GB2223509B - Vapour phase processing - Google Patents

Vapour phase processing

Info

Publication number
GB2223509B
GB2223509B GB8823233A GB8823233A GB2223509B GB 2223509 B GB2223509 B GB 2223509B GB 8823233 A GB8823233 A GB 8823233A GB 8823233 A GB8823233 A GB 8823233A GB 2223509 B GB2223509 B GB 2223509B
Authority
GB
United Kingdom
Prior art keywords
vapour phase
phase processing
processing
vapour
phase
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
GB8823233A
Other versions
GB8823233D0 (en
GB2223509A (en
Inventor
George Richard Antell
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
STC PLC
Nortel Networks Optical Components Ltd
Original Assignee
STC PLC
Northern Telecom Europe Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by STC PLC, Northern Telecom Europe Ltd filed Critical STC PLC
Priority to GB8823233A priority Critical patent/GB2223509B/en
Publication of GB8823233D0 publication Critical patent/GB8823233D0/en
Publication of GB2223509A publication Critical patent/GB2223509A/en
Application granted granted Critical
Publication of GB2223509B publication Critical patent/GB2223509B/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C30B25/14—Feed and outlet means for the gases; Modifying the flow of the reactive gases
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
GB8823233A 1988-10-04 1988-10-04 Vapour phase processing Expired - Lifetime GB2223509B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB8823233A GB2223509B (en) 1988-10-04 1988-10-04 Vapour phase processing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB8823233A GB2223509B (en) 1988-10-04 1988-10-04 Vapour phase processing

Publications (3)

Publication Number Publication Date
GB8823233D0 GB8823233D0 (en) 1988-11-09
GB2223509A GB2223509A (en) 1990-04-11
GB2223509B true GB2223509B (en) 1992-08-05

Family

ID=10644667

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8823233A Expired - Lifetime GB2223509B (en) 1988-10-04 1988-10-04 Vapour phase processing

Country Status (1)

Country Link
GB (1) GB2223509B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7678194B2 (en) 2002-07-17 2010-03-16 Applied Materials, Inc. Method for providing gas to a processing chamber
US8146896B2 (en) 2008-10-31 2012-04-03 Applied Materials, Inc. Chemical precursor ampoule for vapor deposition processes

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0269389A (en) * 1988-08-31 1990-03-08 Toyo Stauffer Chem Co Formation of saturated vapor of solid organometallic compound in vapor growth method
GB9206552D0 (en) * 1992-03-26 1992-05-06 Epichem Ltd Bubblers
DE60020781T2 (en) * 1999-08-20 2006-05-11 Rohm And Haas Chemicals Llc Bubble device with two fries
US6444038B1 (en) 1999-12-27 2002-09-03 Morton International, Inc. Dual fritted bubbler
DE60106675T2 (en) * 2000-05-31 2005-12-01 Shipley Co., L.L.C., Marlborough Evaporator
US7547363B2 (en) 2003-07-08 2009-06-16 Tosoh Finechem Corporation Solid organometallic compound-filled container and filling method thereof
CA2566944C (en) * 2004-05-20 2016-10-11 Nam Hung Tran Bubbler for constant vapor delivery of a solid chemical
US7775508B2 (en) 2006-10-31 2010-08-17 Applied Materials, Inc. Ampoule for liquid draw and vapor draw with a continuous level sensor
CN102330071A (en) * 2011-09-05 2012-01-25 西安中为光电科技有限公司 Improving method of service efficiency of solid-state source in serial connection
CN102296282A (en) * 2011-09-05 2011-12-28 西安中为光电科技有限公司 Method for improving using efficiency of solid state source by reverse connection
US9598766B2 (en) * 2012-05-27 2017-03-21 Air Products And Chemicals, Inc. Vessel with filter
US9957612B2 (en) 2014-01-17 2018-05-01 Ceres Technologies, Inc. Delivery device, methods of manufacture thereof and articles comprising the same
CN112458434B (en) * 2021-01-29 2021-06-01 江苏南大光电材料股份有限公司 Packaging container for solid precursor and application of packaging container in vapor deposition process

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB439218A (en) * 1934-12-14 1935-12-02 Sparklets Ltd Improvements in or relating to spraying apparatus
GB621778A (en) * 1945-05-10 1949-04-19 Gen Electric Apparatus for the production of a "smoke" or "fog" of finely divided materials
GB666402A (en) * 1947-09-20 1952-02-13 Mise En Valeur Des Brevets Et Improvements in or relating to the preparation of aerosols
GB847119A (en) * 1956-06-15 1960-09-07 Ciba Ltd Method and apparatus for condensing the vapours of metal chlorides
GB980991A (en) * 1962-03-23 1965-01-20 Ici Ltd Apparatus for evaporating solid carbon dioxide
GB1074957A (en) * 1962-12-21 1967-07-05 Ciba Ltd A method of and a device for discharging volatile active liquids over a prolonged period at a uniform rate
EP0113518A2 (en) * 1982-12-09 1984-07-18 Morton Thiokol, Inc. Bubbler cylinder and dip tube device
GB2158645A (en) * 1983-05-10 1985-11-13 Raytheon Co Semiconductor manufacturing methods
EP0196170A2 (en) * 1985-03-26 1986-10-01 Kabushiki Kaisha Toshiba Organic metallic compound pyrolysis vapor growth apparatus
GB2183175A (en) * 1985-11-13 1987-06-03 Blake Martin Device for producing smoke or mist

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB439218A (en) * 1934-12-14 1935-12-02 Sparklets Ltd Improvements in or relating to spraying apparatus
GB621778A (en) * 1945-05-10 1949-04-19 Gen Electric Apparatus for the production of a "smoke" or "fog" of finely divided materials
GB666402A (en) * 1947-09-20 1952-02-13 Mise En Valeur Des Brevets Et Improvements in or relating to the preparation of aerosols
GB847119A (en) * 1956-06-15 1960-09-07 Ciba Ltd Method and apparatus for condensing the vapours of metal chlorides
GB980991A (en) * 1962-03-23 1965-01-20 Ici Ltd Apparatus for evaporating solid carbon dioxide
GB1074957A (en) * 1962-12-21 1967-07-05 Ciba Ltd A method of and a device for discharging volatile active liquids over a prolonged period at a uniform rate
EP0113518A2 (en) * 1982-12-09 1984-07-18 Morton Thiokol, Inc. Bubbler cylinder and dip tube device
GB2158645A (en) * 1983-05-10 1985-11-13 Raytheon Co Semiconductor manufacturing methods
EP0196170A2 (en) * 1985-03-26 1986-10-01 Kabushiki Kaisha Toshiba Organic metallic compound pyrolysis vapor growth apparatus
GB2183175A (en) * 1985-11-13 1987-06-03 Blake Martin Device for producing smoke or mist

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7678194B2 (en) 2002-07-17 2010-03-16 Applied Materials, Inc. Method for providing gas to a processing chamber
US8146896B2 (en) 2008-10-31 2012-04-03 Applied Materials, Inc. Chemical precursor ampoule for vapor deposition processes

Also Published As

Publication number Publication date
GB8823233D0 (en) 1988-11-09
GB2223509A (en) 1990-04-11

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Legal Events

Date Code Title Description
732E Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977)
732E Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977)
732E Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977)
732E Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977)
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20031004