Classifications

• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
  • G03F7/70—Microphotolithographic exposure; Apparatus therefor
  • G03F7/70058—Mask illumination systems
  • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
• • G—PHYSICS
  • G02—OPTICS
  • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
  • G02B5/00—Optical elements other than lenses
  • G02B5/005—Diaphragms
• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
  • G03F7/70—Microphotolithographic exposure; Apparatus therefor
  • G03F7/70216—Mask projection systems
  • G03F7/7025—Size or form of projection system aperture, e.g. aperture stops, diaphragms or pupil obscuration; Control thereof

Definitions

• Optical imaging device with at least one system aperture
• the invention relates to an optical imaging device, in particular an objective for semiconductor lithography, with at least one system diaphragm, the system diaphragm having a plurality of movable slats.
• iris diaphragms with a plane diaphragm plane are used in optical systems in semiconductor lithography.
• a diaphragm is known in which, from a certain opening width, a further flat plate pack limits the beam path at a second position.
• the diaphragm has at least two diaphragms arranged at an axial distance from one another. In Depending on the opening diameter of the system cover, a different cover is optically active.
• the plate pack of which can be moved along the optical axis.
• the lamellae are arranged between two rings that are rotatable relative to one another, at least one of the rings being rotatable.
• the plate pack is moved or moved in parallel in the axial direction.
• WO 02/31870 discloses a projection system with aperture diaphragms, the aperture diaphragms being arranged in the vicinity of the pupil plane. At least one of the aperture diaphragms can be changed in the opening diameter and in the axial direction be moved.
• the present invention is therefore based on the object of providing a system diaphragm in an optical imaging device for limiting the beam path, which solves the disadvantages of the prior art, which can be used in a small installation space, and with almost no friction of the slats, and so on Avoid contamination on optical surfaces.
• the system diaphragm of an optical imaging device has spherically curved lamellae which are rotatably mounted.
• the rotary bearing axes of the lamellae are advantageously directed towards the center of curvature of a sphere, which in turn also determines the spherical curvature or shape of the lamellae. It is thus possible for the light-determining edge of the system cover to move along a spherically designed plane when opening and closing.
• a system diaphragm can now be constructed which, at different opening widths and different positions along an optical axis of an optical imaging device, for example a projection lens, travels a curve which corresponds to a sphere and can plunge or drive into the spherical cap of the sphere from the installation space ,
• an optical imaging device for example a projection lens
• a system diaphragm according to the invention can be introduced into the hollow surface of a mirror, a lens or a very narrow space between two lenses.
• the lamellae are arranged such that they can overlap on two spherical surfaces whose centers of curvature are identical, the two spherical surfaces advantageously being at a very small distance A from one another.
• the system diaphragm has lamellae, the surfaces of which do not lie directly on top of one another, as in the case of the diaphragms known from the prior art, but are arranged alternately on two spheres and at a distance A of a few millimeters, preferably A ⁇ 1 mm. Thanks to the contactless closing and opening of the slats it is an enormous advantage, namely that there is no friction between two "superimposed" lamellae, which can contaminate the projection objective, for example, by particles formed thereby. Furthermore, there is no wear on the slats used in the system cover.
• the use of the individually mounted lamellas thus opens up the possibility of producing them, for example, from ceramics, such as SISIC (reaction-bound silicon-infiltrated silicon carbide).
• SISIC reaction-bound silicon-infiltrated silicon carbide
• the slats can thus be made light and very stiff and can also be made in any shape.
• the slats are each rotatably supported on the pivot bearing axis by means of solid-state joints, the slats being movable by means of a drive ring, the drive ring being rotatably supported about an optical axis by means of solid-state joints.
• Solid-state joints With solid-state joints, small travels can be achieved through elastic deformation of a spring element. This results in significant advantages such as no sliding and rolling friction. As a result, no particles can settle on optical surfaces of optical imaging devices, as is the case when plain or roller bearings are used, and the imaging quality deteriorates considerably. Another advantage is that Solid joints can be calculated very precisely. Lubricants that may be on the surfaces of the optical imaging devices, as is the case when plain or roller bearings are used, and the imaging quality deteriorates considerably. Another advantage is that Solid joints can be calculated very precisely. Lubricants that may be on the surfaces of the optical imaging devices, as is the case when plain or roller bearings are used, and the imaging quality deteriorates considerably. Another advantage is that Solid joints can be calculated very precisely. Lubricants that may be on the surfaces of the optical imaging devices, as is the case when plain or roller bearings are used, and the imaging quality deteriorates considerably. Another advantage is that Solid joints can be calculated very precisely. Lubricants that may be on the surfaces of the optical imaging
• Figure 1 is a schematic representation of an arrangement of a system diaphragm according to the invention in a hollow surface of an optical element
• Figure 2 is a schematic representation of an arrangement and design of a lamella of the system cover according to the invention.
• FIG. 3 shows a basic representation of an arrangement of a plurality of lamellae of the system cover
• FIG. 4 shows a perspective view of the system cover according to the invention, the slats being mounted over solid-state joints;
• Figure 5 is a schematic representation of the system panel with a multi-plate drive
• FIG. 6 shows a basic representation of a possibility for aligning the pivot axes of the slats
• FIG. 7 shows a basic representation of an alternative possibility for aligning the pivot axes of the lamellae
• FIG. 8 shows a basic illustration of a possibility for measuring when aligning the pivot axis of the lamellae
• FIG. 9 shows an illustration in principle of an alternative possibility for measuring when aligning the rotary bearing axes of the lamellae.
• Figure 10 is a schematic representation of an alternative embodiment of the system cover according to the invention.
• FIG. 1 shows how a system diaphragm 1 according to the invention (shown here only in dashed lines) can be introduced into a hollow surface of an optical element 2 in an optical imaging device PL, for example a lens for semiconductor lithography, which is shown in principle and in order to thus limit space in a space-saving manner to ensure the beam path at different positions along an optical axis 3 for different opening widths.
• the optical imaging device PL is designed as an objective for use in semiconductor lithography.
• R B shows the radius of the system cover 1, which is present, for example, when the system cover 1 is completely closed.
• R E is the radius of the surface before the optical element 2, which corresponds to the surface of the system diaphragm 1.
• the lamella 4 is shown in cross section.
• the lamella 4 is spherical in its curvature. There is a bearing on the lamella 4
• the pivot bearing 5 is provided, which is designed as a rotary bearing.
• the pivot bearing 5 has a pivot bearing axis 6 which is directed very precisely at a center of curvature C of a sphere 7 which is produced by the lamella shape of the lamella 4. Due to the spherical configuration of the lamella 4 and the orientation of the pivot axis 6 on the center of curvature C, the lamella 4 can now move in a spherical surface.
• the center of curvature C of the sphere 7 thus corresponds to the center of the optimal aperture area.
• FIG 3 a section of the system cover 1 with three slats 4 is shown in principle.
• a single lamella 4 is not yet able to limit the beam path in a circular manner.
• a certain number of lamellae 4 is usually necessary, which approximately describe a circle due to their light-defining edges.
• Eight to ten slats 4 can preferably be used here for circular beam path limitation.
• the slats 4 are light and very stiff and can be produced in any shape. Due to the rigidity of the slats 4, a hanging down of the slats 4 due to their own weight and consequently contact of individual slats 4 can advantageously be avoided. An overlap of the individual slats 4 is therefore only possible if the slats 4 are located in two spherical surfaces 7 and 7 ', which are shown here in broken lines, at a very small distance A from one another.
• the pivot bearing axes 6 of the slats 4 are directed towards the center of curvature C and the spheres 7 and 7 'likewise have their center of curvature in C.
• the slats 4 should move synchronously and, as already mentioned, the axes of rotation or pivot bearing 6 of the pivot bearing 5 should be very precisely aligned with the center of curvature C.
• the distance A between the two spheres 7 and 7 ' should be kept as small as possible, for example only a few mm, preferably A ⁇ 1 mm, but nevertheless ensure contactlessness of the slats 4 when the system cover 1 is closed and opened. This can advantageously be accomplished in that the rotary bearings 5 with their rotary bearing axes 6 alternately in the direction of the elbow. center C and opposite, as can be clearly seen in Figure 3, are arranged.
• the system diaphragm 1 according to the invention is shown in a perspective view in FIG.
• the system cover 1 according to the invention makes it possible, by using solid-state joints 8, to rotate or move the slats 4, and thus to adjust the cover opening 9, without the use of roller or slide bearings.
• the system cover 1 from FIG. 4 is shown in more detail in FIG.
• the slats 4 are rotatably mounted on their pivot bearing axis 6 by means of the solid-state joints 8, which can be seen more clearly in FIG.
• the solid-state joints 8 can be used as solid-state joints 8.
• the solid-state joints 8 can be determined very precisely by calculation. If the load on the solid joints 8 lies within the fatigue strength of the material, the risk of failure of such solid joints 8 is very low.
• Metallic materials can be used for the solid-state joints 8, care being taken to ensure that the materials are UV-resistant.
• a drive ring or synchronization ring 10 can be rotated a few degrees about the optical axis 3 in the direction of the arrow by means of a hermetically sealed lever which is guided outwards.
• the drive ring 10 itself is mounted by means of radially stiff solid joints 11 which are soft in the direction of rotation.
• a drive element 12 is monolithic with the drive ring 10.
• the drive element 12 is connected to the plate 4 on the pivot bearing axis 6 of the plate 4. If the drive ring 10 is now moved about the optical axis 3, the drive element 12 rotates with the lamella 4 around the Lamella axis or pivot bearing axis 6.
• the solid body joints 11 deform elastically, whereby the drive torque increases.
• solid-state joints 11 ′ are also provided between the drive element 12 and the drive ring 10.
• the solid body joint 11 ' can be designed as a single leaf spring. Of course, this does not represent any restriction to a type of solid-state joint.
• the drive ring 10 should be formed from a material which has a high resistance to alternating loads, so that the risk of failure remains very low.
• the drive unit 10 ' is arranged to move the slats 4 outside a gas space G.
• the gas space G can be filled with various gases, such as helium or nitrogen.
• the drive unit 10 'with rubbing moving parts can be replaced, while the non-friction system, which is only supported by solid-state joints 8, 11 and 11', is arranged in the optical gas space G.
• the arrangement of the drive unit 10 'outside the gas space G is advantageous in that no contamination substances can thus deposit on the optical surfaces.
• Such a mounting of the slats 4 with solid joints 8, 11 and 11 ' can of course also be used for panel systems which move in one plane and should not be limited to a panel whose light-defining edge follows a spherical surface.
• the suspension has a lower and an upper bearing element 14 and 14 '.
• the pivot bearing axis 6 is located between the bearing elements 14 and 14 '.
• the membrane 13 is provided between the bearing elements 14, 14' and the lamella 4.
• the lower bearing element 14 can be adjusted with the aid of adjustment screws 15.
• the membrane 13 is thus used as a ball joint.
• adjustment screws 15 arranged three times at 120 ° can be used for the adjustment.
• FIG. 7 Another possibility for adjusting the pivot bearing axis 6 to the center of curvature C is the use of a kinematic system.
• the solid body joint 16 can be designed as a four-bar joint.
• Holding elements 17 are provided for holding the solid body joint 16 on the upper part of the solid body joint 16. Due to the advantageous use a four-bar linkage, the pivoting movements of the pivot bearing 5 can be used to adjust the pivot bearing axis 6.
• Such kinematics are particularly suitable if a direction of the axis, in the exemplary embodiment the x-axis, can be solved by manufacturing tolerances on the holding elements 17. A movement in the y direction is therefore sufficient.
• a further alternative is the kinematics if the kinematics or the pivot bearing 5 is made rotatable about the z-axis. This is easily possible with a clamping device.
• FIGS. 8 and 9 schematically show measurement methods when aligning the pivot bearing axes 6 of the slats 4 to the center of curvature C.
• a first possibility is given by a tactile measurement method, as shown in FIG. It is important here that the spherically shaped lamella 4 is produced very precisely.
• the sphere can thus be measured, for example, with two militron probes 18. The exact radius of the spherical surface of the lamella 4 can be determined. With the correct arrangement of the lamella 4 in space, the center of curvature C can thus be determined directly.
• a tool can also be aligned with a reference plane and an axis of rotation. Like the lamella 4, the tool also has a spherical shape.
• the slats 4 are placed against this prefabricated form and sucked in or held using other fastening methods.
• the prefabricated shape is then aligned with the reference plane and with the pivot bearing axis 6. After alignment, the lamellae 4 can thus be measured using the tool or the prefabricated shape and positioned at the correct location.
• Tactile measurement is that it can be easily implemented with a mechanical tool and that the mechanical tool is reusable. Furthermore, it is relatively inexpensive compared to other measurement methods.
• FIG. 9 shows a further schematic illustration of an optical measuring method for aligning the pivot bearing axes 6 of the slats 4.
• the slat 4 is also held by a prefabricated shape or device, so that the slat 4 can be tilted or moved.
• a small recess H in the form of a hole is made in the lamella 4 or in the bearing 5. With the aid of a laser beam 19, which passes through the small recess H, a point can be imaged on a screen 20.
• the center of curvature C In order to define the center of curvature C, it is necessary that a laser beam 19 must pass through all the lamellae 4 or rotary bearings 5 in order to obtain imaging points on the screen 20.
• the imaging points should result in a small point cloud as possible, which is close to the center of curvature C. If all imaging points form such a small point cloud, the center of curvature C is determined using the optical measurement method.
• the optical measuring method is much more precise than the tactile measuring method.
• the lamellae 4 ' are layered.
• the lamellae 4' are also spherical in their curvature, with pivot bearing axes 6 'of pivot bearings 5' again having to be aligned with the center of curvature C of the sphere.
• a guide system known from the prior art can be provided for guiding the slats 4 ', which has an inner ring with a fixed axis, an outer ring with a grooved ring and pins.
• both the fixed ring and the moving grooved ring are provided with a spherical surface.

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• Physics & Mathematics (AREA)
• General Physics & Mathematics (AREA)
• Optics & Photonics (AREA)
• Diaphragms For Cameras (AREA)
• Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
• Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Priority Applications (2)

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Cited By (5)

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Citations (2)

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• 2004
  • 2004-07-02 US US10/566,196 patent/US8009343B2/en not_active Expired - Fee Related
  • 2004-07-02 WO PCT/EP2004/007186 patent/WO2005019878A1/de not_active Ceased
  • 2004-07-02 JP JP2006522245A patent/JP5620039B2/ja not_active Expired - Fee Related
• 2011
  • 2011-08-08 JP JP2011173442A patent/JP5639971B2/ja not_active Expired - Fee Related

Patent Citations (2)

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