JP5199068B2 - 光学エレメント調整組立体 - Google Patents
光学エレメント調整組立体 Download PDFInfo
- Publication number
- JP5199068B2 JP5199068B2 JP2008510485A JP2008510485A JP5199068B2 JP 5199068 B2 JP5199068 B2 JP 5199068B2 JP 2008510485 A JP2008510485 A JP 2008510485A JP 2008510485 A JP2008510485 A JP 2008510485A JP 5199068 B2 JP5199068 B2 JP 5199068B2
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- Prior art keywords
- optical element
- elastic
- elastic means
- mount
- assembly according
- Prior art date
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- 230000003287 optical effect Effects 0.000 title claims description 118
- 230000033001 locomotion Effects 0.000 claims description 17
- 238000001393 microlithography Methods 0.000 claims description 3
- 230000005489 elastic deformation Effects 0.000 claims 1
- 230000007246 mechanism Effects 0.000 description 12
- 230000009467 reduction Effects 0.000 description 8
- 239000002184 metal Substances 0.000 description 7
- 239000013013 elastic material Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
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- 230000003628 erosive effect Effects 0.000 description 2
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- 229910000831 Steel Inorganic materials 0.000 description 1
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- 239000000835 fiber Substances 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
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Images
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/003—Alignment of optical elements
- G02B7/005—Motorised alignment
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
- G02B7/023—Mountings, adjusting means, or light-tight connections, for optical elements for lenses permitting adjustment
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Lens Barrels (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Mounting And Adjusting Of Optical Elements (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Description
Claims (13)
- 光学エレメントをマウントに対して位置決めするための組立体であって、前記光学エレメントが位置決め構造によって位置決め可能であるものにおいて、
前記位置決め構造は、第1の位置から第2の位置まで延びる、少なくとも一つの弾性手段を有する位置決め手段を備え、
前記弾性手段は、前記第2の位置で、前記光学エレメント自体、前記光学エレメントのフランジ、前記光学エレメントを保持するホルダー、および、前記光学エレメントを支持するサポートのうちいずれか一つに機械的に結合し、
前記弾性手段は、外部から加えられる前記第1の位置における前記弾性手段の第1の動きが、独立に二つの自由度で前記光学エレメントの位置決めの動きを生成するように、前記第2の位置における前記弾性手段の第2の動きを生ぜしめ、
前記弾性手段は、前記位置決め手段が実質的に剛体手段であったとした場合と比較して、前記弾性手段の前記第1の位置と前記第2の位置との間の弾性的な変形により、前記第1の動きを前記第2の動きに縮小して伝達するものであり、
前記弾性手段は、弾性てこ又は弾性ロッドを含むことを特徴とする組立体。 - 前記弾性手段は、前記第2の位置で前記ホルダー又は前記サポートに結合し、前記ホルダー又は前記サポートが、前記弾性手段によって力、又は、トルクが加えられる少なくとも一つの平衡(isostatic)マウントを含み、
前記平衡マウントは少なくとも二つの自由度で調整可能である、ことを特徴とする請求項1に記載の組立体。 - 前記少なくとも一つの平衡マウントがバイポッドである、又は、バイポッド構造である、ことを特徴とする請求項2に記載の組立体。
- 前記弾性手段は、二つの圧電又は電歪アクチュエータ、二つのモータ、および、二つの空気圧又は油圧手段により、二つの方向、又は、自由度の各々で移動可能であることを特徴とする請求項1から3のいずれか1項に記載の組立体。
- 三つの前記弾性手段を備え、各々の前記弾性手段が二つの方向、又は、複数の自由度で、移動可能であるように設けられる、ことを特徴とする請求項1から4のいずれか1項に記載の組立体。
- 前記三つの弾性手段は、互いに実質的に120度の角度離れて配置されている、ことを特徴とする請求項5に記載の組立体。
- 前記弾性手段は、少なくとも一つのねじ、特にマイクロメータねじによって移動可能、又は、調整可能である、ことを特徴とする請求項1から6のいずれか1項に記載の組立体。
- 前記マウントは、外側リングを備え、前記少なくとも一つのねじが、前記外側リング、又は、前記外側リングに接続された中間リング(27)に担持される、ことを特徴とする請求項7に記載の組立体。
- 前記中間リング(27)が、静的に固定されるような仕方で前記外側リングに結合されている、ことを特徴とする請求項8に記載の組立体。
- 前記中間リング(27)がばねエレメントによって前記外側リングに結合されている、ことを特徴とする請求項9に記載の組立体。
- 前記ばねエレメントが、前記中間リング(27)と前記外側リングの間で互いから少なくとも実質的に等しい距離離れて分布している、ことを特徴とする請求項10に記載の組立体。
- 前記ばねエレメントが堅い(stiff)、ことを特徴とする請求項10、又は、11に記載の組立体。
- 投影対物レンズが、請求項1から12の何れか1項に記載の組立体を備えることを特徴とするマイクロリソグラフィー用の投影露光装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US67968705P | 2005-05-09 | 2005-05-09 | |
US60/679,687 | 2005-05-09 | ||
PCT/EP2006/004337 WO2006119970A2 (en) | 2005-05-09 | 2006-05-09 | Assembly for adjusting an optical element |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2008541160A JP2008541160A (ja) | 2008-11-20 |
JP2008541160A5 JP2008541160A5 (ja) | 2009-06-25 |
JP5199068B2 true JP5199068B2 (ja) | 2013-05-15 |
Family
ID=36649826
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008510485A Expired - Fee Related JP5199068B2 (ja) | 2005-05-09 | 2006-05-09 | 光学エレメント調整組立体 |
Country Status (3)
Country | Link |
---|---|
US (1) | US20090207511A1 (ja) |
JP (1) | JP5199068B2 (ja) |
WO (1) | WO2006119970A2 (ja) |
Families Citing this family (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102007014155A1 (de) * | 2007-03-20 | 2008-09-25 | Jenoptik Laser, Optik, Systeme Gmbh | Optikfassung und optisches Bauelement mit einer derartigen Optikfassung |
WO2008122313A1 (en) * | 2007-04-05 | 2008-10-16 | Carl Zeiss Smt Ag | Optical element module with imaging error and position correction |
DE102007045975A1 (de) * | 2007-09-25 | 2009-04-09 | Carl Zeiss Smt Ag | Optische Einrichtung mit einstellbarer Kraftwirkung auf ein optisches Modul |
NL1036701A1 (nl) | 2008-04-15 | 2009-10-19 | Asml Holding Nv | Apparatus for supporting an optical element, and method of making same. |
DE102008029161B3 (de) * | 2008-06-19 | 2009-10-08 | Jenoptik Laser, Optik, Systeme Gmbh | Lateral verstellbare optische Fassung mit Kniehebelmanipulatoreinheiten |
DE102008032853A1 (de) | 2008-07-14 | 2010-01-21 | Carl Zeiss Smt Ag | Optische Einrichtung mit einem deformierbaren optischen Element |
DE102009044957A1 (de) | 2008-09-30 | 2010-04-08 | Carl Zeiss Smt Ag | Stützelemente für ein optisches Element |
DE102008063223B3 (de) | 2008-12-23 | 2010-09-09 | Jenoptik Laser, Optik, Systeme Gmbh | Monolithische optische Fassung |
WO2010098474A1 (ja) * | 2009-02-27 | 2010-09-02 | 株式会社 ニコン | 光学素子保持装置、光学系、露光装置、デバイスの製造方法及び光学素子の交換方法 |
DE102009031690A1 (de) * | 2009-06-26 | 2010-09-23 | Carl Zeiss Laser Optics Gmbh | Optische Anordnung |
DE102009037133B4 (de) * | 2009-07-31 | 2013-01-31 | Carl Zeiss Laser Optics Gmbh | Haltevorrichtung für ein optisches Element |
DE102009037135B4 (de) * | 2009-07-31 | 2013-07-04 | Carl Zeiss Laser Optics Gmbh | Haltevorrichtung für ein optisches Element |
DE102009045163B4 (de) | 2009-09-30 | 2017-04-06 | Carl Zeiss Smt Gmbh | Optische Anordnung in einer mikrolithographischen Projektionsbelichtungsanlage |
US8591048B2 (en) * | 2009-10-30 | 2013-11-26 | Flir Systems, Inc. | Spatially efficient kinematic mirror mount |
TWI542952B (zh) | 2010-12-02 | 2016-07-21 | Asml控股公司 | 圖案化裝置支撐件 |
DE102011088735A1 (de) | 2010-12-20 | 2012-06-21 | Carl Zeiss Smt Gmbh | Anordnung zur Halterung eines optischen Elementes, insbesondere in einer EUV-Projektionsbelichtungsanlage |
DE102012025493A1 (de) | 2012-12-21 | 2014-06-26 | Manfred Steinbach | Präzisionshalterung |
JP2016508626A (ja) * | 2013-02-13 | 2016-03-22 | ザイゴ コーポレーションZygo Corporation | 一体化されたフレクシャを有するモノリシック光学構成要素 |
GB2513927A (en) * | 2013-05-10 | 2014-11-12 | Zeiss Carl Smt Gmbh | Optical element arrangement with an optical element split into optical sub-elements |
CN112068277B (zh) * | 2020-08-31 | 2021-08-20 | 中国科学院长春光学精密机械与物理研究所 | 大口径光学透镜的多级柔性支撑结构 |
DE102020212927A1 (de) * | 2020-10-14 | 2022-04-14 | Carl Zeiss Smt Gmbh | Abstützung eines optischen elements |
CN113341532B (zh) * | 2021-06-30 | 2022-05-17 | 中国科学院长春光学精密机械与物理研究所 | 高精度、高稳定性、紧凑的望远镜三镜俯仰调整机构 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5214529A (en) * | 1992-05-29 | 1993-05-25 | Eastman Kodak Company | Assembly for static and dynamic positional control of an optical element |
DE19825716A1 (de) * | 1998-06-09 | 1999-12-16 | Zeiss Carl Fa | Baugruppe aus optischem Element und Fassung |
US6220717B1 (en) * | 2000-06-06 | 2001-04-24 | Anthony Pastore | Mirror for use with elevated hunter stand |
KR100775796B1 (ko) * | 2000-08-18 | 2007-11-12 | 가부시키가이샤 니콘 | 광학소자 유지장치 |
JP4770090B2 (ja) * | 2000-08-18 | 2011-09-07 | 株式会社ニコン | 光学素子保持装置、鏡筒及び露光装置並びにマイクロデバイスの製造方法 |
DE10140608A1 (de) * | 2001-08-18 | 2003-03-06 | Zeiss Carl | Vorrichtung zur Justage eines optischen Elements |
US20030234918A1 (en) * | 2002-06-20 | 2003-12-25 | Nikon Corporation | Adjustable soft mounts in kinematic lens mounting system |
JP3805323B2 (ja) * | 2003-05-21 | 2006-08-02 | キヤノン株式会社 | 露光装置、収差低減方法及び光学部材調整機構 |
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2006
- 2006-05-09 JP JP2008510485A patent/JP5199068B2/ja not_active Expired - Fee Related
- 2006-05-09 WO PCT/EP2006/004337 patent/WO2006119970A2/en active Application Filing
- 2006-05-09 US US11/914,055 patent/US20090207511A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
US20090207511A1 (en) | 2009-08-20 |
JP2008541160A (ja) | 2008-11-20 |
WO2006119970A2 (en) | 2006-11-16 |
WO2006119970A3 (en) | 2007-01-04 |
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