JP2016107258A - ラッカーで基板を被覆する方法およびラッカー層を平坦化するための装置 - Google Patents
ラッカーで基板を被覆する方法およびラッカー層を平坦化するための装置 Download PDFInfo
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- 239000004922 lacquer Substances 0.000 title claims abstract description 118
- 238000000576 coating method Methods 0.000 title claims abstract description 14
- 239000011248 coating agent Substances 0.000 title claims abstract description 13
- 238000000034 method Methods 0.000 title claims description 26
- 239000002904 solvent Substances 0.000 claims abstract description 95
- 238000010438 heat treatment Methods 0.000 claims abstract description 22
- 238000001035 drying Methods 0.000 claims abstract description 12
- 239000000758 substrate Substances 0.000 claims description 79
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 claims description 12
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical group CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 8
- 238000005507 spraying Methods 0.000 claims description 5
- 238000009835 boiling Methods 0.000 claims description 3
- 238000001704 evaporation Methods 0.000 abstract description 3
- 238000000265 homogenisation Methods 0.000 abstract 1
- 239000002245 particle Substances 0.000 description 18
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 238000009826 distribution Methods 0.000 description 5
- 239000007789 gas Substances 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
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- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
- B05D3/0433—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases the gas being a reactive gas
- B05D3/0453—After-treatment
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- B05C9/08—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation
- B05C9/12—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation the auxiliary operation being performed after the application
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- B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
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- B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
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- B05D3/046—Curing or evaporating the solvent
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
- B05D3/0466—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases the gas being a non-reacting gas
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
- B05D3/0466—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases the gas being a non-reacting gas
- B05D3/0473—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases the gas being a non-reacting gas for heating, e.g. vapour heating
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
- B05D3/0486—Operating the coating or treatment in a controlled atmosphere
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
- B05D3/0493—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases using vacuum
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- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/10—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by other chemical means
- B05D3/107—Post-treatment of applied coatings
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
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- B05D7/02—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to macromolecular substances, e.g. rubber
- B05D7/04—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to macromolecular substances, e.g. rubber to surfaces of films or sheets
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
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- B05D7/24—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials for applying particular liquids or other fluent materials
- B05D7/26—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials for applying particular liquids or other fluent materials synthetic lacquers or varnishes
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Coating Apparatus (AREA)
- Spray Control Apparatus (AREA)
- Details Or Accessories Of Spraying Plant Or Apparatus (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Abstract
Description
Claims (16)
- ラッカーで基板(26)を被覆する方法であって、
基板(26)にラッカーが均一に塗布される工程と、
基板(26)に塗布されたラッカー(30)の溶剤比率を減らす工程と、
被覆された基板(26)を溶剤雰囲気に曝す工程と、を含む方法。 - 溶剤雰囲気に曝した後に、被覆された基板が加熱され、その結果、塗布されたラッカー(30)がソフトベークされることを特徴とする請求項1に記載の方法。
- 基板(26)に塗布されたラッカー(30)の溶剤比率を減らすために、被覆された基板が真空に曝されることを特徴とする請求項1または2に記載の方法。
- 基板(26)に塗布されたラッカー(30)の溶剤比率を減らすために、被覆された基板が加熱されることを特徴とする請求項1〜3のいずれかに記載の方法。
- 溶剤雰囲気は、少なくとも50mol%、特に少なくとも70mol%の溶剤比率を有することを特徴とする請求項1〜4のいずれかに記載の方法。
- 溶剤雰囲気の溶剤は、アセトンまたはメチルエチルケトンであることを特徴とする請求項1〜5のいずれかに記載の方法。
- 溶剤雰囲気の温度は、溶剤の沸点より高いことを特徴とする請求項1〜6のいずれかに記載の方法。
- 溶剤雰囲気の圧力は、0.5バール以上、特に0.7バール以上であることを特徴とする請求項1〜7のいずれかに記載の方法。
- 被覆された基板(26)が、480秒間以下、特に420秒以下の間、溶剤雰囲気に曝されることを特徴とする請求項1〜8のいずれかに記載の方法。
- ラッカーは、噴霧により基板に均一に塗布されることを特徴とする請求項1〜9のいずれかに記載の方法。
- 基板(26)の上のラッカー層(30)を平坦化する装置であって、
処理チャンバ(12)、
ラッカー層(30)の溶剤比率を減らすように設計された乾燥装置(18)、および
処理チャンバ(12)の中で溶剤雰囲気を形成できる蒸発器(16)、を有する装置。 - 装置(10)は、基板に均一にラッカーを塗布できる、特にラッカーを噴霧できる被覆装置(20)を有することを特徴とする請求項11に記載の装置。
- 乾燥装置(18)は、処理チャンバ(12)の中で真空を形成することができる真空ポンプ(28)を有することを特徴とする請求項11または12に記載の装置。
- 加熱装置(18)は、ラッカー層(30)を加熱することができる加熱装置(36)を有することを特徴とする請求項11〜13のいずれかに記載の装置。
- 装置(10)は、処理チャンバ(12)の中で雰囲気を加熱できる加熱システム(22)を有することを特徴とする請求項11〜14のいずれかに記載の装置。
- 蒸発器(16)は、少なくとも50mol%、特に少なくとも70mol%の溶剤比率を有する溶剤雰囲気を形成することを特徴とする請求項11〜15のいずれかに記載の装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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JP2021063110A JP7119161B2 (ja) | 2014-09-25 | 2021-04-01 | ラッカーで基板を被覆する方法およびラッカー層を平坦化するための装置 |
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DE102014113928.3A DE102014113928B4 (de) | 2014-09-25 | 2014-09-25 | Verfahren zum Beschichten eines Substrats mit einem Lack sowie Vorrichtung zum Planarisieren einer Lackschicht |
DE102014113928.3 | 2014-09-25 |
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JP2021063110A Division JP7119161B2 (ja) | 2014-09-25 | 2021-04-01 | ラッカーで基板を被覆する方法およびラッカー層を平坦化するための装置 |
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JP2016107258A true JP2016107258A (ja) | 2016-06-20 |
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JP2021063110A Active JP7119161B2 (ja) | 2014-09-25 | 2021-04-01 | ラッカーで基板を被覆する方法およびラッカー層を平坦化するための装置 |
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JP (2) | JP6863674B2 (ja) |
KR (1) | KR20160036500A (ja) |
CN (1) | CN105457855B (ja) |
AT (1) | AT516292B1 (ja) |
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CN106622829A (zh) * | 2016-12-09 | 2017-05-10 | 安徽省建筑工程质量监督检测站 | 一种负压环境下防水涂料的成型方法 |
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CN109062010A (zh) * | 2018-09-12 | 2018-12-21 | 上海华力集成电路制造有限公司 | 改善光刻胶表面粗糙度的方法 |
DE102019202736A1 (de) * | 2019-02-28 | 2020-09-03 | Audi Ag | Verfahren und Anlage zum Trocknen von Lack |
JP7213586B1 (ja) * | 2021-07-19 | 2023-01-27 | 株式会社ユニバーサルエンターテインメント | 遊技機 |
JP7213584B1 (ja) * | 2021-07-19 | 2023-01-27 | 株式会社ユニバーサルエンターテインメント | 遊技機 |
JP7213585B1 (ja) * | 2021-07-19 | 2023-01-27 | 株式会社ユニバーサルエンターテインメント | 遊技機 |
JP7213583B1 (ja) * | 2021-07-19 | 2023-01-27 | 株式会社ユニバーサルエンターテインメント | 遊技機 |
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JP2021119001A (ja) | 2021-08-12 |
AT516292B1 (de) | 2018-01-15 |
US20160089693A1 (en) | 2016-03-31 |
CN105457855B (zh) | 2021-04-27 |
JP6863674B2 (ja) | 2021-04-21 |
TW201626436A (zh) | 2016-07-16 |
DE102014113928B4 (de) | 2023-10-05 |
US10232405B2 (en) | 2019-03-19 |
DE102014113928A1 (de) | 2016-03-31 |
US20190151889A1 (en) | 2019-05-23 |
US11247229B2 (en) | 2022-02-15 |
KR20160036500A (ko) | 2016-04-04 |
JP7119161B2 (ja) | 2022-08-16 |
TWI724999B (zh) | 2021-04-21 |
AT516292A2 (de) | 2016-04-15 |
AT516292A3 (de) | 2017-02-15 |
CN105457855A (zh) | 2016-04-06 |
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