JP5353810B2 - 露光装置、露光方法、並びにデバイス製造方法 - Google Patents

露光装置、露光方法、並びにデバイス製造方法 Download PDF

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Publication number
JP5353810B2
JP5353810B2 JP2010108698A JP2010108698A JP5353810B2 JP 5353810 B2 JP5353810 B2 JP 5353810B2 JP 2010108698 A JP2010108698 A JP 2010108698A JP 2010108698 A JP2010108698 A JP 2010108698A JP 5353810 B2 JP5353810 B2 JP 5353810B2
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Prior art keywords
liquid
substrate
optical system
projection optical
exposure
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Expired - Fee Related
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JP2010108698A
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Japanese (ja)
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JP2010187019A (ja
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博之 長坂
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Nikon Corp
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Nikon Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/42—Projection printing apparatus, e.g. enlarger, copying camera for automatic sequential copying of the same original
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70325—Resolution enhancement techniques not otherwise provided for, e.g. darkfield imaging, interfering beams, spatial frequency multiplication, nearfield lenses or solid immersion lenses
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • H10P76/204—
    • H10P76/2041—

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP2010108698A 2003-05-23 2010-05-10 露光装置、露光方法、並びにデバイス製造方法 Expired - Fee Related JP5353810B2 (ja)

Priority Applications (1)

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JP2010108698A JP5353810B2 (ja) 2003-05-23 2010-05-10 露光装置、露光方法、並びにデバイス製造方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2003146424 2003-05-23
JP2003146424 2003-05-23
JP2010108698A JP5353810B2 (ja) 2003-05-23 2010-05-10 露光装置、露光方法、並びにデバイス製造方法

Related Parent Applications (1)

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JP2004151715A Division JP4720106B2 (ja) 2003-05-23 2004-05-21 露光方法、並びにデバイス製造方法

Publications (2)

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JP2010187019A JP2010187019A (ja) 2010-08-26
JP5353810B2 true JP5353810B2 (ja) 2013-11-27

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JP2010108698A Expired - Fee Related JP5353810B2 (ja) 2003-05-23 2010-05-10 露光装置、露光方法、並びにデバイス製造方法
JP2010108738A Expired - Fee Related JP5353811B2 (ja) 2003-05-23 2010-05-10 露光装置、露光方法、及びデバイス製造方法
JP2012210090A Expired - Fee Related JP5454645B2 (ja) 2003-05-23 2012-09-24 露光装置、並びにデバイス製造方法
JP2013083820A Expired - Lifetime JP5516791B2 (ja) 2003-05-23 2013-04-12 露光装置、露光方法、並びにデバイス製造方法
JP2013242938A Expired - Fee Related JP5751316B2 (ja) 2003-05-23 2013-11-25 露光装置、露光方法、並びにデバイス製造方法
JP2014132785A Expired - Fee Related JP5787008B2 (ja) 2003-05-23 2014-06-27 露光装置、露光方法、並びにデバイス製造方法
JP2015007528A Expired - Fee Related JP5831652B2 (ja) 2003-05-23 2015-01-19 露光装置、露光方法、並びにデバイス製造方法
JP2015120109A Expired - Fee Related JP6065943B2 (ja) 2003-05-23 2015-06-15 露光装置、露光方法、並びにデバイス製造方法
JP2016003686A Expired - Fee Related JP6008056B2 (ja) 2003-05-23 2016-01-12 露光装置、露光方法、並びにデバイス製造方法
JP2016217693A Expired - Fee Related JP6195005B2 (ja) 2003-05-23 2016-11-08 露光装置、露光方法、並びにデバイス製造方法

Family Applications After (9)

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JP2010108738A Expired - Fee Related JP5353811B2 (ja) 2003-05-23 2010-05-10 露光装置、露光方法、及びデバイス製造方法
JP2012210090A Expired - Fee Related JP5454645B2 (ja) 2003-05-23 2012-09-24 露光装置、並びにデバイス製造方法
JP2013083820A Expired - Lifetime JP5516791B2 (ja) 2003-05-23 2013-04-12 露光装置、露光方法、並びにデバイス製造方法
JP2013242938A Expired - Fee Related JP5751316B2 (ja) 2003-05-23 2013-11-25 露光装置、露光方法、並びにデバイス製造方法
JP2014132785A Expired - Fee Related JP5787008B2 (ja) 2003-05-23 2014-06-27 露光装置、露光方法、並びにデバイス製造方法
JP2015007528A Expired - Fee Related JP5831652B2 (ja) 2003-05-23 2015-01-19 露光装置、露光方法、並びにデバイス製造方法
JP2015120109A Expired - Fee Related JP6065943B2 (ja) 2003-05-23 2015-06-15 露光装置、露光方法、並びにデバイス製造方法
JP2016003686A Expired - Fee Related JP6008056B2 (ja) 2003-05-23 2016-01-12 露光装置、露光方法、並びにデバイス製造方法
JP2016217693A Expired - Fee Related JP6195005B2 (ja) 2003-05-23 2016-11-08 露光装置、露光方法、並びにデバイス製造方法

Country Status (7)

Country Link
US (9) US7495744B2 (enExample)
EP (6) EP3279740A1 (enExample)
JP (10) JP5353810B2 (enExample)
KR (12) KR101544655B1 (enExample)
HK (3) HK1205282A1 (enExample)
TW (9) TWI511181B (enExample)
WO (1) WO2004105106A1 (enExample)

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