36 extends in the longitudinal direction of the electrode 30. For example, water is passed through the cooling path 36 as a refrigerant (temperature control medium), whereby the electrode 30 is cooled (temperature controlled).

The first nozzle member 50 and the second nozzle member 60 sandwich the insulating frame 11, the electrode 30, and the dielectric member 40 from the left and right, and constitute the left and right walls of the processing head 1.
The first nozzle member 50 on the left side is made of an insulating material such as resin or ceramic having excellent plasma resistance and insulating properties such as Unilate (registered trademark). As shown in FIGS. 1 and 2, the nozzle member 50 generally has a rectangular cross section that is long in the vertical direction, and extends in the front-rear direction. As shown in FIG. 1, the lower surface (tip surface) of the nozzle member 50 is an inclined surface that is inclined downward toward the left outer side.

  Similar to the first nozzle member 50, the second nozzle member 60 on the right side is made of an insulating material such as resin or ceramic having excellent plasma resistance and insulating properties such as Unirate (registered trademark). As shown in FIGS. 1 and 2, the nozzle member 60 generally has a rectangular cross section that is long in the vertical direction, and extends in the front-rear direction. As shown in FIG. 1, the lower surface (tip surface) of the nozzle member 60 is a slope inclined downward toward the right outer side.

The first and second nozzle members 50 and 60 are supported as follows.
As shown in FIG. 1, the upper surface of the left first nozzle member 50 is abutted against the lower surface of the left side portion of the head frame 10 and is connected to the head frame 10 with a bolt (not shown) or the like. Further, the upper portion of the inner side surface facing the right side of the nozzle member 50 is attached to the left side surface of the insulating frame 11, and is connected to the insulating frame 11 with a bolt (not shown) or the like. The lower part of the inner side surface of the nozzle member 50 is opposed to the left side surface (first side surface) of the electrode 30. A first electrode side space 81 is defined between the nozzle member 50 and the electrode 30.

  The upper surface of the second nozzle member 60 on the right side is abutted against the lower surface of the right side portion of the head frame 10 and is connected to the head frame 10 with a bolt (not shown) or the like. Further, the upper part of the inner side surface facing the left side of the nozzle member 60 is attached to the right side surface of the insulating frame 11, and is connected to the insulating frame 11 with a bolt (not shown) or the like. The lower part of the inner side surface of the nozzle member 60 faces away from the right side surface (second side surface) of the electrode 30. A second electrode side space 82 is defined between the nozzle member 60 and the electrode 30.

  A first gas path 51 is formed inside the left first nozzle member 50. The first gas passage 51 includes an introduction passage 52 extending downward from the upper surface of the nozzle member 50, a blowout passage 53 connected to the lower end of the introduction passage 52, and a plurality of pore-like shapes extending downward from the blowout passage 53. The blowout holes 54 and the blowout openings 55 connected to the blowout holes 54 are provided. The processing gas source 5 is connected to the upper end portion of the introduction path 52 via the introduction line 5a. A processing gas according to the processing purpose is stored in the processing gas source 5, and a processing gas having a predetermined flow rate is supplied to the first gas passage 51.

As shown in FIGS. 1 and 2, the blowout path 53 extends in the longitudinal direction of the nozzle member 50.
The blow-out holes 54 extend obliquely inward (right side) from the lower side of the blow-out path 53 and are arranged at intervals in the longitudinal direction of the blow-out path 53.

  A concave groove 55 is formed on the lower surface of the nozzle member 50 so as to extend in the longitudinal direction, and the lower end of each outlet hole 54 is opened on the upper bottom surface of the concave groove 55. An air outlet is formed by the concave groove 55.

A second gas path 61 is formed inside the second nozzle member 60 on the right side. The second gas path 61 has a suction port 62, a number of suction holes 63, a suction path 64, and a discharge path 65 extending upward from the suction path 64.
A concave groove 62 is formed on the lower surface of the nozzle member 60 so as to extend in the longitudinal direction. This concave groove constitutes the suction port 62.
The suction hole 63 has a short pore shape extending upward from the upper bottom surface of the suction port 62. A number of suction holes 63 are arranged at intervals in the longitudinal direction of the suction port 62.
The suction path 64 extends in the longitudinal direction of the nozzle member 60 and connects a number of suction holes 63.
The discharge path 65 extends upward from the suction path 64 and reaches the upper surface of the nozzle member 60. An exhaust means 6 comprising a vacuum pump or the like is connected to the upper end portion of the discharge path 65 via an exhaust line 6a. As the exhaust means 6, a vacuum pump or the like common to the suction means 4 connected to the suction hole 34 may be used.

The nozzle members 50 and 60 are used not only as members that form the supply / exhaust passage of the processing gas, but also as members that hold the dielectric member 40.
As shown in FIGS. 2 and 3, the left first nozzle member 50 is integrally provided with a first holding portion 56 for holding the left end of the dielectric member 40. The first holding portion 56 is formed in the vicinity of the lower end of the inner surface of the first nozzle member 50 and has a concave groove shape extending in the longitudinal direction of the nozzle member 50 (the direction orthogonal to the plane of FIG. 1). The edge of the first extending portion 41 of the dielectric member 40 is inserted into the first holding portion 56.
The lower end of the first electrode side space 81 is closed by the first extending portion 41 of the dielectric member 40, and as a result, the first electrode side space 81 is separated from the discharge space 91.

As shown in FIGS. 1 and 2, the second holding member 66 for holding the right end of the dielectric member 40 is integrally provided in the second nozzle member 60 on the right side. The second holding portion 66 is formed in the vicinity of the lower end of the inner surface of the second nozzle member 60 and has a concave groove shape extending in the longitudinal direction of the nozzle member 60 (the direction orthogonal to the plane of FIG. 1). The edge of the second extending portion 42 of the dielectric member 40 is inserted into the second holding portion 66.
The lower end of the second electrode side space 82 is closed by the second extending portion 42 of the dielectric member 40, and as a result, the second electrode side space 82 is separated from the discharge space 91.

The operation of the atmospheric pressure plasma processing apparatus M configured as described above will be described.
The workpiece W to be processed is wound around the upper part of the roll 2. A processing path 90 including a discharge space 91 is defined between the processing head 1 and the workpiece W on the roll 2.
Then, the processing gas from the processing gas source 5 is introduced into the introduction path 52 of the first gas path 51. This processing gas is sent from the introduction passage 52 to the blowout passage 53, and is sequentially passed through the blowout holes 54 while diffusing in the blowout passage 53 in the longitudinal direction of the nozzle member 50. To the left end (upstream end) of the processing passage 90. This processing gas is guided to the discharge space 91 at the center of the processing passage 90.
In parallel, a voltage is supplied from the power source 3 to the electrode 30, and an atmospheric pressure glow discharge is formed between the electrode 30 and the roll 2. As a result, the processing gas is turned into plasma in the discharge space 91, and this plasmad processing gas comes into contact with the surface of the workpiece W to cause a reaction. Thereby, desired surface treatments such as cleaning, surface modification, etching, ashing, and film formation can be performed.
The processed gas enters the suction port 62 of the second gas passage 61 from the right end portion (downstream end portion) of the processing passage 90, and exhausts through the suction hole 63, the suction passage 64, the discharge passage 65, and the exhaust line 6a in order. It is discharged by means 6.

  According to the atmospheric pressure plasma processing apparatus M, the member that forms the first gas path 51 for introducing the processing gas into the discharge space 91 and the member that holds one end of the dielectric member 40 in the width direction are the common member 50. Configured. Further, a member that forms the second gas path 61 for leading the treated gas from the discharge space 91 and a member that holds the other end of the dielectric member 40 in the width direction are configured by a common member 60. Therefore, the number of parts can be reduced, the assembly can be simplified, and the trouble of positioning the nozzle members 50, 60 and the dielectric member 40 can be saved.

  By supporting the electrode 30 so as to be suspended from the upper side by the bolt 12, it is not necessary to support the electrode 30 from the side, and a member for holding the electrode is arranged between the nozzle members 50, 60 and the electrode 30, or the nozzle There is no need to hold the electrode 30 with the members 50 and 60 themselves. Therefore, spaces 81 and 82 can be formed between the electrode 30 and the nozzle members 50 and 60 so that the electrodes 30 and the nozzle members 50 and 60 can be thermally separated. This prevents the nozzle members 50 and 60, that is, the holding members of the dielectric member 40 from being heated and causing thermal deformation even when the electrode 30 generates heat due to plasma discharge or a creeping discharge is formed on the side portion. it can. As a result, it is possible to prevent the gas passages 51 and 62 from being deformed to make the gas flow non-uniform or to prevent the dielectric member 40 from being properly held and being damaged or dropped off.

Further, the suction means 4 is driven to suck the suction hole 34 through the suction path 35. Accordingly, the dielectric member 40 can be brought into close contact with the lower surface of the electrode 30, and a gap can be prevented from being formed between the electrode 30 and the dielectric member 40. As a result, the occurrence of abnormal discharge between the electrode 30 and the dielectric member 40 can be avoided, and the generation of particles can be suppressed.
Since the electrode 30 is suspended from the bolt 12 and the dielectric member 30 is not subjected to its own weight, the dielectric member 30 is not damaged by the weight of the electrode 30.

Next, another embodiment of the present invention will be described. In the following embodiments, the same reference numerals are given to the drawings and the description thereof is omitted for the same configurations as those of the above-described embodiments.
FIG. 4 shows a modification of the electrode support structure. Instead of the short metal bolt 14 of the first embodiment, a long resin (insulating material) bolt 15 is used as the support portion of the electrode 30. The head of the resin bolt 15 is hooked on the head frame 10, and the leg portion passes through the head frame 10 and the insulating frame 11 and is screwed into the electrode 30. Thereby, the bolt 15 not only supports the electrode 30 so as to hang, but also holds the insulating frame 11 sandwiched between the head frame 10 and the electrode 30. Therefore, the bolt 12 that connects the head frame 10 and the insulating frame 11 is not necessary.

  FIG. 5 shows a modification of the outlet at the downstream end of the first gas passage 51. A diffusion plate 57 is provided in the groove 55 on the lower surface of the first nozzle member 50. The diffusion plate 57 is configured by a perforated plate having a large number of small holes 57a, and extends in the front-rear direction (in the direction orthogonal to the plane of FIG. 5) in accordance with the recessed groove 55 extending in the front-rear direction. The processing gas is introduced into the space between the upper bottom surface of the concave groove 55 and the diffusion plate 57 from the blowout holes 54, diffuses, and is blown out from a large number of small holes 57a. The small hole 57 a constitutes the outlet of the first passage 51.

  6 and 7 show a modification in which the width of the outlet of the first passage 51 is variable. The blowout width adjusting member 58 is accommodated in the concave groove 55 on the lower surface of the first nozzle member 50. The blowing width adjusting member 58 is made of an insulating material having excellent plasma resistance such as Unirate (registered trademark), and has a plate shape extending in the front-rear direction (the direction orthogonal to the plane of FIG. 6 and the vertical direction in FIG. 7). . A blowout port 51 a of the first gas path 51 is formed between the right end edge (the edge on the side facing the electrode 30) of the blowout width adjusting member 58 and the right end face of the concave groove 55.

  A bolt insertion hole 58 a is formed in the blowout width adjusting member 58. The blowing width adjusting member 58 is fixed to the first nozzle member 50 by screwing the bolt 59 inserted into the insertion hole 58 a into the first nozzle member 50. The bolt insertion hole 58a is a long hole with the long diameter directed to the left and right. Thereby, the position of the left-right direction with respect to the 1st nozzle member 50 of the blowing width adjustment member 58 can be adjusted now. As a result, the width of the outlet 51a can be adjusted.

The present invention is not limited to the above embodiment, and various modifications can be made.
For example, the electrode structure of the plasma processing apparatus M is composed of the plate electrode 30 and the roll electrode 2, but the ground electrode may also be a plate electrode and a parallel plate electrode.
The present invention is universally applicable to various plasma surface treatments such as cleaning, surface modification, etching, ashing, and film formation.

  The present invention can be used for plasma surface treatment of glass substrates for flat panels such as liquid crystal panels and silicon substrates in semiconductor manufacturing.

It is front sectional drawing of the atmospheric pressure plasma processing apparatus which concerns on 1st Embodiment of this invention. It is a bottom view of the processing head of the atmospheric pressure plasma processing apparatus. It is sectional drawing which expands and shows the holding | maintenance part of the dielectric member of the said processing head in FIG. It is front sectional drawing of the processing head which shows the modification of an electrode support structure. It is sectional drawing which shows the modification of the blower outlet of the 1st nozzle member of a process head. It is sectional drawing which shows the other modification of the blower outlet of a 1st nozzle member. It is a bottom view of the 1st nozzle member shown in FIG.

Explanation of symbols

M Atmospheric pressure plasma processing equipment W Object 3 Power supply 14 Volt (support)
15 bolts (support)
30 Power supply electrode 34 Adsorption hole 40 Dielectric member 40X Main dielectric part 41 First extension part 42 Second extension part 50 First nozzle member 51 First gas path 56 First holding part 60 Second nozzle member 61 Second gas path 66 Second holding portion 81 First electrode side space 82 Second electrode side space 91 Discharge space

Claims (3)

In a plasma processing apparatus that introduces a processing gas into a discharge space and applies it to an object to be processed disposed in the discharge space, and performs a surface treatment of the object to be processed,
(A) an electrode having a discharge surface for forming the discharge space;
(B) A plate-shaped solid dielectric having a main dielectric portion covering the discharge surface of the electrode, and the main dielectric portion and the discharge surface and thus extending from the electrode along the extending direction along the discharge surface. A dielectric member comprising a body;
(C) A gas path that supplies the processing gas to the discharge space or sucks a processed gas from the discharge space, and a holding portion that holds an end of the extending portion in the extending direction are integrated. a and an insulating material made of a nozzle member apart to the extending direction of the electrode,
(D) a support portion that supports the electrode from the side opposite to the discharge surface;
The side surfaces of the electrode and the nozzle member that are spaced apart from each other in the extending direction directly face each other, and the side surface and the portion of the extending portion on the side of the main dielectric portion from the end portion An electrode side space is defined by the plasma processing apparatus.   The electrode is provided with a suction hole that opens near the edge of the discharge surface on the side of the extension portion and vacuum-sucks the dielectric member, and the dielectric member covers the suction hole. The plasma processing apparatus according to claim 1. In a plasma processing apparatus that introduces a processing gas into a discharge space and applies it to an object to be processed disposed in the discharge space, and performs a surface treatment of the object to be processed,
(E) an electrode having a discharge surface for forming the discharge space;
(F) a main dielectric portion covering the discharge surface of the electrode, and a first extension extending from the main dielectric portion and the discharge surface and thus the electrode to one side of the extension direction along the extending direction along the discharge surface. A dielectric composed of a plate-like solid dielectric having an extending portion and a second extending portion extending from the main dielectric portion and the discharge surface, and thus the other side of the extending direction along the extending direction, along the extending direction. A member,
(G) integrally having a first gas passage for supplying the processing gas to the discharge space and a first holding portion for holding the one end of the first extending portion in the extending direction; A first nozzle member made of an insulating material separated from the electrode to the one side in the extending direction;
(H) integrally having a second gas path for sucking the treated gas from the discharge space and a second holding part for holding the other end of the second extending part in the extending direction; Then, a second nozzle member made of an insulating material separated from the electrode to the other side in the extending direction,
(I) a support portion that supports the electrode from the side opposite to the discharge surface;
The first side surfaces of the electrode and the first nozzle member facing each other in the extending direction are directly facing each other, the first side surface of the electrode and the first nozzle member A first electrode side space is defined by the first side surface and a portion on the main dielectric portion side from the one end portion of the first extension portion, and the electrode and the second nozzle member The second side surfaces facing away from each other in the extending direction directly face each other, the second side surface of the electrode, the second side surface of the second nozzle member, and the second extension. A plasma processing apparatus, wherein a second electrode side space is defined by a portion of the main dielectric portion side of the other end portion of the portion.

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