JP5620039B2 - 少なくとも１つのシステム絞りを備えた光学結像装置 - Google Patents

少なくとも１つのシステム絞りを備えた光学結像装置 Download PDF

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Publication number
JP5620039B2
JP5620039B2 JP2006522245A JP2006522245A JP5620039B2 JP 5620039 B2 JP5620039 B2 JP 5620039B2 JP 2006522245 A JP2006522245 A JP 2006522245A JP 2006522245 A JP2006522245 A JP 2006522245A JP 5620039 B2 JP5620039 B2 JP 5620039B2
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Japan
Prior art keywords
thin plate
optical imaging
imaging device
joint
elastic
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Expired - Fee Related
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JP2006522245A
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English (en)
Japanese (ja)
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JP2007500869A (ja
JP2007500869A5 (enExample
Inventor
ヘルマン ビーク
ヘルマン ビーク
マルチン ヒューバー
マルチン ヒューバー
ヘンツェリンフランコ
フランコ ヘンツェリン
トーマス ビスコフ
トーマス ビスコフ
ベルンハルト ゲルリッヒ
ベルンハルト ゲルリッヒ
ゲルハルト ツェケリー
ゲルハルト ツェケリー
ウィ−リーム グエン
ウィ−リーム グエン
イ−． ハンフリーズマーティン
マーティン イ−． ハンフリーズ
Original Assignee
カール・ツァイス・エスエムティー・ゲーエムベーハー
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Publication of JP2007500869A publication Critical patent/JP2007500869A/ja
Publication of JP2007500869A5 publication Critical patent/JP2007500869A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/005—Diaphragms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/7025—Size or form of projection system aperture, e.g. aperture stops, diaphragms or pupil obscuration; Control thereof

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Diaphragms For Cameras (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2006522245A 2003-08-01 2004-07-02 少なくとも１つのシステム絞りを備えた光学結像装置 Expired - Fee Related JP5620039B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE10335215 2003-08-01
DE10335215.5 2003-08-01
PCT/EP2004/007186 WO2005019878A1 (de) 2003-08-01 2004-07-02 Optische abbildungsvorrichtung mit wenigstens einer systemblende

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2011173442A Division JP5639971B2 (ja) 2003-08-01 2011-08-08 少なくとも１つのシステム絞りを備えた光学結像装置

Publications (3)

Publication Number Publication Date
JP2007500869A JP2007500869A (ja) 2007-01-18
JP2007500869A5 JP2007500869A5 (enExample) 2013-07-25
JP5620039B2 true JP5620039B2 (ja) 2014-11-05

Family

ID=34201407

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2006522245A Expired - Fee Related JP5620039B2 (ja) 2003-08-01 2004-07-02 少なくとも１つのシステム絞りを備えた光学結像装置
JP2011173442A Expired - Fee Related JP5639971B2 (ja) 2003-08-01 2011-08-08 少なくとも１つのシステム絞りを備えた光学結像装置

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2011173442A Expired - Fee Related JP5639971B2 (ja) 2003-08-01 2011-08-08 少なくとも１つのシステム絞りを備えた光学結像装置

Country Status (3)

Country Link
US (1) US8009343B2 (enExample)
JP (2) JP5620039B2 (enExample)
WO (1) WO2005019878A1 (enExample)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1690139B1 (en) 2003-12-02 2009-01-14 Carl Zeiss SMT AG Projection optical system
WO2010032753A1 (ja) * 2008-09-18 2010-03-25 株式会社ニコン 開口絞り、光学系、露光装置及び電子デバイスの製造方法
DE102011003145A1 (de) * 2010-02-09 2011-08-11 Carl Zeiss SMT GmbH, 73447 Optisches System mit Blendeneinrichtung
JP5938405B2 (ja) * 2011-07-07 2016-06-22 キヤノン電子株式会社 光量調節装置および光学機器
JP6270475B2 (ja) 2011-07-07 2018-01-31 キヤノン電子株式会社 光量調節装置および光学機器
JP5506769B2 (ja) * 2011-12-12 2014-05-28 キヤノン株式会社 光学機器および光学機器を具備した撮像装置
JP2013235183A (ja) * 2012-05-10 2013-11-21 Canon Inc 光学系及びそれを有する撮像装置
US20150086190A1 (en) * 2012-06-06 2015-03-26 Canon Denshi Kabushiki Kaisha Light-quantity control apparatus and optical apparatus
JP6051044B2 (ja) * 2012-06-06 2016-12-21 キヤノン電子株式会社 光量調節羽根、それを用いた光量調節装置及び光学機器。
WO2013183299A1 (ja) * 2012-06-06 2013-12-12 キヤノン電子株式会社 光量調節装置及びそれを用いた光学機器
JP6051045B2 (ja) * 2012-12-27 2016-12-21 キヤノン電子株式会社 光量調節装置および光学機器
JP6051033B2 (ja) * 2012-12-17 2016-12-21 キヤノン電子株式会社 光量調節装置および光学機器
JP6099924B2 (ja) * 2012-10-04 2017-03-22 キヤノン株式会社 光学機器およびそれを備えた撮像装置
JP2015072419A (ja) * 2013-10-04 2015-04-16 キヤノン株式会社 光量調整装置およびそれを備えた光学機器、撮像装置
CN115857282A (zh) * 2022-12-16 2023-03-28 南京云创大数据科技股份有限公司 一种光刻机改变光束直径的膜片移动机构
DE102023211977A1 (de) * 2023-11-30 2024-12-24 Carl Zeiss Smt Gmbh Optisches system und projektionsbelichtungsanlage

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2276667A1 (fr) * 1974-06-28 1976-01-23 Kernforschungsanlage Juelich Diaphragme a ouverture reglable de facon continue
US4296352A (en) * 1979-12-19 1981-10-20 General Electric Company Incandescent lamp
JPH02153334A (ja) * 1988-12-06 1990-06-13 Canon Inc 球面シヤツタ
US5323301A (en) * 1992-12-08 1994-06-21 Robert Kaufman Dimmable studio lighting device
US5552925A (en) * 1993-09-07 1996-09-03 John M. Baker Electro-micro-mechanical shutters on transparent substrates
JPH1165094A (ja) * 1997-08-22 1999-03-05 Nikon Corp 収納ケース、露光装置及びデバイス製造装置
JP2000089294A (ja) * 1998-09-11 2000-03-31 Seiko Precision Inc カメラの羽根開閉装置
JP2001110710A (ja) * 1999-10-08 2001-04-20 Nikon Corp 露光装置、露光方法、および半導体デバイスの製造方法
DE19955984A1 (de) * 1999-11-20 2001-05-23 Zeiss Carl Optische Abbildungsvorrichtung, insbesondere Objektiv mit wenigstens einer Systemblende
JP4296701B2 (ja) 2000-10-11 2009-07-15 株式会社ニコン 投影光学系，該投影光学系を備えた露光装置，及び該露光装置を用いたデバイスの製造方法
JP2002318403A (ja) 2001-04-20 2002-10-31 Canon Inc 絞り装置及びそれを用いた光学機器
JP2003115127A (ja) * 2001-10-01 2003-04-18 Sony Corp 光学ピックアップ装置

Also Published As

Publication number Publication date
JP2012014180A (ja) 2012-01-19
WO2005019878A1 (de) 2005-03-03
JP2007500869A (ja) 2007-01-18
JP5639971B2 (ja) 2014-12-10
US8009343B2 (en) 2011-08-30
US20090021820A1 (en) 2009-01-22

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