JP7119161B2 - ラッカーで基板を被覆する方法およびラッカー層を平坦化するための装置 - Google Patents
ラッカーで基板を被覆する方法およびラッカー層を平坦化するための装置 Download PDFInfo
- Publication number
- JP7119161B2 JP7119161B2 JP2021063110A JP2021063110A JP7119161B2 JP 7119161 B2 JP7119161 B2 JP 7119161B2 JP 2021063110 A JP2021063110 A JP 2021063110A JP 2021063110 A JP2021063110 A JP 2021063110A JP 7119161 B2 JP7119161 B2 JP 7119161B2
- Authority
- JP
- Japan
- Prior art keywords
- lacquer
- substrate
- solvent
- atmosphere
- lacquer layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000004922 lacquer Substances 0.000 title claims description 113
- 239000000758 substrate Substances 0.000 title claims description 71
- 238000000034 method Methods 0.000 title claims description 24
- 239000011248 coating agent Substances 0.000 title claims description 12
- 238000000576 coating method Methods 0.000 title claims description 12
- 239000002904 solvent Substances 0.000 claims description 81
- 238000010438 heat treatment Methods 0.000 claims description 20
- 239000002245 particle Substances 0.000 claims description 19
- 238000001035 drying Methods 0.000 claims description 13
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 239000007789 gas Substances 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 238000005507 spraying Methods 0.000 description 3
- 239000006200 vaporizer Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 230000002349 favourable effect Effects 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000012876 topography Methods 0.000 description 2
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 235000019592 roughness Nutrition 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000009987 spinning Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000009423 ventilation Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
- B05D3/0433—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases the gas being a reactive gas
- B05D3/0453—After-treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C9/00—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
- B05C9/08—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation
- B05C9/12—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation the auxiliary operation being performed after the application
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/02—Processes for applying liquids or other fluent materials performed by spraying
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
- B05D3/0254—After-treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
- B05D3/0433—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases the gas being a reactive gas
- B05D3/0453—After-treatment
- B05D3/046—Curing or evaporating the solvent
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
- B05D3/0466—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases the gas being a non-reacting gas
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
- B05D3/0466—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases the gas being a non-reacting gas
- B05D3/0473—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases the gas being a non-reacting gas for heating, e.g. vapour heating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
- B05D3/0486—Operating the coating or treatment in a controlled atmosphere
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
- B05D3/0493—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases using vacuum
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/10—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by other chemical means
- B05D3/107—Post-treatment of applied coatings
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/02—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to macromolecular substances, e.g. rubber
- B05D7/04—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to macromolecular substances, e.g. rubber to surfaces of films or sheets
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/24—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials for applying particular liquids or other fluent materials
- B05D7/26—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials for applying particular liquids or other fluent materials synthetic lacquers or varnishes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Spray Control Apparatus (AREA)
- Coating Apparatus (AREA)
- Details Or Accessories Of Spraying Plant Or Apparatus (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Description
Claims (6)
- 基板(26)の上のラッカー層(30)を平坦化する装置であって、
処理チャンバ(12)、
ラッカー層(30)の溶剤比率を減らすように設計された乾燥装置(18)、および
処理チャンバ(12)の中で溶剤雰囲気を形成できる蒸発器(16)、を有し、
蒸発器(16)は、基板に塗布されたラッカーの溶剤割合が乾燥装置(18)により減少した後に、溶剤雰囲気を生成するように構成され、塗布装置(18)により基板に塗布されたラッカーが再び流動しないようにし、かつラッカー層が不規則やラッカー粒子のない状態で製造されるようにした装置。 - 装置(10)は、基板に均一にラッカーを塗布できる、特にラッカーを噴霧できる被覆装置(20)を有することを特徴とする請求項1に記載の装置。
- 乾燥装置(18)は、処理チャンバ(12)の中で真空を形成することができる真空ポンプ(28)を有することを特徴とする請求項1または2に記載の装置。
- 加熱装置(18)は、ラッカー層(30)を加熱することができる加熱装置(36)を有することを特徴とする請求項1~3のいずれかに記載の装置。
- 装置(10)は、処理チャンバ(12)の中で雰囲気を加熱できる加熱システム(22)を有することを特徴とする請求項1~4のいずれかに記載の装置。
- 蒸発器(16)は、少なくとも50mol%、特に少なくとも70mol%の溶剤比率を有する溶剤雰囲気を形成することを特徴とする請求項1~5のいずれかに記載の装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102014113928.3 | 2014-09-25 | ||
DE102014113928.3A DE102014113928B4 (de) | 2014-09-25 | 2014-09-25 | Verfahren zum Beschichten eines Substrats mit einem Lack sowie Vorrichtung zum Planarisieren einer Lackschicht |
JP2015183992A JP6863674B2 (ja) | 2014-09-25 | 2015-09-17 | ラッカーで基板を被覆する方法およびラッカー層を平坦化するための装置 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015183992A Division JP6863674B2 (ja) | 2014-09-25 | 2015-09-17 | ラッカーで基板を被覆する方法およびラッカー層を平坦化するための装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2021119001A JP2021119001A (ja) | 2021-08-12 |
JP7119161B2 true JP7119161B2 (ja) | 2022-08-16 |
Family
ID=55485545
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015183992A Active JP6863674B2 (ja) | 2014-09-25 | 2015-09-17 | ラッカーで基板を被覆する方法およびラッカー層を平坦化するための装置 |
JP2021063110A Active JP7119161B2 (ja) | 2014-09-25 | 2021-04-01 | ラッカーで基板を被覆する方法およびラッカー層を平坦化するための装置 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015183992A Active JP6863674B2 (ja) | 2014-09-25 | 2015-09-17 | ラッカーで基板を被覆する方法およびラッカー層を平坦化するための装置 |
Country Status (7)
Country | Link |
---|---|
US (2) | US10232405B2 (ja) |
JP (2) | JP6863674B2 (ja) |
KR (1) | KR20160036500A (ja) |
CN (1) | CN105457855B (ja) |
AT (1) | AT516292B1 (ja) |
DE (1) | DE102014113928B4 (ja) |
TW (1) | TWI724999B (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106622829B (zh) * | 2016-12-09 | 2019-05-07 | 安徽省建筑工程质量监督检测站 | 一种负压环境下防水涂料的成型方法 |
CN109062010A (zh) * | 2018-09-12 | 2018-12-21 | 上海华力集成电路制造有限公司 | 改善光刻胶表面粗糙度的方法 |
DE102019202736A1 (de) * | 2019-02-28 | 2020-09-03 | Audi Ag | Verfahren und Anlage zum Trocknen von Lack |
JP7213583B1 (ja) * | 2021-07-19 | 2023-01-27 | 株式会社ユニバーサルエンターテインメント | 遊技機 |
JP7213584B1 (ja) * | 2021-07-19 | 2023-01-27 | 株式会社ユニバーサルエンターテインメント | 遊技機 |
JP7213586B1 (ja) * | 2021-07-19 | 2023-01-27 | 株式会社ユニバーサルエンターテインメント | 遊技機 |
JP7213585B1 (ja) * | 2021-07-19 | 2023-01-27 | 株式会社ユニバーサルエンターテインメント | 遊技機 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003017402A (ja) | 2001-04-17 | 2003-01-17 | Tokyo Electron Ltd | 基板の処理方法及び基板の処理システム |
JP2003092256A (ja) | 2001-07-12 | 2003-03-28 | Hirata Corp | 基板処理装置及び基板処理方法 |
JP2005334810A (ja) | 2004-05-28 | 2005-12-08 | Alps Electric Co Ltd | スプレーコート装置及びスプレーコート方法 |
WO2010053125A1 (ja) | 2008-11-05 | 2010-05-14 | 株式会社 東芝 | 成膜装置、成膜方法及び半導体装置 |
Family Cites Families (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59166958A (ja) * | 1983-03-11 | 1984-09-20 | Hitachi Chem Co Ltd | 塗装物の製造法 |
US4680871A (en) * | 1985-05-17 | 1987-07-21 | David Reznik | Apparatus and method for drying and curing coated substrates |
JPS62219923A (ja) * | 1986-03-20 | 1987-09-28 | Fujitsu Ltd | 半導体装置の製造方法 |
US4716906A (en) * | 1986-06-30 | 1988-01-05 | Spacelabs, Inc. | Blood pressure cuff |
US4794021A (en) * | 1986-11-13 | 1988-12-27 | Microelectronics And Computer Technology Corporation | Method of providing a planarized polymer coating on a substrate wafer |
JPS63185028A (ja) * | 1987-01-27 | 1988-07-30 | Nec Yamagata Ltd | 半導体装置の製造方法 |
JPH01238017A (ja) * | 1988-03-18 | 1989-09-22 | Fujitsu Ltd | レジスト層の形成方法 |
JPH01248529A (ja) * | 1988-03-30 | 1989-10-04 | Ushio Inc | Sog膜の硬化方法 |
JPH03293057A (ja) * | 1990-04-09 | 1991-12-24 | Honda Motor Co Ltd | 塗装方法 |
JP3214186B2 (ja) * | 1993-10-07 | 2001-10-02 | 三菱電機株式会社 | 半導体装置の製造方法 |
US6248398B1 (en) * | 1996-05-22 | 2001-06-19 | Applied Materials, Inc. | Coater having a controllable pressurized process chamber for semiconductor processing |
JPH11220905A (ja) * | 1998-02-04 | 1999-08-17 | Mitsubishi Chemical Corp | 被覆粒状肥料の製造方法 |
US6530340B2 (en) * | 1998-11-12 | 2003-03-11 | Advanced Micro Devices, Inc. | Apparatus for manufacturing planar spin-on films |
JP2002015971A (ja) * | 2000-06-27 | 2002-01-18 | Matsushita Electric Ind Co Ltd | パターン形成方法及び半導体装置の製造装置 |
JP2002043307A (ja) * | 2000-07-26 | 2002-02-08 | Sharp Corp | 樹脂被膜基板および樹脂被膜基板の製造方法 |
CN1912744B (zh) * | 2001-02-28 | 2010-06-23 | Asml控股公司 | 均匀涂布基片的方法 |
JP4290905B2 (ja) * | 2001-07-10 | 2009-07-08 | Nec液晶テクノロジー株式会社 | 有機膜の平坦化方法 |
RU2345888C2 (ru) * | 2002-04-17 | 2009-02-10 | Стратасис, Инк. | Способ выравнивания при моделировании методом наслоения |
JP2004225147A (ja) | 2003-01-27 | 2004-08-12 | Jfe Steel Kk | 高炉用焼結鉱の製造方法 |
JP2005011996A (ja) * | 2003-06-19 | 2005-01-13 | Tokyo Electron Ltd | 塗布処理方法及び塗布処理装置 |
JP3974127B2 (ja) * | 2003-09-12 | 2007-09-12 | 株式会社東芝 | 半導体装置の製造方法 |
DE10351963B4 (de) | 2003-11-07 | 2013-08-22 | Süss Microtec Lithography Gmbh | Verfahren zum Belacken von Halbleitersubstraten |
JP2006010090A (ja) * | 2004-05-27 | 2006-01-12 | Aisin Seiki Co Ltd | エンジン駆動式空気調和機 |
JP2006100090A (ja) * | 2004-09-29 | 2006-04-13 | Seiko Epson Corp | 有機el装置の製造方法及び製造装置、有機el装置並びに電子機器 |
JP4819016B2 (ja) * | 2007-10-01 | 2011-11-16 | ゲットナー・ファンデーション・エルエルシー | 液晶表示装置の製造方法 |
KR20120135701A (ko) * | 2011-06-07 | 2012-12-17 | 삼성전기주식회사 | 스핀코팅 장치 및 방법, 그리고 구조물을 갖는 기판의 제조방법 |
US20150197455A1 (en) * | 2011-12-08 | 2015-07-16 | Inmold Biosystems A/S | Spin-on-glass assisted polishing of rough substrates |
CN103524770A (zh) * | 2013-08-28 | 2014-01-22 | 中国科学院福建物质结构研究所 | 一种3d打印产品表面抛光方法及其装置 |
-
2014
- 2014-09-25 DE DE102014113928.3A patent/DE102014113928B4/de active Active
-
2015
- 2015-09-15 AT ATA50785/2015A patent/AT516292B1/de active
- 2015-09-17 JP JP2015183992A patent/JP6863674B2/ja active Active
- 2015-09-18 TW TW104130969A patent/TWI724999B/zh active
- 2015-09-22 KR KR1020150133789A patent/KR20160036500A/ko not_active Application Discontinuation
- 2015-09-22 US US14/861,105 patent/US10232405B2/en active Active
- 2015-09-23 CN CN201510612238.4A patent/CN105457855B/zh active Active
-
2019
- 2019-01-24 US US16/256,280 patent/US11247229B2/en active Active
-
2021
- 2021-04-01 JP JP2021063110A patent/JP7119161B2/ja active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003017402A (ja) | 2001-04-17 | 2003-01-17 | Tokyo Electron Ltd | 基板の処理方法及び基板の処理システム |
JP2003092256A (ja) | 2001-07-12 | 2003-03-28 | Hirata Corp | 基板処理装置及び基板処理方法 |
JP2005334810A (ja) | 2004-05-28 | 2005-12-08 | Alps Electric Co Ltd | スプレーコート装置及びスプレーコート方法 |
WO2010053125A1 (ja) | 2008-11-05 | 2010-05-14 | 株式会社 東芝 | 成膜装置、成膜方法及び半導体装置 |
Also Published As
Publication number | Publication date |
---|---|
AT516292B1 (de) | 2018-01-15 |
DE102014113928B4 (de) | 2023-10-05 |
TWI724999B (zh) | 2021-04-21 |
CN105457855A (zh) | 2016-04-06 |
KR20160036500A (ko) | 2016-04-04 |
DE102014113928A1 (de) | 2016-03-31 |
CN105457855B (zh) | 2021-04-27 |
JP2021119001A (ja) | 2021-08-12 |
US11247229B2 (en) | 2022-02-15 |
AT516292A3 (de) | 2017-02-15 |
JP6863674B2 (ja) | 2021-04-21 |
TW201626436A (zh) | 2016-07-16 |
JP2016107258A (ja) | 2016-06-20 |
AT516292A2 (de) | 2016-04-15 |
US20160089693A1 (en) | 2016-03-31 |
US10232405B2 (en) | 2019-03-19 |
US20190151889A1 (en) | 2019-05-23 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP7119161B2 (ja) | ラッカーで基板を被覆する方法およびラッカー層を平坦化するための装置 | |
JP6259299B2 (ja) | 基板処理方法および基板処理装置 | |
JP6591280B2 (ja) | 基板処理装置および基板処理方法 | |
US9934958B2 (en) | Substrate treatment apparatus and substrate treatment method | |
JP6472760B2 (ja) | レジスト等のウエハ周縁部からの溶解除去方法 | |
JP6442359B2 (ja) | 液充填方法および充填材層形成方法 | |
JP2019169555A (ja) | 基板処理方法及び基板処理装置 | |
JP6718216B2 (ja) | 基板を被覆する方法および被覆装置 | |
JP2018160701A5 (ja) | 基板洗浄システム、基板洗浄方法および記憶媒体 | |
KR20200004555A (ko) | 기판 처리 장치 및 기판 처리 방법 | |
JPH0231863A (ja) | コーティング剤の塗布並びにその熟成方法 | |
JPH01139174A (ja) | コーティング剤の塗布並びにその熟成方法 | |
JP6186437B2 (ja) | 基板の照射処理装置 | |
JP5945410B2 (ja) | レジスト現像装置およびモールド製造方法 | |
KR101256290B1 (ko) | 기판 건조 장치 | |
CN107693364B (zh) | 吸脱式粉末药剂的包衣的制备方法 | |
JP2000262959A (ja) | 均一な皮膜層作成方法 | |
JP2012044054A (ja) | 塗布処理装置および塗布液吐出方法 | |
JP2005183629A (ja) | 薄膜形成装置および薄膜形成方法 | |
GB2584834A (en) | Additive manufacturing | |
JPH0527414A (ja) | 半導体用ペリクルおよびその製造方法 | |
JPH01180279A (ja) | コーティング剤の塗布並びにその熟成方法 | |
KR20100029626A (ko) | 트리메틸클로로실란 증기를 이용한 기판 표면 처리 장치 및방법 | |
JP2006068619A (ja) | バリアー膜形成方法およびバリアー膜形成装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20210430 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20210430 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20220127 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20220215 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20220513 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20220705 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20220803 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 7119161 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |