GB2185494B - Vapour phase deposition process - Google Patents

Vapour phase deposition process

Info

Publication number
GB2185494B
GB2185494B GB8601188A GB8601188A GB2185494B GB 2185494 B GB2185494 B GB 2185494B GB 8601188 A GB8601188 A GB 8601188A GB 8601188 A GB8601188 A GB 8601188A GB 2185494 B GB2185494 B GB 2185494B
Authority
GB
United Kingdom
Prior art keywords
deposition process
phase deposition
vapour phase
vapour
phase
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB8601188A
Other versions
GB8601188D0 (en
GB2185494A (en
Inventor
Clifford Graham Cureton
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
STC PLC
Original Assignee
STC PLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by STC PLC filed Critical STC PLC
Priority to GB8601188A priority Critical patent/GB2185494B/en
Publication of GB8601188D0 publication Critical patent/GB8601188D0/en
Publication of GB2185494A publication Critical patent/GB2185494A/en
Application granted granted Critical
Publication of GB2185494B publication Critical patent/GB2185494B/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C23C16/483—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation using coherent light, UV to IR, e.g. lasers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Optics & Photonics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
GB8601188A 1986-01-18 1986-01-18 Vapour phase deposition process Expired GB2185494B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB8601188A GB2185494B (en) 1986-01-18 1986-01-18 Vapour phase deposition process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB8601188A GB2185494B (en) 1986-01-18 1986-01-18 Vapour phase deposition process

Publications (3)

Publication Number Publication Date
GB8601188D0 GB8601188D0 (en) 1986-02-19
GB2185494A GB2185494A (en) 1987-07-22
GB2185494B true GB2185494B (en) 1989-11-15

Family

ID=10591574

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8601188A Expired GB2185494B (en) 1986-01-18 1986-01-18 Vapour phase deposition process

Country Status (1)

Country Link
GB (1) GB2185494B (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2623820A1 (en) * 1987-11-30 1989-06-02 Gen Electric GAS PHASE DEPOSITION BY LASER CHEMICAL PROCESS USING FIBER OPTIC BEAM
US7575784B1 (en) 2000-10-17 2009-08-18 Nanogram Corporation Coating formation by reactive deposition
CN1251809C (en) 2000-10-17 2006-04-19 尼奥弗托尼克斯公司 Coating formation by reactive deposition
US7491431B2 (en) 2004-12-20 2009-02-17 Nanogram Corporation Dense coating formation by reactive deposition
CN113666378A (en) * 2021-09-03 2021-11-19 徐州金琳光电材料产业研究院有限公司 Preparation method of high-purity silicon dioxide for optical coating

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2163000A (en) * 1984-07-26 1986-02-12 Japan Res Dev Corp Apparatus for forming crystal of semiconductor

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2163000A (en) * 1984-07-26 1986-02-12 Japan Res Dev Corp Apparatus for forming crystal of semiconductor

Also Published As

Publication number Publication date
GB8601188D0 (en) 1986-02-19
GB2185494A (en) 1987-07-22

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Legal Events

Date Code Title Description
732E Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977)
732E Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977)
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20000118