JP6961225B2 - 格子整合クラッド層を有する高い閉じ込め係数のiii窒化物端面発光レーザーダイオードに関する方法およびデバイス - Google Patents
格子整合クラッド層を有する高い閉じ込め係数のiii窒化物端面発光レーザーダイオードに関する方法およびデバイス Download PDFInfo
- Publication number
- JP6961225B2 JP6961225B2 JP2017559826A JP2017559826A JP6961225B2 JP 6961225 B2 JP6961225 B2 JP 6961225B2 JP 2017559826 A JP2017559826 A JP 2017559826A JP 2017559826 A JP2017559826 A JP 2017559826A JP 6961225 B2 JP6961225 B2 JP 6961225B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- laser diode
- clad layer
- semiconductor laser
- porous
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000034 method Methods 0.000 title claims description 46
- 150000004767 nitrides Chemical class 0.000 title description 25
- 239000004065 semiconductor Substances 0.000 claims description 59
- 238000005530 etching Methods 0.000 claims description 44
- 239000000758 substrate Substances 0.000 claims description 19
- 238000001039 wet etching Methods 0.000 claims description 16
- 230000008569 process Effects 0.000 claims description 11
- 238000005253 cladding Methods 0.000 claims description 10
- 239000011148 porous material Substances 0.000 claims description 10
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 8
- 239000003792 electrolyte Substances 0.000 claims description 8
- 238000004519 manufacturing process Methods 0.000 claims description 8
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 7
- 229910017604 nitric acid Inorganic materials 0.000 claims description 7
- 239000006185 dispersion Substances 0.000 claims description 5
- 238000000407 epitaxy Methods 0.000 claims description 5
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 claims description 5
- 238000000151 deposition Methods 0.000 claims description 4
- 239000008151 electrolyte solution Substances 0.000 claims description 4
- 238000005286 illumination Methods 0.000 claims description 2
- 230000003287 optical effect Effects 0.000 description 34
- 229910002704 AlGaN Inorganic materials 0.000 description 32
- 239000000463 material Substances 0.000 description 9
- 238000004364 calculation method Methods 0.000 description 5
- 238000013461 design Methods 0.000 description 4
- 238000001312 dry etching Methods 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000005336 cracking Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 230000003071 parasitic effect Effects 0.000 description 3
- 238000002161 passivation Methods 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 238000009616 inductively coupled plasma Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000000370 acceptor Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 230000006399 behavior Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 238000004993 emission spectroscopy Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000000877 morphologic effect Effects 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 238000001878 scanning electron micrograph Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 230000002269 spontaneous effect Effects 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000000927 vapour-phase epitaxy Methods 0.000 description 1
- 238000001947 vapour-phase growth Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/2004—Confining in the direction perpendicular to the layer structure
- H01S5/2009—Confining in the direction perpendicular to the layer structure by using electron barrier layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/2054—Methods of obtaining the confinement
- H01S5/2081—Methods of obtaining the confinement using special etching techniques
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/305—Structure or shape of the active region; Materials used for the active region characterised by the doping materials used in the laser structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
- H01S5/3211—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures characterised by special cladding layers, e.g. details on band-discontinuities
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
- H01S5/3211—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures characterised by special cladding layers, e.g. details on band-discontinuities
- H01S5/3213—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures characterised by special cladding layers, e.g. details on band-discontinuities asymmetric clading layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
- H01S5/3211—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures characterised by special cladding layers, e.g. details on band-discontinuities
- H01S5/3219—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures characterised by special cladding layers, e.g. details on band-discontinuities explicitly Al-free cladding layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/343—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/34333—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser with a well layer based on Ga(In)N or Ga(In)P, e.g. blue laser
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S2304/00—Special growth methods for semiconductor lasers
- H01S2304/04—MOCVD or MOVPE
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
- H01S5/042—Electrical excitation ; Circuits therefor
- H01S5/0421—Electrical excitation ; Circuits therefor characterised by the semiconducting contacting layers
- H01S5/0422—Electrical excitation ; Circuits therefor characterised by the semiconducting contacting layers with n- and p-contacts on the same side of the active layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
- H01S5/3211—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures characterised by special cladding layers, e.g. details on band-discontinuities
- H01S5/3214—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures characterised by special cladding layers, e.g. details on band-discontinuities comprising materials from other groups of the periodic system than the materials of the active layer, e.g. ZnSe claddings and GaAs active layer
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Geometry (AREA)
- Semiconductor Lasers (AREA)
- Led Devices (AREA)
- Weting (AREA)
Description
技術分野
該技術は、端面発光III窒化物レーザーダイオードなどの端面発光レーザーダイオードに関する。
従来の端面発光半導体レーザーは典型的に、分離閉じ込めヘテロ構造(separate confinement heterostructure) (SCH)を使用する(implement)。この構造において、光学導波管構造は、上部クラッド層と底部クラッド層に挟まれた能動接合を含み得る。クラッド層は典型的に、より低い屈折率を有するので、光学モードは、導波管構造内に空間的に閉じ込められ得る。エンドミラー(end mirror)または屈折半導体/エアファセットは、長さ方向に(例えば、レーザー発光の方向に沿って)さらなる光学的な閉じ込めを提供し得、レーザー空洞を画定し得る。導波管構造は、より大きな禁制帯を有するp型およびn型半導体層間に挟まれた能動領域、通常多量子井戸を含み得る。p型およびn型層は、能動領域内の誘導放出の電気的および光学的な閉じ込めを補助する。半導体構造における効果的な発振(lasing)には、光学的閉じ込めと電気的閉じ込めの両方が必要である。
発明者らは、格子整合ナノ多孔質n+型クラッド層を有するIII窒化物端面発光レーザーダイオードを作製するための方法および構造を思いつき、開発した。高度にドーピングされたn+-GaNクラッド層は、レーザーダイオード構造の一部としてエピタキシャルに成長し得る。該構造はさらに、n型GaNとp型GaN半導体層に挟まれたInGaN/GaN多量子井戸を含み得る。n+ドープト(doped)GaN層は、その後、電気化学的エッチング法により選択的に多孔化され、その後、層が高度に導電性を維持しながら、材料の屈折率は有意に低下する。電気化学的多孔質化プロセスにより、レーザー構造の隣接するn型GaN層と比較して、高いインデックスコントラスト(index contrast)を有するn面(底面)クラッド層が生じる。さらに、多孔質クラッド層は、高度に導電性であり、かつ隣接する層と格子整合している。整合した格子は、高いインデックスコントラストを有する他の半導体レーザーダイオード構造に存在し得る材料の応力を防ぐ。
発明者らは、従来のIII窒化物端面発光レーザーダイオードおよび他の半導体材料(例えば、GaAs、InP等)で作製された端面発光レーザーダイオードは、レーザーダイオードの能動領域とクラッド層の間の屈折率コントラストを制限する固形の半導体クラッド層(例えば、III窒化物系についてAlGaNで形成される)を有することを認識し、理解している。屈折率コントラストにおけるこの制限は、レーザーの光学モードが、しばしば良好に閉じ込められず、ダイオードの能動領域(誘導放出が生じる領域)に空間的に良好に整合されないことを意味する。その結果、発明者らは、ダイオードの効率が可能な程度まで高くならないということを認識し、理解している。
本発明の態様として、以下のものが挙げられる。
[1]基板上に形成されレーザービームの端面発光のために整列される能動領域、および該基板と該能動領域の間に形成される多孔質クラッド層を含む、半導体レーザーダイオード。
[2]能動領域についての第1の屈折率値と多孔質クラッド層についての第2の屈折率値の差が0.1より大きい、[1]記載の半導体レーザーダイオード。
[3]該多孔質クラッド層がnドープトGaNを含む、[1]記載の半導体レーザーダイオード。
[4]該多孔質クラッド層のドーピング密度が1×10 18 cm -3 〜1×10 19 cm -3 である、[3]記載の半導体レーザーダイオード。
[5]1×10 18 cm -3 〜5×10 18 cm -3 のドーピングレベルを有し、該多孔質クラッド層と該基板の間に配置されるn型GaN層をさらに含む、[4]記載の半導体レーザーダイオード。
[6]該多孔質クラッド層の多孔率が30%〜60%である、[1]記載の半導体レーザーダイオード。
[7]該多孔質クラッド層の平均孔径が10nm〜100nmである、[6]記載の半導体レーザーダイオード。
[8]該多孔質クラッド層の厚さが200nm〜500nmである、[1]記載の半導体レーザーダイオード。
[9]該能動領域が多量子井戸を含む、[1]〜[8]いずれか記載の半導体レーザーダイオード。
[10]多孔質クラッド層の反対にある能動領域の面上に形成される導電性酸化物クラッド層をさらに含む、[1]〜[8]いずれか記載の半導体レーザーダイオード。
[11]4%〜10%の一次元閉じ込め係数Γ 1D を有する、[10]記載の半導体レーザーダイオード。
[12]該導電性酸化物クラッド層が酸化インジウムスズを含む、[10]記載の半導体レーザーダイオード。
[13]照明の光源として一体化される、[1]〜[11]いずれか記載の半導体レーザーダイオード。
[14]半導体レーザーダイオードを作製するための方法であって、該方法が、
基板上にn+ドープトGaN層を形成する工程、
該n+ドープトGaN層に隣接する端面発光半導体レーザーダイオードのための能動接合を形成する工程、
能動接合を通るトレンチをエッチングして、n+ドープトGaN層の表面を暴露させる工程、および
続いて、n+ドープトGaN層をウエットエッチングして、n+ドープトGaN層を多孔質クラッド層に変換する工程
を含む、方法。
[15]該能動接合に隣接する導電性酸化物クラッド層を形成する工程をさらに含む、[14]記載の方法。
[16]該n+ドープトGaN層に隣接するn型電流分散層を形成する工程をさらに含み、n型電流分散層のドーピング濃度が1×10 18 cm -3 〜5×10 18 cm -3 である、[14]記載の方法。
[17]能動接合を形成する工程が、n型GaN、多量子井戸およびp型GaNをエピタキシーにより堆積させる工程を含む、[14]記載の方法。
[18]能動接合を形成した後にウエットエッチングがなされる、[14]または[17]記載の方法。
[19]ウエットエッチングが、n+ドープトGaN層を側方に多孔化する電気化学的エッチングを含み、光増幅エッチングを必要としない、[14]〜[17]いずれか記載の方法。
[20]ウエットエッチングが、n+ドープトGaN層を多孔化するための電解液として硝酸を使用する、[19]記載の方法。
[21]ウエットエッチングが、n+ドープトGaN層を多孔化するための電解液としてフッ化水素酸を含む[19]記載の方法。
[22]n+ドープトGaN層が、5×10 18 cm -3 〜2×10 20 cm -3 のドーピング濃度を有する、[14]〜[16]いずれか記載の方法。
Claims (21)
- 基板上に形成されレーザービームの端面発光のために整列される能動領域、および該基板と該能動領域の間に形成される多孔質クラッド層を含む、半導体レーザーダイオードであって、該多孔質クラッド層は、該レーザーダイオードが、6.06%〜10%の一次元閉じ込め係数Γ1Dを有するように、屈折率コントラストを提供する、半導体レーザーダイオード。
- 能動領域についての第1の屈折率値と多孔質クラッド層についての第2の屈折率値の差が0.1より大きい、請求項1記載の半導体レーザーダイオード。
- 該多孔質クラッド層がnドープトGaNを含む、請求項1記載の半導体レーザーダイオード。
- 該多孔質クラッド層のドーピング密度が1×1018cm-3〜1×1019cm-3である、請求項3記載の半導体レーザーダイオード。
- 1×1018cm-3〜5×1018cm-3のドーピングレベルを有し、該多孔質クラッド層と該基板の間に配置されるn型GaN層をさらに含む、請求項4記載の半導体レーザーダイオード。
- 該多孔質クラッド層の多孔率が30%〜60%である、請求項1記載の半導体レーザーダイオード。
- 該多孔質クラッド層の平均孔径が10nm〜100nmである、請求項6記載の半導体レーザーダイオード。
- 該多孔質クラッド層の厚さが200nm〜500nmである、請求項1記載の半導体レーザーダイオード。
- 該能動領域が多量子井戸を含む、請求項1〜8いずれか記載の半導体レーザーダイオード。
- 多孔質クラッド層の反対にある能動領域の面上に形成される導電性酸化物クラッド層をさらに含む、請求項1〜8いずれか記載の半導体レーザーダイオード。
- 該導電性酸化物クラッド層が酸化インジウムスズを含む、請求項10記載の半導体レーザーダイオード。
- 照明の光源として一体化される、請求項1〜10いずれか記載の半導体レーザーダイオード。
- 半導体レーザーダイオードを作製するための方法であって、該方法が、
基板上にn+ドープトGaN層を形成する工程、
該n+ドープトGaN層に隣接する端面発光半導体レーザーダイオードのための能動接合を形成する工程、
能動接合を通るトレンチをエッチングして、n+ドープトGaN層の表面を暴露させる工程、および
続いて、n+ドープトGaN層をウエットエッチングして、n+ドープトGaN層を多孔質クラッド層に変換する工程
を含み、該多孔質クラッド層は、該レーザーダイオードが、6.06%〜10%の一次元閉じ込め係数Γ1Dを有するように、屈折率コントラストを提供する、方法。 - 該能動接合に隣接する導電性酸化物クラッド層を形成する工程をさらに含む、請求項13記載の方法。
- 該n+ドープトGaN層に隣接するn型電流分散層を形成する工程をさらに含み、n型電流分散層のドーピング濃度が1×1018cm-3〜5×1018cm-3である、請求項13記載の方法。
- 能動接合を形成する工程が、n型GaN、多量子井戸およびp型GaNをエピタキシーにより堆積させる工程を含む、請求項13記載の方法。
- 能動接合を形成した後にウエットエッチングがなされる、請求項13または16記載の方法。
- ウエットエッチングが、n+ドープトGaN層を側方に多孔化する電気化学的エッチングを含み、光増速エッチングを必要としない、請求項13〜16いずれか記載の方法。
- ウエットエッチングが、n+ドープトGaN層を多孔化するための電解液として硝酸を使用する、請求項18記載の方法。
- ウエットエッチングが、n+ドープトGaN層を多孔化するための電解液としてフッ化水素酸を使用する、請求項18記載の方法。
- n+ドープトGaN層が、5×1018cm-3〜2×1020cm-3のドーピング濃度を有する、請求項13〜15いずれか記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201562163811P | 2015-05-19 | 2015-05-19 | |
US62/163,811 | 2015-05-19 | ||
PCT/US2016/033270 WO2016187421A1 (en) | 2015-05-19 | 2016-05-19 | A method and device concerning iii-nitride edge emitting laser diode of high confinement factor with lattice matched cladding layer |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2018517295A JP2018517295A (ja) | 2018-06-28 |
JP6961225B2 true JP6961225B2 (ja) | 2021-11-05 |
Family
ID=57320858
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017559826A Active JP6961225B2 (ja) | 2015-05-19 | 2016-05-19 | 格子整合クラッド層を有する高い閉じ込め係数のiii窒化物端面発光レーザーダイオードに関する方法およびデバイス |
Country Status (5)
Country | Link |
---|---|
US (1) | US10554017B2 (ja) |
EP (1) | EP3298624B1 (ja) |
JP (1) | JP6961225B2 (ja) |
CN (1) | CN107710381B (ja) |
WO (1) | WO2016187421A1 (ja) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2529394A4 (en) | 2010-01-27 | 2017-11-15 | Yale University | Conductivity based selective etch for gan devices and applications thereof |
US11095096B2 (en) | 2014-04-16 | 2021-08-17 | Yale University | Method for a GaN vertical microcavity surface emitting laser (VCSEL) |
US11043792B2 (en) | 2014-09-30 | 2021-06-22 | Yale University | Method for GaN vertical microcavity surface emitting laser (VCSEL) |
US11018231B2 (en) | 2014-12-01 | 2021-05-25 | Yale University | Method to make buried, highly conductive p-type III-nitride layers |
KR102467783B1 (ko) | 2017-09-27 | 2022-11-16 | 캠브리지 엔터프라이즈 리미티드 | 재료를 다공화하기 위한 방법 및 반도체 구조체 |
GB201801337D0 (en) * | 2018-01-26 | 2018-03-14 | Cambridge Entpr Ltd | Method for etching a semiconductor structure |
WO2021087315A1 (en) * | 2019-10-31 | 2021-05-06 | Yale University | Porous iii-nitrides and methods of using and making thereof |
CN111129244B (zh) * | 2019-12-30 | 2022-03-25 | 广东德力光电有限公司 | 一种银镜大功率倒装芯片及其制备方法 |
JP2023511373A (ja) * | 2020-01-23 | 2023-03-17 | イェール ユニバーシティー | Iii族窒化物における多孔度の制御および局所化、およびその使用および作製方法 |
GB2593693B (en) * | 2020-03-30 | 2022-08-03 | Plessey Semiconductors Ltd | LED precursor |
US11688829B2 (en) | 2020-12-30 | 2023-06-27 | Meta Platforms Technologies, Llc | Engineered substrate architecture for InGaN red micro-LEDs |
PL438136A1 (pl) * | 2021-06-13 | 2022-12-19 | Instytut Wysokich Ciśnień Polskiej Akademii Nauk | Epitaksjalna struktura laserowa i sposób wytwarzania epitaksjalnej struktury laserowej |
JP2023117509A (ja) * | 2022-02-14 | 2023-08-24 | ヌヴォトンテクノロジージャパン株式会社 | 窒化物系半導体発光素子 |
DE102022110694A1 (de) | 2022-05-02 | 2023-11-02 | Ams-Osram International Gmbh | Optoelektronisches halbleiterlaserbauelement und verfahren zur herstellung eines optoelektronischen halbleiterlaserbauelements |
Family Cites Families (112)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4202454C1 (ja) | 1992-01-29 | 1993-07-29 | Siemens Ag, 8000 Muenchen, De | |
US5307361A (en) * | 1992-11-05 | 1994-04-26 | Eastman Kodak Company | Ridge waveguide laser diode with a depressed-index cladding layer |
JP3080831B2 (ja) * | 1994-02-03 | 2000-08-28 | 日本電気株式会社 | 多重量子井戸半導体レーザ |
JPH08148280A (ja) | 1994-04-14 | 1996-06-07 | Toshiba Corp | 半導体装置およびその製造方法 |
US5502787A (en) * | 1995-05-22 | 1996-03-26 | At&T Corp. | Article comprising a semiconductor waveguide structure |
US6324192B1 (en) | 1995-09-29 | 2001-11-27 | Coretek, Inc. | Electrically tunable fabry-perot structure utilizing a deformable multi-layer mirror and method of making the same |
JPH10135500A (ja) | 1996-03-18 | 1998-05-22 | Sony Corp | 薄膜半導体、太陽電池および発光素子の製造方法 |
US5919430A (en) | 1996-06-19 | 1999-07-06 | Degussa Aktiengesellschaft | Preparation of crystalline microporous and mesoporous metal silicates, products produced thereby and use thereof |
US5818861A (en) | 1996-07-19 | 1998-10-06 | Hewlett-Packard Company | Vertical cavity surface emitting laser with low band gap highly doped contact layer |
US20030189963A1 (en) | 1996-11-12 | 2003-10-09 | Deppe Dennis G. | Low threshold microcavity light emitter |
KR100413792B1 (ko) | 1997-07-24 | 2004-02-14 | 삼성전자주식회사 | 질화갈륨 층과 공기층이 반복 적층된 분산브래그 반사기를구비한 단파장 면발광 반도체 레이저장치 및 그 제조 방법 |
JP4075021B2 (ja) | 1997-12-26 | 2008-04-16 | ソニー株式会社 | 半導体基板の製造方法および薄膜半導体部材の製造方法 |
JP2000124552A (ja) * | 1998-10-16 | 2000-04-28 | Agilent Technol Inc | 窒化物半導体レーザ素子 |
KR100480764B1 (ko) | 1998-12-10 | 2005-06-16 | 삼성전자주식회사 | Gan계 고반사율 분산 브래그 반사기를 갖는 광소자의 제조방법 |
US6320206B1 (en) | 1999-02-05 | 2001-11-20 | Lumileds Lighting, U.S., Llc | Light emitting devices having wafer bonded aluminum gallium indium nitride structures and mirror stacks |
JP2000349393A (ja) | 1999-03-26 | 2000-12-15 | Fuji Xerox Co Ltd | 半導体デバイス、面発光型半導体レーザ、及び端面発光型半導体レーザ |
JP3453544B2 (ja) | 1999-03-26 | 2003-10-06 | キヤノン株式会社 | 半導体部材の作製方法 |
JP2001223165A (ja) | 2000-02-10 | 2001-08-17 | Hitachi Cable Ltd | 窒化物半導体及びその製造方法 |
JP2002176226A (ja) | 2000-09-22 | 2002-06-21 | Toshiba Corp | 光素子およびその製造方法 |
US20020070125A1 (en) | 2000-12-13 | 2002-06-13 | Nova Crystals, Inc. | Method for lift-off of epitaxially grown semiconductors by electrochemical anodic etching |
US6434180B1 (en) | 2000-12-19 | 2002-08-13 | Lucent Technologies Inc. | Vertical cavity surface emitting laser (VCSEL) |
FR2823596B1 (fr) | 2001-04-13 | 2004-08-20 | Commissariat Energie Atomique | Substrat ou structure demontable et procede de realisation |
US20020158265A1 (en) | 2001-04-26 | 2002-10-31 | Motorola, Inc. | Structure and method for fabricating high contrast reflective mirrors |
US6537838B2 (en) | 2001-06-11 | 2003-03-25 | Limileds Lighting, U.S., Llc | Forming semiconductor structures including activated acceptors in buried p-type III-V layers |
US7919791B2 (en) | 2002-03-25 | 2011-04-05 | Cree, Inc. | Doped group III-V nitride materials, and microelectronic devices and device precursor structures comprising same |
ATE425557T1 (de) | 2002-05-15 | 2009-03-15 | Panasonic Corp | Lichtemittierendes halbleiterelement und zugehöriges produktionsverfahren |
US7535100B2 (en) | 2002-07-12 | 2009-05-19 | The United States Of America As Represented By The Secretary Of The Navy | Wafer bonding of thinned electronic materials and circuits to high performance substrates |
JP2004055611A (ja) * | 2002-07-16 | 2004-02-19 | Fuji Photo Film Co Ltd | 半導体発光素子 |
TW200409378A (en) | 2002-11-25 | 2004-06-01 | Super Nova Optoelectronics Corp | GaN-based light-emitting diode and the manufacturing method thereof |
AU2003295880A1 (en) | 2002-11-27 | 2004-06-23 | University Of Toledo, The | Integrated photoelectrochemical cell and system having a liquid electrolyte |
US6990132B2 (en) | 2003-03-20 | 2006-01-24 | Xerox Corporation | Laser diode with metal-oxide upper cladding layer |
US6972438B2 (en) | 2003-09-30 | 2005-12-06 | Cree, Inc. | Light emitting diode with porous SiC substrate and method for fabricating |
US7271896B2 (en) | 2003-12-29 | 2007-09-18 | Intel Corporation | Detection of biomolecules using porous biosensors and raman spectroscopy |
US7553371B2 (en) | 2004-02-02 | 2009-06-30 | Nanosys, Inc. | Porous substrates, articles, systems and compositions comprising nanofibers and methods of their use and production |
JP2005244089A (ja) | 2004-02-27 | 2005-09-08 | Canon Inc | 陽極化成装置及び処理方法並びに半導体基板の製造方法 |
KR100568298B1 (ko) | 2004-03-30 | 2006-04-05 | 삼성전기주식회사 | 외부양자효율이 개선된 질화물 반도체 및 그 제조방법 |
TWI385816B (zh) | 2004-04-28 | 2013-02-11 | Verticle Inc | 垂直結構的半導體裝置 |
US7768023B2 (en) | 2005-10-14 | 2010-08-03 | The Regents Of The University Of California | Photonic structures for efficient light extraction and conversion in multi-color light emitting devices |
US7768024B2 (en) | 2005-12-02 | 2010-08-03 | The Regents Of The University Of California | Horizontal emitting, vertical emitting, beam shaped, distributed feedback (DFB) lasers fabricated by growth over a patterned substrate with multiple overgrowth |
WO2005122350A1 (ja) | 2004-06-11 | 2005-12-22 | Ricoh Company, Ltd. | 面発光レーザダイオードおよびその製造方法 |
US8119537B2 (en) | 2004-09-02 | 2012-02-21 | Micron Technology, Inc. | Selective etching of oxides to metal nitrides and metal oxides |
TWI249966B (en) | 2004-10-20 | 2006-02-21 | Genesis Photonics Inc | Light-emitting device having porous light-emitting layer |
US7550395B2 (en) | 2004-11-02 | 2009-06-23 | The Regents Of The University Of California | Control of photoelectrochemical (PEC) etching by modification of the local electrochemical potential of the semiconductor structure relative to the electrolyte |
GB0424957D0 (en) | 2004-11-11 | 2004-12-15 | Btg Int Ltd | Methods for fabricating semiconductor devices and devices fabricated thereby |
US7751455B2 (en) | 2004-12-14 | 2010-07-06 | Palo Alto Research Center Incorporated | Blue and green laser diodes with gallium nitride or indium gallium nitride cladding laser structure |
US20070007241A1 (en) | 2005-04-20 | 2007-01-11 | University Of Rochester | Methods of making and modifying porous devices for biomedical applications |
JP4027392B2 (ja) * | 2005-04-28 | 2007-12-26 | キヤノン株式会社 | 垂直共振器型面発光レーザ装置 |
US7483466B2 (en) | 2005-04-28 | 2009-01-27 | Canon Kabushiki Kaisha | Vertical cavity surface emitting laser device |
US8254423B2 (en) * | 2008-05-30 | 2012-08-28 | The Regents Of The University Of California | (Al,Ga,In)N diode laser fabricated at reduced temperature |
JP4933193B2 (ja) | 2005-08-11 | 2012-05-16 | キヤノン株式会社 | 面発光レーザ、該面発光レーザにおける二次元フォトニック結晶の製造方法 |
KR100706796B1 (ko) | 2005-08-19 | 2007-04-12 | 삼성전자주식회사 | 질화물계 탑에미트형 발광소자 및 그 제조 방법 |
DE112006002505T5 (de) | 2005-09-29 | 2008-08-14 | Sumitomo Chemical Co., Ltd. | Verfahren zur Herstellung eines Halbleiters eines Nitrids der Gruppe 3-5 und Verfahren zur Herstellung einer lichtemittierenden Vorrichtung |
US7655489B2 (en) | 2005-10-19 | 2010-02-02 | The University Of Notre Dame Du Lac | Monolithically-pumped erbium-doped waveguide amplifiers and lasers |
TWI451597B (zh) | 2010-10-29 | 2014-09-01 | Epistar Corp | 光電元件及其製造方法 |
US7501299B2 (en) | 2005-11-14 | 2009-03-10 | Palo Alto Research Center Incorporated | Method for controlling the structure and surface qualities of a thin film and product produced thereby |
US7737451B2 (en) | 2006-02-23 | 2010-06-15 | Cree, Inc. | High efficiency LED with tunnel junction layer |
CN101443887B (zh) | 2006-03-10 | 2011-04-20 | Stc.Unm公司 | Gan纳米线的脉冲式生长及在族ⅲ氮化物半导体衬底材料中的应用和器件 |
US7974327B2 (en) | 2006-03-14 | 2011-07-05 | Furukawa Electric Co., Ltd. | Surface emitting laser element array |
JP4967463B2 (ja) | 2006-06-06 | 2012-07-04 | 富士ゼロックス株式会社 | 面発光型半導体レーザ装置 |
US8174025B2 (en) | 2006-06-09 | 2012-05-08 | Philips Lumileds Lighting Company, Llc | Semiconductor light emitting device including porous layer |
US7915624B2 (en) | 2006-08-06 | 2011-03-29 | Lightwave Photonics, Inc. | III-nitride light-emitting devices with one or more resonance reflectors and reflective engineered growth templates for such devices, and methods |
WO2008075692A1 (ja) | 2006-12-20 | 2008-06-26 | International Business Machines Corporation | 面発光レーザーおよびその製造方法 |
JP2008211164A (ja) | 2007-01-29 | 2008-09-11 | Matsushita Electric Ind Co Ltd | 窒化物半導体発光装置及びその製造方法 |
JP2008226974A (ja) * | 2007-03-09 | 2008-09-25 | Canon Inc | 多層膜構造体、多層膜構造体で構成される面発光レーザおよびその製造方法 |
US8920625B2 (en) | 2007-04-27 | 2014-12-30 | Board Of Regents Of The University Of Texas System | Electrochemical method of making porous particles using a constant current density |
US9096939B2 (en) | 2007-05-29 | 2015-08-04 | Transphorm, Inc. | Electrolysis transistor |
US20090001416A1 (en) | 2007-06-28 | 2009-01-01 | National University Of Singapore | Growth of indium gallium nitride (InGaN) on porous gallium nitride (GaN) template by metal-organic chemical vapor deposition (MOCVD) |
JP5056299B2 (ja) | 2007-09-18 | 2012-10-24 | 日立電線株式会社 | 窒化物半導体下地基板、窒化物半導体積層基板および窒化物半導体下地基板の製造方法 |
JP2009094360A (ja) * | 2007-10-10 | 2009-04-30 | Rohm Co Ltd | 半導体レーザダイオード |
WO2009048265A1 (en) | 2007-10-12 | 2009-04-16 | Industry Foundation Of Chonnam National University | Method of selectively etching semiconductor region, separation method of semiconductor layer and separation method of semiconductor device from substrate |
US7928448B2 (en) | 2007-12-04 | 2011-04-19 | Philips Lumileds Lighting Company, Llc | III-nitride light emitting device including porous semiconductor layer |
US20090173373A1 (en) | 2008-01-07 | 2009-07-09 | Wladyslaw Walukiewicz | Group III-Nitride Solar Cell with Graded Compositions |
JP4395812B2 (ja) | 2008-02-27 | 2010-01-13 | 住友電気工業株式会社 | 窒化物半導体ウエハ−加工方法 |
JP4404162B2 (ja) | 2008-02-27 | 2010-01-27 | 住友電気工業株式会社 | 窒化物半導体ウエハ− |
KR101159995B1 (ko) | 2008-03-13 | 2012-06-25 | 쇼와 덴코 가부시키가이샤 | Ⅲ족 질화물 반도체 소자 및 그 제조 방법, ⅲ족 질화물 반도체 발광 소자 및 그 제조 방법, 및 램프 |
JP5205098B2 (ja) | 2008-03-27 | 2013-06-05 | Dowaエレクトロニクス株式会社 | 半導体発光素子およびその製造方法 |
US8946736B2 (en) | 2010-10-29 | 2015-02-03 | Epistar Corporation | Optoelectronic device and method for manufacturing the same |
US9070827B2 (en) | 2010-10-29 | 2015-06-30 | Epistar Corporation | Optoelectronic device and method for manufacturing the same |
JP4968232B2 (ja) | 2008-10-17 | 2012-07-04 | 日立電線株式会社 | 窒化物半導体の製造方法 |
US8062916B2 (en) | 2008-11-06 | 2011-11-22 | Koninklijke Philips Electronics N.V. | Series connected flip chip LEDs with growth substrate removed |
JP5191934B2 (ja) | 2009-03-19 | 2013-05-08 | アズビル株式会社 | 状態監視システムおよび状態監視方法 |
JP4902682B2 (ja) * | 2009-03-27 | 2012-03-21 | キヤノン株式会社 | 窒化物半導体レーザ |
WO2010111854A1 (zh) | 2009-03-31 | 2010-10-07 | 西安电子科技大学 | 紫外发光二极管器件及其制造方法 |
EP2430652B1 (en) | 2009-05-12 | 2019-11-20 | The Board of Trustees of the University of Illionis | Printed assemblies of ultrathin, microscale inorganic light emitting diodes for deformable and semitransparent displays |
JP2011054935A (ja) | 2009-06-19 | 2011-03-17 | Rohm & Haas Electronic Materials Llc | ドーピング方法 |
EP2461436B1 (en) * | 2009-07-31 | 2020-05-27 | Nichia Corporation | Nitride-semiconductor laser diode |
US8409998B2 (en) | 2009-09-30 | 2013-04-02 | Furukawa Electric Co., Ltd | Method of manufacturing vertical-cavity surface emitting laser |
KR101082788B1 (ko) * | 2009-10-16 | 2011-11-14 | 한국산업기술대학교산학협력단 | 다공성 질화물 반도체 상의 고품질 비극성/반극성 반도체 소자 및 그 제조 방법 |
EP2529394A4 (en) * | 2010-01-27 | 2017-11-15 | Yale University | Conductivity based selective etch for gan devices and applications thereof |
US20110188528A1 (en) * | 2010-02-04 | 2011-08-04 | Ostendo Technologies, Inc. | High Injection Efficiency Polar and Non-Polar III-Nitrides Light Emitters |
GB201012483D0 (en) | 2010-07-26 | 2010-09-08 | Seren Photonics Ltd | Light emitting diodes |
TWI501421B (zh) | 2010-09-21 | 2015-09-21 | Epistar Corp | 光電元件及其製造方法 |
US8519430B2 (en) | 2010-10-29 | 2013-08-27 | Epistar Corporation | Optoelectronic device and method for manufacturing the same |
TWI419367B (zh) | 2010-12-02 | 2013-12-11 | Epistar Corp | 光電元件及其製造方法 |
KR101550117B1 (ko) * | 2011-02-18 | 2015-09-03 | 에피스타 코포레이션 | 광전 소자 및 그 제조 방법 |
US8343788B2 (en) | 2011-04-19 | 2013-01-01 | Epistar Corporation | Light emitting device and manufacturing method thereof |
US20130140517A1 (en) | 2011-06-29 | 2013-06-06 | Purdue Research Foundation | Thin and Flexible Gallium Nitride and Method of Making the Same |
JP2013038394A (ja) * | 2011-07-14 | 2013-02-21 | Rohm Co Ltd | 半導体レーザ素子 |
US9335262B2 (en) | 2011-08-25 | 2016-05-10 | Palo Alto Research Center Incorporated | Gap distributed Bragg reflectors |
FR2980784B1 (fr) | 2011-10-04 | 2013-10-25 | Swisstex France | Dispositif pour abaisser la tension d'un fil entre un systeme de transformation dudit fil et un systeme de bobinage dudit fil |
JP5956604B2 (ja) | 2011-12-14 | 2016-07-27 | ソウル バイオシス カンパニー リミテッドSeoul Viosys Co.,Ltd. | 発光ダイオード |
KR101278063B1 (ko) | 2012-02-06 | 2013-06-24 | 전남대학교산학협력단 | 나노포러스 구조를 이용한 반도체소자 분리방법 |
CN110246941A (zh) * | 2012-03-19 | 2019-09-17 | 亮锐控股有限公司 | 在硅衬底上生长的发光器件 |
KR101351484B1 (ko) | 2012-03-22 | 2014-01-15 | 삼성전자주식회사 | 질화물계 반도체 전방향 리플렉터를 구비한 발광소자 |
WO2014004261A1 (en) | 2012-06-28 | 2014-01-03 | Yale University | Lateral electrochemical etching of iii-nitride materials for microfabrication |
US8497171B1 (en) | 2012-07-05 | 2013-07-30 | Taiwan Semiconductor Manufacturing Co., Ltd. | FinFET method and structure with embedded underlying anti-punch through layer |
WO2014061174A1 (ja) * | 2012-10-19 | 2014-04-24 | パナソニック株式会社 | 半導体発光素子 |
JP6170300B2 (ja) | 2013-01-08 | 2017-07-26 | 住友化学株式会社 | 窒化物半導体デバイス |
US9048387B2 (en) | 2013-08-09 | 2015-06-02 | Qingdao Jason Electric Co., Ltd. | Light-emitting device with improved light extraction efficiency |
US11095096B2 (en) | 2014-04-16 | 2021-08-17 | Yale University | Method for a GaN vertical microcavity surface emitting laser (VCSEL) |
US11043792B2 (en) | 2014-09-30 | 2021-06-22 | Yale University | Method for GaN vertical microcavity surface emitting laser (VCSEL) |
US11018231B2 (en) | 2014-12-01 | 2021-05-25 | Yale University | Method to make buried, highly conductive p-type III-nitride layers |
-
2016
- 2016-05-19 US US15/574,739 patent/US10554017B2/en active Active
- 2016-05-19 WO PCT/US2016/033270 patent/WO2016187421A1/en unknown
- 2016-05-19 CN CN201680035900.7A patent/CN107710381B/zh active Active
- 2016-05-19 EP EP16797298.3A patent/EP3298624B1/en active Active
- 2016-05-19 JP JP2017559826A patent/JP6961225B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
WO2016187421A1 (en) | 2016-11-24 |
EP3298624B1 (en) | 2023-04-19 |
EP3298624A4 (en) | 2019-01-02 |
JP2018517295A (ja) | 2018-06-28 |
US10554017B2 (en) | 2020-02-04 |
CN107710381B (zh) | 2022-01-18 |
US20180152003A1 (en) | 2018-05-31 |
CN107710381A (zh) | 2018-02-16 |
EP3298624A1 (en) | 2018-03-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6961225B2 (ja) | 格子整合クラッド層を有する高い閉じ込め係数のiii窒化物端面発光レーザーダイオードに関する方法およびデバイス | |
KR102425935B1 (ko) | GaN 수직 마이크로캐비티 표면 방출 레이저(VCSEL)를 위한 방법 | |
US11095096B2 (en) | Method for a GaN vertical microcavity surface emitting laser (VCSEL) | |
KR102467783B1 (ko) | 재료를 다공화하기 위한 방법 및 반도체 구조체 | |
US9082934B2 (en) | Semiconductor optoelectronic structure with increased light extraction efficiency | |
WO2018184288A1 (zh) | 基于多孔DBR的GaN基VCSEL芯片及制备方法 | |
US20170133826A1 (en) | Lateral electrochemical etching of iii-nitride materials for microfabrication | |
JP2007053369A (ja) | 窒化物半導体垂直キャビティ面発光レーザ | |
CN110061109B (zh) | 一种多孔GaN导电DBR及其制备方法 | |
CN110098295B (zh) | 一种具有导电DBR的GaN基LED的制备方法 | |
JP6724687B2 (ja) | ナノロッドの形成方法及び半導体素子の製造方法 | |
KR20130055976A (ko) | 공극층을 갖는 발광 다이오드 및 그것을 제조하는 방법 | |
JP2014090090A (ja) | Iii族窒化物半導体レーザ素子、iii族窒化物半導体レーザ素子を作製する方法 | |
CN111384663A (zh) | 氮化镓基半导体激光器及其制作方法 | |
EP4266516A1 (en) | Photonic crystal surface emission laser and method for manufacturing same | |
JP2016127131A (ja) | 光半導体装置及びその製造方法 | |
JP2013030810A (ja) | 半導体発光素子 | |
JP2009087977A (ja) | 半導体光素子及びその製造方法 | |
JP2010287804A (ja) | 半導体光素子 | |
Peng et al. | High efficient InGaN blue light emitting diode with embedded nanoporous structure | |
CN105406358A (zh) | 一种GaN基激光器制备方法和结构 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20190425 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20200422 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20200507 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20200805 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20201105 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20210402 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20210701 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20210907 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20211006 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6961225 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |