JP6462620B2 - 基板処理装置および基板処理方法 - Google Patents
基板処理装置および基板処理方法 Download PDFInfo
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Description
本実施形態に係る処理ユニット16では、ウェハWに発生した電気を保持部60、回転機構80、接地部150経由で接地電位に流すことで、ウェハWを除電することができる。ここで、ウェハWに発生した電気の導通経路の構成について具体的に説明する。
ところで、基板を除電するための導通経路の抵抗値は、基本的には低いことが好ましい。しかしながら、一連の基板処理においては、導通経路の抵抗値を常に低い状態としておくことが好ましくない場合がある。
ところで、上述した実施形態では、ウェハWに発生した電気を、支持ピン61b、導電性部材61f、回転軸81、軸受83、ハウジング82aおよび接地部150経由で接地電位に逃がすこととした。
上述した第1変形例では、接続部材85を回転軸81の周面に接触させることとしたが、接続部材は、回転軸81の反負荷側の端部に接続されてもよい。かかる第2変形例について図11を参照して説明する。図11は、第2変形例に係る導通経路の構成を示す図である。
上述した第2変形例のように、接続部材85Aを回転軸81Aと同軸上で回転させる場合、容器84に代えて導電性の軸受を用いることも可能である。かかる第3変形例について図12を参照して説明する。図12は、第3変形例に係る導通経路の構成を示す図である。
ところで、ベースプレート61(図2参照)は、樹脂で形成される。樹脂は、静電気を発生させやすく、発生した静電気はウェハWに悪影響を及ぼすおそれがある。そこで、ベースプレート61が過度に帯電していないかをたとえば定期的に検査することが好ましい。
ところで、図2に示すように、支持ピン61bに支持されているウェハWの周縁部と対向するトッププレート110の周縁部は、ウェハWへ向けて下方に突出させて設けられており、ウェハWの周縁部との間に隙間D1を形成する。
1 基板処理システム
2 搬入出ステーション
3 処理ステーション
4 制御装置
16 処理ユニット
18 制御部
61 ベースプレート
61b 支持ピン
61f 導電性部材
80 回転機構
81 回転軸
82 電動機
83 軸受
150 接地部
160 可変抵抗部
Claims (8)
- 基板を保持する導電性の保持部と、
前記保持部と接触し、導電性素材で形成される導通経路部と、
前記保持部に保持された基板に対して処理液を供給する供給部と、
一端部が前記導通経路部に接続され、他端部が接地電位に接続される接地部と、
前記接地部に設けられ、抵抗値を変更可能な可変抵抗部と、
前記可変抵抗部を制御する制御部と、
を備え、
前記制御部は、
前記基板に対する前記処理液の供給が開始されてから終了するまでの期間のうち、該期間の開始直後における前記可変抵抗部の抵抗値が、その後の前記可変抵抗部の抵抗値よりも高くなるように前記可変抵抗部を制御すること
を特徴とする基板処理装置。 - 前記可変抵抗部は、
第1抵抗値を有する第1抵抗器と、
前記第1抵抗値よりも高い第2抵抗値を有する第2抵抗器と、
前記接地部に接続させる抵抗器を前記第1抵抗器と前記第2抵抗器との間で切り替える切替部と
を備え、
前記制御部は、
前記切替部を制御して、前記期間の開始直後においては前記第2抵抗器を前記接地部に接続させ、その後、前記第1抵抗器を前記接地部に接続させること
を特徴とする請求項1に記載の基板処理装置。 - 前記可変抵抗部は、
前記制御部から入力される信号に従って抵抗値を変更させる可変抵抗器であること
を特徴とする請求項1に記載の基板処理装置。 - 基板を保持する導電性の保持部と、
前記保持部と接触し、導電性素材で形成される導通経路部と、
前記保持部に保持された基板に対して処理液を供給する供給部と、
一端部が前記導通経路部に接続され、他端部が接地電位に接続される接地部と、
前記接地部に設けられ、抵抗値を変更可能な可変抵抗部と
を備え、
前記導通経路部は、
前記保持部を回転させる回転機構であり、
前記回転機構は、
前記保持部と電気的に接触し、前記保持部を回転可能に支持する導電性の回転軸と、
前記回転軸を回転させる電動機と、
導電性の液体が貯留された導電性の容器と、
一端部が前記回転軸に電気的に接触し、他端部が前記液体に浸漬される導電性の接続部材と
を備え、
前記接地部の一端部は、
前記回転機構における前記容器に接続されること
を特徴とする基板処理装置。 - 前記接続部材は、
長手方向に延びる棒形状を有し、前記回転軸の反負荷側の端部に対し前記回転軸と同軸上に接続されること
を特徴とする請求項4に記載の基板処理装置。 - 前記回転機構は、
前記電動機と前記回転軸との間に設けられ、前記回転軸を回転可能に支持する絶縁性の軸受
を備えることを特徴とする請求項4または5に記載の基板処理装置。 - 基板を保持する導電性の保持部と、
前記保持部と接触し、導電性素材で形成される導通経路部と、
前記保持部に保持された基板に対して処理液を供給する供給部と、
一端部が前記導通経路部に接続され、他端部が接地電位に接続される接地部と、
前記接地部に設けられ、抵抗値を変更可能な可変抵抗部と、
前記基板の帯電量を測定する測定部と、
前記保持部に保持された前記基板を前記測定部へ搬送する基板搬送部と、
前記測定部による測定結果に基づき、前記保持部の帯電量を推定する推定部と
を備え、
前記推定部は、
前記測定結果と、前記基板を前記保持部から受け取る際の前記基板の前記保持部からの上昇量に応じた補正量とを用いて前記保持部の帯電量を推定すること
を特徴とする基板処理装置。 - 基板を保持する保持工程と、
接地電位に接続された前記基板に対して処理液を供給する供給工程と、
前記供給工程において、前記基板と前記接地電位との間の抵抗値を変更可能な可変抵抗部の抵抗値を変更する抵抗値変更工程と、
を含み、
前記抵抗値変更工程は、
前記基板に対する前記処理液の供給が開始されてから終了するまでの期間のうち、該期間の開始直後における前記可変抵抗部の抵抗値が、その後の前記可変抵抗部の抵抗値よりも高くなるように前記可変抵抗部を制御すること
を特徴とする基板処理方法。
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