JP4052965B2 - Plasma processing equipment - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to an atmospheric pressure plasma processing apparatus for performing plasma surface treatment such as surface modification of an object to be processed, cleaning, film formation, etching, ashing, etc. by converting a processing gas into plasma at substantially normal pressure.
[0002]
[Prior art]
For example, in Patent Document 1, a processing space is defined between a pair of electrodes, a processing gas is introduced into the processing space under a substantially normal pressure, and plasma is generated by applying an electric field to the electrodes. An apparatus for performing processing is described.
In Patent Document 2, a processing space is defined between a nozzle head that accommodates a pair of electrodes and an object to be processed, and a processing gas converted into plasma from the nozzle head is blown into the processing space, and the plasma surface of the object to be processed An apparatus for performing processing is described. Further, the document 2 describes that a gas curtain is formed by providing a number of blowing holes for an inert gas so as to surround the processing space. The blowing direction from each blowing hole is directed straight downward along the thickness direction of the processing space. Accordingly, it is possible to reduce the processing gas from leaking from the processing space and the outside air from entering the processing space.
[0003]
[Patent Document 1]
Japanese Patent Laying-Open No. 3040358 (FIG. 8, page 7)
[Patent Document 2]
JP 2002-176050 A (FIG. 2)
[0004]
[Problems to be solved by the invention]
An object of the present invention is to further prevent and reliably prevent leakage of processing gas and the reduction of intrusion of outside air in the gas curtain mechanism.
[0005]
[Means for Solving the Problems]
The present invention has been proposed in order to solve the above-described problems, and is an apparatus for performing plasma surface treatment of an object to be processed with a processing gas that has been converted into plasma in a processing space at a substantially normal pressure, and comprising an inert gas First blowing means for forming a first gas curtain at the peripheral edge of the processing space by blowing, and second gas curtain by blowing inert gas from the first blowing means on the side opposite to the processing space. And a second blowing means for forming at least one of the blowing means, wherein the blowing direction of at least one of the blowing means is inclined to the opposite side of the other blowing means with respect to the thickness direction of the processing space. To do.
[0006]
According to the above characteristic configuration, the gas curtain can be formed in a double manner at the periphery of the processing space, and it is possible to reduce the processing gas from leaking from the processing space and the outside air entering the processing space. In addition, it is possible to reliably prevent the processing gas from leaking from the processing space by inclining the first gas curtain, that is, the first gas curtain to the side opposite to the second blowing means, that is, the processing space. On the other hand, by inclining the second blowing means to the side opposite to the first blowing means, that is, the processing space, it is possible to reliably prevent outside air from entering the processing space.
[0007]
The blowing direction of the other blowing means is preferably along the thickness direction of the processing space or inclined to the opposite side of the one blowing means with respect to the thickness direction of the processing space. . That is, when the blowing direction of the first blowing means is inclined toward the processing space as one blowing means, the blowing direction of the second blowing means is along the thickness direction of the processing space, or It is desirable to be inclined to the opposite side of the processing space. As a result, leakage of the processing gas can be surely prevented, and intrusion of outside air can be reliably reduced or prevented. Further, when the blowing direction of the second blowing means as one blowing means is inclined to the opposite side of the processing space, the blowing direction of the first blowing means is along the thickness direction of the processing space, Alternatively, it is desirable to be inclined toward the processing space. As a result, intrusion of outside air can be reliably prevented, and leakage of the processing gas can be reliably reduced or prevented.
[0008]
An inert gas expansion means is provided that extends along the peripheral edge of the processing space and expands the inert gas in the extending direction, and the first and second blowing means branch from a substantially full length region of the inert gas expansion means. It is desirable to extend. Thereby, it is possible to cope with both the first and second blowing means by a single inert gas expanding means. In addition, the first and second gas curtains can be formed so as to extend along the periphery of the processing space, and the leakage of the processing gas and the entry of outside air can be more reliably prevented.
[0009]
It is desirable that the blowing directions of the first and second blowing means have a “C” shape in a sectional view along a virtual plane orthogonal to the extending direction of the inert gas spreading means. As a result, leakage of the processing gas can be more reliably prevented, and intrusion of outside air can be more reliably prevented.
[0010]
Further, the electrode includes a pair of electrodes that define the processing space in between and plasmatize the processing gas introduced into the space by applying an electric field, and a holder provided at the peripheral edge of each electrode. Preferably, the first and second blowing means are provided, and the other electrode holder is arranged at the tip of the blowing direction of these blowing means. Thereby, two blowing means can be incorporated in one electrode holder, and the configuration can be simplified. In addition, a gas curtain can be formed between the pair of electrode holders, and leakage of processing gas and entry of outside air can be reliably prevented.
[0011]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, an embodiment of the present invention will be described with reference to the drawings.
As shown in FIGS. 1 and 2, the atmospheric pressure plasma processing apparatus M <b> 1 according to this embodiment includes a pair of upper and lower electrode units 10 and 20. A thin plate-like workpiece W (object to be processed) is arranged in a processing space 1a formed between the electrodes 11 and 21 described later (specifically, placed on the upper surface of the lower electrode unit 20). The upper surface of the workpiece W is cleaned (surface treatment) under normal pressure.
[0012]
The lower ground electrode unit 20 includes a ground electrode 21 having a square plate shape in plan view and resin electrode holders 22 mounted at the four corners of the ground electrode 21 and is supported by an apparatus body (not shown). Has been. The earth electrode 21 is grounded via a ground wire 42. A solid dielectric sprayed film 23 made of alumina, for example, is formed on the upper surface and side surfaces of the ground electrode 21. A refrigerant passage 21 a is formed in the ground electrode 21. By passing the refrigerant through the refrigerant passage 21a, the earth electrode 21 is cooled or heated (temperature adjustment).
[0013]
The upper hot electrode unit 10 includes a rectangular hot electrode 11 that is long in the left and right in plan view, and electrode holders 30F, 30R, and 30S mounted at the four corners of the hot electrode 11. The hot electrode 11 is divided into a counter electrode member 12 disposed on the lower side facing the ground electrode 21 and a back electrode member 13 disposed on the upper side opposite to the ground electrode 21, which are separated. It is possible to join.
[0014]
The back-side electrode member 13 is formed in a thick plate shape with a conductive metal, preferably lightweight aluminum. Although detailed illustration is omitted, the back-side electrode member 13 is suspended and supported by the apparatus main body via a suspension bracket 19 so as to be slidable back and forth. As a result, the hot electrode unit 10 is retracted to the set position (the state shown in FIG. 1) directly above the ground electrode unit 20 and to the rear (left side in FIG. 1) to expose the upper surface of the ground electrode unit 20. It can move horizontally between retreat positions (not shown). In the set position, a gap having a thickness of, for example, about 1 to 2 mm, that is, the processing space 1a is formed between the upper and lower electrode units 10 and 20 (between a resin sheet 76 (FIG. 3) and the sprayed film 23 described later). It has become so.
[0015]
As shown in FIG. 1, the back-side electrode member 13 is connected to a pulse power source 40 (electric field applying means) via a feeder line 41. The pulse power source 40 supplies a pulse voltage having a predetermined height to the hot electrode 11 at a predetermined cycle.
[0016]
Further, as shown in FIGS. 1 and 2, a refrigerant passage 13 a is formed inside the back-side electrode member 13. The refrigerant passage 13 a has a U-shape in plan view and extends left and right, and both ends are opened on the upper surface of the back-side electrode member 13. A refrigerant introduction pipe 61 made of a flexible tube is connected to the upstream end of the refrigerant passage 13a, and a refrigerant outlet pipe 62 made of a flexible tube is connected to the downstream end. A refrigerant such as cold water or hot water from the introduction pipe 61 is passed through the refrigerant passage 13a, whereby the hot electrode 11 is cooled or heated (temperature adjustment). Thereafter, the refrigerant is discharged through the outlet pipe 62.
[0017]
The counter electrode member 12 of the hot electrode 11 is made of a conductive metal, preferably light aluminum, like the back electrode member 13, has the same planar shape as the back electrode member 13, and The plate is thinner than the side electrode member 13. The corner of the lower surface of the counter electrode member 12 is rounded over the entire circumference.
[0018]
A joining structure between the two divided members 12 and 13 of the hot electrode 11 will be described.
A plurality of insertion holes 13b penetrating from the upper surface to the lower surface are formed in the back-side electrode member 13 at appropriate intervals. A bolt hole 12a having a female screw on the inner peripheral surface is formed at a position corresponding to the insertion hole 13b of the opposing electrode member 12. The bolt hole 12 a is formed from the upper surface of the opposing electrode member 12 to the middle in the thickness direction, and does not reach the lower surface of the opposing electrode member 12. (Therefore, the lower surface of the opposing electrode member 12 is in a smooth state even at the position where the bolt hole 12a is disposed, and as a result, the entire lower surface is smooth.) Then, the bolt 14 is bolted through the insertion hole 13b. It is screwed into the hole 12a. The counter electrode member 12 is attracted to and pressed against the back electrode member 13 by the bolt 14.
[0019]
In the hot electrode 11, a dielectric plate 71 is provided on the lower surface of the counter electrode member 12 (the surface facing the ground electrode 21). The dielectric plate 71 is made of thin (for example, about 1 mm thick) transparent quartz glass and plays a role as a solid dielectric for the hot electrode 11. Of course, the dielectric plate 71 is a separate object from the backward electrode member 13 of the hot electrode 11.
[0020]
As shown in FIG. 3, a thin resin sheet 76 is bonded to the lower surface of the dielectric plate 71. The sheet 76 is made of a fluorine-containing resin, for example, tetrafluoroethylene.
[0021]
The counter electrode member 12 and the dielectric plate 71 are bonded by an ultraviolet curable adhesive 74 (photo curable adhesive). This adhesive 74 is composed of a silicon compound having a hydrolyzable functional group (for example, an alkoxy group) and a compound (for example, carboxylic acid anhydride) that promotes the reaction, polymerization, or crosslinking of the silicon compound by ultraviolet (light) irradiation. When the dielectric plate 71 and the counter electrode member 12 are relatively expanded and contracted by heat, the heat is maintained while maintaining the bonding state between them. It has elasticity enough to absorb the difference between expansion and contraction.
[0022]
The adhesive 74 before curing has a low viscosity. After this low viscosity adhesive 74 is applied between the counter electrode member 12 and the dielectric plate 71, the dielectric plate 71 is shaken small. Thereby, bubbles can be reliably removed from the adhesive 74. Thereafter, the adhesive 74 is cured by applying ultraviolet rays. Since the dielectric plate 71 is made of transparent quartz glass, it can sufficiently transmit ultraviolet rays.
[0023]
As shown in FIGS. 1 and 2, the peripheral edge of the dielectric plate 71 protrudes from the peripheral edge of the counter electrode member 12. The accessory member 73 having a square shape is assigned to the upper surface of the peripheral protruding portion of the dielectric plate 71 and the peripheral side surface of the opposing electrode member 12. The accessory member 73 is made of a dielectric resin. The accessory member 73 is divided into four parts according to the four edges of the counter electrode member 12, but may be integrally formed to form a frame shape. The accessory member 73 is fixed to the peripheral side surface of the opposing electrode member 12 by a horizontal bolt 75. The bolt 75 is made of a dielectric resin.
[0024]
Next, the electrode holder of the hot electrode unit 10 will be described.
As shown in FIG. 1, the front electrode holder 30 </ b> F includes an inner holder member 31 that has an inverted L shape and is directly addressed to the hot electrode 11, an outer holder member 32 provided on the front outer side thereof, It has an upper plate 33 provided on the upper side of the holder members 31, 32 and a lower plate 34 provided on the lower side of the holder member 32, and left and right (on the paper surface of FIG. 1) along the front end portion of the hot electrode 11. Elongate in an orthogonal direction).
[0025]
A processing gas introduction mechanism that cooperates with the processing gas source 50 is incorporated in the front holder 30F. That is, a processing gas introduction path 32a is formed in the outer holder member 32 of the front holder 30F. The introduction path 32a is configured by sequentially connecting a receiving path 32b, a chamber 32c, and a slit 32d from the upstream side. The upstream end of the receiving path 32b is connected to the processing gas source 50 via a processing gas supply pipe 51 made of a flexible tube. The processing gas source 50 includes, for example, N as a cleaning processing gas. ₂ Or O ₂ Etc. are stored.
[0026]
The chamber 32c has a large volume and extends substantially the entire length of the outer holder member 32 so that the processing gas from the receiving passage 32b can be made uniform in the left-right longitudinal direction. The slit 32d extends obliquely downward so as to approach the hot electrode 11 from the full length region of the chamber 32c. The blowout path 30a is continuous with the entire length region of the slit 32d. The blowout path 30a is formed by an R-lower end portion of the inner holder member 31 and a curved edge of the lower plate 34, and extends to the left and right orthogonal to the paper surface of FIG. The blow-out path 30a is opened obliquely downward toward the rear, that is, toward the inside of the electrode unit 10.
[0027]
The bolt hole 34a for bolting the lower plate 34 to the holder member 32 is a long hole that is long in the front-rear direction. Thereby, the front-back position of the lower board 34 can be adjusted, and the width | variety of the blowing path 30a can be expanded / contracted by extension. Further, the lower plate 34 is formed with another blowout path 34b connected to the chamber 32c. The blow-out path 34b is located in front of the blow-out path 30a and opens obliquely downward toward the front.
[0028]
The rear holder 30R of the hot electrode 11 has a structure in which the front holder 30F is reversed in the front-rear direction. That is, the electrode holder 30R includes inner and outer holder members 35 and 36 and upper and lower plates 37 and 38. The rear holder 30R incorporates an exhaust mechanism that cooperates with the vacuum pump 53 (exhaust means). That is, the suction path 30 b is formed by the inner holder member 35 and the lower plate 38. Since the bolt hole 38a of the lower plate 38 is a long hole, the front and rear positions of the lower plate 38 can be adjusted, and the suction passage 30b can be expanded and contracted. An exhaust path 36 a is formed in the outer holder member 36. The exhaust path 36a has a slit 36d extending from the suction path 30b, a chamber 36c connected to the slit 36d, and a lead-out path 36b connected to the chamber 36c. The downstream end of the lead-out path 36b is connected to the vacuum pump 53 via an exhaust pipe 52 made of a flexible tube.
[0029]
Features of the present invention will be described.
As shown in FIG. 2, the holders 30 </ b> S on the left and right sides of the hot electrode 11 have a reverse L shape when viewed from the front and extend in the front-rear direction and are directed to the left and right sides of the hot electrode 11. A gas curtain mechanism that cooperates with the curtain gas source 54 is incorporated in these holders 30S.
[0030]
That is, as shown in FIGS. 2 and 4, a curtain gas introduction path 30c is formed in each holder 30S. The introduction path 30c includes a vertical path 30d, a horizontal path (inert gas expanding means) 30e, and a plurality of first and second blowing paths (first and second blowing means) 30f and 30g. The vertical path 30d extends vertically downward from the upper surface at the longitudinal center of the holder 30S. As shown in FIG. 2, the upper end of the vertical path 30d is connected to a curtain gas source 54 via a curtain gas supply pipe 55 made of a flexible tube. The curtain gas source 54 has, for example, N as curtain gas. ₂ Inert gas such as is stored. When the processing gas is the same material as the curtain gas, the processing gas source 50 may be used as the curtain gas source.
[0031]
As shown in FIGS. 4A and 4B, the horizontal path 30e is connected to the lower end of the vertical path 30d and extends along the front and rear direction, that is, along the front and rear edges of the processing space 1a over the entire length of the holder 30S. . Both end openings of the horizontal path 30e are closed by plugs 30P.
[0032]
A plurality of blowing paths 30f and 30g are connected to the bottom of the horizontal path 30e. Each of the air outlets 30f and 30g has a small-diameter (for example, 1 mmφ) pore shape. The plurality of first blow-out paths 30f are arranged at regular intervals in the front-rear direction so as to cover the entire length of the horizontal path 30e. Similarly, the plurality of second blow-off paths 30g are also arranged at regular intervals in the front-rear direction so as to cover the entire length area of the horizontal path 30e. In addition, although these 1st, 2nd blowing paths 30f and 30g are arrange | positioned in the mutually same front-back direction position, you may arrange | position alternately.
[0033]
As shown in FIGS. 4B and 5, the first blowing path 30f is arranged closer to the inner side (the processing space 1a side), and the second blowing path 30g is closer to the outer side (opposite to the processing space 1a). It is arranged in. As shown in FIG. 5, these outlet passages 30f and 30g are inclined to the opposite side of the other outlet passages 30g and 30f with respect to the thickness direction of the processing space 1a, that is, the vertical direction, and are viewed from the side (horizontal passage 30e). (Cross-sectional view along a virtual plane orthogonal to the extending direction).
[0034]
That is, the first blow-off path 30f extends obliquely downward from the bottom of the horizontal path 30e toward the inside (the processing space 1a side), and opens at the lower end surface of the holder 30S. On the other hand, the second blow-off path 30g extends obliquely downward from the bottom of the horizontal path 30e toward the outside (the side opposite to the processing space 1a) and opens at the lower end surface of the holder 30S. In this embodiment, with respect to the thickness direction (vertical direction) of the processing space 1a, the first blow-out path 30f is inclined about 45 degrees inward, and the second blow-out path 30g is inclined about 30 degrees outward. A ground electrode holder 22 is disposed at the tip (downward) of these blow-out paths 30f and 30g.
[0035]
In addition, on the lower end surface of the holder 30S, two grooves 30h and 30i having a triangular cross section and extending in the front-rear direction are formed side by side. The first blowing path 30f is connected to the first groove 30h on the inner side (the processing space 1a side), and the second blowing path 30g is connected to the second groove 30i on the outer side (the side opposite to the processing space 1a).
[0036]
A procedure for cleaning the workpiece W using the atmospheric pressure plasma processing apparatus M1 configured as described above will be described.
The hot electrode unit 10 is positioned at the retracted position, and the workpiece W to be processed is placed on the upper surface of the ground electrode unit 20. Then, the hot electrode unit 10 is advanced and positioned at the set position.
[0037]
Next, the processing gas is introduced from the processing gas source 50 into the receiving path 32 b through the supply pipe 51. After this processing gas is made uniform in the chamber 32c, it is blown out from the blowing path 30a to the processing space 1a between the electrode units 10 and 20 through the slit 32d.
[0038]
For example, N as the processing gas ₂ Is used, the air outlet 34b in front of the air outlet 30a is opened, and N ₂ Should be blown out. Thereby, the blowing flow from the blowing passage 30a can be blocked from the outside, and outside air can be prevented from being taken into the processing space 1a. In this case, the blowing path 30a corresponds to the “first blowing means” of the present invention, and the blowing path 34b constitutes the “second blowing means” of the present invention.
[0039]
Further, the pulse power supply 40 is turned on. Thereby, a pulse voltage is applied to the backward electrode member 13 of the hot electrode 11. Since the two divided members 12 and 13 of the hot electrode 11 are pressed against each other and are in a good conductive state, the pulse voltage is surely applied to the opposing electrode member 12 without loss. . As a result, an electric field is formed in the processing space 1 a between the upper and lower electrodes 11 and 21. This electric field is not affected by the attachment / detachment mechanism including the bolt 14 and the bolt hole 12a. Therefore, uniform glow discharge can be formed without generating an arc in the processing space 1a. By this glow discharge, the processing gas flowing in the processing space 1a can be turned into plasma. Furthermore, the fluorine contained in the sheet 76 can be made into plasma and jump out into the space 1a and mixed with the plasma-treated processing gas. Thereby, the upper surface of the workpiece W can be favorably plasma cleaned. Since fluorine can be extracted from the sheet 76, it is not necessary to include fluorine in the processing gas, and the processing gas supply configuration can be simplified.
[0040]
In parallel, the curtain gas is introduced from the curtain gas source 54 through the supply pipe 55 to the left and right introduction paths 30c. The curtain gas is spread uniformly in the front-rear direction along the horizontal path 30e through the vertical path 30d of the path 30c. And it blows off from the full length area of the horizontal path 30e through the blowing paths 30f and 30g to the extension direction of the hole axis of these blowing paths 30f and 30g.
[0041]
As a result, as shown in FIG. 5, a first gas curtain C1 is formed in the gap between the holders 30S and 22 by the curtain gas from the first blow-out path 30f, and the second gas by the curtain gas from the second blow-out path 30g. A gas curtain C2 is formed. That is, the gas curtains C1 and C2 can be formed in the periphery of the processing space 1a, thereby reducing the processing gas from leaking from the processing space and the outside air entering the processing space. Moreover, the first and second gas curtains C1 and C2 have a “C” shape in a side view. That is, the first gas curtain C1 is inclined inward (to the processing space 1a) as it goes downward. By the first gas curtain C1 having the inner slope, the processing gas can be reliably prevented from leaking from the processing space 1a. On the other hand, the second gas curtain C2 is inclined outward (opposite to the processing space 1a) as it goes downward. By the second gas curtain C2 having the outer slope, it is possible to reliably prevent outside air from being taken into the processing space 1a.
[0042]
The used processing gas and curtain gas are sucked into the suction path 30b of the rear holder 30R, sucked into the vacuum pump 53 through the exhaust path 36a and the exhaust pipe 52, and exhausted.
After the processing is completed, the supply of processing gas and curtain gas is stopped and the power supply is stopped. Then, the hot electrode unit 10 is pushed and positioned at the retracted position, and the cleaned work W on the ground electrode unit 20 is taken out.
[0043]
According to the atmospheric pressure plasma processing apparatus M1 of this embodiment, the dielectric plate 71 can be detachably attached to a part of the electrode 11, that is, the electrode member 13, and can be stably installed. This mechanism for attaching and detaching does not generate an arc or impair the uniformity of plasma. When the dielectric plate 71 is damaged or dirty, a part of the electrode 11, that is, the back-side electrode member 13 can be easily replaced separately by removing the bolt 14. That is, it is not necessary to replace the entire electrode 11. Therefore, it is not necessary to remove the power supply line 41 and the refrigerant pipes 61 and 62 connected to the back electrode member 13 of the electrode 11 or to remove the back electrode member 13 from the suspension bracket 19.
[0044]
The counter electrode member 12 is formed in a film shape or a thin plate shape such as an aluminum foil, and the back electrode member 13 is formed with a suction hole that opens in a divided surface with the counter electrode member. A suction unit may be connected to the suction hole, and the opposing electrode member may be sucked to the suction hole by the suction unit.
[0045]
Further, since the adhesive 74 is sufficiently defoamed before curing, and the space between the opposing electrode member 12 and the dielectric plate 71 is filled with the adhesive 74 having almost no air bubbles, the space between these members 12 and 71 is reduced. Can reliably prevent arcing.
Furthermore, an arc from the peripheral side surface of the opposing electrode member 12 can be prevented by the dielectric attachment member 73, and as a result, the arc can be prevented from being transmitted around the periphery of the dielectric plate 71 and falling to the ground electrode 21. And since the volt | bolt 75 is formed with dielectric material resin, the arc from the surrounding side surface of the opposing electrode member 12 can be prevented more reliably. It should be noted that the peripheral side portion of the back-side electrode member 13 and the bolt 39 that stops the holders 35 and 30S are also preferably made of a dielectric resin in order to prevent arcing.
[0046]
When the opposing electrode member 12 and the dielectric plate 71 are thermally expanded to a different degree by voltage application, the UV curable adhesive 74 expands and contracts while maintaining the bonding state of the members 12 and 71, so that these members 12 and 71 can be absorbed, and thermal stress can be prevented from occurring in these members 12 and 71.
[0047]
The present invention is not limited to the above-described embodiment, and various modifications can be made.
For example, the blowing direction of any one of the first and second blowing means may extend straight along the thickness direction of the processing space.
The 1st, 2nd blowing means may be comprised by the slit-like blowing path covering the substantially full length area of an inert gas expansion means.
The first and second blowing means may be arranged on opposite sides of the processing space in the thickness direction. (Either one of the first and second outlets 30f, 30g may be provided in the lower electrode holder 22.)
The plasma processing apparatus according to the above embodiment is a so-called direct type in which an object to be processed is disposed between a pair of electrodes, and the processing space is used as a processing space. The present invention can also be applied to a so-called remote type plasma processing apparatus in which an object is placed and plasma processing gas is blown out.
The present invention is applicable not only to glow discharge but also to plasma treatment by corona discharge, and is not limited to cleaning, but includes film formation, surface modification (hydrophilization, water repellency, functional group addition, etc.), etching, ashing, etc. It can be applied to various discharge plasma treatments.
[0048]
【The invention's effect】
As described above, according to the present invention, it is possible to reliably prevent the processing gas from leaking from the processing space, or to reliably prevent outside air from entering the processing space.
[Brief description of the drawings]
FIG. 1 is a cross-sectional view of a normal pressure plasma processing apparatus according to an embodiment of the present invention cut along a front-rear direction.
FIG. 2 is a cross-sectional view of the atmospheric pressure plasma processing apparatus cut along the left-right direction.
FIG. 3 is an enlarged sectional view showing an electrode facing portion of the atmospheric pressure plasma processing apparatus.
FIG. 4A is a side view of left and right electrode holders of a hot electrode unit of the atmospheric pressure plasma processing apparatus.
(B) It is a bottom view of the said electrode holder.
FIG. 5 is an enlarged cross-sectional view of a main part of the atmospheric pressure plasma processing apparatus.
[Explanation of symbols]
M1 atmospheric pressure plasma processing equipment
W Workpiece (Workpiece)
C1 first gas curtain
C2 second gas curtain
1a Processing space
10 Hot electrode unit
11 Hot electrode
20 Earth electrode unit
21 Earth electrode
22 Earth electrode holder (the other electrode holder)
30S Hot electrode holder (one electrode holder)
30e Horizontal path (inert gas expansion means)
30f 1st blowing path (1st blowing means)
30g Second outlet (second outlet)

Claims (5)

An apparatus for performing plasma surface treatment of an object to be processed with a processing gas converted into plasma in a processing space at a substantially normal pressure,
A first blow path for forming a first gas curtain blown to the peripheral portion of the processing space separately from the above process gas an inert gas,
Tip, above the said processing space side of the distal end of the first blowing path are spaced apart on opposite sides, to form a second gas curtain by blowing an inert gas from the tip, and the first blowing path and a separate second blowing path,
The plasma processing characterized in that the blowing direction of at least one of the first and second blowing paths is inclined to the opposite side of the other blowing path with respect to the thickness direction of the processing space. apparatus. The blowing direction of the other blowing path is along the thickness direction of the processing space, or is inclined to the opposite side of the one blowing path with respect to the thickness direction of the processing space. The plasma processing apparatus according to claim 1. An inert gas expansion means that extends along the peripheral edge of the processing space and expands the inert gas in the extending direction is provided, and the first and second blow-off paths branch from a substantially full length region of the inert gas expansion means. The plasma processing apparatus according to claim 1, wherein the plasma processing apparatus extends. The first blowing path is inclined toward the processing space as it goes to the tip, and the second blowing path is tilted toward the side opposite to the processing space as it goes toward the tip. The plasma processing apparatus in any one of Claims 1-3 . The above processing space is defined in between, a pair of electrodes for converting the processing gas introduced into this space into plasma by applying an electric field, and a holder provided on the peripheral edge of each electrode, The plasma processing according to any one of claims 1 to 4, wherein first and second blow-out paths are provided, and the other electrode holder is disposed so as to face a tip portion of these blow-out paths. apparatus.

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